JP6888956B2 - ワイドバンドギャップ半導体材料用ｉｇｂｔ構造 - Google Patents

ワイドバンドギャップ半導体材料用ｉｇｂｔ構造 Download PDF

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JP6888956B2
JP6888956B2 JP2016557300A JP2016557300A JP6888956B2 JP 6888956 B2 JP6888956 B2 JP 6888956B2 JP 2016557300 A JP2016557300 A JP 2016557300A JP 2016557300 A JP2016557300 A JP 2016557300A JP 6888956 B2 JP6888956 B2 JP 6888956B2
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igbt
stack
diffusion region
igbt element
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Japanese (ja)
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JP2017508300A (ja
JP2017508300A5 (enExample
Inventor
ヴィピンタス パーラ
ヴィピンタス パーラ
ブラント エドワード ロバート ヴァン
ブラント エドワード ロバート ヴァン
リン チェン
リン チェン
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Wolfspeed Inc
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Cree Inc
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Publication of JP2017508300A5 publication Critical patent/JP2017508300A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411—Insulated-gate bipolar transistors [IGBT]
    • H10D12/441—Vertical IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/01—Manufacture or treatment
    • H10D12/031—Manufacture or treatment of IGBTs
    • H10D12/032—Manufacture or treatment of IGBTs of vertical IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/832—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge being Group IV materials comprising two or more elements, e.g. SiGe
    • H10D62/8325—Silicon carbide

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  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
JP2016557300A 2014-03-14 2015-01-12 ワイドバンドギャップ半導体材料用ｉｇｂｔ構造 Active JP6888956B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/212,991 US20150263145A1 (en) 2014-03-14 2014-03-14 Igbt structure for wide band-gap semiconductor materials
US14/212,991 2014-03-14
PCT/US2015/011015 WO2015160393A1 (en) 2014-03-14 2015-01-12 Igbt structure for wide band-gap semiconductor materials

Publications (3)

Publication Number Publication Date
JP2017508300A JP2017508300A (ja) 2017-03-23
JP2017508300A5 JP2017508300A5 (enExample) 2017-11-02
JP6888956B2 true JP6888956B2 (ja) 2021-06-18

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JP2016557300A Active JP6888956B2 (ja) 2014-03-14 2015-01-12 ワイドバンドギャップ半導体材料用ｉｇｂｔ構造

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Country Link
US (1) US20150263145A1 (enExample)
EP (1) EP3117463B1 (enExample)
JP (1) JP6888956B2 (enExample)
WO (1) WO2015160393A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9530844B2 (en) 2012-12-28 2016-12-27 Cree, Inc. Transistor structures having reduced electrical field at the gate oxide and methods for making same
US10115815B2 (en) 2012-12-28 2018-10-30 Cree, Inc. Transistor structures having a deep recessed P+ junction and methods for making same
JP6610653B2 (ja) * 2015-02-20 2019-11-27 住友電気工業株式会社 炭化珪素半導体装置
DE112017003587B4 (de) * 2016-07-15 2024-05-29 Rohm Co., Ltd. Halbleitervorrichtung und verfahren zur herstellung einer halbleitervorrichtung
US10269955B2 (en) * 2017-01-17 2019-04-23 Cree, Inc. Vertical FET structure
US11489069B2 (en) * 2017-12-21 2022-11-01 Wolfspeed, Inc. Vertical semiconductor device with improved ruggedness
US10615274B2 (en) 2017-12-21 2020-04-07 Cree, Inc. Vertical semiconductor device with improved ruggedness
JP7038645B2 (ja) * 2018-12-06 2022-03-18 三菱電機株式会社 半導体装置および半導体装置の製造方法
CN112447842A (zh) * 2019-08-28 2021-03-05 比亚迪半导体股份有限公司 平面栅mosfet及其制造方法
CN113964196B (zh) * 2021-10-20 2023-01-20 重庆平创半导体研究院有限责任公司 一种耗尽型功率半导体结构、串联结构和加工工艺

