WO2018184375A1 - 一种光衍射器件及其制备方法和三维显示装置 - Google Patents

一种光衍射器件及其制备方法和三维显示装置 Download PDF

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WO2018184375A1
WO2018184375A1 PCT/CN2017/106807 CN2017106807W WO2018184375A1 WO 2018184375 A1 WO2018184375 A1 WO 2018184375A1 CN 2017106807 W CN2017106807 W CN 2017106807W WO 2018184375 A1 WO2018184375 A1 WO 2018184375A1
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phase
light diffraction
transparent substrate
light
optical element
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PCT/CN2017/106807
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English (en)
French (fr)
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邵仁锦
浦东林
朱鹏飞
张瑾
朱鸣
陈林森
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苏州苏大维格光电科技股份有限公司
苏州大学
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Publication of WO2018184375A1 publication Critical patent/WO2018184375A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46—Systems using spatial filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

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  • the present invention relates to the field of display device technologies, and more particularly to a depth-sensing light diffraction device, a method for fabricating the same, and a three-dimensional display device.
  • Vision is the most direct way for human observation and cognitive world. With the continuous improvement of human pursuit, how to make machine or smart device have human-like 3D visual perception ability, thus realize the natural interaction between human and machine, human and network world. The virtual interaction, and even the interaction between machines and machines, has become a hot topic of the moment.
  • the prerequisite for human-computer interaction is that the machine or smart device can establish a three-dimensional image of the real scene. This requires the machine or smart device to deeply perceive the real scene and obtain the depth information of the real scene.
  • the key technology used is called depth perception technology. .
  • depth perception technology plays an indispensable role in promoting the development of virtual reality, augmented reality, intelligent robots, drones, smart phones, intelligent monitoring, plastic surgery and other emerging industries.
  • the mainstream depth perception technologies include three types, stereo vision technology, time-of-flight technology and structured light technology.
  • structured light technology Compared with the first two depth sensing technologies, structured light technology has the advantages of being unaffected by ambient light, simple stereo matching algorithm, and more stable and accurate depth information. It will become human-computer interaction for a long time now and in the future.
  • Mainstream technologies in the field of deep acquisition of smart devices. Typical products currently using structured light depth sensing technology are produced by Microsoft Corporation. Kinect series depth camera, structured light depth sensing module used by Google's Project tango project and Microsoft Hololens depth camera.
  • structured light can be classified into an illumination projection type and a laser diffraction type.
  • the resolution, field of view and depth of focus of the illumination projection type structured light have their own limitations.
  • the laser diffraction type structured light can obtain a higher quality structured light image due to the diffraction characteristics of its optical structure.
  • laser diffraction structured light technology is gradually becoming the mainstream of high-resolution, high-matching precision 3D depth information.
  • the depth sensing module of the Kinect generation of Microsoft's somatosensory interaction device is to obtain the depth information of the real object by forming a laser speckle image through the diffractive optical element.
  • the structured light image acquired from the surface of the measured object is an information source reflecting the three-dimensional shape of the target object. Therefore, the resolution, contrast, and angle of view of the structured light image are directly related to the reliability of the depth information. With precision.
  • the resolution, contrast and field of view of the laser-diffracted structured light image depend on the diffraction unit size and phase matching accuracy of the structured light element. So far, in the structured light application represented by the kinect depth camera, the diffraction unit size of the structured light diffraction element can only be limited to the order of micrometers, which greatly limits the resolution, contrast and angle of view of the structured light image. It is difficult to fully exhibit the advantages of diffractive structured light.
  • the present invention proposes a nano-scale light diffraction device based on random laser speckle.
  • the light diffraction device has advantages such as high resolution, high contrast, and large field of view.
  • the lithography technology proposed by the invention has the advantages of high speed, low cost and the like.
  • a method for fabricating a light diffraction device comprising the steps of:
  • the invention provides a method for fabricating a nano-scale diffraction device, namely phase-phase optical field interference lithography.
  • a high quality depth sensing light diffraction device can be prepared by this method.
  • the phase optical field interference lithography method proposed by the invention has the advantages of high resolution and high phase matching precision, and the invention is compared with lithography techniques such as ultraviolet projection exposure and electron beam direct writing.
  • the proposed lithography technology has the advantages of high speed and low cost.
