JP7104266B1 - 希土類含有SiC基板及びSiC複合基板 - Google Patents
希土類含有SiC基板及びSiC複合基板 Download PDFInfo
- Publication number
- JP7104266B1 JP7104266B1 JP2022535220A JP2022535220A JP7104266B1 JP 7104266 B1 JP7104266 B1 JP 7104266B1 JP 2022535220 A JP2022535220 A JP 2022535220A JP 2022535220 A JP2022535220 A JP 2022535220A JP 7104266 B1 JP7104266 B1 JP 7104266B1
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- Japan
- Prior art keywords
- sic
- substrate
- rare earth
- layer
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
- H10D62/832—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge being Group IV materials comprising two or more elements, e.g. SiGe
- H10D62/8325—Silicon carbide
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B1/00—Single-crystal growth directly from the solid state
- C30B1/02—Single-crystal growth directly from the solid state by thermal treatment, e.g. strain annealing
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021167477 | 2021-10-12 | ||
| JP2021167477 | 2021-10-12 | ||
| PCT/JP2021/047648 WO2023062850A1 (ja) | 2021-10-12 | 2021-12-22 | 希土類含有SiC基板及びSiC複合基板 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP7104266B1 true JP7104266B1 (ja) | 2022-07-20 |
| JPWO2023062850A1 JPWO2023062850A1 (https=) | 2023-04-20 |
| JPWO2023062850A5 JPWO2023062850A5 (https=) | 2023-09-20 |
Family
ID=82482455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022535220A Active JP7104266B1 (ja) | 2021-10-12 | 2021-12-22 | 希土類含有SiC基板及びSiC複合基板 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20240250127A1 (https=) |
| EP (1) | EP4417739A4 (https=) |
| JP (1) | JP7104266B1 (https=) |
| CN (1) | CN117940620A (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004533720A (ja) * | 2001-05-11 | 2004-11-04 | クリー インコーポレイテッド | 高い降伏電圧を有する半導体デバイスのための高抵抗率炭化珪素基板 |
| WO2021149235A1 (ja) * | 2020-01-24 | 2021-07-29 | 日本碍子株式会社 | 希土類含有SiC基板及びSiCエピタキシャル層の製法 |
| WO2021149598A1 (ja) * | 2020-01-24 | 2021-07-29 | 日本碍子株式会社 | 二軸配向SiC複合基板及び半導体デバイス用複合基板 |
-
2021
- 2021-12-22 CN CN202180102294.7A patent/CN117940620A/zh active Pending
- 2021-12-22 JP JP2022535220A patent/JP7104266B1/ja active Active
- 2021-12-22 EP EP21960703.3A patent/EP4417739A4/en active Pending
-
2024
- 2024-02-14 US US18/441,143 patent/US20240250127A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004533720A (ja) * | 2001-05-11 | 2004-11-04 | クリー インコーポレイテッド | 高い降伏電圧を有する半導体デバイスのための高抵抗率炭化珪素基板 |
| WO2021149235A1 (ja) * | 2020-01-24 | 2021-07-29 | 日本碍子株式会社 | 希土類含有SiC基板及びSiCエピタキシャル層の製法 |
| WO2021149598A1 (ja) * | 2020-01-24 | 2021-07-29 | 日本碍子株式会社 | 二軸配向SiC複合基板及び半導体デバイス用複合基板 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2023062850A1 (https=) | 2023-04-20 |
| US20240250127A1 (en) | 2024-07-25 |
| EP4417739A1 (en) | 2024-08-21 |
| CN117940620A (zh) | 2024-04-26 |
| EP4417739A4 (en) | 2025-08-27 |
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