JP7189030B2 - Deposition equipment - Google Patents

Description

The present invention relates to a film forming apparatus for forming a film containing at least carbon by cathodic arc discharge.

2. Description of the Related Art Conventionally, there is known a film forming apparatus for forming a film on the surface of a substrate (workpiece) by physical vapor deposition (PVD), chemical vapor deposition (CVD), or the like. A film forming apparatus employing a cathodic arc method, which is one of the PVD methods, includes a vacuum chamber functioning as an anode, a target arranged in the vacuum chamber and functioning as a cathode, and an arc power supply. An arc discharge is generated within the vacuum chamber when an arc power supply applies a predetermined discharge voltage between the vacuum chamber and the target. Ions emitted from the target by the arc discharge deposit on the substrate in the vacuum chamber to form a coating.

Patent Literature 1 discloses a plasma apparatus for forming a carbon film on a substrate. In this technique, a pair of movable magnets are provided between a base material and a carbon target provided in a vacuum chamber, and a magnetic field formed by the magnets changes the flight paths of carbon ions, thereby Deposit carbon ions on the material.

Patent No. 5954440 specification

As described above, when a carbon film is formed on a substrate by the cathodic arc method, the movement of the arc spot that emits carbon ions is very difficult on the discharge surface of the target containing carbon compared to the metal target. There is a problem. As an example, the moving speed of the arc spot on the carbon target is several mm/sec or less, and the moving speed of the arc spot on the metal target is about several m/sec. When the temperature of the metal rises due to the heat from the arc discharge, its resistance increases, so the arc spot tends to move to the surrounding cooler region. On the other hand, when the temperature of carbon rises, its resistance decreases, so the arc spot is less likely to move and tends to stay in place. When a carbon target is used in this way, the area where carbon ions are emitted from the discharge surface of the target is limited because the arc spot is difficult to move. It was difficult to obtain thickness distribution. In the technique described in Patent Document 1, the carbon ions flying from the target are guided by a magnet, but the problem of arc spots as described above is not mentioned, and the problem has not been solved. .

The present invention has been made in view of the above problems, and provides a film forming apparatus capable of forming a film containing at least carbon on a substrate with a stable film thickness distribution by cathodic arc discharge. for the purpose.

A film forming apparatus according to one aspect of the present invention forms a coating containing at least carbon on a surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge. A film forming apparatus, comprising: a vacuum chamber having a wall surrounding an internal space; a moving mechanism configured to move the base material so as to move the base material, and a target-facing surface composed of a material containing carbon; an arc power supply including at least one target, a cathode connected to the at least one target, and an anode connected to the vacuum chamber mounted oppositely to the vacuum chamber; and at least one target. A magnetic field generating mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of the target facing surface toward the substrate, wherein the magnetic field generating mechanism includes the first In the first magnetic field, the magnetic lines of force passing through the target-facing surface extend toward one end side of the substrate in the width direction as it approaches the substrate, while in the second magnetic field, the magnetic force lines pass through the target-facing surface. a magnetic field generation mechanism for alternately forming the first magnetic field and the second magnetic field such that the magnetic lines of force extending toward the other end side of the base material in the width direction as it approaches the base material; , wherein the magnetic field generation mechanism includes a first coil arranged at one end side of the at least one target in the width direction and receiving a current supply to generate the first magnetic field; and the at least one target. a plurality of coils including at least a second coil that is arranged on the other end side in the width direction of the and receives a current supply to generate the second magnetic field, and the first coil and the second coil alternately and a current supply unit that alternately generates the first magnetic field and the second magnetic field by applying a current to the coils, and the first coil and the second coil of the plurality of coils each have the width It is constructed by winding an electric wire around a center line extending parallel to the direction .

According to this configuration, the electrons flying from the target-facing surface are spread from the target-facing surface to both sides in the width direction of the substrate by the first magnetic field and the second magnetic field alternately formed by the magnetic field generating mechanism. form an electron beam. Carbon ions flying from the surface facing the target move along the electron beam so as to neutralize the movement of the electrons. Therefore, the carbon ions can be forced to move in the width direction of the substrate. Therefore, even when the movement speed of the arc spot on the target-facing surface of the target containing carbon is low, the carbon-containing coating is stably formed on the base material by allowing the carbon ions to reach a wide range in the width direction of the base material. It becomes possible to form with a film thickness distribution. In addition, according to this configuration, the current supply section alternately supplies current to the first coil and the second coil, thereby forming the first magnetic field and the second magnetic field. Furthermore, according to this configuration, the first magnetic field and the second magnetic field can be stably generated by the first coil and the second coil respectively wound around the center line extending parallel to the width direction.

In the above configuration, the at least one target is supported by the wall of the vacuum chamber so that the target-facing surface is exposed to the internal space, and the plurality of coils are arranged outside the vacuum chamber. and at a position capable of forming the first magnetic field and the second magnetic field in the internal space of the vacuum chamber.

According to this configuration, it is possible to reduce the thermal load due to arc discharge on the plurality of coils and prevent demagnetization of the magnetic force. In addition, the need for arranging a cooling mechanism for cooling the plurality of coils is reduced compared to the case where the plurality of coils are arranged inside the vacuum chamber.

