JP7068659B2 - 露光用光源装置 - Google Patents

露光用光源装置 Download PDF

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Publication number
JP7068659B2
JP7068659B2 JP2018228435A JP2018228435A JP7068659B2 JP 7068659 B2 JP7068659 B2 JP 7068659B2 JP 2018228435 A JP2018228435 A JP 2018228435A JP 2018228435 A JP2018228435 A JP 2018228435A JP 7068659 B2 JP7068659 B2 JP 7068659B2
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Japan
Prior art keywords
optical system
semiconductor laser
light
light source
emitted
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Active
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JP2018228435A
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English (en)
Japanese (ja)
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JP2020091398A (ja
Inventor
雄一 三浦
賢志 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
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Ushio Denki KK
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Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP2018228435A priority Critical patent/JP7068659B2/ja
Priority to TW108139627A priority patent/TWI780373B/zh
Priority to PCT/JP2019/044321 priority patent/WO2020116099A1/ja
Priority to CN201980073618.1A priority patent/CN112969969B/zh
Publication of JP2020091398A publication Critical patent/JP2020091398A/ja
Application granted granted Critical
Publication of JP7068659B2 publication Critical patent/JP7068659B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
JP2018228435A 2018-12-05 2018-12-05 露光用光源装置 Active JP7068659B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2018228435A JP7068659B2 (ja) 2018-12-05 2018-12-05 露光用光源装置
TW108139627A TWI780373B (zh) 2018-12-05 2019-11-01 曝光用光源裝置
PCT/JP2019/044321 WO2020116099A1 (ja) 2018-12-05 2019-11-12 露光用光源装置
CN201980073618.1A CN112969969B (zh) 2018-12-05 2019-11-12 曝光用光源装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018228435A JP7068659B2 (ja) 2018-12-05 2018-12-05 露光用光源装置

Publications (2)

Publication Number Publication Date
JP2020091398A JP2020091398A (ja) 2020-06-11
JP7068659B2 true JP7068659B2 (ja) 2022-05-17

Family

ID=70974567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018228435A Active JP7068659B2 (ja) 2018-12-05 2018-12-05 露光用光源装置

Country Status (4)

Country Link
JP (1) JP7068659B2 (zh)
CN (1) CN112969969B (zh)
TW (1) TWI780373B (zh)
WO (1) WO2020116099A1 (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013061858A1 (ja) 2011-10-24 2013-05-02 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP2015060084A (ja) 2013-09-19 2015-03-30 ウシオ電機株式会社 導光体及びレーザ光源装置
JP2017161603A (ja) 2016-03-07 2017-09-14 ウシオ電機株式会社 光源装置及びこれを備えた露光装置
JP2018004868A (ja) 2016-06-30 2018-01-11 セイコーエプソン株式会社 照明装置およびプロジェクター
WO2018037548A1 (ja) 2016-08-26 2018-03-01 株式会社島津製作所 発光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5630004A (en) * 1994-09-09 1997-05-13 Deacon Research Controllable beam director using poled structure
JP2004138603A (ja) * 2002-09-24 2004-05-13 Topcon Corp レーザ光源装置及びこれを用いた表面検査装置
US9599510B2 (en) * 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013061858A1 (ja) 2011-10-24 2013-05-02 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP2015060084A (ja) 2013-09-19 2015-03-30 ウシオ電機株式会社 導光体及びレーザ光源装置
JP2017161603A (ja) 2016-03-07 2017-09-14 ウシオ電機株式会社 光源装置及びこれを備えた露光装置
JP2018004868A (ja) 2016-06-30 2018-01-11 セイコーエプソン株式会社 照明装置およびプロジェクター
WO2018037548A1 (ja) 2016-08-26 2018-03-01 株式会社島津製作所 発光装置

Also Published As

Publication number Publication date
CN112969969A (zh) 2021-06-15
JP2020091398A (ja) 2020-06-11
CN112969969B (zh) 2021-11-09
TW202036171A (zh) 2020-10-01
TWI780373B (zh) 2022-10-11
WO2020116099A1 (ja) 2020-06-11

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