  • step s2 comprises the following steps:
  • step s22 according to the grating equation:
  • the minimum diffraction unit size of the diffractive optical element be D1
  • magnification ratio a 5-100 times.
  • the proportional engraving is a photolithography method that combines lens refraction and laser interference lithography and satisfies nanometer resolution.
  • the diffraction angle of the diffractive optical element is inversely proportional to the diffraction unit size when the wavelength is constant.
  • the phase light field interference lithography direct writing device comprises:
  • a beam expander lens wherein the laser beam generated by the laser generating device forms a parallel beam through the beam expander lens
  • the parallel beam is subjected to spot shaping by a spatial light modulator to form a beam spot;
  • the spot beam is imaged on the plane of the diffractive optical element of the back focal plane through the 4f optical component to form a plurality of diffracted lights;
  • the projection objective lens the diffracted light is concentrated by the projection objective on the surface of the transparent substrate to perform interference exposure to form a nano-scale structured light diffraction pattern.
  • the micro-scale phase-type diffractive optical element is placed in the phase-phase optical field interference lithography direct writing device, and then the laser generating device is turned on;
  • a laser beam generated by the laser generating device forms a parallel beam through a beam expander lens
  • Parallel beams are spot-shaped by a spatial light modulator to form a beam of a particular shape
  • the beam of light is imaged on the plane of the diffractive optical element of the back focal plane through a 4f optical component to form a plurality of diffracted lights;
  • the diffracted light is subjected to interference exposure by a projection layer concentrated on a surface of the transparent substrate by a projection objective to form a nano-scale structured light diffraction pattern.
  • the photoresist pattern is transferred onto the transparent substrate by dry etching to finally form a nano-scale light diffraction element having a phase depth of relief type.
  • the present invention also provides a micro-scale phase-type diffractive optical element, that is, a second-order surface relief type diffractive optical element comprising a transparent substrate and a black-and-white distribution of a random speckle spectrum bitmap on which the surface of the transparent substrate is disposed, the random speckle spectrum
  • the black and white distribution of the bitmap is a second-order surface relief of the micrometer.
  • the present invention also provides a light diffraction device comprising a transparent substrate and a black and white distribution of random speckle spectral bitmaps on which the surface of the transparent substrate is disposed, the black and white distribution of the random speckle spectral bitmap being a nanoscale second-order surface relief.
  • the present invention also provides a three-dimensional display device comprising the light diffraction device prepared by the above method, or the above-described light diffraction device.
  • 1 is a schematic diagram of calculating a binary bitmap generating random speckle using a fast Fourier transform algorithm of laser diffraction
  • FIG. 2 is a schematic diagram of converting a speckle bitmap into a second-order spectral bitmap by using a Fourier transform algorithm
  • FIG. 3 is a schematic diagram of processing a second-order spectral bit pattern feature onto a surface of a transparent substrate to form a nano-scale phase-type diffractive optical element having a phase depth of a relief structure;
  • FIG. 4 is a schematic view showing a relationship between a diffraction angle ⁇ and a viewing angle of a nano-structured light diffraction device
  • FIG. 5 is a schematic view of a light-diffracting device for forming a depth-sensing device using a phase-light field interference lithography direct writing device
  • a method for fabricating a light diffraction device comprising the steps of:
  • the invention provides a method for fabricating a nano-scale diffraction device, namely phase-phase optical field interference lithography.
  • High quality depth-sensing structured light diffraction devices can be prepared by this method.
  • the phase optical field interference lithography method proposed by the invention has the advantages of high resolution and high phase matching precision, and the invention is compared with lithography techniques such as ultraviolet projection exposure and electron beam direct writing.
  • the proposed lithography technology has the advantages of high speed and low cost.
  • Step s2 includes the following steps:
  • step s22 applying a photoresist layer on the surface of the transparent substrate, placing the micro-scale phase-type diffractive optical element in a phase-phase optical field interference lithography direct writing device for direct writing lithography, and patterning the micron-order phase-type diffractive optical element
  • the photoresist layer is turned into a surface of the transparent substrate in proportion and etched to form a nano-scale light diffraction element.
  • step s22 according to the grating equation:
  • D2 0.1 ⁇ m is obtained according to the above relationship.
  • the proportional engraving is a photolithography method that combines lens refraction and laser interference lithography and satisfies nanometer resolution.