In addition, a film forming apparatus according to another aspect of the present invention forms a coating containing at least carbon on the surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge. forming a vacuum chamber having walls surrounding an interior space; a moving mechanism configured to move the base material so as to move on a surface; and a target-facing surface made of a material containing carbon, wherein the base material faces the target at a predetermined position on the moving surface. an arc power supply including at least one target mounted face-to-face in the vacuum chamber, a cathode connected to the at least one target, and an anode connected to the vacuum chamber; a magnetic field generation mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of one target toward the substrate, wherein the first magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward one end side of the substrate in the width direction as it approaches the substrate, and the second magnetic field passes through the target-facing surface and a line of magnetic force extending toward the other end side of the base material in the width direction as it approaches the base material, and the magnetic field generating mechanism is arranged at one end side of the at least one target in the width direction. and a first coil that generates the first magnetic field by being supplied with a current, and a first coil that is arranged on the other end side of the at least one target in the width direction and is supplied with the current to generate the second magnetic field. a plurality of coils including at least a second coil to be generated; and current supply for alternately generating the first magnetic field and the second magnetic field by alternately applying current to the first coil and the second coil. and a portion, wherein the at least one target includes a plurality of targets spaced apart from each other in the width direction, and the plurality of coils each have a center extending in a direction orthogonal to the target facing surface. It includes at least three coils, which are formed by winding an electric wire around a wire, are spaced apart from each other in the width direction, and are respectively arranged at positions on both sides of the plurality of targets in the width direction.

According to this configuration, the electrons flying from the target-facing surface are spread from the target-facing surface to both sides in the width direction of the substrate by the first magnetic field and the second magnetic field alternately formed by the magnetic field generating mechanism. form an electron beam. Carbon ions flying from the surface facing the target move along the electron beam so as to neutralize the movement of the electrons. Therefore, the carbon ions can be forced to move in the width direction of the substrate. Therefore, even when the movement speed of the arc spot on the target-facing surface of the target containing carbon is low, the carbon-containing coating is stably formed on the base material by allowing the carbon ions to reach a wide range in the width direction of the base material. It becomes possible to form with a film thickness distribution. In addition, according to this configuration, the current supply section alternately supplies current to the first coil and the second coil, thereby forming the first magnetic field and the second magnetic field. Further, according to this configuration, the first magnetic field and the second magnetic field are alternately formed on the plurality of targets by at least three or more coils, and the carbon ions can reach a wide range in the width direction of the base material. It becomes possible.

In the above configuration, the at least three coils include at least one intermediate coil arranged between targets adjacent to each other among the plurality of targets, and the intermediate coil is supplied with current. Preferably, the first magnetic field is formed for one adjacent target and the second magnetic field is formed for the other adjacent target.

According to this configuration, since the intermediate coil also has the function of forming a magnetic field on one target and the other adjacent target, it is possible to reduce the size of the magnetic field generating mechanism in the width direction of the substrate.

In addition, a film forming apparatus according to another aspect of the present invention forms a coating containing at least carbon on the surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge. forming a vacuum chamber having walls surrounding an interior space; a moving mechanism configured to move the base material so as to move on a surface; and a target-facing surface made of a material containing carbon, wherein the base material faces the target at a predetermined position on the moving surface. an arc power supply including at least one target mounted face-to-face in the vacuum chamber, a cathode connected to the at least one target, and an anode connected to the vacuum chamber; a magnetic field generation mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of one target toward the substrate, wherein the first magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward one end side of the substrate in the width direction as it approaches the substrate, and the second magnetic field passes through the target-facing surface and a line of magnetic force extending toward the other end side of the base material in the width direction as it approaches the base material, and the magnetic field generating mechanism is arranged at one end side of the at least one target in the width direction. and a first coil that generates the first magnetic field by being supplied with a current, and a first coil that is arranged on the other end side of the at least one target in the width direction and is supplied with the current to generate the second magnetic field. a plurality of coils including at least a second coil to be generated; and current supply for alternately generating the first magnetic field and the second magnetic field by alternately applying current to the first coil and the second coil. , wherein the current supply unit is capable of adjusting the magnitude of the current applied to the plurality of coils and the frequency for switching the flow of the current between the plurality of coils.

According to this configuration, the electrons flying from the target-facing surface are spread from the target-facing surface to both sides in the width direction of the substrate by the first magnetic field and the second magnetic field alternately formed by the magnetic field generating mechanism. form an electron beam. Carbon ions flying from the surface facing the target move along the electron beam so as to neutralize the movement of the electrons. Therefore, the carbon ions can be forced to move in the width direction of the substrate. Therefore, even when the movement speed of the arc spot on the target-facing surface of the target containing carbon is low, the carbon-containing coating is stably formed on the base material by allowing the carbon ions to reach a wide range in the width direction of the base material. It becomes possible to form with a film thickness distribution. In addition, according to this configuration, the current supply section alternately supplies current to the first coil and the second coil, thereby forming the first magnetic field and the second magnetic field. Moreover, according to this configuration, it is possible to control the thickness of the coating on the base material, the shape of distribution, etc. by changing the magnitude and frequency of the current flowing through the coil.

In the above configuration, if the frequency is f (Hz), the moving speed of the base material by the movement mechanism is v (m/s), and the distance from the target facing surface to the base material is TS (m), It is desirable that the relationship f≧v/TS is satisfied.

