JP7146645B2 - 連続基板上に材料を堆積する方法及び装置 - Google Patents
連続基板上に材料を堆積する方法及び装置 Download PDFInfo
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- JP7146645B2 JP7146645B2 JP2018563020A JP2018563020A JP7146645B2 JP 7146645 B2 JP7146645 B2 JP 7146645B2 JP 2018563020 A JP2018563020 A JP 2018563020A JP 2018563020 A JP2018563020 A JP 2018563020A JP 7146645 B2 JP7146645 B2 JP 7146645B2
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- C—CHEMISTRY; METALLURGY
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62884—Coating the powders or the macroscopic reinforcing agents by gas phase techniques
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H51/00—Forwarding filamentary material
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62844—Coating fibres
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- C—CHEMISTRY; METALLURGY
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62844—Coating fibres
- C04B35/62857—Coating fibres with non-oxide ceramics
- C04B35/62865—Nitrides
- C04B35/62868—Boron nitride
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62844—Coating fibres
- C04B35/62857—Coating fibres with non-oxide ceramics
- C04B35/62865—Nitrides
- C04B35/62871—Silicon nitride
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62894—Coating the powders or the macroscopic reinforcing agents with more than one coating layer
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- C—CHEMISTRY; METALLURGY
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/71—Ceramic products containing macroscopic reinforcing agents
- C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
- C04B35/80—Fibres, filaments, whiskers, platelets, or the like
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/342—Boron nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/38—Non-oxide ceramic constituents or additives
- C04B2235/3852—Nitrides, e.g. oxynitrides, carbonitrides, oxycarbonitrides, lithium nitride, magnesium nitride
- C04B2235/386—Boron nitrides
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/38—Non-oxide ceramic constituents or additives
- C04B2235/3852—Nitrides, e.g. oxynitrides, carbonitrides, oxycarbonitrides, lithium nitride, magnesium nitride
- C04B2235/3873—Silicon nitrides, e.g. silicon carbonitride, silicon oxynitride
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
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- C04B2235/5216—Inorganic
- C04B2235/522—Oxidic
- C04B2235/5224—Alumina or aluminates
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
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- C04B2235/5216—Inorganic
- C04B2235/522—Oxidic
- C04B2235/5236—Zirconia
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- C04B2235/5216—Inorganic
- C04B2235/524—Non-oxidic, e.g. borides, carbides, silicides or nitrides
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
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- C04B2235/5216—Inorganic
- C04B2235/524—Non-oxidic, e.g. borides, carbides, silicides or nitrides
- C04B2235/5244—Silicon carbide
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/60—Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
- C04B2235/614—Gas infiltration of green bodies or pre-forms
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Prostheses (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662344962P | 2016-06-02 | 2016-06-02 | |
| US62/344,962 | 2016-06-02 | ||
| PCT/US2017/035728 WO2017210583A1 (en) | 2016-06-02 | 2017-06-02 | Methods and apparatus for depositing materials on a continuous substrate |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019522108A JP2019522108A (ja) | 2019-08-08 |
| JP2019522108A5 JP2019522108A5 (enExample) | 2021-10-21 |
| JP7146645B2 true JP7146645B2 (ja) | 2022-10-04 |
Family
ID=60479088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018563020A Active JP7146645B2 (ja) | 2016-06-02 | 2017-06-02 | 連続基板上に材料を堆積する方法及び装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11578004B2 (enExample) |
| EP (1) | EP3464218A4 (enExample) |
| JP (1) | JP7146645B2 (enExample) |
| CN (1) | CN109195931B (enExample) |
| SG (2) | SG11201810649PA (enExample) |
| TW (1) | TWI757299B (enExample) |
| WO (1) | WO2017210583A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3957619B1 (en) * | 2020-08-19 | 2025-11-12 | Rolls-Royce High Temperature Composites Inc | Method of making a ceramic matrix composite that exhibits chemical resistance |
