JP6849695B2 - 半導体デバイスのための集積抵抗器 - Google Patents
半導体デバイスのための集積抵抗器 Download PDFInfo
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- JP6849695B2 JP6849695B2 JP2018550570A JP2018550570A JP6849695B2 JP 6849695 B2 JP6849695 B2 JP 6849695B2 JP 2018550570 A JP2018550570 A JP 2018550570A JP 2018550570 A JP2018550570 A JP 2018550570A JP 6849695 B2 JP6849695 B2 JP 6849695B2
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- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
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- Thin Film Transistor (AREA)
Description
[付記項1]
第1の活性層と、
前記第1の活性層上に位置する第2の活性層であって、
電荷層が、前記第1の活性層と前記第2の活性層との間に位置する、
前記第2の活性層と、
前記第1の活性層の第1の部分と前記第2の活性層の第1の部分とを含む第1の活性エリアを含むパワートランジスタであって、
動作時に、電流が、前記電荷層の第1の部分を通って流れる、
前記パワートランジスタと、
前記パワートランジスタの前記第1の活性エリアの上方において横方向に延びるゲートアレイであって、
前記ゲートアレイが、前記パワートランジスタのゲートとして機能する、
前記ゲートアレイと、
前記第1の活性層の第2の部分と前記第2の活性層の第2の部分と前記電荷層の第2の部分とを含む第2の活性エリアを含むゲート抵抗器であって、
前記第2の活性エリアが、前記第1の活性エリアから電気的に絶縁された、
前記ゲート抵抗器と、
前記ゲート抵抗器の第1の横方向端部および第2の横方向端部にそれぞれ位置する第1の接点および第2の接点であって、
前記第1の接点および前記第2の接点が、前記第2の活性層の前記第2の部分に電気的に接続され、
前記第2の接点がさらに、前記ゲートアレイに電気的に接続された、
前記第1の接点および前記第2の接点と、
前記第1の接点に電気的に接続されたゲートバスと、
を備える、ヘテロ構造半導体デバイス。
[付記項2]
前記ゲート抵抗器が、前記第2の活性エリアの長さと幅とにより規定された抵抗値をもち、
前記長さが、第1の横方向に延び、
前記幅が、前記第1の横方向に実質的に直交する第2の横方向に延びた、
付記項1に記載の前記ヘテロ構造半導体デバイス。
[付記項3]
前記第2の活性エリアの前記長さが、前記第1の接点と前記第2の接点との間における前記第1の横方向の距離を実質的に含む、
付記項2に記載のヘテロ構造半導体デバイス。
[付記項4]
前記ゲートアレイが、ゲート誘電体層により前記第2の活性層の前記第1の部分から絶縁される、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項5]
前記ゲートアレイが、複数のフィンガーを備え、
前記複数のフィンガーの各々が、前記第1の活性エリアの上方において前記第1の横方向に延びた、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項6]
前記抵抗値が、前記パワートランジスタに流れる前記電流の振動を実質的に減衰するように決定された、
付記項2に記載のヘテロ構造半導体デバイス。
[付記項7]
前記第1の活性層が、窒化物ベースの半導体材料を含む、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項8]
前記第1の活性層が、窒化ガリウム(GaN)、インジウム窒化物(InN)、窒化アルミニウム(AlN)、アルミニウムガリウム窒化物(AlGaN)、インジウムガリウム窒化物(InGaN)、またはアルミニウムインジウムガリウム窒化物(AlInGaN)からなる群から選択される、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項9]
前記ゲートアレイが、前記第2の横方向に延びた接続部を含み、
前記複数のフィンガーが、前記接続部を介して互いに接続された、
付記項5に記載のヘテロ構造半導体デバイス。
[付記項10]
前記接続部が、前記ゲート抵抗器の前記幅に実質的に等しい前記第2の横方向における幅をもつ、
付記項9に記載のヘテロ構造半導体デバイス。
[付記項11]
前記第1の活性層が、1〜10マイクロメートルの厚さの範囲の縦方向における厚さをもつ、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項12]
前記第2の活性層が、10〜40ナノメートル(nm)の厚さの範囲内の縦方向における厚さをもつ、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項13]
前記第1の活性層と前記第2の活性層とが、前記第1の活性エリアから前記第2の活性エリアを電気的に絶縁する空所を規定する、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項14]
前記第1の活性エリアから前記第2の活性エリアを電気的に絶縁する注入領域をさらに備える、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項15]