According to this configuration, even when a predetermined portion of the substrate passes through the position facing the target facing surface only once (one pass) like a roll coater, uniform film thickness distribution and film thickness can be reproduced. can ensure the integrity of the

In addition, a film forming apparatus according to another aspect of the present invention forms a coating containing at least carbon on the surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge. forming a vacuum chamber having walls surrounding an interior space; a moving mechanism configured to move the base material so as to move on a surface; and a target-facing surface made of a material containing carbon, wherein the base material faces the target at a predetermined position on the moving surface. an arc power supply including at least one target mounted face-to-face in the vacuum chamber, a cathode connected to the at least one target, and an anode connected to the vacuum chamber; a magnetic field generation mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of one target toward the substrate, wherein the first magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward one end side of the substrate in the width direction as it approaches the substrate, and the second magnetic field passes through the target-facing surface Further, the width of the at least one target in the width direction of the base material is set to 30 mm or less, including magnetic lines of force extending so as to approach the other end side of the base material in the width direction as the base material is approached. are

According to this configuration, the electrons flying from the target-facing surface are spread from the target-facing surface to both sides in the width direction of the substrate by the first magnetic field and the second magnetic field alternately formed by the magnetic field generating mechanism. form an electron beam. Carbon ions flying from the surface facing the target move along the electron beam so as to neutralize the movement of the electrons. Therefore, the carbon ions can be forced to move in the width direction of the substrate. Therefore, even when the movement speed of the arc spot on the target-facing surface of the target containing carbon is low, the carbon-containing coating is stably formed on the base material by allowing the carbon ions to reach a wide range in the width direction of the base material. It becomes possible to form with a film thickness distribution. In addition, according to this configuration, by setting the width of the target to be small, the range of the arc spot can be narrowed, while the flight range of carbon ions can be controlled by the first magnetic field and the second magnetic field. reproducibility can be improved.

According to the present invention, there is provided a film forming apparatus capable of forming a film containing at least carbon on a substrate with a stable film thickness distribution by cathodic arc discharge.

1 is a schematic cross-sectional view of a film forming apparatus according to one embodiment of the present invention; FIG. FIG. 3 is a schematic diagram showing how a magnetic field is formed by the configuration of a coil applying device and an induction coil in the film forming apparatus according to one embodiment of the present invention. FIG. 4 is a schematic diagram showing how two magnetic fields are alternately formed by a pair of coils in the film forming apparatus according to one embodiment of the present invention. FIG. 5 is a schematic diagram showing how a magnetic field is formed by the configuration of a coil applying device and an induction coil in the film forming apparatus according to the first modified embodiment of the present invention. FIG. 10 is a schematic diagram showing how two magnetic fields are alternately formed by a plurality of coils in a film forming apparatus according to a second modified embodiment of the present invention; FIG. 10 is a schematic diagram showing how two magnetic fields are alternately formed by a plurality of coils in a film forming apparatus according to a second modified embodiment of the present invention; It is a typical sectional view of the film-forming apparatus based on 3rd modification embodiment of this invention. It is a typical sectional view of the conventional film-forming apparatus. FIG. 8 is a top plan view of the film forming apparatus of FIG. 7 ; FIG. 8 is a schematic diagram showing the trajectory of the maximum film thickness portion of the carbon film formed on the substrate in the film forming apparatus of FIG. 7; 8 is a schematic diagram showing a trajectory of a carbon film formed on a substrate in the film forming apparatus of FIG. 7; FIG.

A film forming apparatus 1 according to an embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic cross-sectional view of a film forming apparatus 1 according to this embodiment. FIG. 2 is a schematic diagram showing the configuration of the coil applying device 20 and how the magnetic field is formed by the induction coil 18 in the film forming apparatus 1. As shown in FIG. FIG. 3 is a schematic diagram showing how two magnetic fields are alternately formed by the induction coil 18 in the film forming apparatus 1. As shown in FIG. The directions shown in each drawing are for explaining the structure and function of the film forming apparatus 1 according to the present embodiment, and do not limit the film forming apparatus according to the present invention.

The film forming apparatus 1 forms a film containing carbon (carbon film, carbon coating) on a substrate by cathodic arc discharge. In this embodiment, the film forming apparatus 1 employs a roll coater system, and forms a carbon film on a belt-shaped workpiece W (base material). The film forming apparatus 1 includes a vacuum chamber 10, a take-up roll 11, an idler roll 12, a film forming roll 13, an idler roll 14, an unwinding roll 15, an evaporation source 16, an arc power source 19, and a magnetic field. a generating mechanism 2;

The vacuum chamber 10 has walls surrounding an internal space, and the internal space is evacuated by a vacuum pump (not shown). A take-up roll 11 is rotatably supported in the vacuum chamber 10 and holds a strip-shaped work W. As shown in FIG. The take-up roll 11 is rotationally driven by a drive section (not shown). An idler roll 12, a film forming roll 13, and an idler roll 14 are rotatably held in the vacuum chamber 10 below the take-up roll 11 and form a moving surface of the work W. As shown in FIG. The unwind roll 15 is rotatably supported in the vacuum chamber 10 to the right of the take-up roll 11 . A roll body of the work W is attached to the feed roll 15 . As the take-up roll 11 is rotationally driven, the workpiece W pulled out from the take-up roll 15 is transferred to the idler roll 14, the film forming roll 13, the idler roll 12, and the take-up roll 11 as indicated by the arrows in FIG. Move upwards.

