JP7196343B1 - 皮膜密着用の下地膜を有するガラス基材、及び皮膜を設けたガラス部品 - Google Patents
皮膜密着用の下地膜を有するガラス基材、及び皮膜を設けたガラス部品 Download PDFInfo
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- 239000011521 glass Substances 0.000 title abstract description 114
- 239000000758 substrate Substances 0.000 claims abstract description 88
- 238000000576 coating method Methods 0.000 claims abstract description 47
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- 238000000034 method Methods 0.000 claims abstract description 30
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 66
- 238000005507 spraying Methods 0.000 claims description 45
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 16
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- 229910017604 nitric acid Inorganic materials 0.000 claims description 14
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- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
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- 239000005388 borosilicate glass Substances 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
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- 230000000052 comparative effect Effects 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
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- 229910019655 synthetic inorganic crystalline material Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 229940105963 yttrium fluoride Drugs 0.000 description 1
- 229940105970 yttrium iodide Drugs 0.000 description 1
- LFWQXIMAKJCMJL-UHFFFAOYSA-K yttrium(3+);triiodide Chemical compound I[Y](I)I LFWQXIMAKJCMJL-UHFFFAOYSA-K 0.000 description 1
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 description 1
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
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- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
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- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
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- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
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Abstract
Description
この実験例では、石英ガラス基材の素地面に膜厚300μmを超える厚膜の溶射皮膜を直接形成した場合における素地面と皮膜の密着性を確認した。この実験例で使用した溶射用粉末材料は、アルミナ(Al2O3)粉、シリコン(Si)粉、イットリア(Y2O3)粉、アルミナ(Al2O3)粗粉(前記アルミナ粉より粗い粒度の粉末)、イットリア安定化ジルコニア(Y2O3-stabilizedZrO2/略号:YSZ) 粉とした。前記YSZ粉の化学組成は、ZrO2(8wt%Y2O3)とした。
この実験では、実験例1で確認した溶射材料を溶射して形成した溶射皮膜の気孔率を測定した。特にイットリア安定化ジルコニア(YSZ)は、大気プラズマ溶射(APS)で形成したYSZ(YSZ-APS)皮膜、及び水プラズマ溶射(WPS)で形成したYSZ(YSZ-WPS)皮膜について、後述する実験例4の下地膜を設けた溶射皮膜を形成し測定した。
