JP7054013B2 - 半導体集積回路装置 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 28
- 239000002070 nanowire Substances 0.000 claims description 72
- 239000002184 metal Substances 0.000 claims description 31
- 230000003068 static effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- -1 PD is a pad Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
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Description
図1は実施形態に係る半導体集積回路装置(半導体チップ)の全体構成を模式的に示す平面図である。図1に示す半導体集積回路装置1は、半導体基板2上に、コアロジック領域10が設けられている。本開示では、コアロジック部10は、上述したナノワイヤFETを含むスタンダードセル(以下、適宜、単に「セル」という)によって構成されている。また半導体基板2上には、コアロジック領域10以外に、SRAM(Static Random Access Memory)ブロック21,22、例えばA/DコンバータやPLL等のアナログ回路を含むマクロブロック23、半導体集積回路装置1の外部と信号等のやりとりを行うためのI/O部31,32,33,34等が設けられている。
図3は本開示における特徴その1を示すスタンダードセルの構成例である。図3では、スタンダードセルC11,C12がY方向に並べて配置されており、スタンダードセルC12はY方向において反転されている。図3において、X方向に延びる一点鎖線GR1は、ナノワイヤNWを配置可能な位置を表すグリッドである。グリッドGR1はピッチPnで配置されている。ナノワイヤNWはグリッドGR1上に配置されている。ただし、ナノワイヤNWが配置されていないグリッドGR1もある。
Hc=(Pn×0.5)×M(M:奇数)
と設定できるようにする。これにより、ナノワイヤNWの配置ピッチの均一性を保ちつつ、セル高さHcの選択の自由度を高めることができる。
図4は図3の構成例において、M2配線層に形成したメタル配線を図示した図である。図4において、X方向に延びる破線GR2は、M2配線層においてメタル配線を配置可能な位置を表すグリッドである。グリッドGR2はピッチPmで配置されている。ただし、図4の構成では、ピッチPmは、半導体集積回路装置1における最小配線ピッチPmminよりも大きい(Pm>Pmmin)。グリッドGR2上にメタル配線5a~5eが配置されている。ただし、メタル配線が配置されていないグリッドGR2もある。なお、メタル配線5a~5eは、セル内配線であってもよいし、セル間を接続する配線であってもよい。
Hc=(Pn×0.5)×23
=(48×0.5)×23=552nm
となる。この場合、
552/64=8.625
なので、セル高さHc(=552nm)は、メタル配線の最小配線ピッチPmmin(=64nm)の整数倍にならない。このことは、複数のスタンダードセルからなる回路ブロックのレイアウトの均一性を損なうことになり、好ましくない。
552/69=8
すなわち、セル高さHc(=552nm)は、メタル配線のピッチPm(=69nm)の8倍、すなわち整数倍になっている。この結果、メタル配線のピッチPmは、SRAMブロック22におけるM2配線層での配線ピッチPmSRAMよりも大きくなっている。
ここで、Integer()は括弧内の数値の整数部分を示す関数である。また、kは、ピッチPmの値が1nm単位になるように調整するための変数である。
10 コアロジック領域
22 SRAMブロック(マクロブロック)
C,C11,C12 スタンダードセル
CR1,CR2,CR3 セル列
Hc セル高さ
NW ナノワイヤ
Pn ナノワイヤのピッチ(第1ピッチ)
Pm メタル配線のピッチ(第2ピッチ)
PmSRAM SRAMブロックにおけるメタル配線のピッチ(第3ピッチ)
Claims (3)
- 第1方向に並ぶ複数のスタンダードセルからなるセル列が、前記第1方向と垂直をなす第2方向において、複数、並べて配置された回路ブロックを備え、
前記複数のスタンダードセルは、前記第1方向に延び、前記第2方向において第1ピッチで配置された複数のナノワイヤを備え、
前記複数のスタンダードセルは、前記第2方向におけるサイズであるセル高さが、前記第1ピッチの半分のM倍(Mは奇数)である
ことを特徴とする半導体集積回路装置。 - 第1方向に並ぶ複数のスタンダードセルからなるセル列が、前記第1方向と垂直をなす第2方向において、複数、並べて配置された回路ブロックと、
マクロブロックとを備え、
前記複数のスタンダードセルは、前記第1方向に延び、前記第2方向において第1ピッチで配置された複数のナノワイヤを備え、
前記複数のスタンダードセルは、前記第2方向におけるサイズであるセル高さが、前記第1ピッチの半分のN倍(Nは整数)であり、
前記回路ブロックは、前記複数のナノワイヤの上層にある第1配線層に形成されており、前記第1方向に延び、前記第2方向において第2ピッチで配置された複数のメタル配線を備え、
前記マクロブロックは、前記第1配線層に形成されており、前記第1方向に延び、前記第2方向において第3ピッチで配置された複数のメタル配線を備え、
前記第2ピッチは、前記第3ピッチより大きい
ことを特徴とする半導体集積回路装置。 - 請求項2記載の半導体集積回路装置において、
前記マクロブロックは、SRAM (Static Random Access Memory) ブロックである
ことを特徴とする半導体集積回路装置。
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2010141187A (ja) | 2008-12-12 | 2010-06-24 | Renesas Technology Corp | 半導体集積回路装置 |
US20140097493A1 (en) | 2012-10-09 | 2014-04-10 | Samsung Electronics Co., Ltd. | Cells including at least one fin field effect transistor and semiconductor integrated circuits including the same |
JP2014220498A (ja) | 2013-05-02 | 2014-11-20 | 台湾積體電路製造股▲ふん▼有限公司Taiwan Semiconductor Manufacturing Company,Ltd. | 公称最小ピッチの非整数倍であるセル高さを有するスタンダードセル |
US20150041924A1 (en) | 2012-06-13 | 2015-02-12 | Synopsys, Inc. | N-channel and p-channel end-to-end finfet cell architecture |
JP2015506589A (ja) | 2012-01-13 | 2015-03-02 | テラ イノヴェイションズ インコーポレイテッド | リニアFinFET構造をもつ回路 |
US20160125116A1 (en) | 2014-10-31 | 2016-05-05 | Synopsys, Inc. | Methodology using fin-fet transistors |
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US9318607B2 (en) | 2013-07-12 | 2016-04-19 | Samsung Electronics Co., Ltd. | Semiconductor device and method of fabricating the same |
KR102314778B1 (ko) * | 2015-08-21 | 2021-10-21 | 삼성전자주식회사 | 반도체 소자 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2010141187A (ja) | 2008-12-12 | 2010-06-24 | Renesas Technology Corp | 半導体集積回路装置 |
JP2015506589A (ja) | 2012-01-13 | 2015-03-02 | テラ イノヴェイションズ インコーポレイテッド | リニアFinFET構造をもつ回路 |
US20150041924A1 (en) | 2012-06-13 | 2015-02-12 | Synopsys, Inc. | N-channel and p-channel end-to-end finfet cell architecture |
US20140097493A1 (en) | 2012-10-09 | 2014-04-10 | Samsung Electronics Co., Ltd. | Cells including at least one fin field effect transistor and semiconductor integrated circuits including the same |
JP2014220498A (ja) | 2013-05-02 | 2014-11-20 | 台湾積體電路製造股▲ふん▼有限公司Taiwan Semiconductor Manufacturing Company,Ltd. | 公称最小ピッチの非整数倍であるセル高さを有するスタンダードセル |
US20160125116A1 (en) | 2014-10-31 | 2016-05-05 | Synopsys, Inc. | Methodology using fin-fet transistors |
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US11348925B2 (en) | 2022-05-31 |
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