JP6912098B2 - 二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製 - Google Patents

二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製 Download PDF

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JP6912098B2
JP6912098B2 JP2018530493A JP2018530493A JP6912098B2 JP 6912098 B2 JP6912098 B2 JP 6912098B2 JP 2018530493 A JP2018530493 A JP 2018530493A JP 2018530493 A JP2018530493 A JP 2018530493A JP 6912098 B2 JP6912098 B2 JP 6912098B2
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silicon dioxide
range
less
particularly preferably
quartz glass
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JP2019502631A (ja
JP2019502631A5 (OSRAM
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マティアス オッター
マティアス オッター
ヴァルター レーマン
ヴァルター レーマン
ミハエル ヒュネルマン
ミハエル ヒュネルマン
ニルス クリスティアン ニールセン
ニルス クリスティアン ニールセン
ニゲル ロバート ヴィッペイ
ニゲル ロバート ヴィッペイ
ボリス グローマン
ボリス グローマン
アブドウル−ガファール クペバネ
アブドウル−ガファール クペバネ
トーマス カイザー
トーマス カイザー
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ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー
ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
    • C03B17/04—Forming tubes or rods by drawing from stationary or rotating tools or from forming nozzles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/022—Purification of silica sand or other minerals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C12/00—Powdered glass; Bead compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
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    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
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    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/26—Doped silica-based glasses containing non-metals other than boron or halide containing carbon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/32—Doped silica-based glasses containing metals containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/54—Doped silica-based glasses containing metals containing beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/10—Melting processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
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    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
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    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/412—Index profiling of optical fibres
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    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

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  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Optical Integrated Circuits (AREA)
  • Silicon Compounds (AREA)
JP2018530493A 2015-12-18 2016-12-16 二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製 Active JP6912098B2 (ja)

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Application Number Priority Date Filing Date Title
EP15201098.9 2015-12-18
EP15201098 2015-12-18
PCT/EP2016/081520 WO2017103167A2 (de) 2015-12-18 2016-12-16 Verringern des kohlenstoffgehalts von siliziumdioxidgranulat und herstellung eines quarzglaskörpers

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JP2019502631A JP2019502631A (ja) 2019-01-31
JP2019502631A5 JP2019502631A5 (OSRAM) 2020-01-16
JP6912098B2 true JP6912098B2 (ja) 2021-07-28

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US (1) US20190077672A1 (OSRAM)
EP (1) EP3390307A2 (OSRAM)
JP (1) JP6912098B2 (OSRAM)
CN (1) CN108698886A (OSRAM)
TW (1) TWI764879B (OSRAM)
WO (1) WO2017103167A2 (OSRAM)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10618833B2 (en) 2015-12-18 2020-04-14 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a synthetic quartz glass grain
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
JP7044454B2 (ja) 2015-12-18 2022-03-30 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
TW201731782A (zh) 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 在多腔式爐中製備石英玻璃體
TWI788278B (zh) 2015-12-18 2023-01-01 德商何瑞斯廓格拉斯公司 由均質石英玻璃製得之玻璃纖維及預成型品
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
EP3390293B1 (de) 2015-12-18 2023-04-19 Heraeus Quarzglas GmbH & Co. KG Erhöhen des siliziumgehalts bei der herstellung von quarzglas
TWI813534B (zh) 2015-12-18 2023-09-01 德商何瑞斯廓格拉斯公司 利用露點監測在熔融烘箱中製備石英玻璃體
MY202205A (en) * 2019-03-22 2024-04-17 Wacker Chemie Ag Method for producing technical silicon
CN112390261A (zh) * 2019-08-13 2021-02-23 斯特里特技术有限公司 气相二氧化硅颗粒分离脱氢的系统和方法
EP4030204B1 (de) * 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Mikrostrukturierte optische faser und vorform dafür
CN121605090A (zh) * 2023-09-15 2026-03-03 日本板硝子株式会社 玻璃粉体

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60260434A (ja) * 1984-06-04 1985-12-23 Shin Etsu Chem Co Ltd 光伝送用無水ガラス素材の製造方法
JP2925797B2 (ja) * 1991-07-30 1999-07-28 古河電気工業株式会社 光ファイバ用多孔質母材の精製方法
US6136736A (en) * 1993-06-01 2000-10-24 General Electric Company Doped silica glass
JP3751326B2 (ja) * 1994-10-14 2006-03-01 三菱レイヨン株式会社 高純度透明石英ガラスの製造方法
EP0725037B2 (de) * 1995-02-04 2012-04-25 Evonik Degussa GmbH Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
DE19729505A1 (de) * 1997-07-10 1999-01-14 Heraeus Quarzglas Verfahren zur Herstellung von Si0¶2¶-Granulat
EP1088789A3 (en) * 1999-09-28 2002-03-27 Heraeus Quarzglas GmbH & Co. KG Porous silica granule, its method of production and its use in a method for producing quartz glass
DE10019693B4 (de) * 2000-04-20 2006-01-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben
DE60123878T2 (de) * 2000-06-28 2007-05-24 Japan Super Quartz Corp. Synthetisches Quarzpulver, Verfahren zur Herstellung und synthetischer Quarztiegel
DE10163938A1 (de) * 2001-12-22 2003-07-10 Degussa Flammenhydrolytisch hergestelltes Silicium-Titan-Mischoxidpulver mit an der Oberfläche angereichertem Siliciumdioxid, dessen Herstellung und Verwendung
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
US7452518B2 (en) * 2004-12-28 2008-11-18 Momentive Performance Materials Inc. Process for treating synthetic silica powder and synthetic silica powder treated thereof
CN100463851C (zh) * 2005-10-26 2009-02-25 太原理工大学 一种超细疏水性二氧化硅的制取方法
JPWO2009096557A1 (ja) * 2008-01-30 2011-05-26 旭硝子株式会社 エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法
US8925354B2 (en) * 2009-11-04 2015-01-06 Corning Incorporated Methods for forming an overclad portion of an optical fiber from pelletized glass soot
KR20140044903A (ko) * 2011-07-29 2014-04-15 모멘티브 퍼포먼스 머티리얼즈 인크. 고순도 금속산화물 제조방법 및 그 방법으로 만들어진 입자 및 재료
DE102011121153B3 (de) * 2011-12-15 2013-03-21 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser
DE102012008437B3 (de) * 2012-04-30 2013-03-28 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung synthetischer Quarzglaskörnung
US9745201B2 (en) * 2014-01-29 2017-08-29 Mitsubishi Materials Corporation Synthetic amorphous silica powder and process for manufacturing same
EP3000790B2 (de) * 2014-09-29 2023-07-26 Heraeus Quarzglas GmbH & Co. KG Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat

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US20190077672A1 (en) 2019-03-14
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CN108698886A (zh) 2018-10-23
TW201733924A (zh) 2017-10-01
JP2019502631A (ja) 2019-01-31
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