この実験では、石英ガラスからなる基材にブラスト処理(ブラスト材:炭化ケイ素砥粒C#80、吐出エア圧力:0.4MPa)よって粗面化された素地に、溶射材料として、アルミナ(Al2O3)粉、シリコン(Si)粉、イットリア(Y2O3)粉、アルミナ(Al2O3)粗粉(前記アルミナ粉より粗い粒度の粉末)を使用して大気プラズマ溶射によって、膜厚300μm~400μmの溶射皮膜を形成した。そして各溶射膜について溶射皮膜の膜厚と表面粗さ、石英ガラス基材の表面粗さ、皮膜の引張密着強度(以下、引張強度とする)を測定した。YSZ粉は、実験1の結果と同様に石英ガラス基材に皮膜形成できなかったことから実験例3の測定対象から外した。
す。
前記実験例3の結果において、特にイットリア(Y2O3)の溶射皮膜と石英ガラス基材との密着性が高いことに着目し、以下ではイットリア(Y2O3)を下地膜として使用することで、石英ガラス基材に対して厚膜での形成が困難であったイットリア安定化ジルコニア(YSZ)を厚膜で形成することを確認した。
この実験例では、前記実験例3及び4に関連して、各種溶射材料を用いた溶射皮膜に対しても、前記イットリア(Y2O3)からなる下地膜を形成し、その密着性を確認する為に引張密着強度試験を行った。
上記実験例5及び6に示す様に、イットリア(Y2O3)の下地膜を設けた上に、トップコート膜としての溶射皮膜を形成することにより、石英ガラス素地に対するトップコート膜の密着性を高めることができる。更に当該下地膜を設けた上に、トップコート膜としての溶射皮膜を形成することにより、下地膜の耐薬品特性を利用して当該ガラス部品の再生を行うことができる。そこで本実験例では、石英ガラス基材および下地膜であるY2O3の耐薬品特性を利用した溶射皮膜の再生を確認する。具体的には硝酸に対し、石英ガラス基材は不溶であり、Y2O3は可溶である事から、この化学薬品特性を応用してガラス部品の再生を行う。この時、トップコート膜が硝酸に不溶ある材料からなり気孔を有さない膜質(緻密質)であっても、トップコート膜端部から薬液が浸透することによるサイドエッチングにより下地膜のY2O3膜が溶解される。またトップコート膜が溶射皮膜である場合は、気孔を有する膜質(多孔質)であることから、皮膜の最表面から最下面(下地膜との界面)までの薬液浸透が起きやすく、下地膜の Y2O3膜が容易に溶解される。
20 下地膜
30 皮膜
Claims (7)
- 金属又はセラミックスの溶射皮膜が形成される石英ガラス基材であって、
前記溶射皮膜が形成される領域には、イットリアの溶射皮膜であって、気孔率が10%以下の下地膜を設けたことを特徴とする石英ガラス基材。
- 前記下地膜が形成される石英ガラス基材における対象領域の表面粗さは、算術平均粗さRaが3.5μm~5.5μmであり、最大高さ粗さRmaxが35μm~55μmである、請求項1に記載の石英ガラス基材。
- 前記下地膜は、膜厚100μm以上の厚さである、請求項1又は2に記載の石英ガラス基材。
- 石英ガラス基材に金属又はセラミックスからなる溶射皮膜を設けた石英ガラス部品であって、
当該石英ガラス基材が請求項1~3の何れか一項に記載の石英ガラス基材であって、
前記溶射皮膜は前記下地膜に形成されている石英ガラス部品。
- 前記下地膜に形成される溶射皮膜は、その膜厚が300μmを超える厚さであり、
前記下地膜の膜厚は、当該下地膜における表面粗さ(最大高さRmax)の値と石英ガラス基材の対象領域における表面粗さ(最大高さRmax)の値の合計以上の厚さに形成されている、請求項4に記載の石英ガラス部品。
- 石英ガラス基材に、金属又はセラミックスの溶射皮膜を形成してなる石英ガラス部品の製造方法であって、
石英ガラス基材に、イットリアを溶射することにより気孔率が10%以下の下地膜を形成する下地膜形成処理と、
下地膜形成処理で形成した下地膜に、金属又はセラミックスの溶射皮膜を形成する皮膜形成処理とからなる、石英ガラス部品の製造方法。
- 請求項5に記載の石英ガラス部品又は請求項6に記載の石英ガラス部品の製造方法により製造された石英ガラス部品の再生方法であって、
前記下地膜を、当該下地膜が可溶で石英ガラス基材が不溶である下地膜溶解成分によって溶解させる下地膜溶解処理を含み、
当該下地膜溶解成分として、硝酸を含む薬液が使用されることを特徴とする石英ガラス部品の再生方法。
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JP2004018299A (ja) | 2002-06-14 | 2004-01-22 | Tocalo Co Ltd | 半導体装置用部材およびその製造方法 |
JP2006215081A (ja) | 2005-02-01 | 2006-08-17 | Seiko Epson Corp | 光学物品及び製造方法 |
JP2008095132A (ja) | 2006-10-06 | 2008-04-24 | Ulvac Material Kk | 真空成膜装置、エッチング装置等における装置構成部品、およびその製造方法と再生方法 |
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JP2006215081A (ja) | 2005-02-01 | 2006-08-17 | Seiko Epson Corp | 光学物品及び製造方法 |
JP2008095132A (ja) | 2006-10-06 | 2008-04-24 | Ulvac Material Kk | 真空成膜装置、エッチング装置等における装置構成部品、およびその製造方法と再生方法 |
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