JP6836699B2 - Glass plate - Google Patents

Description

The present invention relates to a glass plate used for a flat panel display or the like.

In the manufacturing process of flat panel displays, etc., the glass plate is held on the stage (pedestal) by vacuum adsorption to mount a circuit, etc., and when the glass plate is removed from the stage, peeling charge occurs and the glass plate cracks or cracks. Therefore, it is known that the suction surface is roughened to prevent peeling antistatic (see Patent Document 1).

Patent Document 1 includes a first surface which is a surface on which a semiconductor element or a color film is formed, and a second surface opposite to the first surface, and the second surface is larger than −1.5 and is larger than −1.5. A glass plate that is a substrate using polo-aluminosilicate glass having an Rsk smaller than −0.5 _{and having a composition containing SiO 2} , Al ₂ O ₃ and B ₂ O _{3, on which a glass plate is placed.} It is disclosed that the area of the second surface in contact with the table (stage) surface is reduced by the surface treatment, and the charging of the glass substrate is suppressed more effectively.

Japanese Unexamined Patent Publication No. 2014-69999

In Patent Document 1, peeling charge of the second surface is prevented to reduce cracking, but there is a problem that it is difficult to improve workability by determining the orientation when the glass plate is packed in the pallet. is there.

The present invention provides a glass plate having a rough surface to be a suction surface and improved orientation discrimination of the glass plate.

The glass plate of the present invention has a first main surface, a second main surface facing the first main surface, and an end surface connecting the first main surface and the second main surface, and the end surface. Is provided with a first end face, the first surface roughness of the first main surface is smaller than the second surface roughness of the second main surface, and the first cullet peeling rate of the first end face is the other end face. It is different from the cullet peeling rate of.

According to the present invention, the second main surface is roughened by the reaction gas to prevent peeling charge when the second main surface is adsorbed on the stage and peeled from the stage, and at the same time, the first cullet peeling rate of the first end face is set to another end face. It is possible to provide a glass plate in which the directionality can be easily discriminated by making it different from the cullet peeling rate of.

1 (a) to 1 (b) show an example of a glass plate according to the present invention, FIG. 1 (a) is a front perspective view, and FIG. 1 (b) is a conceptual diagram of a transport state in a transport device. 2 (a) to 2 (c) show an example of a glass plate according to the present invention, which is a front view of FIG. 2 (a), a right side view of FIG. 2 (b), and a bottom view of FIG. 2 (c). FIG. 3 is a conceptual diagram showing an example of a transport state of the glass plate according to the present invention. 4 (a) to 4 (b) show the results of measuring the amount of fluorine and the Al / Si ratio of the first main surface of the glass plate according to the present invention. b) It is a table of the measurement result of the amount of fluorine and the measurement result of Al / Si. 5 (a) to 5 (b) are tables in which the cullet peeling rate at each end face of the glass plate according to the present invention was measured, and the first sample of FIG. 5 (a) and the second sample of FIG. 5 (b) are shown. is there. 6 (a) to 6 (b) are photographs of the cullet of the glass plate according to the present invention by an electron microscope, FIG. 6 (a) the first end face, and FIG. 6 (b) the second end face. FIG. 7 is a table in which the roughness of each end face of the glass plate according to the present invention is measured. FIG. 8 is a table showing values measured by indexes showing various roughness of the glass plate according to the present invention.

Hereinafter, specific embodiments of the glass plate according to the present invention will be described in detail with reference to the drawings.

1 (a) to 1 (b) show an example of a glass plate according to the present invention, FIG. 1 (a) is a front perspective view, and FIG. 1 (b) is a conceptual diagram of a transport state in a transport device. 2 (a) to 2 (c) show an example of the glass plate according to the present invention, FIG. 2 (a) is a front view, FIG. 2 (b) is a right side view, and FIG. 2 (c) is a bottom view. is there. An example of the glass plate will be described in detail with reference to FIGS. 1 (a) to 2 (c) of the glass plate.