前記第2の活性エリアの上方に位置する抵抗器制御端子をさらに備え、
前記抵抗器制御端子に印加された信号が、前記ゲート抵抗器の抵抗値を制御する、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項16]
前記抵抗器制御端子が、ゲート誘電体層上に位置する追加的な金属接点を備える、
付記項1に記載のヘテロ構造半導体デバイス。
[付記項17]
ヘテロ構造半導体デバイスを製造する方法であって、
基材上に第1の活性層を形成することと、
前記第1の活性層上に第2の活性層を形成することであって、
電荷層が前記第1の活性層と前記第2の活性層との間に形成されるように、前記第1の活性層と前記第2の活性層とが異なるバンドギャップをもつ、
前記第2の活性層を形成することと、
第1の活性エリアと第2の活性エリアとを規定することであって、
前記第1の活性エリアが、前記第1の活性層の第1の部分と前記第2の活性層の第1の部分と前記電荷層の第1の部分とを含み、
前記第2の活性エリアが、前記第1の活性層の第2の部分と前記第2の活性層の第2の部分と前記電荷層の第2の部分とを含み、
前記第2の活性エリアが、前記第1の活性エリアから電気的に絶縁され、
前記第1の活性エリアが、パワートランジスタを備え、
前記第2の活性エリアが、前記ヘテロ構造半導体デバイスの集積ゲート抵抗器を備える、
前記第1の活性エリアと前記第2の活性エリアとを規定することと、
前記第2の活性層の前記第2の部分に直接的に第1の接点と第2の接点とを形成することであって、
前記第1の接点と前記第2の接点とが、ある距離により横方向に分離され、
前記第1の接点および前記第2の接点が、それぞれ、前記集積ゲート抵抗器の第1の端子および第2の端子を備える、
前記第1の接点と前記第2の接点とを形成することと、
前記パワートランジスタの前記第1の活性エリアの上方において横方向に延びたゲートのアレイを形成することであって、
前記ゲートのアレイが、前記第2の接点に電気的に接続され、前記パワートランジスタのゲートとして機能する、
前記ゲートのアレイを形成することと、
を含む、ヘテロ構造半導体デバイスを製造する方法。
[付記項18]
前記ゲートのアレイを形成することが、
前記第2の活性層の前記第1の部分と前記第2の部分との上方に延びたゲート誘電体層を形成することと、
前記ゲート誘電体層の上方に金属層を形成することと、
前記金属層をパターン形成して前記ゲートのアレイを規定することと、
を含む、
付記項17に記載の方法。
[付記項19]
前記金属層をパターン形成することが、第1のオーミック接点に電気的に接続されたゲートバスをさらに規定する、
付記項18に記載の方法。
[付記項20]
前記第1の活性エリアと前記第2の活性エリアを規定することが、前記第1の活性エリアと前記第2の活性エリアとの間において前記第1の活性層と前記第2の活性層とに空所をエッチングすることを含む、
付記項17に記載の方法。
[付記項21]
前記第1の活性エリアと前記第2の活性エリアを規定することが、前記第1の活性エリアと前記第2の活性エリアとの間における半導体材料の領域にイオンを注入することを含む、
付記項17に記載の方法。
Claims (21)
- 第1の活性層と、
前記第1の活性層上に位置する第2の活性層であって、
電荷層が、前記第1の活性層と前記第2の活性層との間に位置する、
前記第2の活性層と、
前記第1の活性層の第1の部分と前記第2の活性層の第1の部分とを含む第1の活性エリアを含むパワートランジスタであって、
動作時に、電流が、前記電荷層の第1の部分を通って流れる、
前記パワートランジスタと、
前記パワートランジスタの前記第1の活性エリアの上方において横方向に延びるゲートアレイであって、
前記ゲートアレイが、前記パワートランジスタのゲートとして機能する、
前記ゲートアレイと、
前記第1の活性層の第2の部分と前記第2の活性層の第2の部分と前記電荷層の第2の部分とを含む第2の活性エリアを含むゲート抵抗器であって、
前記第2の活性エリアが、前記第1の活性エリアから電気的に絶縁された、
前記ゲート抵抗器と、
前記ゲート抵抗器の第1の横方向端部および第2の横方向端部にそれぞれ位置する第1のビアオーミック接点および第2のビアオーミック接点であって、
前記第1のビアオーミック接点および前記第2のビアオーミック接点が、前記第2の活性層の前記第2の部分に電気的に接続され、
前記第2のビアオーミック接点がさらに、前記ゲートアレイの重なっている部分に電気的に接続された、
前記第1のビアオーミック接点および前記第2のビアオーミック接点と、
前記パワートランジスタのゲート端子と前記第1のビアオーミック接点とに電気的に接続されたゲートバスであって、
前記ゲートバスの一部が前記ゲート抵抗器の一部に重なっている、
前記ゲートバスと、
を備え、
前記ゲート抵抗器が、前記ゲート端子と前記パワートランジスタのゲートとの間に接続されている、
ヘテロ構造半導体デバイス。 - 前記ゲート抵抗器が、前記第2の活性エリアの長さと幅とにより規定された抵抗値をもち、
前記長さが、第1の横方向に延び、
前記幅が、前記第1の横方向に実質的に直交する第2の横方向に延びた、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記第2の活性エリアの前記長さが、前記第1のビアオーミック接点と前記第2のビアオーミック接点との間における前記第1の横方向の距離を実質的に含む、
請求項2に記載のヘテロ構造半導体デバイス。 - 前記ゲートアレイが、ゲート誘電体層により前記第2の活性層の前記第1の部分から絶縁される、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記ゲートアレイが、複数のフィンガーを備え、
