JP7184525B2 - チャックテーブルおよびチャックテーブルを備えた加工装置 - Google Patents
チャックテーブルおよびチャックテーブルを備えた加工装置 Download PDFInfo
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- JP7184525B2 JP7184525B2 JP2018041615A JP2018041615A JP7184525B2 JP 7184525 B2 JP7184525 B2 JP 7184525B2 JP 2018041615 A JP2018041615 A JP 2018041615A JP 2018041615 A JP2018041615 A JP 2018041615A JP 7184525 B2 JP7184525 B2 JP 7184525B2
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- chuck table
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/14—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object using acoustic emission techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/22—Details, e.g. general constructional or apparatus details
- G01N29/223—Supports, positioning or alignment in fixed situation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/024—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with the stock carried by a movable support for feeding stock into engagement with the cutting blade, e.g. stock carried by a pivoted arm or a carriage
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/26—Scanned objects
- G01N2291/269—Various geometry objects
- G01N2291/2697—Wafer or (micro)electronic parts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Chemical & Material Sciences (AREA)
- Acoustics & Sound (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
4:保持部
10:基板
10a:細孔
12:AEセンサー
14:枠体
30:切削装置(加工装置)
32:加工手段
34:表示手段
40:切削手段
42:切削水供給ノズル
Claims (7)
- 被加工物を保持する保持部を備えたチャックテーブルであって、
該保持部に格子状に複数のAEセンサーが配設され、被加工物を介して発生する弾性波を複数箇所で収集し、該複数のAEセンサーの配置に関連づけて弾性波の強さの分布を取得し、
該保持部は、複数の細孔が形成された基板と、該基板の上面に配設された該複数のAEセンサーと、該基板を支持する枠体と、から少なくとも構成され、
吸引源が該枠体に連通し該複数の細孔に吸引力を伝達して被加工物を吸引保持するチャックテーブル。 - 被加工物を保持する保持部を備えたチャックテーブルであって、該保持部に格子状に複数のAEセンサーが配設され、被加工物を介して発生する弾性波を複数箇所で収集し、該複数のAEセンサーの配置に関連づけて弾性波の強さの分布を取得するチャックテーブルと、該チャックテーブルに保持された被加工物に加工を施す加工手段と、該チャックテーブルと該加工手段とを相対的に加工送りする加工送り手段と、該複数のAEセンサーによって収集された弾性波の強さの分布を表示する表示手段と、を少なくとも備え、
該加工手段は、被加工物を切削する切削ブレードを回転可能に備えた切削手段と該切削ブレードに切削水を供給する切削水供給ノズルとから少なくとも構成され、
該加工送り手段は、該チャックテーブルと該加工手段とをX軸方向に相対的に加工送りするX軸送り手段と、該チャックテーブルと該加工手段とをX軸方向に直交するY軸方向に相対的に割り出し送りするY軸送り手段と、を有する加工装置。 - 該複数のAEセンサーはX座標Y座標で配設され、該表示手段は収集された弾性波をX座標Y座標で表示する請求項2記載の加工装置。
- 該表示手段は収集された弾性波の強さを色で表示する請求項3記載の加工装置。
- 該複数のAEセンサーによって収集された弾性波を記録する記録手段を備えた請求項2記載の加工装置。
- 該切削ブレードによる切削に伴う弾性波、該切削ブレードを挟むように位置づけられた一対の該切削水供給ノズルから供給される切削水に伴う弾性波が該複数のAEセンサーによって収集される請求項2記載の加工装置。
- 該複数のAEセンサーによって収集された弾性波の強さの分布によって切削水供給の不具合を検出する請求項2記載の加工装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018041615A JP7184525B2 (ja) | 2018-03-08 | 2018-03-08 | チャックテーブルおよびチャックテーブルを備えた加工装置 |
US16/295,706 US10870220B2 (en) | 2018-03-08 | 2019-03-07 | Chuck table and processing apparatus including the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018041615A JP7184525B2 (ja) | 2018-03-08 | 2018-03-08 | チャックテーブルおよびチャックテーブルを備えた加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019160860A JP2019160860A (ja) | 2019-09-19 |
JP7184525B2 true JP7184525B2 (ja) | 2022-12-06 |
