JP7177183B2 - 装置の動作を説明するパラメータ間の重要な関係の決定 - Google Patents

装置の動作を説明するパラメータ間の重要な関係の決定 Download PDF

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JP7177183B2
JP7177183B2 JP2020569728A JP2020569728A JP7177183B2 JP 7177183 B2 JP7177183 B2 JP 7177183B2 JP 2020569728 A JP2020569728 A JP 2020569728A JP 2020569728 A JP2020569728 A JP 2020569728A JP 7177183 B2 JP7177183 B2 JP 7177183B2
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parameters
data
data set
semiconductor manufacturing
relationships
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JP2021527953A (ja
JP2021527953A5 (https=
JPWO2019238348A5 (https=
Inventor
サイターマンズ、デイヴィッド、エバート、ソング、クーク
ブラント、マルセル、リチャード、アンドレ
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ASML Netherlands BV
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ASML Netherlands BV
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70533—Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/042—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators in which a parameter or coefficient is automatically adjusted to optimise the performance
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0224—Process history based detection method, e.g. whereby history implies the availability of large amounts of data
    • G05B23/024—Quantitative history assessment, e.g. mathematical relationships between available data; Functions therefor; Principal component analysis [PCA]; Partial least square [PLS]; Statistical classifiers, e.g. Bayesian networks, linear regression or correlation analysis; Neural networks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Evolutionary Computation (AREA)
  • Artificial Intelligence (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Mathematical Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing And Monitoring For Control Systems (AREA)
JP2020569728A 2018-06-15 2019-05-15 装置の動作を説明するパラメータ間の重要な関係の決定 Active JP7177183B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP18177970.3 2018-06-15
EP18177970.3A EP3582007A1 (en) 2018-06-15 2018-06-15 Determining significant relationships between parameters describing operation of an apparatus
PCT/EP2019/062512 WO2019238348A1 (en) 2018-06-15 2019-05-15 Determining significant relationships between parameters describing operation of an apparatus

Publications (4)

Publication Number Publication Date
JP2021527953A JP2021527953A (ja) 2021-10-14
JP2021527953A5 JP2021527953A5 (https=) 2022-06-16
JPWO2019238348A5 JPWO2019238348A5 (https=) 2022-06-16
JP7177183B2 true JP7177183B2 (ja) 2022-11-22

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ID=62684681

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JP2020569728A Active JP7177183B2 (ja) 2018-06-15 2019-05-15 装置の動作を説明するパラメータ間の重要な関係の決定

Country Status (6)

Country Link
US (1) US11526084B2 (https=)
EP (1) EP3582007A1 (https=)
JP (1) JP7177183B2 (https=)
CN (1) CN112334835A (https=)
NL (1) NL2021804A (https=)
WO (1) WO2019238348A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12189303B2 (en) 2020-05-08 2025-01-07 Asml Netherlands B.V. Methods and apparatus for diagnosing unobserved operational parameters
JP7643422B2 (ja) * 2022-09-14 2025-03-11 トヨタ自動車株式会社 作業状況監視システム、作業状況監視方法、及び、作業状況監視プログラム
KR20250117398A (ko) * 2022-11-29 2025-08-04 도쿄엘렉트론가부시키가이샤 컴퓨터 프로그램, 정보 처리 장치 및 정보 처리 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009124101A (ja) 2007-08-02 2009-06-04 Asml Netherlands Bv 検査方法および装置、リソグラフィ装置、リソグラフィ処理セル、およびデバイス製造方法
JP2013074294A (ja) 2011-09-28 2013-04-22 Asml Netherlands Bv 基板にパターンを適用する方法、デバイス製造方法、及びこの方法に使用されるリソグラフィ装置
JP2017520021A (ja) 2014-06-03 2017-07-20 アセルタ ナノグラフィクス 差分手順によりｉｃ製造プロセスのパラメータを判断する方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458610B1 (en) * 2001-05-31 2002-10-01 Advanced Micro Devices, Inc. Method and apparatus for optical film stack fault detection
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7650200B2 (en) * 2007-03-30 2010-01-19 Tokyo Electron Limited Method and apparatus for creating a site-dependent evaluation library
WO2017055073A1 (en) 2015-09-29 2017-04-06 Asml Netherlands B.V. Methods of modelling systems or performing predictive maintenance of lithographic systems
KR102189686B1 (ko) 2016-04-20 2020-12-14 에이에스엠엘 네델란즈 비.브이. 레코드 매칭 방법, 유지보수 스케줄링 방법, 및 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009124101A (ja) 2007-08-02 2009-06-04 Asml Netherlands Bv 検査方法および装置、リソグラフィ装置、リソグラフィ処理セル、およびデバイス製造方法
JP2013074294A (ja) 2011-09-28 2013-04-22 Asml Netherlands Bv 基板にパターンを適用する方法、デバイス製造方法、及びこの方法に使用されるリソグラフィ装置
JP2017520021A (ja) 2014-06-03 2017-07-20 アセルタ ナノグラフィクス 差分手順によりｉｃ製造プロセスのパラメータを判断する方法

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Publication number Publication date
US20210325789A1 (en) 2021-10-21
JP2021527953A (ja) 2021-10-14
NL2021804A (en) 2018-11-06
US11526084B2 (en) 2022-12-13
EP3582007A1 (en) 2019-12-18
CN112334835A (zh) 2021-02-05
WO2019238348A1 (en) 2019-12-19

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