前記複数のフィンガーの各々が、前記第1の活性エリアの上方において第1の横方向に延びた、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記抵抗値が、前記パワートランジスタに流れる前記電流の振動を実質的に減衰するように決定された、
請求項2に記載のヘテロ構造半導体デバイス。 - 前記第1の活性層が、窒化物ベースの半導体材料を含む、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記第1の活性層が、窒化ガリウム(GaN)、インジウム窒化物(InN)、窒化アルミニウム(AlN)、アルミニウムガリウム窒化物(AlGaN)、インジウムガリウム窒化物(InGaN)、またはアルミニウムインジウムガリウム窒化物(AlInGaN)からなる群から選択される、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記ゲートアレイが、前記第1の横方向に実質的に直交する第2の横方向に延びた接続部を含み、
前記複数のフィンガーが、前記接続部を介して互いに接続された、
請求項5に記載のヘテロ構造半導体デバイス。 - 前記接続部が、前記ゲート抵抗器の幅に実質的に等しい前記第2の横方向における幅をもつ、
請求項9に記載のヘテロ構造半導体デバイス。 - 前記第1の活性層が、1〜10マイクロメートルの厚さの範囲の縦方向における厚さをもつ、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記第2の活性層が、10〜40ナノメートル(nm)の厚さの範囲内の縦方向における厚さをもつ、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記第1の活性層と前記第2の活性層とが、前記第1の活性エリアから前記第2の活性エリアを電気的に絶縁する空所を規定する、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記第1の活性エリアから前記第2の活性エリアを電気的に絶縁する注入領域をさらに備える、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記第2の活性エリアの上方に位置する抵抗器制御端子をさらに備え、
前記抵抗器制御端子に印加された信号が、前記ゲート抵抗器の抵抗値を制御する、
請求項1に記載のヘテロ構造半導体デバイス。 - 前記抵抗器制御端子が、ゲート誘電体層上に位置する追加的な金属接点を備える、
請求項15に記載のヘテロ構造半導体デバイス。 - ヘテロ構造半導体デバイスを製造する方法であって、
基材上に第1の活性層を形成することと、
前記第1の活性層上に第2の活性層を形成することであって、
電荷層が前記第1の活性層と前記第2の活性層との間に形成されるように、前記第1の活性層と前記第2の活性層とが異なるバンドギャップをもつ、
前記第2の活性層を形成することと、
第1の活性エリアと第2の活性エリアとを規定することであって、
前記第1の活性エリアが、前記第1の活性層の第1の部分と前記第2の活性層の第1の部分と前記電荷層の第1の部分とを含み、
前記第2の活性エリアが、前記第1の活性層の第2の部分と前記第2の活性層の第2の部分と前記電荷層の第2の部分とを含み、
前記第2の活性エリアが、前記第1の活性エリアから電気的に絶縁され、
前記第1の活性エリアが、パワートランジスタの一部であり、
前記第2の活性エリアが、前記ヘテロ構造半導体デバイスの集積ゲート抵抗器の一部である、
前記第1の活性エリアと前記第2の活性エリアとを規定することと、
前記第2の活性層の前記第2の部分に直接的に第1のビアオーミック接点と第2のビアオーミック接点とを形成することであって、
前記第1のビアオーミック接点と前記第2のビアオーミック接点とが、ある距離により横方向に分離され、
前記第1のビアオーミック接点および前記第2のビアオーミック接点が、それぞれ、前記集積ゲート抵抗器の第1の端子および第2の端子を備える、
前記第1のビアオーミック接点と前記第2のビアオーミック接点とを形成することと、
前記パワートランジスタの前記第1の活性エリアと前記集積ゲート抵抗器の前記第2の活性エリアの一部との上方において横方向に延びたゲートのアレイを形成することであって、
前記ゲートのアレイが、前記第2のビアオーミック接点に電気的に接続され、前記パワートランジスタのゲートとして機能する、
前記ゲートのアレイを形成することと、
を含む、ヘテロ構造半導体デバイスを製造する方法。 - 前記ゲートのアレイを形成することが、
前記第2の活性層の前記第1の部分と前記第2の部分との上方に延びたゲート誘電体層を形成することと、
前記ゲート誘電体層の上方に金属層を形成することと、
前記金属層をパターン形成して前記ゲートのアレイを規定することと、
を含む、
請求項17に記載の方法。 - 前記金属層をパターン形成することが、第1のオーミック接点に電気的に接続されたゲートバスをさらに規定する、
請求項18に記載の方法。 - 前記第1の活性エリアと前記第2の活性エリアを規定することが、前記第1の活性エリアと前記第2の活性エリアとの間において前記第1の活性層と前記第2の活性層とに空所をエッチングすることを含む、
請求項17に記載の方法。 - 前記第1の活性エリアと前記第2の活性エリアを規定することが、前記第1の活性エリアと前記第2の活性エリアとの間における半導体材料の領域にイオンを注入することを含む、
請求項17に記載の方法。
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