JP7027527B2 - 被覆金属基材 - Google Patents
被覆金属基材 Download PDFInfo
- Publication number
- JP7027527B2 JP7027527B2 JP2020512567A JP2020512567A JP7027527B2 JP 7027527 B2 JP7027527 B2 JP 7027527B2 JP 2020512567 A JP2020512567 A JP 2020512567A JP 2020512567 A JP2020512567 A JP 2020512567A JP 7027527 B2 JP7027527 B2 JP 7027527B2
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- JP
- Japan
- Prior art keywords
- coating
- metal substrate
- base material
- coated metal
- magnesium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 title claims description 63
- 239000002184 metal Substances 0.000 title claims description 63
- 239000000758 substrate Substances 0.000 title claims description 45
- 238000000576 coating method Methods 0.000 claims description 79
- 239000011248 coating agent Substances 0.000 claims description 68
- 239000011701 zinc Substances 0.000 claims description 40
- 239000011777 magnesium Substances 0.000 claims description 34
- 229910000831 Steel Inorganic materials 0.000 claims description 29
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 29
- 239000010959 steel Substances 0.000 claims description 29
- 229910052725 zinc Inorganic materials 0.000 claims description 29
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 28
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 26
- 229910052749 magnesium Inorganic materials 0.000 claims description 25
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 21
- 229910052782 aluminium Inorganic materials 0.000 claims description 16
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 14
- 229910052742 iron Inorganic materials 0.000 claims description 14
- 239000011651 chromium Substances 0.000 claims description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 13
- 239000010936 titanium Substances 0.000 claims description 13
- 238000001704 evaporation Methods 0.000 claims description 12
- 238000001771 vacuum deposition Methods 0.000 claims description 12
- 238000007740 vapor deposition Methods 0.000 claims description 12
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 9
- 238000010894 electron beam technology Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- 239000011159 matrix material Substances 0.000 claims description 5
- 238000010298 pulverizing process Methods 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 238000001912 gas jet deposition Methods 0.000 claims description 4
- 238000000227 grinding Methods 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000004070 electrodeposition Methods 0.000 claims description 3
- 238000001540 jet deposition Methods 0.000 claims description 3
- 238000005339 levitation Methods 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 238000004381 surface treatment Methods 0.000 claims description 3
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 2
- 238000005422 blasting Methods 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 238000005289 physical deposition Methods 0.000 claims description 2
- 238000005554 pickling Methods 0.000 claims description 2
- 238000005498 polishing Methods 0.000 claims description 2
- 238000005488 sandblasting Methods 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000000543 intermediate Substances 0.000 claims 5
- 230000008020 evaporation Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 description 17
- 239000010410 layer Substances 0.000 description 15
- 230000007797 corrosion Effects 0.000 description 14
- 238000005260 corrosion Methods 0.000 description 14
- 229910009369 Zn Mg Inorganic materials 0.000 description 10
- 229910007573 Zn-Mg Inorganic materials 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 9
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 5
- 229910021364 Al-Si alloy Inorganic materials 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 229910001092 metal group alloy Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000009864 tensile test Methods 0.000 description 3
