JP6935609B1 - 過酸化水素水製造装置 - Google Patents
過酸化水素水製造装置 Download PDFInfo
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- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 47
- 239000007789 gas Substances 0.000 claims abstract description 33
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 30
- 239000002994 raw material Substances 0.000 claims abstract description 16
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 239000011162 core material Substances 0.000 claims description 4
- 230000002209 hydrophobic effect Effects 0.000 claims description 4
- 239000000725 suspension Substances 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- -1 polytetrafluoroethylene Polymers 0.000 claims description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 239000011148 porous material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 abstract description 10
- 239000001257 hydrogen Substances 0.000 abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 2
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 238000011282 treatment Methods 0.000 description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
- 239000001301 oxygen Substances 0.000 description 12
- 229910052760 oxygen Inorganic materials 0.000 description 12
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000006864 oxidative decomposition reaction Methods 0.000 description 2
- 230000002085 persistent effect Effects 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 239000010842 industrial wastewater Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
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Abstract
Description
この促進酸化処理法において、OHラジカルを生成する方法として、過酸化水素含有水にオゾンを添加する方法やUVランプを照射する方法が知られている。
[1]第1実施形態
図1は、実施形態の水処理システムの概要構成ブロック図である。
水処理システム10は、加圧状態で被処理水LQを供給する給水ポンプ11と、上流側既設配管12と、下流側既設配管13と、上流側既設配管12と下流側既設配管13との間に設置され、過酸化水素水を連続的に製造する過酸化水素水製造装置として機能する水処理ユニット14と、水処理ユニット14のガス供給管15を介して酸素を含んだ酸素含有ガスOGを供給できるガス供給装置16と、を備えている。
図3は、水処理ユニットの断面概略図である。
水処理ユニット14は、胴部21と、ボルト固定用の孔22がそれぞれ複数設けられた一対のフランジ23、24と、胴部21のフランジ23寄りに設けられたガス供給管15と、を備えている。
エジェクタ部25は、被処理水LQの導入側に向かって内径が徐々に拡径されている導入側拡径部25Aと、ノズル部25Bと、被処理水LQの導出側に向かって内径が徐々に拡径されている導出側拡径部25Cと、を備えている。
給水ポンプ11により加圧された状態の被処理水LQが水処理ユニット14のエジェクタ部25に供給されると、エジェクタ部25の流路径は導入側拡径部25Aからノズル部25Bに向かって徐々に狭くなるため、被処理水LQの速度(流速)は徐々に早くなる。
O2+2H++2e−→H2O2 …(1)
このため、電気分解部26において設けられる電気分解用の電極についても、発生した乱流を可能な限り邪魔しないような構成が望まれる。
図3に示すように電気分解部26の電気分解用電極群27は、エジェクタ部25の導出側拡径部25Cの直後に配置され、外部の直流電源28から電気分解用の直流電流が供給されている。
電気分解部26の電気分解用電極群27は、板状のアノード電極31A及びカソード電極31Kを備えている。
図5に示すように、アノード電極31A1〜31A3と、カソード電極31K1〜31K3を交互に配置して、複数の電極対で電気分解部26の電気分解用電極群27を構成している。
以上の説明のように、第1実施形態によれば、効率よく過酸化水素水を連続的に製造できる。
上記第1実施形態においては、平板電極を用いていたが、本第2実施形態は、乱流の整流を抑制し、より実効的な過酸化水素水の製造効率の向上を図るための実施形態である。
本第2実施形態の電極は、複数の径が異なる孔がランダムに配置された多孔平板電極として構成され、アノード電極31A11とカソード電極31K11とで電極対を構成している。
上記各実施形態においては、平板状の電極を用いていたが、本第3実施形態は、3次元形状を有する電極を用いた場合の実施形態である。
図7においては、黒色部分は、孔(開口部)である。
図7に示すように第3実施形態のアノード電極31A21あるいはカソード電極31K21は、3次元の多孔質形状(スポンジ状)をなしており、電極の表面積を維持しつつ、被処理水LQの乱流も維持することが可能となっている。
図8は、第4実施形態の電極の説明図である。
図8に示すように第4実施形態のアノード電極31A31あるいはカソード電極31K31は、それぞれ板状の電極ベース41及び電極ベース41上に立設された複数の棒状電極42を備えており、それぞれ剣山状の形状をなしている。
ここで、アノード電極31A31あるいはカソード電極31K31のそれぞれの棒状電極42は、アノード電極31A31及びカソード電極31K31を近接して対向配置した場合に、互いに干渉しない位置、かつ、ランダムな位置に配置されており、電極の表面積を維持しつつ、被処理水LQの乱流も維持することが可能となっている。
各実施形態によれば、試薬としての過酸化水素を用いることなく、簡易な構成で低コストの過酸化水素水製造装置を構築できる。
11 給水ポンプ
12 上流側既設配管
13 下流側既設配管
14 水処理ユニット
15 ガス供給管
15A ガス供給用開口
16 ガス供給装置
21 胴部
22 孔
23 フランジ
25 エジェクタ部
25A 導入側拡径部
25B ノズル部
25C 導出側拡径部
26 電気分解部
27 電気分解用電極群
28 直流電源
31A、31A1、31A11、31A21、31A31 アノード電極
31K、31K1、31K11、31K21、31K31 カソード電極
41 電極ベース
42 棒状電極
LQ 被処理水
OG 酸素含有ガス
RF 乱流
Claims (5)
- 被処理水が導入される導入側拡径部、前記導入側拡径部に連設され、酸素ガスを含む原料ガスが外部より導入される導入開口が側壁に設けられたノズル部及び前記ノズル部に連設され前記原料ガスが混合された前記被処理水が導出される導出側拡径部を有するエジェクタ部と、
前記エジェクタ部の下流側に設けられ、前記導出された前記原料ガスが混合された前記被処理水を電気分解し、前記酸素ガスを原料として過酸化水素を生成するための電気分解用電極が配置された電気分解部と、を備え、
前記電気分解用電極を構成するカソード電極は、
電極芯材と、
前記電極芯材に積層された多孔質炭素層と、
前記多孔質炭素層の表面にコーティングにより形成された疎水層と、
から成る、過酸化水素水製造装置。 - 前記電気分解用電極は、板状の電極ベースに複数の棒状電極が立設されている、
請求項1記載の過酸化水素水製造装置。 - 前記電気分解用電極は、連通孔を有する多孔質材料で形成されている3次元電極として構成されている、
請求項1記載の過酸化水素水製造装置。 - 前記疎水層は、ポリテトラフルオロエチレン系懸濁液を前記コーティングすることにより形成されている、
請求項1記載の過酸化水素水製造装置。 - 前記電気分解用電極はさらにアノード電極を備え、前記アノード電極と前記カソード電極とで構成される電極対を複数対備えている、
請求項1乃至請求項4のいずれか一項記載の過酸化水素水製造装置。
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