JP6959952B6 - - Google Patents

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Publication number
JP6959952B6
JP6959952B6 JP2019056218A JP2019056218A JP6959952B6 JP 6959952 B6 JP6959952 B6 JP 6959952B6 JP 2019056218 A JP2019056218 A JP 2019056218A JP 2019056218 A JP2019056218 A JP 2019056218A JP 6959952 B6 JP6959952 B6 JP 6959952B6
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JP
Japan
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JP2019056218A
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JP2019164351A (ja
JP6959952B2 (ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2019056218A 2012-02-20 2019-03-25 マイクロリソグラフィのための投影露光方法及び投影露光装置 Active JP6959952B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE102012202536A DE102012202536A1 (de) 2012-02-20 2012-02-20 Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie
DE102012202536.7 2012-02-20
US201261601126P 2012-02-21 2012-02-21
US61/601,126 2012-02-21
JP2018025203A JP2018112746A (ja) 2012-02-20 2018-02-15 マイクロリソグラフィのための投影露光方法及び投影露光装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2018025203A Division JP2018112746A (ja) 2012-02-20 2018-02-15 マイクロリソグラフィのための投影露光方法及び投影露光装置

Publications (3)

Publication Number Publication Date
JP2019164351A JP2019164351A (ja) 2019-09-26
JP6959952B2 JP6959952B2 (ja) 2021-11-05
JP6959952B6 true JP6959952B6 (ja) 2022-03-22

Family

ID=48915203

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2014558069A Active JP6322583B2 (ja) 2012-02-20 2013-02-14 マイクロリソグラフィのための投影露光方法及び投影露光装置
JP2018025203A Pending JP2018112746A (ja) 2012-02-20 2018-02-15 マイクロリソグラフィのための投影露光方法及び投影露光装置
JP2019056218D Active JP7090375B2 (ja) 2012-02-20 2019-03-25 マイクロリソグラフィのための投影露光方法及び投影露光装置
JP2019056218A Active JP6959952B2 (ja) 2012-02-20 2019-03-25 マイクロリソグラフィのための投影露光方法及び投影露光装置

Family Applications Before (3)

Application Number Title Priority Date Filing Date
JP2014558069A Active JP6322583B2 (ja) 2012-02-20 2013-02-14 マイクロリソグラフィのための投影露光方法及び投影露光装置
JP2018025203A Pending JP2018112746A (ja) 2012-02-20 2018-02-15 マイクロリソグラフィのための投影露光方法及び投影露光装置
JP2019056218D Active JP7090375B2 (ja) 2012-02-20 2019-03-25 マイクロリソグラフィのための投影露光方法及び投影露光装置

Country Status (4)

Country Link
US (1) US9665006B2 (ja)
JP (4) JP6322583B2 (ja)
DE (1) DE102012202536A1 (ja)
WO (1) WO2013124205A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015036002A1 (en) * 2013-09-14 2015-03-19 Carl Zeiss Smt Gmbh Method of operating a microlithographic projection apparatus
DE102013219986A1 (de) * 2013-10-02 2015-04-02 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie
DE102017216458A1 (de) * 2017-09-18 2019-03-21 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels als optischer Komponente für ein optisches System einer Projektionsbelichtungsanlage für die Projektionslithographie
WO2019072703A1 (en) 2017-10-11 2019-04-18 Asml Netherlands B.V. FLOW OF OPTIMIZATION OF PROCESS OF FORMATION OF REASONS
CN113009788A (zh) * 2021-02-24 2021-06-22 上海华力微电子有限公司 光刻装置
CN113253415B (zh) * 2021-06-01 2022-02-11 中国科学院长春光学精密机械与物理研究所 主镜侧向支撑结构及装调方法
DE102022208320A1 (de) 2022-08-10 2024-02-15 Carl Zeiss Smt Gmbh Verfahren zum Betreiben eines Messsystems

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1251402B1 (en) 2001-03-30 2007-10-24 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4178862B2 (ja) 2001-08-01 2008-11-12 カール・ツァイス・エスエムティー・アーゲー Ｅｕｖフォトリソグラフィ用の反射投影レンズ
US6846086B2 (en) * 2002-03-11 2005-01-25 Intel Corporation Mirror assembly with thermal contour control
JP2006501660A (ja) 2002-09-30 2006-01-12 カール・ツァイス・エスエムティー・アーゲー 照明の同定用のセンサを備える波長≦１９３ｎｍ用の照明システム
US7221430B2 (en) * 2004-05-11 2007-05-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100517569C (zh) * 2004-08-09 2009-07-22 株式会社尼康 光学特性测量装置及方法、曝光装置及方法及组件制造方法
US7508489B2 (en) * 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
DE102006039895A1 (de) 2006-08-25 2008-03-13 Carl Zeiss Smt Ag Verfahren zur Korrektur von durch Intensitätsverteilungen in optischen Systemen erzeugten Abbildungsveränderungen sowie entsprechendes optisches System
DE102007005875A1 (de) * 2007-02-06 2008-08-14 Carl Zeiss Smt Ag Vorrichtung und Verfahren zur Bestimmung der Ausrichtung von Oberflächen von optischen Elementen
DE102007047446A1 (de) * 2007-10-04 2009-04-09 Carl Zeiss Smt Ag Optisches Element mit wenigstens einem elektrisch leitenden Bereich und Beleuchtungssystem mit einem solchen Element
CN103293665B (zh) 2008-02-15 2016-07-06 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
JP2009206274A (ja) 2008-02-27 2009-09-10 Nikon Corp 光学特性調整方法、露光方法、及びデバイス製造方法
DE102008030664A1 (de) * 2008-07-01 2010-01-21 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit Bestimmung von Abbildungsfehlern
JP2010114266A (ja) * 2008-11-06 2010-05-20 Canon Inc 露光装置およびその制御方法、ならびにデバイス製造方法
JP2010123790A (ja) 2008-11-20 2010-06-03 Canon Inc 投影露光装置、変位計測手段の計測基準の校正方法およびデバイス製造方法
JP2010141071A (ja) 2008-12-11 2010-06-24 Nikon Corp 光学部材冷却装置、光学系、露光装置及びデバイスの製造方法
DE102009048553A1 (de) 2009-09-29 2011-03-31 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv mit Umlenkspiegeln und Projektionsbelichtungsverfahren
DE102009046098A1 (de) 2009-10-28 2011-05-05 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv mit einer reflektiven optischen Komponente und einer Messeinrichtung
JP2011192900A (ja) 2010-03-16 2011-09-29 Nikon Corp 投影光学装置及び露光装置並びにデバイス製造方法
DE102011004326A1 (de) * 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Optische Baugruppe für eine Beleuchtungsoptik für die Projektionslithographie

Also Published As

Publication number Publication date
JP2019164351A (ja) 2019-09-26
JP2015511405A (ja) 2015-04-16
US20150029479A1 (en) 2015-01-29
DE102012202536A1 (de) 2013-08-22
WO2013124205A1 (en) 2013-08-29
JP7090375B2 (ja) 2022-06-24
JP6959952B2 (ja) 2021-11-05
US9665006B2 (en) 2017-05-30
JP6322583B2 (ja) 2018-05-09
JP2018112746A (ja) 2018-07-19

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