JP7193074B2 - 光硬化性及び熱硬化性樹脂組成物、並びにその硬化物 - Google Patents
光硬化性及び熱硬化性樹脂組成物、並びにその硬化物 Download PDFInfo
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- JP7193074B2 JP7193074B2 JP2018110938A JP2018110938A JP7193074B2 JP 7193074 B2 JP7193074 B2 JP 7193074B2 JP 2018110938 A JP2018110938 A JP 2018110938A JP 2018110938 A JP2018110938 A JP 2018110938A JP 7193074 B2 JP7193074 B2 JP 7193074B2
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- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
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- 239000006229 carbon black Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 235000010187 litholrubine BK Nutrition 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
Images
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- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/022—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations
- C08F299/024—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
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- G—PHYSICS
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- C08F2/00—Processes of polymerisation
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3085—Imagewise removal using liquid means from plates or webs transported vertically; from plates suspended or immersed vertically in the processing unit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/06—Mounting, supporting or suspending transformers, reactors or choke coils not being of the signal type
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
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- H05K3/22—Secondary treatment of printed circuits
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Description
(2)グリシジル(メタ)アクリレート、α-メチルグリシジル(メタ)アクリレート等のエポキシ基と、不飽和二重結合を有する化合物(c)と、不飽和二重結合を有する化合物(b)との共重合体に不飽和カルボン酸(a)を反応させ、得られた2級のヒドロキシ基に無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸等の飽和または不飽和多塩基酸無水物(d)を反応させて得られるカルボキシル基含有感光性樹脂;
(3)無水マレイン酸、無水イタコン酸等の不飽和二重結合を有する酸無水物(e)と、不飽和二重結合を有する化合物(b)との共重合体にヒドロキシアルキル(メタ)アクリレート等の1つのヒドロキシ基と、1つ以上のエチレン性不飽和二重結合を有する化合物(f)とを反応させて得られるカルボキシル基含有感光性樹脂;
(4)後述するように、分子中に2つ以上のエポキシ基を有する多官能エポキシ化合物(g)または多官能エポキシ化合物のヒドロキシ基を追加的にエピクロロヒドリンによりエポキシ化した多官能エポキシ樹脂のエポキシ基と、(メタ)アクリル酸等の不飽和モノ-カルボン酸(h)のカルボキシル基をエステル化反応(全体エステル化または部分エステル化、好ましくは全体エステル化)させ、生成されたヒドロキシ基に追加的に飽和または不飽和多塩基酸無水物(d)を反応させて得られるカルボキシル基含有感光性化合物。
エポキシ基とカルボキシル基の当量比を1にしたこと以外には、実施例1と同様にして、樹脂組成物及びドライフィルムソルダーレジストを製造した。
エポキシ基とカルボキシル基の当量比を2にし、光重合モノマーを除外したこと以外は、実施例1と同様にして樹脂組成物及びドライフィルムソルダーレジストを製造した。
エポキシ基とカルボキシル基の当量比を2にすること以外は、実施例1と同様にして樹脂組成物及びドライフィルムソルダーレジストを製造した。
○:塗膜が完全に除去されて残渣がない。
△:微かに充填材の残渣がある。
×:塗膜残渣がある。
形式:Q800
測定条件/測定温度:20~300℃
昇温速度:5℃/分
周波数:1Hz
変形モード:引張モード
測定塗膜大きさ:20mmL×5mmW
ρ=E'min/3ΦRT
式中、ρは、架橋密度(mol/m3)、E'minは、貯蔵弾性率E'(N/m2)の最小値、Φは、フロント係数≒1、Rは、気体定数(Nm/molK)、Tは、E'minの絶対温度(K)を示す。
Claims (13)
- 光硬化性及び熱硬化性樹脂組成物の全重量を基準にして、
5~20重量部のエポキシ樹脂と、
20~25重量部のカルボキシル基含有感光性樹脂と、
1~3重量部の光重合開始剤と、
60重量部以上の無機充填材とを含み、
エポキシ基の当量数/カルボキシル基の当量数の値が1超過2未満である、光硬化性及び熱硬化性樹脂組成物。 - 光硬化性及び熱硬化性樹脂組成物の全重量を基準にして、
5~20重量部のエポキシ樹脂と、
20~25重量部のカルボキシル基含有感光性樹脂(ただし、ビスフェノールフルオレン骨格を有するカルボキシル基含有樹脂を含有するものを除く。)と、
1~3重量部の光重合開始剤と、
60重量部以上の無機充填材とを含み、
エポキシ基の当量数/カルボキシル基の当量数の値が1超過2未満である、光硬化性及び熱硬化性樹脂組成物。 - 30mgKOH/g未満の酸価を有する請求項1または請求項2に記載の光硬化性及び熱硬化性樹脂組成物。
- 硬化後の架橋密度(ρ)が、50×103mol/m3~150×103mol/m3である請求項1から請求項3のいずれか一項に記載の光硬化性及び熱硬化性樹脂組成物。
- 硬化後のガラス転移温度が、180℃以上である請求項1から請求項4のいずれか1項に記載の光硬化性及び熱硬化性樹脂組成物。
- 光硬化性及び熱硬化性樹脂組成物の全重量を基準にして0.5~2重量部の感光性アクリレート化合物をさらに含む請求項1から請求項5のいずれか1項に記載の光硬化性及び熱硬化性樹脂組成物。
- 顔料、増粘剤、消泡剤、レベリング剤、及びシランカップリング剤のうちの1種以上の化合物を含む請求項1から請求項6のいずれか1項に記載の光硬化性及び熱硬化性樹脂組成物。
- 請求項1から請求項7のいずれか1項に記載の光硬化性及び熱硬化性樹脂組成物をキャリアフィルムに塗布及び乾燥して製造されたドライフィルム。
- 請求項1から請求項7のいずれか1項に記載の光硬化性及び熱硬化性樹脂組成物、または前記光硬化性及び熱硬化性樹脂組成物をキャリアフィルムに塗布及び乾燥して製造されたドライフィルムを光硬化及び熱硬化した、硬化物。
- 55μm以下の直径を有するビアホールを含む請求項9に記載の硬化物。
- ビアホールの下面直径/ビアホールの上面直径の百分率は、80%以上である請求項10に記載の硬化物。
- 請求項9から請求項11のいずれか1項に記載の硬化物を含む基板。
- 前記基板は、高周波インダクタ基板である請求項12に記載の基板。
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