  • the diffraction angle of the diffractive optical element is inversely proportional to the diffraction unit size when the wavelength is constant.
  • the depth of the phase formed by the transparent substrate 7 and its surface is the relief structure 71.
  • the phase optical field interference lithography direct writing device comprises:
  • Laser generating device 1 Laser
  • the laser beam generated by the laser generating device 1 passes through the beam expander lens 2 to form a parallel beam;
  • the spatial light modulator SLM element 3 the parallel beam is subjected to spot shaping through the SLM element 3 (Spatial Light Modulator) to form a spot beam of a characteristic shape;
  • Projection objective lens 6 the diffracted light is concentrated by the projection objective 6 on the surface of the transparent substrate 7 to perform interference exposure to form a nano-scale light diffraction pattern.
  • Fig. 5 Also shown in Fig. 5 are reflectors 82 and 82 for changing the direction of the beam, which can be selected as needed or required.
  • step s22 the prepared micro-scale phase-type diffractive optical element 5 is placed in the phase-phase optical field interference lithography direct writing device, as shown in Figure 5, and then the laser generating device 1 is turned on;
  • the laser beam generated by the laser generating device 1 passes through the expanding lens 2 to form a parallel beam;
  • the parallel beam is subjected to spot shaping through a SLM element 3 (Spatial Light Modulator) to form a spot beam of a specific shape;
  • SLM element 3 Spaal Light Modulator
  • the beam of light is imaged by the 4f optical component 4 on the plane of the micro-scale phase-type diffractive optical element 5 of the back focal plane to form a plurality of diffracted lights;
  • the diffracted light is concentrated by the projection objective 6 on the surface of the transparent substrate 7 to perform interference exposure to form a nano-scale light diffraction pattern.
  • the photoresist pattern is transferred to the transparent substrate by dry etching, and finally a nano-scale light diffraction element having a depth of embossing is formed, that is, a light diffraction device facing the depth perception.
  • the manufacturing method provided by the invention improves the precision of the minimum diffraction unit, thereby improving the resolution and the angle of view, and the regularity of the smallest diffraction unit produced is better. It ensures the sharpness of the light after diffraction and improves the contrast.
  • the present invention also provides a micro-scale phase-type diffractive optical element, that is, a second-order surface relief type diffractive optical element, comprising a transparent substrate and a black and white distribution of random speckle spectrum bitmaps on the surface of the transparent substrate.
  • the black and white distribution of the random speckle spectrum bitmap is a second-order surface relief of the micrometer order.
  • the present invention also provides a depth-sensing light diffraction device comprising a transparent substrate and a black-and-white distribution of a random speckle spectrum bitmap of the surface of the transparent substrate, the black-and-white distribution of the random speckle spectrum bitmap being nano-order second-order Surface relief.
  • the invention proposes a nano-scale light diffraction device based on random laser speckle, that is, a depth-sensing light diffraction device.
  • the diffraction structure unit of the light diffraction device has only a few hundred nanometers or even several tens of nanometers, and has the advantages of high resolution, high contrast and large field of view.
  • the present invention also provides a three-dimensional display device comprising the depth-sensing-oriented light diffraction device prepared by the foregoing method, or the aforementioned depth-sensing-oriented light diffraction device, and an image generating device.
  • a three-dimensional display device comprising the depth-sensing-oriented light diffraction device prepared by the foregoing method, or the aforementioned depth-sensing-oriented light diffraction device, and an image generating device.