- 229910000619 316 stainless steel Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- 229910018619 Si-Fe Inorganic materials 0.000 description 1
- 229910008289 Si—Fe Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000004210 cathodic protection Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
- C23C2/12—Aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/34—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the shape of the material to be treated
- C23C2/36—Elongated material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
-
- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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Description
-「wt.%」は重量パーセントを意味する。
A.金属基材を設ける工程、
B.任意に金属基材の表面処理を行う工程、
C.アルミニウムからなる第1の被覆を堆積させる工程であって、かかる第1の被覆の厚さが5μm未満である、工程及び
D.0.5~5.9重量%のマグネシウムを含んでなり、残部が亜鉛である第2の被覆を堆積させる工程を含む。
A.任意に、マグネトロンカソード粉砕装置を含む中間部分、
B.任意に亜鉛を50%未満含むアルミニウムをベースとする第1の被覆を蒸着する、電子ビーム蒸着装置を含む第1の部分及び
C.ジェット蒸着装置を含む第2の部分
を備える。
LME試験
LME感度を測定するために、スポット溶接条件に可能な限り近似している条件で高温引張試験を実施した。
電気化学的挙動試験
試験体1~試験体5を作成し、電気化学電位試験に供した。
腐食試験
まず試験体1~試験体5で、金属基材が1mmの幅になるまで当該被覆をスクラッチした。
Claims (17)
- アルミニウムからなる少なくとも第1の被覆を備える被覆金属基材であって、かかる第1の被覆は厚さが2~4μmであり、及び0.5~5.9重量%のマグネシウムを含んでなり、残部が亜鉛である第2の被覆によって直接上面が覆われており、金属基材と第1の被覆との間に中間層が存在し、かかる中間層が鉄、ニッケル、クロム及び任意にチタンを含む、被覆金属基材。
- 第2の被覆の厚さが1~10μmである、請求項1に記載の被覆金属基材。
- 第2の被覆が、0.5~4.5重量%のマグネシウムを含んでなる、請求項1又は2に記載の被覆金属基材。
- 第2の被覆が、0.5~2.0重量%のマグネシウムを含んでなり、残部が亜鉛である、請求項3に記載の被覆金属基材。
- 第2の被覆が、2.0~5.0重量%のマグネシウムを含んでなり、残部が亜鉛である、請求項1~4のいずれか一項に記載の被覆金属基材。
- 第2の被覆が、次のアルミニウム、シリコン及び銅から選択される元素のうちの少なくとも1つを含まない、請求項1~5のいずれか一項に記載の被覆金属基材。
- 第2の被覆が、亜鉛及びマグネシウムからなる、請求項1~5のいずれか一項に記載の被覆金属基材。
- 第2の被覆の微細構造が、Znマトリックス中にMg2Zn11相を95重量%未満含む、請求項1~7のいずれか一項に記載の被覆金属基材。
- 金属基材が、アルミニウム基材、鋼基材、ステンレス鋼基材、銅基材、鉄基材、銅合金基材、チタン基材、コバルト基材又はニッケル基材の中から選択される、請求項1~8のいずれか一項に記載の被覆金属基材。
- 請求項1~9のいずれか一項に記載の被覆金属基材の製造方法であって、以下の工程、
A.金属基材を設ける工程、
B.任意に前記金属基材の表面処理を行う工程、
C.アルミニウムからなる第1の被覆を堆積させる工程であって、かかる第1の被覆の厚さが2~4μmであり、工程及び
D.0.5~5.9重量%のマグネシウムを含んでなり、残部が亜鉛である第2の被覆を堆積させる工程、
を含む、方法。 - 工程B)が実行されるとき、表面処理がショットブラスト、酸洗、エッチング、研磨、サンドブラスト、研削並びに鉄、ニッケル、クロム及び任意にチタンを含む中間層の堆積から選択される、請求項10に記載の方法。
- 工程C)及び工程D)において、第1及び第2の被覆を堆積させる工程が、溶融めっき、電着法又は真空蒸着により、互いに独立して実行される、請求項10又は11に記載の方法。
- 工程C)及び工程D)において真空蒸着が実行されるとき、マグネトロンカソード粉砕法、ジェット蒸着法、電磁浮上蒸着法又は電子ビーム物理蒸着法により、第1及び第2の被覆が互いに独立して堆積される、請求項12に記載の方法。
- 自動車両の部品製造のための、請求項1~9のいずれか一項に記載の被覆金属基材の使用。
- 請求項1~9のいずれか一項に記載の被覆金属基材を得るための、請求項10~13のいずれか一項に記載の方法を用いる、走行中の金属基材上に被覆を連続真空蒸着するための設備であって、当該設備が、以下の順序で、
A.任意に、マグネトロンカソード粉砕装置を含む中間部分、
B.電子ビーム蒸着装置を含む第1の部分及び
C.ジェット蒸着装置を含む第2の部分、
を備え、
中間部分が存在する場合、マグネトロンカソード粉砕装置が、鉄、クロム、ニッケル及び任意にチタンからなる1つのターゲットを含む真空蒸着チャンバ並びに鉄、ニッケル、クロム及び任意にチタンを含む中間層を金属基材上に堆積させるプラズマ源を備える、
設備。 - 第1の部分において、電子ビーム蒸着装置が、アルミニウムからなる金属を含む蒸発るつぼを備える真空蒸着チャンバ、加熱装置及び電子銃を備える、請求項14又は15に記載の設備。
- 第2の部分において、ジェット蒸着装置が、少なくとも1つの蒸発るつぼを含む真空蒸着チャンバ、蒸気ジェットコーター及び0.5~5.9重量%のマグネシウムを含んでなり、残部が亜鉛である蒸気を前記蒸気ジェットコーターに供給するのに適した、少なくとも1つの蒸発るつぼを備える、請求項14~16のいずれか一項に記載の設備。
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PCT/IB2017/001045 WO2019043422A1 (en) | 2017-08-30 | 2017-08-30 | COATED METALLIC SUBSTRATE |
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PCT/IB2018/055407 WO2019043472A1 (en) | 2017-08-30 | 2018-07-20 | COATED METALLIC SUBSTRATE |
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CN110261294B (zh) * | 2019-06-04 | 2022-04-19 | 中国船舶重工集团公司第七二五研究所 | 一种模拟深海环境下裂纹区金属腐蚀电化学试验装置 |
WO2020245632A1 (en) * | 2019-06-05 | 2020-12-10 | Arcelormittal | A method for manufacturing a metal assembly |
CN112553577A (zh) * | 2019-09-26 | 2021-03-26 | 宝山钢铁股份有限公司 | 一种提高真空镀膜收得率的真空镀膜装置 |
WO2021123872A1 (en) * | 2019-12-16 | 2021-06-24 | Arcelormittal | A heating system |
CN111676361A (zh) * | 2020-07-20 | 2020-09-18 | 安徽省巢湖市共力链条有限公司 | 一种高强度耐腐蚀链条热处理工艺 |
CN115368166A (zh) * | 2022-07-29 | 2022-11-22 | 中国航发北京航空材料研究院 | 一种陶瓷微球包覆镍涂层及其制备方法 |
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JP2010522272A (ja) | 2007-03-20 | 2010-07-01 | アルセロールミタル・フランス | 基材をコーティングするためのプロセスおよび金属合金真空蒸着装置 |
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US20200190656A1 (en) | 2020-06-18 |
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