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1247293B (it) * 1990-05-09 1994-12-12 Int Rectifier Corp Dispositivo transistore di potenza presentante una regione ultra-profonda, a maggior concentrazione
JP2944840B2 (ja) * 1993-03-12 1999-09-06 株式会社日立製作所 電力用半導体装置
US6693310B1 (en) * 1995-07-19 2004-02-17 Mitsubishi Denki Kabushiki Kaisha Semiconductor device and manufacturing method thereof
US5939752A (en) * 1995-12-12 1999-08-17 Siliconix Incorporated Low voltage MOSFET with low on-resistance and high breakdown voltage
US7221010B2 (en) * 2002-12-20 2007-05-22 Cree, Inc. Vertical JFET limited silicon carbide power metal-oxide semiconductor field effect transistors
US7569900B2 (en) * 2004-11-16 2009-08-04 Kabushiki Kaisha Toshiba Silicon carbide high breakdown voltage semiconductor device
US7498633B2 (en) * 2005-01-21 2009-03-03 Purdue Research Foundation High-voltage power semiconductor device
JP5025935B2 (ja) * 2005-09-29 2012-09-12 オンセミコンダクター・トレーディング・リミテッド 絶縁ゲート型電界効果トランジスタの製造方法
CA2636776A1 (en) * 2006-01-30 2007-08-02 Sumitomo Electric Industries, Ltd. Method of manufacturing silicon carbide semiconductor device
US20080157117A1 (en) * 2006-12-28 2008-07-03 Mcnutt Ty R Insulated gate bipolar transistor with enhanced conductivity modulation
US8835987B2 (en) * 2007-02-27 2014-09-16 Cree, Inc. Insulated gate bipolar transistors including current suppressing layers
US7687825B2 (en) * 2007-09-18 2010-03-30 Cree, Inc. Insulated gate bipolar conduction transistors (IBCTS) and related methods of fabrication
US8030153B2 (en) * 2007-10-31 2011-10-04 Freescale Semiconductor, Inc. High voltage TMOS semiconductor device with low gate charge structure and method of making
JP4929304B2 (ja) * 2009-03-13 2012-05-09 株式会社東芝 半導体装置
US8629509B2 (en) * 2009-06-02 2014-01-14 Cree, Inc. High voltage insulated gate bipolar transistors with minority carrier diverter
US8563986B2 (en) * 2009-11-03 2013-10-22 Cree, Inc. Power semiconductor devices having selectively doped JFET regions and related methods of forming such devices
US8415671B2 (en) * 2010-04-16 2013-04-09 Cree, Inc. Wide band-gap MOSFETs having a heterojunction under gate trenches thereof and related methods of forming such devices
IT1401754B1 (it) * 2010-08-30 2013-08-02 St Microelectronics Srl Dispositivo elettronico integrato e relativo metodo di fabbricazione.
JP5687128B2 (ja) * 2011-05-06 2015-03-18 三菱電機株式会社 半導体装置およびその製造方法
JP2012243966A (ja) * 2011-05-20 2012-12-10 Sumitomo Electric Ind Ltd 半導体装置
JP5869291B2 (ja) * 2011-10-14 2016-02-24 富士電機株式会社 半導体装置
JP2014022708A (ja) * 2012-07-17 2014-02-03 Yoshitaka Sugawara 半導体装置とその動作方法
WO2014013821A1 (ja) * 2012-07-18 2014-01-23 富士電機株式会社 半導体装置および半導体装置の製造方法
JP6219045B2 (ja) * 2013-03-22 2017-10-25 株式会社東芝 半導体装置およびその製造方法

Also Published As

Publication number Publication date
JP2017508300A (ja) 2017-03-23
US20150263145A1 (en) 2015-09-17
WO2015160393A1 (en) 2015-10-22
EP3117463B1 (en) 2021-12-08
WO2015160393A4 (en) 2016-01-07
EP3117463A1 (en) 2017-01-18

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