  • the transparent substrate 7 can be prepared by selecting a transparent material such as quartz glass or transparent resin.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种基于随机激光散斑的纳米级结构光衍射器件，衍射结构单元只有几百纳米，甚至几十纳米，具有分辨率高，对比度高和视场角大等优势。纳米级衍射器件的制作方法即位相光场干涉光刻法，可以制备出高品质的深度感知结构光衍射器件。相比于传统的光学元件加工技术，位相光场干涉光刻法具有分辨率高和位相匹配精度高等优势，与紫外投影曝光和电子束直写等光刻技术相比，具有速度快、成本低等优势。

Description

一种光衍射器件及其制备方法和三维显示装置
本申请要求了申请日为2017年04月06日,申请号201710222207.7,发明名称为“一种光衍射器件及其制备方法和三维显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本发明涉及显示设备技术领域，更具体地说，涉及一种面向深度感知的光衍射器件及其制备方法和三维显示装置。
背景技术
视觉是人类观察与认知世界最直接的途径，随着人类追求的不断提高，如何让机器或智能设备具有类似人眼的3D视觉感知能力，从而实现人与机器的自然交互、人与网络世界的虚拟交互、甚至机器与机器之间的交互成为时下的技术热点。人机交互的前提条件是机器或智能设备能够建立真实场景的三维图像，这就需要机器或智能设备对真实场景进行深度感知，获取真实场景的深度信息，其中利用的关键技术称为深度感知技术。深度感知技术作为获取三维图像的关键共性技术，对推动虚拟现实、增强现实、智能机器人、无人机、智能手机、智能监控、整形医疗等新兴产业的深入发展起着不可或缺的作用。主流的深度感知技术包括三种，立体视觉技术、飞行时间法技术和结构光技术。相较于前两种深度感知技术，结构光技术具有不受环境光影响、立体匹配算法简单、获取的深度信息更稳定准确等优势，当前和未来很长一段时间内，将成为人机交互、智能设备深度获取等领域的主流技术。当前采用结构光深度感知技术的典型产品有微软公司出品的 Kinect系列深度相机、谷歌的Project tango项目所用的结构光深度感知模组和微软Hololens深度摄像头等。
根据形成机制的不同，结构光可分为照明投影型和激光衍射型。照明投影型结构光的分辨率、视场角和焦深都具有自身的局限性，相比于前者，激光衍射型结构光因其光学结构的衍射特性而能够获得更高品质的结构光图像。随着增强现实、机器视觉、智能手机等深度感知应用领域对高质量三维深度信息的要求越来越高，激光衍射型结构光技术正逐渐成为获得高分辨率、高匹配精度三维深度信息的主流技术手段。微软体感交互设备Kinect一代的深度感知模组就是通过衍射光学元件形成激光散斑图像来获取真实物体的深度信息。
结构光感知技术中，从被测物体表面获取的结构光图像是反映目标物体三维形貌的信息源，因此结构光图像的分辨率、对比度、视场角等特性直接关系到深度信息的可靠性与精确度。激光衍射型结构光图像的分辨率、对比度和视场角取决于结构光元件的衍射单元尺寸和位相匹配精度。目前为止，以kinect深度相机为代表的结构光应用中，结构光衍射元件的衍射单元尺寸仅能局限于微米量级，这大大限制了结构光图像的分辨率、对比度和视场角等特性，难以充分展现衍射型结构光的优势。
发明内容
为了获取更高品质的结构光图像，本发明提出了一种基于随机激光散斑的纳米级光衍射器件。该光衍射器件具有分辨率高，对比度高和视场角大等优势。本发明提出的光刻技术具有速度快、成本低等优势。
为达到上述目的，本发明的技术方案如下：
一种光衍射器件的制作方法，包括以下步骤：
s1，利用傅里叶变换算法计算出随机散斑的二阶频谱位图；
s2，将二阶频谱位图形貌特征加工到透明基底表面，形成位相深度为浮雕结构的位相型衍射光学元件。
本发明提出一种纳米级衍射器件的制作方法，即位相光场干涉光刻法。利用该方法可以制备出高品质的深度感知光衍射器件。相比于传统的光学元件加工技术，本发明提出的位相光场干涉光刻法具有分辨率高和位相匹配精度高等优势，与紫外投影曝光和电子束直写等光刻技术相比，本发明提出的光刻技术具有速度快、成本低等优势。