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JP2018041615A Active JP7184525B2 (ja) | 2018-03-08 | 2018-03-08 | チャックテーブルおよびチャックテーブルを備えた加工装置 |
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US (1) | US10870220B2 (ja) |
JP (1) | JP7184525B2 (ja) |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005103587A (ja) | 2003-09-30 | 2005-04-21 | Disco Abrasive Syst Ltd | レーザー加工装置 |
JP2006245439A (ja) | 2005-03-04 | 2006-09-14 | Disco Abrasive Syst Ltd | 半導体ウエーハの電極加工装置 |
JP2008188646A (ja) | 2007-02-06 | 2008-08-21 | Tokyo Seimitsu Co Ltd | 塑性加工異常検出方法、加工システム及びae検出装置 |
JP2009066708A (ja) | 2007-09-13 | 2009-04-02 | Disco Abrasive Syst Ltd | 加工装置における加工水の確認方法及び確認装置 |
JP2009188378A (ja) | 2007-11-08 | 2009-08-20 | Applied Materials Inc | パルス列アニーリング方法および装置 |
JP2011228436A (ja) | 2010-04-19 | 2011-11-10 | Hitachi High-Technologies Corp | プラズマ処理装置およびプラズマ処理方法 |
JP2014075408A (ja) | 2012-10-03 | 2014-04-24 | Disco Abrasive Syst Ltd | 保持テーブル及び保持方法 |
US20140208850A1 (en) | 2013-01-29 | 2014-07-31 | Geun-Woo Kim | Apparatus and method of detecting a defect of a semiconductor device |
JP2015026700A (ja) | 2013-07-25 | 2015-02-05 | 株式会社クリエイティブ テクノロジー | センサ一体型吸着チャック及び処理装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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DE69130434T2 (de) * | 1990-06-29 | 1999-04-29 | Canon K.K., Tokio/Tokyo | Platte zum Arbeiten unter Vakuum |
JPH0631627A (ja) * | 1992-07-21 | 1994-02-08 | Toshiba Ceramics Co Ltd | 平面研削盤 |
JPH091370A (ja) * | 1995-06-20 | 1997-01-07 | Souei Tsusho Kk | 割断加工方法及び割断加工装置 |
JP2001110754A (ja) | 1999-10-14 | 2001-04-20 | Disco Abrasive Syst Ltd | 切削装置 |
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2018
- 2018-03-08 JP JP2018041615A patent/JP7184525B2/ja active Active
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- 2019-03-07 US US16/295,706 patent/US10870220B2/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005103587A (ja) | 2003-09-30 | 2005-04-21 | Disco Abrasive Syst Ltd | レーザー加工装置 |
JP2006245439A (ja) | 2005-03-04 | 2006-09-14 | Disco Abrasive Syst Ltd | 半導体ウエーハの電極加工装置 |
JP2008188646A (ja) | 2007-02-06 | 2008-08-21 | Tokyo Seimitsu Co Ltd | 塑性加工異常検出方法、加工システム及びae検出装置 |
JP2009066708A (ja) | 2007-09-13 | 2009-04-02 | Disco Abrasive Syst Ltd | 加工装置における加工水の確認方法及び確認装置 |
JP2009188378A (ja) | 2007-11-08 | 2009-08-20 | Applied Materials Inc | パルス列アニーリング方法および装置 |
JP2011228436A (ja) | 2010-04-19 | 2011-11-10 | Hitachi High-Technologies Corp | プラズマ処理装置およびプラズマ処理方法 |
JP2014075408A (ja) | 2012-10-03 | 2014-04-24 | Disco Abrasive Syst Ltd | 保持テーブル及び保持方法 |
US20140208850A1 (en) | 2013-01-29 | 2014-07-31 | Geun-Woo Kim | Apparatus and method of detecting a defect of a semiconductor device |
JP2015026700A (ja) | 2013-07-25 | 2015-02-05 | 株式会社クリエイティブ テクノロジー | センサ一体型吸着チャック及び処理装置 |
Also Published As
Publication number | Publication date |
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JP2019160860A (ja) | 2019-09-19 |
US10870220B2 (en) | 2020-12-22 |
US20190275700A1 (en) | 2019-09-12 |
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