JP2019502631A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019502631A5 JP2019502631A5 JP2018530493A JP2018530493A JP2019502631A5 JP 2019502631 A5 JP2019502631 A5 JP 2019502631A5 JP 2018530493 A JP2018530493 A JP 2018530493A JP 2018530493 A JP2018530493 A JP 2018530493A JP 2019502631 A5 JP2019502631 A5 JP 2019502631A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- melting
- furnace
- treatment
- octamethylcyclotetrasiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- VEVRNHHLCPGNDU-MUGJNUQGSA-O desmosine Chemical compound OC(=O)[C@@H](N)CCCC[N+]1=CC(CC[C@H](N)C(O)=O)=C(CCC[C@H](N)C(O)=O)C(CC[C@H](N)C(O)=O)=C1 VEVRNHHLCPGNDU-MUGJNUQGSA-O 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201098.9 | 2015-12-18 | ||
| EP15201098 | 2015-12-18 | ||
| PCT/EP2016/081520 WO2017103167A2 (de) | 2015-12-18 | 2016-12-16 | Verringern des kohlenstoffgehalts von siliziumdioxidgranulat und herstellung eines quarzglaskörpers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502631A JP2019502631A (ja) | 2019-01-31 |
| JP2019502631A5 true JP2019502631A5 (OSRAM) | 2020-01-16 |
| JP6912098B2 JP6912098B2 (ja) | 2021-07-28 |
Family
ID=54850382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018530493A Active JP6912098B2 (ja) | 2015-12-18 | 2016-12-16 | 二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20190077672A1 (OSRAM) |
| EP (1) | EP3390307A2 (OSRAM) |
| JP (1) | JP6912098B2 (OSRAM) |
| CN (1) | CN108698886A (OSRAM) |
| TW (1) | TWI764879B (OSRAM) |
| WO (1) | WO2017103167A2 (OSRAM) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10618833B2 (en) | 2015-12-18 | 2020-04-14 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a synthetic quartz glass grain |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| TW201731782A (zh) | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 在多腔式爐中製備石英玻璃體 |
| TWI788278B (zh) | 2015-12-18 | 2023-01-01 | 德商何瑞斯廓格拉斯公司 | 由均質石英玻璃製得之玻璃纖維及預成型品 |
| JP6981710B2 (ja) | 2015-12-18 | 2021-12-17 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 二酸化ケイ素造粒体からの石英ガラス体の調製 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| EP3390293B1 (de) | 2015-12-18 | 2023-04-19 | Heraeus Quarzglas GmbH & Co. KG | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
| TWI813534B (zh) | 2015-12-18 | 2023-09-01 | 德商何瑞斯廓格拉斯公司 | 利用露點監測在熔融烘箱中製備石英玻璃體 |
| MY202205A (en) * | 2019-03-22 | 2024-04-17 | Wacker Chemie Ag | Method for producing technical silicon |
| CN112390261A (zh) * | 2019-08-13 | 2021-02-23 | 斯特里特技术有限公司 | 气相二氧化硅颗粒分离脱氢的系统和方法 |
| EP4030204B1 (de) * | 2021-01-19 | 2023-09-20 | Heraeus Quarzglas GmbH & Co. KG | Mikrostrukturierte optische faser und vorform dafür |
| CN121605090A (zh) * | 2023-09-15 | 2026-03-03 | 日本板硝子株式会社 | 玻璃粉体 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60260434A (ja) * | 1984-06-04 | 1985-12-23 | Shin Etsu Chem Co Ltd | 光伝送用無水ガラス素材の製造方法 |
| JP2925797B2 (ja) * | 1991-07-30 | 1999-07-28 | 古河電気工業株式会社 | 光ファイバ用多孔質母材の精製方法 |
| US6136736A (en) * | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| JP3751326B2 (ja) * | 1994-10-14 | 2006-03-01 | 三菱レイヨン株式会社 | 高純度透明石英ガラスの製造方法 |
| EP0725037B2 (de) * | 1995-02-04 | 2012-04-25 | Evonik Degussa GmbH | Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung |
| DE19729505A1 (de) * | 1997-07-10 | 1999-01-14 | Heraeus Quarzglas | Verfahren zur Herstellung von Si0¶2¶-Granulat |
| EP1088789A3 (en) * | 1999-09-28 | 2002-03-27 | Heraeus Quarzglas GmbH & Co. KG | Porous silica granule, its method of production and its use in a method for producing quartz glass |