That is, the workpiece W in this embodiment has dimensions extending in a predetermined width direction and a length direction orthogonal to the width direction. The width direction of the work W in FIG. 1 coincides with the front-rear direction in FIG. 2 (the direction perpendicular to the paper surface of FIG. 2). The length direction of the work W coincides with the moving direction of the work W as indicated by the arrow in FIG. The take-up roll 11, the idler roll 12, the film forming roll 13, the idler roll 14, and the unwinding roll 15 constitute the moving mechanism of the present invention. The take-up roll 11, the idler roll 12, the film forming roll 13, the idler roll 14, and the unwinding roll 15 hold the work W inside the vacuum chamber 10, and the work W is a moving surface extending along the length direction. The work W is moved so as to move upward. 2 and 3, the moving direction of the work W is indicated by an arrow DW.

The evaporation source 16 includes a target 17 (first target) made of carbon. In this embodiment, the target 17 has a thin plate shape. Note that the target 17 may have a disk shape, a cylindrical shape, a rectangular parallelepiped shape, or the like. The target 17 has a target discharge surface 171 (FIG. 2) that is melted by arc discharge. The target 17 is mounted and fixed to the vacuum chamber 10 so that the work W faces the target discharge surface 171 at a predetermined position on the moving surface. In other words, the target 17 is supported on the wall of the vacuum chamber 10 so that the target discharge surface 171 is exposed to the interior space of the vacuum chamber 10 . The width of the target 17 in the width direction of the work W (the front-rear direction in FIGS. 2 and 3) is preferably set to 30 mm or less.

Arc power supply 19 applies a voltage between target 17 and vacuum chamber 10 to generate an arc discharge. Arc power supply 19 includes a cathode (-) connected to target 17 and an anode (+) connected to vacuum chamber 10 .

The magnetic field generating mechanism 2 is arranged outside the vacuum chamber 10 and includes an induction coil 18 and a coil applying device 20 . The induction coil 18 has a first induction coil 181 that generates a first magnetic field when supplied with current, and a second induction coil 182 that generates a second magnetic field when supplied with current. The first induction coil 181 and the second induction coil 182 are arranged on both sides of the target 17 in the width direction. Also, the first induction coil 181 and the second induction coil 182 are arranged outside the vacuum chamber 10 and on the opposite side of the workpiece W when viewed from the target 17 . In other words, the first induction coil 181 and the second induction coil 182 can form the first magnetic field and the second magnetic field at a position outside the vacuum chamber 10 and in the interior space of the vacuum chamber 10. located where possible. 2 and 3, each of the first induction coil 181 and the second induction coil 182 has a shape in which an electric wire is wound around a center line CL extending parallel to the width direction (front-rear direction) of the work W. have The cross-sectional shape of the first induction coil 181 and the second induction coil 182 perpendicular to the center line CL may be circular, or substantially rectangular as shown in FIG.

The coil applying device 20 (current supply unit) causes the first magnetic field and the second magnetic field to be generated alternately by alternately applying current to the first induction coil 181 and the second induction coil 182 . Referring to FIG. 2 , coil application device 20 has control section 201 , constant current DC power supply 202 , and relay unit 203 . Constant current DC power supply 202 causes a predetermined current to flow into first induction coil 181 and second induction coil 182 . Relay unit 203 switches the destination of the current from constant current DC power supply 202 between first induction coil 181 and second induction coil 182 . Control unit 201 receives a predetermined command signal and outputs current setting signal SS for adjusting the magnitude of the current flowing from constant current DC power supply 202 to first induction coil 181 and second induction coil 182 . 202. Control unit 201 also receives a predetermined command signal and inputs switching signal SC to relay unit 203 for adjusting the switching frequency of relay unit 203 . Command signals relating to the magnitude and frequency of the current are input from an operation panel (not shown) of the film forming apparatus 1 . Thus, in the present embodiment, the coil applying device 20 determines the magnitude of the current to be passed through the induction coil 18 (plurality of coils) and the first induction coil 181 and the second induction coil 182 (plurality of coils) of the induction coil 18. and the frequency (period) for switching the current flow between. By changing the magnitude and frequency of the currents flowing through the first induction coil 181 and the second induction coil 182 in this way, the thickness of the film on the workpiece W and the distribution shape can be controlled and optimized.

The magnetic field generating mechanism 2 generates a first magnetic field (solid-line magnetic field in FIG. 3) and a second magnetic field (broken-line magnetic field in FIG. 3) each including magnetic lines of force extending from the target discharge surface 171 of the target 17 toward the work W. It is possible to form them alternately. The first magnetic field generated by the magnetic field generating mechanism 2 includes magnetic lines of force that pass through the target discharge surface 171 and extend toward one end side of the work W in the width direction as the work W is approached. On the other hand, the second magnetic field generated by the magnetic field generating mechanism 2 includes magnetic lines of force that pass through the target discharge surface 171 and approach the other end side of the work W in the width direction as the work W is approached. In addition, it is preferable that all magnetic lines of force included in the first magnetic field and passing through the target discharge surface 171 extend so as to approach one end side in the width direction of the work W as the work W is approached. It is desirable that all magnetic lines of force included in the second magnetic field and passing through the target discharge surface 171 extend toward the other end side of the work W in the width direction as the work W approaches.

