JPWO2019238348A5 - - Google Patents
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- Publication number
- JPWO2019238348A5 JPWO2019238348A5 JP2020569728A JP2020569728A JPWO2019238348A5 JP WO2019238348 A5 JPWO2019238348 A5 JP WO2019238348A5 JP 2020569728 A JP2020569728 A JP 2020569728A JP 2020569728 A JP2020569728 A JP 2020569728A JP WO2019238348 A5 JPWO2019238348 A5 JP WO2019238348A5
- Authority
- JP
- Japan
- Prior art keywords
- parameters
- dataset
- semiconductor manufacturing
- frequency data
- subset
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 32
- 238000005259 measurement Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims 14
- 239000004065 semiconductor Substances 0.000 claims 14
- 230000001364 causal effect Effects 0.000 claims 2
- 238000004590 computer program Methods 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 2
- 238000012544 monitoring process Methods 0.000 claims 2
- 238000004458 analytical method Methods 0.000 description 7
- 238000013403 standard screening design Methods 0.000 description 4
- 238000007405 data analysis Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000002547 anomalous effect Effects 0.000 description 1
- 230000003542 behavioural effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Images
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP18177970.3 | 2018-06-15 | ||
| EP18177970.3A EP3582007A1 (en) | 2018-06-15 | 2018-06-15 | Determining significant relationships between parameters describing operation of an apparatus |
| PCT/EP2019/062512 WO2019238348A1 (en) | 2018-06-15 | 2019-05-15 | Determining significant relationships between parameters describing operation of an apparatus |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2021527953A JP2021527953A (ja) | 2021-10-14 |
| JP2021527953A5 JP2021527953A5 (https=) | 2022-06-16 |
| JPWO2019238348A5 true JPWO2019238348A5 (https=) | 2022-06-16 |
| JP7177183B2 JP7177183B2 (ja) | 2022-11-22 |
Family
ID=62684681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020569728A Active JP7177183B2 (ja) | 2018-06-15 | 2019-05-15 | 装置の動作を説明するパラメータ間の重要な関係の決定 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11526084B2 (https=) |
| EP (1) | EP3582007A1 (https=) |
| JP (1) | JP7177183B2 (https=) |
| CN (1) | CN112334835A (https=) |
| NL (1) | NL2021804A (https=) |
| WO (1) | WO2019238348A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12189303B2 (en) | 2020-05-08 | 2025-01-07 | Asml Netherlands B.V. | Methods and apparatus for diagnosing unobserved operational parameters |
| JP7643422B2 (ja) * | 2022-09-14 | 2025-03-11 | トヨタ自動車株式会社 | 作業状況監視システム、作業状況監視方法、及び、作業状況監視プログラム |
| KR20250117398A (ko) * | 2022-11-29 | 2025-08-04 | 도쿄엘렉트론가부시키가이샤 | 컴퓨터 프로그램, 정보 처리 장치 및 정보 처리 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458610B1 (en) * | 2001-05-31 | 2002-10-01 | Advanced Micro Devices, Inc. | Method and apparatus for optical film stack fault detection |
| SG135052A1 (en) | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US7650200B2 (en) * | 2007-03-30 | 2010-01-19 | Tokyo Electron Limited | Method and apparatus for creating a site-dependent evaluation library |
| US7460237B1 (en) | 2007-08-02 | 2008-12-02 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| NL2009345A (en) | 2011-09-28 | 2013-04-02 | Asml Netherlands Bv | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods. |
| EP2952964A1 (en) | 2014-06-03 | 2015-12-09 | Aselta Nanographics | Method for determining the parameters of an ic manufacturing process by a differential procedure |
| WO2017055073A1 (en) | 2015-09-29 | 2017-04-06 | Asml Netherlands B.V. | Methods of modelling systems or performing predictive maintenance of lithographic systems |
| KR102189686B1 (ko) | 2016-04-20 | 2020-12-14 | 에이에스엠엘 네델란즈 비.브이. | 레코드 매칭 방법, 유지보수 스케줄링 방법, 및 장치 |
-
2018
- 2018-06-15 EP EP18177970.3A patent/EP3582007A1/en not_active Withdrawn
- 2018-10-12 NL NL2021804A patent/NL2021804A/en unknown
-
2019
- 2019-05-15 CN CN201980040054.1A patent/CN112334835A/zh active Pending
- 2019-05-15 JP JP2020569728A patent/JP7177183B2/ja active Active
- 2019-05-15 WO PCT/EP2019/062512 patent/WO2019238348A1/en not_active Ceased
- 2019-05-15 US US17/251,568 patent/US11526084B2/en active Active
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