| US20240240391A1 (en) * | 2023-01-12 | 2024-07-18 | Honeywell International Inc. | Continuous vacuum processing of fiber tows |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020170496A1 (en) | 2001-05-17 | 2002-11-21 | Lg Electronics Inc. | Continuous processing apparatus by plasma polymerization with vertical chamber |
| JP2002356751A (ja) | 2001-05-29 | 2002-12-13 | Kawasaki Steel Corp | 超低鉄損一方向性珪素鋼板およびその製造方法 |
| JP2010174370A (ja) | 2009-05-11 | 2010-08-12 | Hitachi Zosen Corp | 減圧ユニット及び圧力復元ユニット |
| JP2013505564A (ja) | 2009-09-22 | 2013-02-14 | アプライド マテリアルズ インコーポレイテッド | モジュール式基板処理システムおよびモジュール基板処理方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS605688B2 (ja) * | 1976-01-10 | 1985-02-13 | 東レ株式会社 | 交絡巻縮糸の製造方法 |
| US4343836A (en) * | 1979-07-26 | 1982-08-10 | United States Of America As Represented By The United States Department Of Energy | One-directional uniformly coated fibers, method of preparation, and uses therefor |
| US4601260A (en) * | 1985-04-01 | 1986-07-22 | Sovonics Solar Systems | Vertical semiconductor processor |
| DE3582682D1 (de) * | 1985-12-19 | 1991-05-29 | Hewlett Packard Co | Vorrichtung zur chemischen dampfphasenabscheidung einer beschichtung auf eine optische faser. |
| US4968918A (en) | 1987-07-06 | 1990-11-06 | Kanebo, Ltd. | Apparatus for plasma treatment |
| JPH0663102B2 (ja) * | 1988-05-10 | 1994-08-17 | 鐘紡株式会社 | プラズマ処理装置 |
| JPH05124841A (ja) * | 1991-06-12 | 1993-05-21 | Sumitomo Electric Ind Ltd | ハーメチツクコート光フアイバの製造方法 |
| US20050005846A1 (en) * | 2003-06-23 | 2005-01-13 | Venkat Selvamanickam | High throughput continuous pulsed laser deposition process and apparatus |
| US20070111367A1 (en) * | 2005-10-19 | 2007-05-17 | Basol Bulent M | Method and apparatus for converting precursor layers into photovoltaic absorbers |
| US20070099527A1 (en) * | 2005-11-01 | 2007-05-03 | General Electric Company | Method and reactor to coat fiber tows and article |
| US20070148346A1 (en) * | 2005-12-23 | 2007-06-28 | General Electric Company | Systems and methods for deposition of graded materials on continuously fed objects |
| EP2000008B1 (en) * | 2006-03-26 | 2011-04-27 | Lotus Applied Technology, Llc | Atomic layer deposition system and method for coating flexible substrates |
| US20100310766A1 (en) * | 2009-06-07 | 2010-12-09 | Veeco Compound Semiconductor, Inc. | Roll-to-Roll Chemical Vapor Deposition System |
| US20110143019A1 (en) * | 2009-12-14 | 2011-06-16 | Amprius, Inc. | Apparatus for Deposition on Two Sides of the Web |
| CN201634580U (zh) * | 2010-01-25 | 2010-11-17 | 上海台姆超声设备有限公司 | 自动太阳能玻璃镀膜设备 |
| WO2012012394A1 (en) * | 2010-07-23 | 2012-01-26 | First Solar, Inc | In-line deposition system |
| CN202164233U (zh) * | 2011-07-22 | 2012-03-14 | 江苏阳帆机电设备制造有限公司 | 全自动坩埚烘烤喷涂流水线 |
| JP6003513B2 (ja) * | 2012-10-15 | 2016-10-05 | 株式会社Ihi | 高温処理炉及び強化繊維の継ぎ方法 |
| CN104164661A (zh) * | 2013-05-16 | 2014-11-26 | 理想能源设备(上海)有限公司 | 直列式多腔叠层并行处理真空设备及其使用方法 |
-
2017
- 2017-06-02 EP EP17807587.5A patent/EP3464218A4/en not_active Withdrawn
- 2017-06-02 JP JP2018563020A patent/JP7146645B2/ja active Active
- 2017-06-02 SG SG11201810649PA patent/SG11201810649PA/en unknown
- 2017-06-02 TW TW106118248A patent/TWI757299B/zh not_active IP Right Cessation
- 2017-06-02 US US16/306,171 patent/US11578004B2/en active Active
- 2017-06-02 WO PCT/US2017/035728 patent/WO2017210583A1/en not_active Ceased
- 2017-06-02 SG SG10202011721TA patent/SG10202011721TA/en unknown
- 2017-06-02 CN CN201780033767.6A patent/CN109195931B/zh not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020170496A1 (en) | 2001-05-17 | 2002-11-21 | Lg Electronics Inc. | Continuous processing apparatus by plasma polymerization with vertical chamber |
| JP2002356751A (ja) | 2001-05-29 | 2002-12-13 | Kawasaki Steel Corp | 超低鉄損一方向性珪素鋼板およびその製造方法 |
| JP2010174370A (ja) | 2009-05-11 | 2010-08-12 | Hitachi Zosen Corp | 減圧ユニット及び圧力復元ユニット |
| JP2013505564A (ja) | 2009-09-22 | 2013-02-14 | アプライド マテリアルズ インコーポレイテッド | モジュール式基板処理システムおよびモジュール基板処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109195931A (zh) | 2019-01-11 |
| US20200290932A1 (en) | 2020-09-17 |
| TWI757299B (zh) | 2022-03-11 |
| JP2019522108A (ja) | 2019-08-08 |
| SG11201810649PA (en) | 2018-12-28 |
| CN109195931B (zh) | 2022-08-09 |
| TW201807240A (zh) | 2018-03-01 |
| EP3464218A4 (en) | 2020-08-05 |
| SG10202011721TA (en) | 2020-12-30 |
| EP3464218A1 (en) | 2019-04-10 |
| US11578004B2 (en) | 2023-02-14 |
| WO2017210583A1 (en) | 2017-12-07 |
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