The glass plate 1 of the present embodiment has a substantially rectangular shape, and has a first main surface 10, a second main surface 20 facing the first main surface 10, and a first main surface 10 and a second main surface 20. It has four end faces to be connected, and the four end faces are a first end face 30, a second end face 40 facing the first end face 30, and a third end face connecting one end of the first end face 30 and one end of the second end face 40. It has a fourth end face 60 that connects the other end of the first end face 30 and the other end of the second end face 40 and faces the third end face 50.

In the transport device 100 for transporting the glass plate 1, the upper surface is the first main surface 10, and the surface that comes into contact with the rotating roller 101 and is etched by hydrogen fluoride gas (HF), which is a reaction gas, is the second main surface 20. Yes, the tip surface in the transport direction (see the arrow direction in the figure) is the first end surface 30, the end surface opposite to the first end surface 30 is the second end surface 40, and the glass plate 1 is viewed from the first main surface 10 side. Looking at it, the right side is the third end surface 50, and the left side is the fourth end surface 60.

Further, as shown in FIG. 2A, the first main surface 10 of the glass plate 1 is the center of the glass plate 1 from any of the first, second, third, and fourth end faces 30, 40, 50, and 60. An edge region 11 that occupies a predetermined width (for example, about 20 mm) on the side and a central region 12 that occupies the center side of the edge region 11 are provided.

As shown in FIG. 2B, the first end surface 30 of the glass plate 1 includes a first region 31 occupying the first main surface 10 side and a second region 32 occupying the second main surface 20 side. Then, in the present embodiment, the boundary between the first region 31 and the second region 32 may have a corrugated shape because the glass plate 1 bends.

As shown in FIG. 2C, the third end surface 50 of the glass plate includes a third region 51 on the first end surface 30 side and a fourth region 52 on the second end surface 40 side. That is, the third region 51 is on the upstream side with respect to the transport direction of the glass plate 1.

The glass plate 1 of the present embodiment is used for manufacturing a flat panel display (FPD) such as a liquid crystal display and an organic EL display. The glass plate 1 has, for example, a rectangular shape having a plate thickness of about 0.2 mm to 0.8 mm and a length and width of about 600 mm to 3000 mm. The glass plate is also referred to as a glass substrate.

The first main surface 10 of the glass plate 1 is a surface on which a multi-layer thin film including a semiconductor element such as a TFT, a color filter, a black matrix (BM), and the like is formed in the manufacturing process of the FPD.

The composition of the glass plate 1 is not particularly limited as long as it is silicate glass. For example, in the case of a glass substrate for FPD, the glass plate 1 contains SiO ₂ , Al ₂ O ₃ , B ₂ O _3, and an oxide of an alkaline earth metal. Aluminosilicate glass having a composition is preferable. Further, from the viewpoint of suppressing the adhesion and defects of the formed element, the so-called non-alkali glass, which substantially does not contain an alkali metal component, is more preferable among the aluminosilicate glasses. In addition, the fact that the alkali metal component is substantially not contained means that the alkali metal component is not contained at all and the inclusion of an unavoidable component in production is permitted. Specifically, the content of the alkali metal oxide in the glass composition is preferably 0.1% by mass or less.

FIG. 3 is a conceptual diagram showing a transport state of the glass plate 1 of the present embodiment. The object of the present invention will be described in detail with reference to FIG.

The transport device 100 continuously transports glass plates cut to a predetermined size one by one in a predetermined direction in a process of manufacturing the glass plate 1, and a plurality of glass plates rotated by a drive device (not shown) or the like. The rotary roller 101 and the nozzle 102 installed below the rotary roller 101 are provided.

The nozzle 102 blows the reaction gas onto the glass plate 1 transported by the transport device 100 from the lower side of the glass plate 1 in a direction substantially perpendicular to the transport direction of the glass plate 1. As a result, the second main surface 20 of the glass plate 1 is etched (roughened). Further, the nozzle 102 has a gas supply path 103 for supplying the reaction gas and a gas suction path 104 for sucking the reaction gas.

The gas supply path 103 is connected to an externally provided raw material gas supply device that supplies, for example, a raw material gas (not shown). The raw material gas includes, for example, a fluorine-based raw material gas and a carrier gas.

