JPWO2019238348A5 - - Google Patents

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JPWO2019238348A5
JPWO2019238348A5 JP2020569728A JP2020569728A JPWO2019238348A5 JP WO2019238348 A5 JPWO2019238348 A5 JP WO2019238348A5 JP 2020569728 A JP2020569728 A JP 2020569728A JP 2020569728 A JP2020569728 A JP 2020569728A JP WO2019238348 A5 JPWO2019238348 A5 JP WO2019238348A5
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Japan
Prior art keywords
parameters
dataset
semiconductor manufacturing
frequency data
subset
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JP2020569728A
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English (en)
Japanese (ja)
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JP2021527953A (ja
JP7177183B2 (ja
JP2021527953A5 (https=
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Priority claimed from EP18177970.3A external-priority patent/EP3582007A1/en
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Publication of JPWO2019238348A5 publication Critical patent/JPWO2019238348A5/ja
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JP2020569728A 2018-06-15 2019-05-15 装置の動作を説明するパラメータ間の重要な関係の決定 Active JP7177183B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP18177970.3 2018-06-15
EP18177970.3A EP3582007A1 (en) 2018-06-15 2018-06-15 Determining significant relationships between parameters describing operation of an apparatus
PCT/EP2019/062512 WO2019238348A1 (en) 2018-06-15 2019-05-15 Determining significant relationships between parameters describing operation of an apparatus

Publications (4)

Publication Number Publication Date
JP2021527953A JP2021527953A (ja) 2021-10-14
JP2021527953A5 JP2021527953A5 (https=) 2022-06-16
JPWO2019238348A5 true JPWO2019238348A5 (https=) 2022-06-16
JP7177183B2 JP7177183B2 (ja) 2022-11-22

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JP2020569728A Active JP7177183B2 (ja) 2018-06-15 2019-05-15 装置の動作を説明するパラメータ間の重要な関係の決定

Country Status (6)

Country Link
US (1) US11526084B2 (https=)
EP (1) EP3582007A1 (https=)
JP (1) JP7177183B2 (https=)
CN (1) CN112334835A (https=)
NL (1) NL2021804A (https=)
WO (1) WO2019238348A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12189303B2 (en) 2020-05-08 2025-01-07 Asml Netherlands B.V. Methods and apparatus for diagnosing unobserved operational parameters
JP7643422B2 (ja) * 2022-09-14 2025-03-11 トヨタ自動車株式会社 作業状況監視システム、作業状況監視方法、及び、作業状況監視プログラム
KR20250117398A (ko) * 2022-11-29 2025-08-04 도쿄엘렉트론가부시키가이샤 컴퓨터 프로그램, 정보 처리 장치 및 정보 처리 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458610B1 (en) * 2001-05-31 2002-10-01 Advanced Micro Devices, Inc. Method and apparatus for optical film stack fault detection
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7650200B2 (en) * 2007-03-30 2010-01-19 Tokyo Electron Limited Method and apparatus for creating a site-dependent evaluation library
US7460237B1 (en) 2007-08-02 2008-12-02 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
NL2009345A (en) 2011-09-28 2013-04-02 Asml Netherlands Bv Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods.
EP2952964A1 (en) 2014-06-03 2015-12-09 Aselta Nanographics Method for determining the parameters of an ic manufacturing process by a differential procedure
WO2017055073A1 (en) 2015-09-29 2017-04-06 Asml Netherlands B.V. Methods of modelling systems or performing predictive maintenance of lithographic systems
KR102189686B1 (ko) 2016-04-20 2020-12-14 에이에스엠엘 네델란즈 비.브이. 레코드 매칭 방법, 유지보수 스케줄링 방법, 및 장치

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