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| DE60123878T2 (de) * | 2000-06-28 | 2007-05-24 | Japan Super Quartz Corp. | Synthetisches Quarzpulver, Verfahren zur Herstellung und synthetischer Quarztiegel |
| DE10163938A1 (de) * | 2001-12-22 | 2003-07-10 | Degussa | Flammenhydrolytisch hergestelltes Silicium-Titan-Mischoxidpulver mit an der Oberfläche angereichertem Siliciumdioxid, dessen Herstellung und Verwendung |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| JP4470479B2 (ja) * | 2003-12-17 | 2010-06-02 | 旭硝子株式会社 | 光学部材用合成石英ガラスおよびその製造方法 |
| US7166963B2 (en) * | 2004-09-10 | 2007-01-23 | Axcelis Technologies, Inc. | Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation |
| US7452518B2 (en) * | 2004-12-28 | 2008-11-18 | Momentive Performance Materials Inc. | Process for treating synthetic silica powder and synthetic silica powder treated thereof |
| CN100463851C (zh) * | 2005-10-26 | 2009-02-25 | 太原理工大学 | 一种超细疏水性二氧化硅的制取方法 |
| JPWO2009096557A1 (ja) * | 2008-01-30 | 2011-05-26 | 旭硝子株式会社 | エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法 |
| US8925354B2 (en) * | 2009-11-04 | 2015-01-06 | Corning Incorporated | Methods for forming an overclad portion of an optical fiber from pelletized glass soot |
| KR20140044903A (ko) * | 2011-07-29 | 2014-04-15 | 모멘티브 퍼포먼스 머티리얼즈 인크. | 고순도 금속산화물 제조방법 및 그 방법으로 만들어진 입자 및 재료 |
| DE102011121153B3 (de) * | 2011-12-15 | 2013-03-21 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser |
| DE102012008437B3 (de) * | 2012-04-30 | 2013-03-28 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung synthetischer Quarzglaskörnung |
| US9745201B2 (en) * | 2014-01-29 | 2017-08-29 | Mitsubishi Materials Corporation | Synthetic amorphous silica powder and process for manufacturing same |
| EP3000790B2 (de) * | 2014-09-29 | 2023-07-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat |
-
2016
- 2016-12-16 WO PCT/EP2016/081520 patent/WO2017103167A2/de not_active Ceased
- 2016-12-16 TW TW105141758A patent/TWI764879B/zh active
- 2016-12-16 CN CN201680082012.0A patent/CN108698886A/zh active Pending
- 2016-12-16 JP JP2018530493A patent/JP6912098B2/ja active Active
- 2016-12-16 US US16/062,234 patent/US20190077672A1/en not_active Abandoned
- 2016-12-16 EP EP16822148.9A patent/EP3390307A2/de not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019502642A5 (OSRAM) | ||
| JP2019504810A5 (OSRAM) | ||
| JP2019503962A5 (OSRAM) | ||
| JP2019502632A5 (OSRAM) | ||
| JP2019502638A5 (OSRAM) | ||
| JP2019502630A5 (OSRAM) | ||
| JP2019502636A5 (OSRAM) | ||
| JP2019502641A5 (OSRAM) | ||
| JP2019502635A5 (OSRAM) | ||
| JP2019502644A5 (OSRAM) | ||
| JP2019503961A5 (OSRAM) | ||
| JP2019502634A5 (OSRAM) | ||
| JP2019506352A5 (OSRAM) | ||
| JP2019506349A5 (OSRAM) | ||
| ATE487716T1 (de) | Indole, 1h-indazole, 1,2-benzisoxazole, 1,2- benzoisothiazole, deren herstellung und verwendungen | |
| NO20063392L (no) | Indoler, 1H-indazoler, 1,2-benzisoksazoler og 1,2-benzisotiazoler, og fremstilling og anvendelser derav | |
| JP2019503966A5 (OSRAM) | ||
| ATE505470T1 (de) | 1h-indazole, benzothiazole, 1,2-benzisoxazole, 1, 2-benzisothiazole und chromone und deren herstellung und verwendungen | |
| JP2015192148A5 (OSRAM) | ||
| TW201228730A (en) | Device and method for supplying zinc gas | |
| EA202190692A1 (ru) | Способ подготовки сыпучей огнеупорной композиции для применения в производстве литейных форм и стержней, соответствующие применение и переработанная смесь для термообработки | |
| TWI576307B (zh) | Asphalt transfer method | |
| JP2015524792A5 (OSRAM) | ||
| EA201070753A1 (ru) | Альфа-аминоамидные производные, применяемые в лечении психиатрических расстройств | |
| KR20140100429A (ko) | 관다발 반응기 내에서의 오르가노클로로실란의 가수분해 방법 |