The fluorine-based raw material gas is used to generate a fluorine-based reaction component that reacts with the surface of the glass plate 1. The fluorine-based reaction component can be generated by converting the fluorine-based raw material gas into plasma (including decomposition, cold air, activation, ionization, etc.). The carrier gas is used for transporting and diluting the fluorine-based raw material gas and for performing plasma discharge. _{In this embodiment, CF 4} is used as the fluorine-based raw material gas, and argon is used as the carrier gas.

Incidentally, the fluorine-based material gas is not limited to _{this, C 2 F 6, C 3} F 8 other perfluorocarbons _{such, CHF 3, CH 2 F 2} , CH 3 F , such as _{hydrofluorocarbons, SF 6, NF 3, XeF} 2 Other fluorine-containing compounds such as may be used. The carrier gas is not limited thereto, N _2, helium, neon, and may be other inert gases such as xenon.

In the present embodiment, the second main surface 20 is etched by plunging the glass plates 1 one by one into the reaction gas, but the first end surface 30 is utilized by using the gas G staying in the transport device 100. The side is also etched. By roughening the first end surface 30 side, it is possible to determine the direction (direction) of the glass plate 1. Since the stagnant gas G is intentionally present and used, it is not necessary to remove the reaction gas or stop the flow for each glass plate 1 to be conveyed. In the present embodiment, the reaction gas is sucked from the inside of the transport device 100 through the gas suction path 104. In the present embodiment, the reaction gas may be intentionally retained in the transport device 100 in order to simultaneously roughen the first end face 30, which is the end face located on the tip side with respect to the transport direction. The amount of stagnant gas G can be controlled in consideration of the degree of roughening. Further, the density and concentration of the reaction gas may be intentionally controlled so as to decrease toward the rear side in the transport direction of the glass plate 1.
By doing so, of the second main surface 20 and the edge region 11, the region along the first end surface 30 is treated by the gas.

The reaction gas is used for etching the second main surface 20, and it is preferable that the central region 12 of the first main surface 10 of the glass plate 1 is not roughened. The first surface roughness of the first main surface 10 is smaller than the second surface roughness of the second main surface 20. Here, the first surface roughness is the average of the values measured by randomly extracting 6 points from the central region 12, and the second surface roughness is (1) to (1) to FIG. 4 (a) described later. It is the average of the measured values at the position on the second main surface 20 corresponding to (6). The first main surface is a surface suitable for forming a semiconductor element or the like.

It may be necessary to determine the orientation of the glass plate 1 that has completed the production line when it is packed in a pallet in the factory, or the orientation of the glass plate 1 that you want to check during transportation in the delivery destination process. Work efficiency can be improved if the orientation of the glass is easily known. Further, for example, the glass plate 1 may be transported in a state of being tilted by about 5 degrees and standing, but at this time, if the surface roughness of the side in contact with the lower conveyor is too small, friction with the conveyor may occur. If it is too small, the glass plate 1 may slip.

In the present embodiment, the orientation of the glass plate 1 can be easily determined by intentionally making one roughened end face (first end face 30). Further, if the glass plate 1 is arranged with the end surface facing down, the problem of slipping on the mounting surface (conveyor) can be easily solved.

4 (a) to 4 (b) show the results of measuring the amount of fluorine and the Al / Si ratio of the first main surface 10, FIG. 4 (a) is a front view of the measurement point, and FIG. 4 (b) is. It is a table of the measurement result of the amount of fluorine and the measurement result of Al / Si. Since the detection of fluorine is almost eliminated when a simple cleaning is additionally performed, the value before cleaning is shown in FIG. 4 (b), but the value of Al / Si does not change even after cleaning, so cleaning is performed. Both previous values are valid.

The Al / Si ratio is the ratio of the Al concentration and the Si concentration on the surface (first main surface 10) of the glass plate 1 measured by X-ray photoelectron spectroscopy, that is, atm% of Al and atm% of Si. Is the ratio of. ESCA5500 manufactured by Albac Phi is used as the measuring device, and the peaks of Si (2p) and Al (2p) are used, the path energy is 117.4 eV, the energy step is 0.5 eV / step, and the extraction angle (with the sample surface). The measurement was performed under the condition of (angle formed by the detector) 150. For the analysis of the spectrum, the analysis software MultiPak Ver. 8.2 was used. The amount of fluorine (fluorine content) was also measured by the same method.

