JP6846385B2 - 配向特性測定方法、配向特性測定プログラム、及び配向特性測定装置 - Google Patents

配向特性測定方法、配向特性測定プログラム、及び配向特性測定装置 Download PDF

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JP6846385B2
JP6846385B2 JP2018112951A JP2018112951A JP6846385B2 JP 6846385 B2 JP6846385 B2 JP 6846385B2 JP 2018112951 A JP2018112951 A JP 2018112951A JP 2018112951 A JP2018112951 A JP 2018112951A JP 6846385 B2 JP6846385 B2 JP 6846385B2
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angle
light
light intensity
detection
orientation
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JP2018197753A (ja
JP2018197753A5 (https=
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清正 細川
清正 細川
茂 江浦
茂 江浦
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Hamamatsu Photonics KK
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Hamamatsu Photonics KK
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/6445—Measuring fluorescence polarisation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/645—Specially adapted constructive features of fluorimeters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N2021/6417—Spectrofluorimetric devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/645—Specially adapted constructive features of fluorimeters
    • G01N2021/6484—Optical fibres

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  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Stereophonic System (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
JP2018112951A 2017-05-23 2018-06-13 配向特性測定方法、配向特性測定プログラム、及び配向特性測定装置 Expired - Fee Related JP6846385B2 (ja)

Applications Claiming Priority (2)

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JP2017101926 2017-05-23
JP2017101926 2017-05-23

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JP2018517235A Division JP6356372B1 (ja) 2017-05-23 2017-11-22 配向特性測定方法、配向特性測定プログラム、及び配向特性測定装置

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JP2018197753A JP2018197753A (ja) 2018-12-13
JP2018197753A5 JP2018197753A5 (https=) 2021-01-07
JP6846385B2 true JP6846385B2 (ja) 2021-03-24

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EP (1) EP3633351B1 (https=)
JP (1) JP6846385B2 (https=)
CN (1) CN110651177B (https=)
TW (2) TWI769203B (https=)
WO (1) WO2018216246A1 (https=)

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Publication number Priority date Publication date Assignee Title
CN109490271A (zh) * 2018-12-26 2019-03-19 华讯方舟科技有限公司 一种荧光光谱的测试装置及测试方法
CN109632745A (zh) * 2018-12-28 2019-04-16 深圳市太赫兹科技创新研究院 角度荧光测量装置和方法
CN112014077B (zh) * 2020-09-24 2025-03-25 远方谱色科技有限公司 一种亮度分布测量装置及方法

Family Cites Families (16)

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JPS62157549A (ja) * 1985-12-30 1987-07-13 Kanzaki Paper Mfg Co Ltd シート状透光性試料の異方性測定方法
JPS6435418A (en) * 1987-07-30 1989-02-06 Matsushita Electric Industrial Co Ltd Method for evaluating liquid crystal orientational capacity of oriented film
JP2677199B2 (ja) * 1994-07-28 1997-11-17 日本電気株式会社 配向膜検査装置および検査方法
US5808738A (en) * 1995-06-13 1998-09-15 University Of South Florida Multiangle, multiwavelength particle characterization system and method
JP2000081371A (ja) * 1998-09-07 2000-03-21 Nec Corp 薄膜分子配向評価方法、評価装置及び記録媒体
US6697157B2 (en) * 1999-05-24 2004-02-24 Hinds Instruments Birefringence measurement
JP3854056B2 (ja) * 1999-12-13 2006-12-06 株式会社荏原製作所 基板膜厚測定方法、基板膜厚測定装置、基板処理方法及び基板処理装置
JP4895428B2 (ja) * 2001-03-12 2012-03-14 シンテック株式会社 液晶セルの配向パラメータ測定方法および測定装置
JP4135603B2 (ja) * 2003-09-12 2008-08-20 オムロン株式会社 ２次元分光装置及び膜厚測定装置
KR101280335B1 (ko) * 2005-01-24 2013-07-01 가부시키가이샤 모리텍스 광학적 이방성 파라미터 측정 방법 및 측정 장치
JP4158801B2 (ja) * 2005-03-29 2008-10-01 セイコーエプソン株式会社 液晶パネルの製造方法及び液晶パネル用基板の製造方法
JP5224835B2 (ja) * 2007-02-09 2013-07-03 国立大学法人東京工業大学 有機ｅｌ素子およびその製造方法、ならびに有機ｅｌ素子の評価方法
JP5806837B2 (ja) * 2011-04-11 2015-11-10 株式会社モリテックス 光学異方性パラメータ測定装置、測定方法及び測定用プログラム
JP5319856B1 (ja) * 2012-06-13 2013-10-16 株式会社シンクロン 膜厚測定装置及び成膜装置
JP6290637B2 (ja) * 2014-01-30 2018-03-07 浜松ホトニクス株式会社 膜厚計測方法及び膜厚計測装置
JP6279399B2 (ja) * 2014-05-23 2018-02-14 浜松ホトニクス株式会社 光計測装置及び光計測方法

Also Published As

Publication number Publication date
TWI813366B (zh) 2023-08-21
JP2018197753A (ja) 2018-12-13
EP3633351B1 (en) 2023-03-29
TW202242382A (zh) 2022-11-01
TW201901137A (zh) 2019-01-01
EP3633351A4 (en) 2021-02-24
CN110651177B (zh) 2022-07-29
WO2018216246A1 (ja) 2018-11-29
EP3633351A1 (en) 2020-04-08
CN110651177A (zh) 2020-01-03
TWI769203B (zh) 2022-07-01

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