JP7041372B2 - 発光装置 - Google Patents

発光装置 Download PDF

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Publication number
JP7041372B2
JP7041372B2 JP2020092491A JP2020092491A JP7041372B2 JP 7041372 B2 JP7041372 B2 JP 7041372B2 JP 2020092491 A JP2020092491 A JP 2020092491A JP 2020092491 A JP2020092491 A JP 2020092491A JP 7041372 B2 JP7041372 B2 JP 7041372B2
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Japan
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region
light
synchrotron radiation
reflected
light emitting
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JP2020092491A
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Japanese (ja)
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JP2020127056A (ja
JP2020127056A5 (https=
Inventor
創一郎 三浦
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Nichia Corp
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Nichia Corp
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Priority to JP2020092491A priority Critical patent/JP7041372B2/ja
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Publication of JP2020127056A5 publication Critical patent/JP2020127056A5/ja
Priority to JP2022030566A priority patent/JP7277844B2/ja
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JP2020092491A 2020-05-27 2020-05-27 発光装置 Active JP7041372B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2020092491A JP7041372B2 (ja) 2020-05-27 2020-05-27 発光装置
JP2022030566A JP7277844B2 (ja) 2020-05-27 2022-03-01 発光装置

Applications Claiming Priority (1)

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JP2020092491A JP7041372B2 (ja) 2020-05-27 2020-05-27 発光装置

Related Parent Applications (1)

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JP2017157063A Division JP6711333B2 (ja) 2017-08-16 2017-08-16 発光装置

Related Child Applications (1)

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JP2022030566A Division JP7277844B2 (ja) 2020-05-27 2022-03-01 発光装置

Publications (3)

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JP2020127056A JP2020127056A (ja) 2020-08-20
JP2020127056A5 JP2020127056A5 (https=) 2020-10-01
JP7041372B2 true JP7041372B2 (ja) 2022-03-24

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JP2020092491A Active JP7041372B2 (ja) 2020-05-27 2020-05-27 発光装置

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2023153241A1 (https=) 2022-02-09 2023-08-17

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000000683A (ja) 1998-06-12 2000-01-07 Advanced Materials Processing Inst Kinki Japan レーザ溶接方法
JP2001291681A (ja) 2000-02-02 2001-10-19 Semiconductor Energy Lab Co Ltd ビームホモジナイザおよびレーザ照射装置および半導体装置および半導体装置の作製方法
JP2003158088A (ja) 2001-11-26 2003-05-30 Semiconductor Energy Lab Co Ltd レーザ照射装置およびレーザ照射方法
JP2005314198A (ja) 2004-04-26 2005-11-10 Lemi Ltd ガラス割断用レーザ装置
JP2009289976A (ja) 2008-05-29 2009-12-10 Nichia Corp 発光装置
CN202126514U (zh) 2011-06-17 2012-01-25 山西飞虹激光科技有限公司 用于激光加工的光学元件及激光加工设备
JP2015002160A (ja) 2013-06-18 2015-01-05 シャープ株式会社 発光装置
US20150124846A1 (en) 2013-11-07 2015-05-07 Binoptics Corporation Lasers with beam shape and beam direction modification
JP2016046481A (ja) 2014-08-26 2016-04-04 住友電気工業株式会社 光アセンブリの製造方法、及び光アセンブリ
JP2017073245A (ja) 2015-10-06 2017-04-13 ウシオ電機株式会社 蛍光光源装置
JP2017107776A (ja) 2015-12-10 2017-06-15 パナソニック株式会社 発光装置および照明装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6377178A (ja) * 1986-09-19 1988-04-07 Fanuc Ltd レ−ザ用集光鏡
KR20040091366A (ko) * 2003-04-21 2004-10-28 엘지전자 주식회사 광디스크 재생장치의 발광소자 벤치 및 그 제조방법

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000000683A (ja) 1998-06-12 2000-01-07 Advanced Materials Processing Inst Kinki Japan レーザ溶接方法
JP2001291681A (ja) 2000-02-02 2001-10-19 Semiconductor Energy Lab Co Ltd ビームホモジナイザおよびレーザ照射装置および半導体装置および半導体装置の作製方法
JP2003158088A (ja) 2001-11-26 2003-05-30 Semiconductor Energy Lab Co Ltd レーザ照射装置およびレーザ照射方法
JP2005314198A (ja) 2004-04-26 2005-11-10 Lemi Ltd ガラス割断用レーザ装置
JP2009289976A (ja) 2008-05-29 2009-12-10 Nichia Corp 発光装置
CN202126514U (zh) 2011-06-17 2012-01-25 山西飞虹激光科技有限公司 用于激光加工的光学元件及激光加工设备
JP2015002160A (ja) 2013-06-18 2015-01-05 シャープ株式会社 発光装置
US20150124846A1 (en) 2013-11-07 2015-05-07 Binoptics Corporation Lasers with beam shape and beam direction modification
JP2016046481A (ja) 2014-08-26 2016-04-04 住友電気工業株式会社 光アセンブリの製造方法、及び光アセンブリ
JP2017073245A (ja) 2015-10-06 2017-04-13 ウシオ電機株式会社 蛍光光源装置
JP2017107776A (ja) 2015-12-10 2017-06-15 パナソニック株式会社 発光装置および照明装置

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JP2020127056A (ja) 2020-08-20

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