<Challenges of carbon targets>
FIG. 8 is a schematic cross-sectional view of a conventional film forming apparatus. 9 is a top plan view of the film forming apparatus of FIG. 7. FIG. FIG. 10 is a schematic diagram showing the trajectory of the maximum film thickness portion of the carbon film formed on the substrate in the film forming apparatus of FIG. 11 is a schematic diagram showing the trajectory of the carbon film formed on the substrate in the film forming apparatus of FIG. 7. FIG. In the film forming apparatus shown in FIGS. 8 to 11, a carbon film is formed on the surface of the workpiece W conveyed by the film forming rolls 51 within the vacuum chamber. A cathode of the arc power supply is connected to a target 52 made of carbon, and an anode is connected to a vacuum chamber (not shown).

As shown in FIGS. 8 and 9, in the cathodic arc discharge, the movement speed of the arc spot on the discharge surface 521 of the target 52 functioning as a cathode is extremely small compared to a metal target due to the properties of carbon. As an example, the moving speed of the arc spot on the carbon target is several mm/s or less, and the moving speed of the arc spot on the metal target is about several m/s. As the metal heats up, its resistance increases, so the arc spot tends to migrate to cooler surrounding areas. On the other hand, when the temperature of carbon rises, its resistance decreases, so the arc spot is less likely to move and tends to stay in place. When a carbon target in which the arc spot is difficult to move is used, the flight path of carbon ions is limited, so the carbon film tends to be unevenly distributed on a part of the workpiece W in the width direction. As a result, the shape of the film thickness distribution in the width direction of the workpiece W changes moment by moment, as indicated by a plurality of broken lines in FIG. Therefore, as the work W moves, the maximum film thickness portion of the carbon film formed on the work W is distributed in a wavy shape as shown in FIG. As a result, the film thickness distribution of the carbon film on the workpiece W tends to become uneven. In particular, in the roll coater method in which the film formation area for forming the carbon film on the workpiece W is limited, it becomes more difficult to form a uniform carbon film. Therefore, it has been desired to move the arc spot on the carbon target faster so that the carbon ions reach a wider range of the workpiece W in the width direction.

In order to solve such a problem, in the present embodiment, instead of moving the arc spot on the carbon target at high speed, attention is paid to distributing the travel path of the flying carbon ions over a wide range in the width direction. is doing. That is, when a predetermined voltage is applied between the target 17 and the vacuum chamber 10 by the arc power source 19 to start arc discharge, the coil applying device 20 causes the first induction coil 181 and the second induction coil 182 to alternately generate current. inflow. As a result, a first magnetic field (broken line) and a second magnetic field (solid line) are alternately formed between the target 17 and the workpiece W, as shown in FIG. As a result, carbon ions flying from the target discharge surface 171 of the target 17 can reach a wide range of the workpiece W in the width direction. Therefore, the carbon ions can be forcibly moved in the width direction of the workpiece W. Therefore, even when the moving speed of the arc spot on the target-facing surface 171 of the target 17 containing carbon is low, the carbon-containing coating is formed on the work W by allowing the carbon ions to reach a wide range in the width direction of the work W. It is possible to form a film with a stable film thickness distribution.

Also, in this embodiment, the induction coil 18 includes a first induction coil 181 and a second induction coil 182 arranged on both sides of the target 17 . Then, the coil applying device 20 alternately applies a current to the first induction coil 181 and the second induction coil 182, thereby easily forming the first magnetic field and the second magnetic field between the target 17 and the work W. It becomes possible to In particular, the first induction coil 181 and the second induction coil 182 wound around the center line CL extending parallel to the width direction of the workpiece W can stably form the magnetic field shown in FIG.

Further, in the present embodiment, since the first induction coil 181 and the second induction coil 182 are arranged outside the vacuum chamber 10 , the coils do not intervene between the target 17 and the workpiece W. Therefore, the heat load due to the arc discharge to the first induction coil 181 and the second induction coil 182 can be reduced, and demagnetization of the magnetic force can be prevented. Also, compared to the case where the first induction coil 181 and the second induction coil 182 are arranged inside the vacuum chamber 10, the need for arranging a cooling mechanism for cooling these coils is reduced.

In this embodiment, the switching frequency of the relay unit 203 is f (Hz), the moving speed (winding speed) of the work W by the winding roll 11 is v (m/s), and the distance from the target discharge surface 171 to the work W is is the distance TS(m) (FIG. 3), the relationship f≧v/TS is satisfied. When such a relationship is satisfied, as in the roll coater method (FIG. 1), when a predetermined portion of the work W passes through the position (film formation position) facing the target facing surface 171 only once ( A uniform film thickness distribution and film thickness reproducibility can be ensured even in a single pass). It is more desirable that the relationship f≧5×v/TS is satisfied.

Further, in this embodiment, the width of the target 17 in the width direction (front-rear direction) of the work W is set to 30 mm or less. According to such a configuration, the range of the arc spot is limited by setting the width of the target 17 small. The magnitude and frequency of the current to flow in can be set. As a result, the reproducibility of the carbon film thickness on the workpiece W can be improved.

Although the film forming apparatus 1 according to one embodiment of the present invention has been described above, the present invention is not limited to these embodiments. As a film forming apparatus according to the present invention, the following modified embodiments are possible.