优选的，步骤s2包括以下步骤：
s21，首先制备微米级位相型衍射光学元件，即将所述随机散斑的二阶频谱位图的黑白分布加工到透明基底表面，形成微米级位相型二阶的表面浮雕型的微米级位相型衍射光学元件；
s22，在透明基底表面涂覆光刻胶层，将微米级位相型衍射光学元件放置于位相光场干涉光刻直写装置中进行直写光刻，将此微米级位相型衍射光学元件图形结构按比例转刻到透明基底表面的光刻胶层，蚀刻后形成纳米级光衍射元件。
优选的，步骤s22中，根据光栅方程：
Λ·sinθ＝±m·λ，m＝0，1，2，…
设衍射光学元件的最小衍射单元尺寸为D1，在投影物镜下进行位相光场干涉光刻，得到的最小衍射单元尺寸满足D2＝(D1/a)/2的关系式，其中a为投影物镜的微缩倍率。
一般而言，优选微缩倍率a＝5-100倍。
设微米级位相型衍射光学元件的最小衍射单元尺寸为D1，在微缩倍率a＝5-100d的投影物镜下进行位相光场干涉光刻，得到的最小衍射单元尺寸满足D2＝(D1/a)/2的关系式。例如当D1＝10μm，a＝50时，根据上述关系式，得到D2＝0.1μm。
优选的，步骤s22中，按比例转刻是通过透镜微缩和激光干涉光刻相结合且满足纳米级的分辨率的光刻方法。
从而能够达到纳米级的分辨率和高位相匹配精度，高位相匹配精度决定了结构光的高对比度；由光栅方程可知，波长一定的情况下，衍射光学元件的衍射角和衍射单元尺寸成反比，衍射单元尺寸越小，衍射角越大，所以纳米级结构光衍射器件能够实现大视场角的结构光图像。
优选的，步骤s22中，所述位相光场干涉光刻直写装置包括：
激光发生装置；
扩束透镜，所述激光发生装置发生的激光束经过扩束透镜形成平行光束；
空间光调制器，平行光束经过空间光调制器进行光斑整形，形成一个光斑束；
4f光学组件，光斑束经过4f光学组件成像于后焦面的衍射光学元件平面，形成多束衍射光；
投影物镜，衍射光通过投影物镜汇聚于透明基底表面的光刻胶层进行干涉曝光，形成纳米级结构光衍射图形。
优选的，步骤s22中，将微米级位相型衍射光学元件放置于所述位相光场干涉光刻直写装置中，然后开启激光发生装置；
所述激光发生装置发生的激光束经过扩束透镜形成平行光束；
平行光束经过空间光调制器进行光斑整形，形成一个特定形状的光斑束；
光斑束经过4f光学组件成像于后焦面的衍射光学元件平面，形成多束衍射光；
衍射光通过投影物镜汇聚于透明基底表面的光刻胶层进行干涉曝光，形成纳米级结构光衍射图形。
优选的，步骤s22中，通过干法刻蚀将光刻胶图形转移到透明基底上，最终形成位相深度为浮雕型的纳米级光衍射元件。
本发明还提供一种微米级位相型衍射光学元件，即二阶的表面浮雕型衍射光学元件，包括透明基底和设置透明基底表面的随机散斑频谱位图的黑白分布，所述随机散斑频谱位图的黑白分布为微米级二阶的表面浮雕。
本发明还提供一种光衍射器件，包括透明基底和设置透明基底表面的随机散斑频谱位图的黑白分布，所述随机散斑频谱位图的黑白分布为纳米级二阶的表面浮雕。
本发明还提供一种三维显示装置，包括上述方法制备的光衍射器件，或上述光衍射器件。
附图说明
为了更清楚地说明本发明实施例技术中的技术方案，下面将对实施例技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是利用激光衍射的快速傅里叶变换算法计算产生随机散斑的二值位图的示意图；
图2是利用傅里叶变换算法将散斑位图转换为二阶频谱位图的示意图；
图3是将二阶频谱位图形貌特征加工到透明基底表面，形成位相深度为浮雕结构的纳米级位相型衍射光学元件的示意图；
图4是衍射角θ与纳米级结构光衍射器件的视场角关系的示意图；图5是利用位相光场干涉光刻直写装置制备面向深度感知的光衍射器件的示意图；
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
一种光衍射器件的制作方法，包括以下步骤：
s1，利用激光衍射的快速傅里叶变换算法(也可以是其他傅里叶变换算法)计算出随机散斑的二阶频谱位图；如图1和图2所示。
s2，将二阶频谱位图形貌特征加工到透明基底表面，形成位相深度为浮雕结构的位相型衍射光学元件。如图3所示。
