JP6904718B2 - 蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置 - Google Patents

蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置 Download PDF

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JP6904718B2
JP6904718B2 JP2017022874A JP2017022874A JP6904718B2 JP 6904718 B2 JP6904718 B2 JP 6904718B2 JP 2017022874 A JP2017022874 A JP 2017022874A JP 2017022874 A JP2017022874 A JP 2017022874A JP 6904718 B2 JP6904718 B2 JP 6904718B2
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mask
frame
joining member
region
thin
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JP2017022874A
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Japanese (ja)
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JP2018127704A5 (enExample
JP2018127704A (ja
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元嗣 成谷
元嗣 成谷
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Japan Display Inc
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Japan Display Inc
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Priority to JP2017022874A priority Critical patent/JP6904718B2/ja
Priority to CN201780086024.5A priority patent/CN110268090B/zh
Priority to PCT/JP2017/041960 priority patent/WO2018146904A1/ja
Publication of JP2018127704A publication Critical patent/JP2018127704A/ja
Publication of JP2018127704A5 publication Critical patent/JP2018127704A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2017022874A 2017-02-10 2017-02-10 蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置 Active JP6904718B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017022874A JP6904718B2 (ja) 2017-02-10 2017-02-10 蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置
CN201780086024.5A CN110268090B (zh) 2017-02-10 2017-11-22 蒸镀掩模、蒸镀掩模的制造方法及蒸镀掩模的制造装置
PCT/JP2017/041960 WO2018146904A1 (ja) 2017-02-10 2017-11-22 蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017022874A JP6904718B2 (ja) 2017-02-10 2017-02-10 蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置

Publications (3)

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JP2018127704A JP2018127704A (ja) 2018-08-16
JP2018127704A5 JP2018127704A5 (enExample) 2020-03-19
JP6904718B2 true JP6904718B2 (ja) 2021-07-21

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JP2017022874A Active JP6904718B2 (ja) 2017-02-10 2017-02-10 蒸着マスク、蒸着マスクの製造方法および蒸着マスクの製造装置

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JP (1) JP6904718B2 (enExample)
CN (1) CN110268090B (enExample)
WO (1) WO2018146904A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102661470B1 (ko) * 2018-09-03 2024-04-29 삼성디스플레이 주식회사 증착 마스크 및 그 제조방법
JP7267762B2 (ja) * 2019-02-01 2023-05-02 株式会社ジャパンディスプレイ 蒸着マスク
JP2021165424A (ja) * 2020-04-08 2021-10-14 株式会社ブイ・テクノロジー 蒸着マスク用フレーム、フレーム付き蒸着マスク、及び蒸着方法
KR20220068327A (ko) * 2020-11-18 2022-05-26 삼성디스플레이 주식회사 마스크 어셈블리 및 그 마스크 어셈블리의 제조 방법
JP7737833B2 (ja) * 2021-06-30 2025-09-11 株式会社Magnolia White 蒸着マスク

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4662808B2 (ja) * 2005-05-17 2011-03-30 大日本印刷株式会社 メタルマスク用フレーム及びその製造方法
KR101182235B1 (ko) * 2009-12-14 2012-09-12 삼성디스플레이 주식회사 증착용 마스크, 그의 제조 방법 및 제조 장치
JP6078818B2 (ja) * 2013-07-02 2017-02-15 株式会社ブイ・テクノロジー 成膜マスク及び成膜マスクの製造方法
JP6168944B2 (ja) * 2013-09-20 2017-07-26 株式会社ブイ・テクノロジー 成膜マスク
JP6357312B2 (ja) * 2013-12-20 2018-07-11 株式会社ブイ・テクノロジー 成膜マスクの製造方法及び成膜マスク
CN117821896A (zh) * 2015-07-17 2024-04-05 凸版印刷株式会社 蒸镀用金属掩模以及蒸镀用金属掩模的制造方法

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Publication number Publication date
CN110268090A (zh) 2019-09-20
JP2018127704A (ja) 2018-08-16
CN110268090B (zh) 2021-08-20
WO2018146904A1 (ja) 2018-08-16

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