(1) FIG. 4 is a schematic diagram showing how a magnetic field is formed by the coil applying device 30 and the induction coil 18 in the film forming apparatus according to the first modified embodiment of the present invention. In this modified embodiment, instead of the coil applying device 20 of the previous embodiment, the magnetic field generating mechanism of the film forming apparatus includes a coil applying device 30 (current supply section). The coil applying device 30 has a control section 301 , a constant current AC power supply 302 and a diode 303 .

Constant-current AC power supply 302 causes a predetermined current to flow into first induction coil 181 and second induction coil 182 . Diode 303 functions to alternately supply alternating current output from constant current alternating current power supply 302 to first induction coil 181 and second induction coil 182 . Upon receiving a predetermined command signal, the control unit 301 generates a setting signal SS for adjusting the magnitude and frequency of the current flowing from the constant-current AC power supply 302 to the first induction coil 181 and the second induction coil 182. Input to power supply 302 . As described above, even in this modified embodiment, the coil applying device 30 controls the magnitude of the current to be applied to the induction coil 18 (plurality of coils), the first induction coil 181 and the second induction coil 182 (plurality of coils) of the induction coil 18. and the frequency (period) for switching the current flow between coils. By changing the magnitude and frequency of the currents flowing through the first induction coil 181 and the second induction coil 182 in this way, the thickness of the film on the workpiece W and the distribution shape can be controlled and optimized.

(2) FIGS. 5 and 6 are schematic diagrams showing how two magnetic fields are alternately formed on each target by a plurality of induction coils in a film forming apparatus according to a second modified embodiment of the present invention. In this modified embodiment, the film forming apparatus includes a third induction coil 183, a fourth induction coil 184 (intermediate coil), a fifth induction coil 185 (intermediate coil), a sixth induction coil 186, and a target 172. , a target 173 and a target 174 . In this modified embodiment, the size (width) of the work W in the width direction is set larger than in the previous embodiment.

The film forming apparatus according to this modified embodiment includes a coil applying device 20 (FIG. 2) similar to that of the previous embodiment. 184, the fifth induction coil 185 and the sixth induction coil 186 are connected in parallel. The control unit 201 first causes current to flow into the third induction coil 183 and the fifth induction coil 185 at the same time. As a result, as shown in FIG. 5, the third induction coil 183 forms a first magnetic field in the target 172, the fifth induction coil 185 forms a second magnetic field in the target 173, and the fifth induction coil 185 forms a A first magnetic field is formed in target 174 . Next, the control unit 201 cuts off the current flow into the third induction coil 183 and the fifth induction coil 185 and causes the current flow into the fourth induction coil 184 and the sixth induction coil 186 at the same time. As a result, the fourth induction coil 184 forms the second magnetic field in the target 172 and the fourth induction coil 184 forms the first magnetic field in the target 173, as shown in FIG. A sixth induction coil 186 also creates a second magnetic field in the target 174 . As described above, in this embodiment, a plurality of targets are arranged at intervals in the width direction of the workpiece W, and a plurality of coils are arranged around the center line extending in a direction orthogonal to the target facing surface. At least three coils, which are formed by winding an electric wire, are arranged at intervals in the width direction and arranged at positions on both sides of the plurality of targets in the width direction.

In addition, focusing on the third induction coil 183, the fourth induction coil 184 (intermediate coil), the fifth induction coil 185, the target 172, and the target 173, the target 172 (first target) and the target 173 (second targets) are arranged at intervals in the width direction of the workpiece W. As shown in FIG. Further, the third induction coil 183 (first coil), the fourth induction coil 184 (second coil), and the fifth induction coil 185 (third coil) are arranged at intervals in the width direction, Each target has a structure in which an electric wire is wound around a center line extending in a direction orthogonal to the target facing surface.

Furthermore, when the control unit 201 (FIG. 2) causes current to flow through the third induction coil 183 and the fifth induction coil 185, the third induction coil 183 forms the first magnetic field in the target 172 and the fifth induction coil 185 forms the second magnetic field in the target 173, the control unit 201 (FIG. 2) causes the fourth induction coil 184 to pass a current through the fourth induction coil 184 to form the second magnetic field in the target 172. A third induction coil 183 and a fourth induction coil 184 are arranged on both sides of the target 172 in the width direction so as to form the first magnetic field in the target 173 together with the fourth induction coil 184 and the fifth induction coil 184 . 185 are arranged on both sides of the target 173 in the width direction. That is, the fourth induction coil 184 (intermediate coil) is supplied with current to form the first magnetic field for one adjacent target and the second magnetic field for the other adjacent target. .

According to such a configuration, it is possible to cause carbon ions to fly over a wide range in the width direction of the work W by the targets 172 and 173 . Moreover, since the fourth induction coil 184 can also have the function of forming a magnetic field on the targets 172 and 173, the size of the magnetic field generation mechanism can be reduced. The relationship between the fourth induction coil 184, the fifth induction coil 185, the sixth induction coils 186, 173 and the target 174 is the same, and the numbers of targets and coils in FIGS. not limited to

(3) FIG. 7 is a schematic cross-sectional view of a film forming apparatus 1A according to a third modified embodiment of the present invention. Although the previous embodiment has been described based on the roll coater type film forming apparatus 1 shown in FIG. 1, the present invention is not limited to this. A film forming apparatus 1A according to this modified embodiment includes a vacuum chamber 10, an evaporation source 16 including a target 17, induction coils including a seventh induction coil 187 and an eighth induction coil 188, a rotary table 41, and a table drive. A portion 42 and a sub-evaporation source 43 including a sub-target 44 are provided. In this modified embodiment, the film forming apparatus 1A is a so-called batch type film forming apparatus.