本发明提出一种纳米级衍射器件的制作方法，即位相光场干涉光刻法。利用该方法可以制备出高品质的深度感知结构光衍射器件。相比于传统的光学元件加工技术，本发明提出的位相光场干涉光刻法具有分辨率高和位相匹配精度高等优势，与紫外投影曝光和电子束直写等光刻技术相比，本发明提出的光刻技术具有速度快、成本低等优势。
步骤s2包括以下步骤：
s21，首先制备微米级位相型衍射光学元件，即将所述随机散斑频谱位图的 黑白分布加工到透明基底表面，形成二阶的表面浮雕型的微米级位相型衍射光学元件；
s22，在透明基底表面涂覆光刻胶层，将微米级位相型衍射光学元件放置于位相光场干涉光刻直写装置中进行直写光刻，将此微米级位相型衍射光学元件图形结构按比例转刻到透明基底表面的光刻胶层，蚀刻后形成纳米级光衍射元件。优选的，步骤s22中，根据光栅方程：
Λ·sinθ＝±m·λ，m＝0，1，2，…
设微米级位相型衍射光学元件的最小衍射单元尺寸为D1，例如在微缩倍率a＝5-100的投影物镜下进行位相光场干涉光刻，得到的最小衍射单元尺寸满足D2＝(D1/a)/2的关系式。例如当D1＝10μm，a＝50时，根据上述关系式，得到D2＝0.1μm。
优选的，步骤s22中，按比例转刻是通过透镜微缩和激光干涉光刻相结合且满足纳米级的分辨率的光刻方法。从而能够达到纳米级的分辨率和高位相匹配精度，高位相匹配精度决定了结构光的高对比度；由光栅方程可知，波长一定的情况下，衍射光学元件的衍射角和衍射单元尺寸成反比，衍射单元尺寸越小，衍射角θ越大，所以纳米级光衍射器件能够实现大视场角的结构光图像，如图4。其中透明基底7及其表面形成的位相深度为浮雕结构71。
如图5所示，步骤s22中，所述位相光场干涉光刻直写装置包括：
激光发生装置1(laser)；
扩束透镜2，所述激光发生装置1发生的激光束经过扩束透镜2形成平行光束；
空间光调制器SLM元件3，平行光束经过SLM元件3(Spatial Light Modulator)进行光斑整形，形成一个特性形状的光斑束；
4f光学组件4(4f optical system)，光斑束经过4f光学组件4成像于后焦面的微米级位相型衍射光学元件5平面，形成多束衍射光；
投影物镜6(Objective lens)，衍射光通过投影物镜6汇聚于透明基底7表面的光刻胶层进行干涉曝光，形成纳米级光衍射图形。
图5中还设有用于改变光束方向的反光器(Reflector)82和82，这个可以根据需要选择是否需要或者需要设置多少。
优选的，步骤s22中，将制作好的微米级位相型衍射光学元件5放置于位相光场干涉光刻直写装置中，如图5所示，然后开启激光发生装置1；
所述激光发生装置1发生的激光束经过扩束透镜2形成平行光束；
平行光束经过SLM元件3(Spatial Light Modulator，空间光调制器)进行光斑整形，形成一个特定形状的光斑束；
光斑束经过4f光学组件4成像于后焦面的微米级位相型衍射光学元件5平面，形成多束衍射光；
衍射光通过投影物镜6汇聚于透明基底7表面的光刻胶层进行干涉曝光，形成纳米级光衍射图形。
最后，通过干法刻蚀将光刻胶图形转移到透明基底上，最终形成位相深度为浮雕型的纳米级光衍射元件，即面向深度感知的光衍射器件。
综上所述，相比于现有技术，本发明提供的制作方法提高了最小衍射单元的精度，从而提高分辨率、视场角，又可以使制作的最小衍射单元的规整度比较好，从而保证了光线经过衍射后的锐利度，提高了对比度。
本发明还提供一种微米级位相型衍射光学元件，即二阶的表面浮雕型衍射光学元件，包括透明基底和设置透明基底表面的随机散斑频谱位图的黑白分布，所 述随机散斑频谱位图的黑白分布为微米级二阶的表面浮雕。
本发明还提供一种面向深度感知的光衍射器件，包括透明基底和设置透明基底表面的随机散斑频谱位图的黑白分布，所述随机散斑频谱位图的黑白分布为纳米级二阶的表面浮雕。
本发明提出了一种基于随机激光散斑的纳米级光衍射器件即面向深度感知的光衍射器件。该光衍射器件的衍射结构单元只有几百纳米，甚至几十纳米，具有分辨率高，对比度高和视场角大等优势。
本发明还提供一种三维显示装置，包括前述方法制备的面向深度感知的光衍射器件，或前述的面向深度感知的光衍射器件，和图像生成装置。如何构建三维显示装置的相关技术方案，在先专利及现有技术已有相关说明，不再赘述。
