JP6845772B2 - 感光性フィルム積層体およびそれを用いて形成された硬化物 - Google Patents

感光性フィルム積層体およびそれを用いて形成された硬化物 Download PDF

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JP6845772B2
JP6845772B2 JP2017171270A JP2017171270A JP6845772B2 JP 6845772 B2 JP6845772 B2 JP 6845772B2 JP 2017171270 A JP2017171270 A JP 2017171270A JP 2017171270 A JP2017171270 A JP 2017171270A JP 6845772 B2 JP6845772 B2 JP 6845772B2
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photosensitive
resin
photosensitive film
film
group
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JP2018136522A (ja
JP2018136522A5 (enrdf_load_stackoverflow
Inventor
越 千 弘 舟
越 千 弘 舟
田 和 也 岡
田 和 也 岡
村 太 郎 北
村 太 郎 北
藤 和 也 佐
藤 和 也 佐
井 康 昭 荒
井 康 昭 荒
藤 信 人 伊
藤 信 人 伊
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Taiyo Holdings Co Ltd
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Taiyo Ink Mfg Co Ltd
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Priority to JP2017171270A priority Critical patent/JP6845772B2/ja
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  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
JP2017171270A 2017-09-06 2017-09-06 感光性フィルム積層体およびそれを用いて形成された硬化物 Active JP6845772B2 (ja)

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JP2017171270A JP6845772B2 (ja) 2017-09-06 2017-09-06 感光性フィルム積層体およびそれを用いて形成された硬化物

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JP2017171270A JP6845772B2 (ja) 2017-09-06 2017-09-06 感光性フィルム積層体およびそれを用いて形成された硬化物

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JP2017032612A Division JP6215497B1 (ja) 2017-01-17 2017-02-23 感光性フィルム積層体およびそれを用いて形成された硬化物

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JP2018136522A JP2018136522A (ja) 2018-08-30
JP2018136522A5 JP2018136522A5 (enrdf_load_stackoverflow) 2020-03-05
JP6845772B2 true JP6845772B2 (ja) 2021-03-24

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021059982A1 (ja) * 2019-09-27 2021-04-01 太陽インキ製造株式会社 光硬化性黒色組成物、光硬化性黒色組成物の硬化物及び黒色被覆基材
WO2022003819A1 (ja) * 2020-06-30 2022-01-06 ギガフォトン株式会社 レーザ加工方法及び回路基板製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001092957A1 (fr) * 2000-06-01 2001-12-06 Nippon Paper Industries Co., Ltd. Feuil de transfert d'une couche de protection d'une emulsion photographique, et photomasque muni d'une couche de protection
JP2004086089A (ja) * 2002-08-29 2004-03-18 Nippon Paper Industries Co Ltd 蛍光体転写フィルム
US20050153107A1 (en) * 2004-01-12 2005-07-14 Tdk Corporation Substrate having functional layer pattern formed thereon and method of forming functional layer pattern
KR101362179B1 (ko) * 2009-12-30 2014-02-12 코오롱인더스트리 주식회사 드라이 필름 포토레지스트의 제조방법
JP2011180376A (ja) * 2010-03-01 2011-09-15 Fujifilm Corp 永久パターン形成方法及び感光性フィルム
JP6143090B2 (ja) * 2013-07-01 2017-06-07 日立化成株式会社 感光性樹脂組成物、これを用いた感光性フィルム、永久レジスト及び永久レジストの製造方法
WO2016159133A1 (ja) * 2015-03-30 2016-10-06 日立化成株式会社 ドライフィルム、硬化物、半導体装置及びレジストパターンの形成方法
WO2016157605A1 (ja) * 2015-03-30 2016-10-06 日立化成株式会社 感光性樹脂組成物、感光性エレメント、硬化物及びレジストパターンの形成方法
KR102562958B1 (ko) * 2015-08-05 2023-08-04 다이요 홀딩스 가부시키가이샤 적층 구조체, 드라이 필름 및 플렉시블 프린트 배선판

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