A rotary table 41 arranged in the vacuum chamber 10 is rotated in the direction of the arrow by a table driving section 42 . As a result, the workpiece W fixed on the rotary table 41 rotates around the rotation axis extending in the vertical direction. At this time, the width direction of the work W coincides with the vertical direction, and the length direction of the work W coincides with the rotation direction of the work W.

The target 17 is a carbon target as in the previous embodiment. On the other hand, the sub-target 44 is a metal target such as Ti or Cr. Both the target 17 and the sub-target 44 are connected to the cathode of a power source similar to the arc power source 19 (FIG. 1), and the anode of the arc power source 19 is connected to the vacuum chamber 10. In the case of the configuration shown in FIG. 7, the moving speed of the arc spot moving on the surface of the carbon target 17 is smaller than the moving speed of the arc spot moving on the surface of the metal sub-target 44. Become. In this case, in the conventional batch-type film forming apparatus, the carbon distribution in the film formed on the surface of the workpiece W tends to be unevenly distributed. On the other hand, in this modified embodiment as well, the first magnetic field and the second magnetic field are formed by alternately flowing currents into the seventh induction coil 187 and the eighth induction coil 188, similar to the previous embodiment. In addition, carbon ions can reach a wide range of the workpiece W in the width direction. As a result, it is possible to form a coating having a uniform carbon content in the metal layer.

(4) Also in the roll coater method shown in FIG. 2, a metal target (cathode) similar to the sub-target 44 (sub-evaporation source 43) in FIG. 7 is arranged at a position different from the target 17. good too. Also in this case, it is possible to form a coating having a uniform carbon content in the metal layer. Similarly, in the batch-type film forming apparatus 1A shown in FIG.

Next, specific examples will be illustrated. In addition, the present invention is not limited to the following examples. Experiments were conducted under the following conditions in the configurations shown in the previous embodiments (FIGS. 1, 2, and 3).
Target 17: Carbon target Transfer speed (moving speed) of workpiece W: v = 300 (mm/sec)
Distance between target discharge surface 171 and workpiece W TS = 150 (mm)
Current switching frequency of first induction coil 181 and second induction coil 182: f=v/TS=300/150=2 (Hz)
Under the above conditions, it became possible to form a uniform carbon film on the surface of the strip-shaped workpiece W. By setting f≧10 (Hz) (=5×v/TS), it became possible to form a more uniform carbon film.

If the current flowing into the first induction coil 181 and the second induction coil 182 is increased, the applied magnetic field becomes stronger, so that the film thickness distribution on the workpiece W becomes sharper (directivity becomes stronger). Therefore, it is desirable to increase the current switching frequency (magnetic field switching period) as the current value increases.

As an example, the relationship between the magnetic force on the target discharge surface 171 and the half width of the film thickness/film thickness distribution was evaluated when TS=150 (mm). In the case of a magnetic force of 10 mT (millitesla), the half-value width was about 190 mm and the film thickness distribution was ±8%. That is, when the current value is increased and the strength of the magnetic field (magnetic force, magnetic flux density) is increased, the film thickness distribution is relatively deteriorated. In this case, it was found that the film thickness distribution was improved to ±8% by changing the current switching frequency from 2.0 (Hz) to 2.5 (Hz).

1, 1A Film forming device 2 Magnetic field generating mechanism 10 Vacuum chamber 11 Winding roll (moving mechanism)
12 idler roll 13 film forming roll 14 idler roll 15 unwinding roll 16 evaporation source 17, 172, 173, 174 target 171 target discharge surface (target facing surface)
18 induction coil (coil)
181 first induction coil (first coil)
182 second induction coil (second coil)
183 third induction coil 184 fourth induction coil (intermediate coil)
185 fifth induction coil (intermediate coil)
186 sixth induction coil 187 seventh induction coil 188 eighth induction coil 19 arc power supplies 20, 30 coil application device (current supply unit)
201, 301 Control unit 202 Constant current DC power supply 203 Relay unit 302 Constant current AC power supply 303 Diode 41 Rotating table 42 Table driving unit 43 Sub evaporation source 44 Sub target 51 Film forming roll 52 Target 521 Discharge surface W Work

Claims (7)