上述透明基底7，可以选择石英玻璃、透明树脂等透明材质制备。
本说明书中各个实施例采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相似部分互相参见即可。对所公开的实施例的上述说明，使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的，本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下，在其它实施例中实现。因此，本发明将不会被限制与本文所示的这些实施例，而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。

Claims (10)

  1. 一种光衍射器件的制作方法，其特征在于，包括以下步骤：
    s1，利用傅里叶变换算法计算出随机散斑的二阶频谱位图；
    s2，将二阶频谱位图形貌特征加工到透明基底表面，形成位相深度为浮雕结构的位相型衍射光学元件。
  2. 根据权利要求1所述的光衍射器件的制作方法，其特征在于，步骤s2包括以下步骤：
    s21，首先制备微米级位相型衍射光学元件，即将所述随机散斑的二阶频谱位图的黑白分布加工到透明基底表面，形成二阶的表面浮雕型的微米级位相型衍射光学元件；
    s22，在透明基底表面涂覆光刻胶层，将微米级位相型衍射光学元件放置于位相光场干涉光刻直写装置中进行直写光刻，将此微米级位相型衍射光学元件图形结构按比例转刻到透明基底表面的光刻胶层，蚀刻后形成纳米级光衍射元件。
  3. 根据权利要求2所述的光衍射器件的制作方法，其特征在于，步骤s22中，根据光栅方程：
    Λ·sinθ＝±m·λ，m＝0，1，2，…
    设衍射光学元件的最小衍射单元尺寸为D1，在投影物镜下进行位相光场干涉光刻，得到的最小衍射单元尺寸满足D2＝(D1/a)/2的关系式，其中a为投影物镜的微缩倍率。
  4. 根据权利要求2或3所述的光衍射器件的制作方法，其特征在于，步骤s22中，按比例转刻是通过透镜微缩和激光干涉光刻相结合且满足纳米级的分辨率的光刻方法。
  5. 根据权利要求2所述的光衍射器件的制作方法，其特征在于，步骤s22中， 所述位相光场干涉光刻直写装置包括：
    激光发生装置；
    扩束透镜，所述激光发生装置发生的激光束经过扩束透镜形成平行光束；
    空间光调制器，平行光束经过空间光调制器进行光斑整形，形成一个光斑束；
    4f光学组件，光斑束经过4f光学组件成像于后焦面的衍射光学元件平面，形成多束衍射光；
    投影物镜，衍射光通过投影物镜汇聚于透明基底表面的光刻胶层进行干涉曝光，形成纳米级结构光衍射图形。
  6. 根据权利要求5所述的光衍射器件的制作方法，其特征在于，步骤s22中，将微米级位相型衍射光学元件放置于所述位相光场干涉光刻直写装置中，然后开启激光发生装置；
    所述激光发生装置发生的激光束经过扩束透镜形成平行光束；
    平行光束经过空间光调制器进行光斑整形，形成一个特定形状的光斑束；
    光斑束经过4f光学组件成像于后焦面的衍射光学元件平面，形成多束衍射光；
    衍射光通过投影物镜汇聚于透明基底表面的光刻胶层进行干涉曝光，形成纳米级结构光衍射图形。
  7. 根据权利要求6所述的光衍射器件的制作方法，其特征在于，步骤s22中，通过干法刻蚀将光刻胶图形转移到透明基底上，最终形成位相深度为浮雕型的纳米级光衍射元件。
  8. 一种微米级位相型衍射光学元件，其特征在于，包括透明基底和设置透明基底表面的随机散斑频谱位图的黑白分布，所述随机散斑频谱位图的黑白分布为微米级二阶的表面浮雕。
  9. 一种光衍射器件，其特征在于，包括透明基底和设置透明基底表面的随机散斑频谱位图的黑白分布，所述随机散斑频谱位图的黑白分布为纳米级二阶的表面浮雕。
  10. 一种三维显示装置，其特征在于，包括如权利要求1-7任一所述方法制备的光衍射器件，或权利要求9所述的光衍射器件。
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