A film forming apparatus for forming a coating containing at least carbon on a surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge,
a vacuum chamber having walls surrounding an interior space;
a moving mechanism that holds the substrate in the internal space of the vacuum chamber and moves the substrate so that the substrate moves on a moving surface that extends along the longitudinal direction;
At least one substrate made of a material containing carbon, having a target-facing surface, and mounted in the vacuum chamber so that the substrate faces the target-facing surface at a predetermined position on the moving surface. target and
an arc power supply including a cathode connected to the at least one target and an anode connected to the vacuum chamber;
a magnetic field generating mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of at least one target toward the substrate;
with
The first magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward one end side of the substrate in the width direction as it approaches the substrate,
The second magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward the other end side of the base in the width direction as the base is approached,
The magnetic field generation mechanism is
A first coil that is arranged at one end of the at least one target in the width direction and receives current supply to generate the first magnetic field, and is arranged at the other end of the at least one target in the width direction. a plurality of coils including at least a second coil that generates the second magnetic field by being supplied with an electric current;
a current supply unit that alternately generates the first magnetic field and the second magnetic field by alternately applying current to the first coil and the second coil;
has
The film forming apparatus , wherein the first coil and the second coil of the plurality of coils are each configured by winding an electric wire around a center line extending parallel to the width direction . The at least one target is supported by the wall of the vacuum chamber so that the target-facing surface is exposed to the internal space,
The plurality of coils are arranged outside the vacuum chamber and at positions capable of forming the first magnetic field and the second magnetic field in the internal space of the vacuum chamber. 1. The film forming apparatus according to 1. A film forming apparatus for forming a coating containing at least carbon on a surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge,
a vacuum chamber having walls surrounding an interior space;
a moving mechanism that holds the substrate in the internal space of the vacuum chamber and moves the substrate so that the substrate moves on a moving surface that extends along the longitudinal direction;
At least one substrate made of a material containing carbon, having a target-facing surface, and mounted in the vacuum chamber so that the substrate faces the target-facing surface at a predetermined position on the moving surface. target and
an arc power supply including a cathode connected to the at least one target and an anode connected to the vacuum chamber;
a magnetic field generating mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of at least one target toward the substrate;
with
The first magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward one end side of the substrate in the width direction as it approaches the substrate,
The second magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward the other end side of the base in the width direction as the base is approached,
The magnetic field generation mechanism is
A first coil that is arranged at one end of the at least one target in the width direction and receives current supply to generate the first magnetic field, and is arranged at the other end of the at least one target in the width direction. a plurality of coils including at least a second coil that generates the second magnetic field by being supplied with an electric current;
a current supply unit that alternately generates the first magnetic field and the second magnetic field by alternately applying current to the first coil and the second coil;
has
The at least one target includes a plurality of targets spaced apart from each other in the width direction,
Each of the plurality of coils is formed by winding an electric wire around a center line extending in a direction orthogonal to the target facing surface, and is arranged at intervals in the width direction and is arranged along the width of the plurality of targets. A deposition apparatus comprising at least three coils, each arranged at a position on each side of the direction. the at least three coils include at least one intermediate coil positioned between targets adjacent to each other among the plurality of targets;
4. The device according to claim 3 , wherein the intermediate coil forms the first magnetic field with respect to one adjacent target and forms the second magnetic field with respect to the other adjacent target by being supplied with current. membrane device. A film forming apparatus for forming a coating containing at least carbon on a surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge,
a vacuum chamber having walls surrounding an interior space;
a moving mechanism that holds the substrate in the internal space of the vacuum chamber and moves the substrate so that the substrate moves on a moving surface that extends along the longitudinal direction;
At least one substrate made of a material containing carbon, having a target-facing surface, and mounted in the vacuum chamber so that the substrate faces the target-facing surface at a predetermined position on the moving surface. target and
an arc power supply including a cathode connected to the at least one target and an anode connected to the vacuum chamber;
a magnetic field generating mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of at least one target toward the substrate;
with
The first magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward one end side of the substrate in the width direction as it approaches the substrate,
The second magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward the other end side of the base in the width direction as the base is approached,
The magnetic field generating mechanism is
A first coil that is arranged at one end of the at least one target in the width direction and receives current supply to generate the first magnetic field, and is arranged at the other end of the at least one target in the width direction. a plurality of coils including at least a second coil that generates the second magnetic field by being supplied with an electric current;
a current supply unit that alternately generates the first magnetic field and the second magnetic field by alternately applying current to the first coil and the second coil;
has
The current supply unit is capable of adjusting a magnitude of current to be supplied to the plurality of coils and a frequency for switching inflow of the current between the plurality of coils . Let f (Hz) be the frequency, v (m/s) be the moving speed of the base material by the moving mechanism, and TS (m) be the distance from the surface facing the target to the base material. 6. The film forming apparatus according to claim 5 , wherein the relationship of is satisfied. A film forming apparatus for forming a coating containing at least carbon on a surface of a substrate having dimensions extending in a predetermined width direction and a length direction perpendicular to the width direction by cathodic arc discharge,
a vacuum chamber having walls surrounding an interior space;
a moving mechanism that holds the substrate in the internal space of the vacuum chamber and moves the substrate so that the substrate moves on a moving surface that extends along the longitudinal direction;
At least one substrate made of a material containing carbon, having a target-facing surface, and mounted in the vacuum chamber so that the substrate faces the target-facing surface at a predetermined position on the moving surface. target and
an arc power supply including a cathode connected to the at least one target and an anode connected to the vacuum chamber;
a magnetic field generating mechanism capable of alternately forming a first magnetic field and a second magnetic field each including magnetic lines of force extending from the target-facing surface of at least one target toward the substrate;
with
The first magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward one end side of the substrate in the width direction as it approaches the substrate,
The second magnetic field includes magnetic lines of force that pass through the target-facing surface and extend toward the other end side of the base in the width direction as the base is approached,
The film forming apparatus , wherein the width of the at least one target in the width direction of the substrate is set to 30 mm or less.

Images