There are six measurement points, which are shown by (1) to (6) on the first main surface 10 of the glass plate 1 (see FIG. 4 (a)). (1) is near the corner side of the first main surface 10 near the first end surface 30 and the fourth end surface 60, and (2) is near the corner side of the first main surface 10 near the first end surface 30 and the third end surface 50. (3) is near the corner side of the first main surface 10 near the second end surface 40 and the third end surface 50, and (4) is near the corner side of the first main surface 10 near the second end surface 40 and the fourth end surface 60. (5) is near the center of the first main surface 10, and (6) is near the first end surface 30 and is between (1) and (2). Further, the measurement points (1) to (4) and (6) are located in the edge region 11 of the first main surface 10.

According to the fluorine content (atm%) measurement result of the first main surface 10 (see FIG. 4B), at the measurement points (1), (2), and (6) close to the first end surface 30, other measurement points. It is understood that the amount of fluorine is larger than that of (3), (4) and (5), and the influence of hydrogen fluoride gas, which is a reaction gas, is exerted. From the table, it can be said that the second main surface 20 or the edge region 11 has a region having a fluorine content of 0.35 atm% or more. Further, the maximum value is preferably 0.50 atm% or more, and more preferably 0.70 atm% or more.

With such a value range, the first end surface 30 is sufficiently roughened to facilitate the determination of the orientation of the glass plate 1, and the second main surface 20 is sufficiently roughened to allow the glass plate 1 to be placed on the stage. Adsorption and peeling of the glass plate 1 from the stage become easy.

According to the measurement result of the Al / Si ratio of the first main surface 10 (see FIG. 4 (b)), at the measurement points (1), (2), and (6) close to the first end surface 30, other measurement points (see FIG. 4 (b)). Compared with 3), (4), and (5), the Al / Si ratio is lower, and Al is reached by hydrogen fluoride gas, which is the reaction gas, and the influence of the reaction gas appears. Understood. In the present embodiment, the glass plate 1 is an aluminosilicate glass (aluminosilicate glass) which is a kind of chemically strengthened glass, and Al / Si is reached in a portion exposed to hydrogen fluoride gas which is a reaction gas. The value of is getting smaller. The composition of the glass used in this embodiment has an Al / Si value of about 0.3. In this embodiment, it is conceivable that Al is reached from the glass component and replaced with F.

Further, from the table, it can be said that the second main surface 20 or the edge region 11 preferably has a region in which Al / Si is 0.17 or less. And it is more preferably 0.15 or less, and further preferably 0.13 or less. Further, although not particularly limited, Al / Si may be 0.01 or more in any region of, for example, the second main surface 20 or the edge region 11.
Further, the second main surface 20 or the edge region 11 preferably has an average value of Al / Si of less than 0.20, and more preferably a region of less than 0.18. Further, although not particularly limited, the lower limit value is, for example, 0.01 or more.

The orientation of the glass plate 1 can be easily determined, the glass plate 1 can be easily adsorbed to the stage, and the glass plate 1 can be easily peeled off from the stage.

According to the present embodiment, it is possible to provide the glass plate 1 in which the first end surface 30 is also roughened while the second main surface 20 is sufficiently roughened.

With reference to FIGS. 5A to 8, the state in which the second main surface 20 and the first end surface 30 are roughened will be described in detail based on some measured values indicating the roughness.

5 (a) to 5 (b) are tables in which the cullet peeling rate at the first end face 30, the second end face 40, the third end face 50, and the fourth end face 60 was measured, and FIG. 5 (a) is the first. The sample, FIG. 5B, is the second sample. The cullet refers to a minute glass grain that peels off from the glass plate 1. The cullet peeling rate (unit:%) was determined as the ratio of the occupied area of the cullet attached to the adhesive surface of the tape (cullet occupancy rate) by the tape test. In the tape test, after attaching the tape to the end face of the glass plate 1, the tape is peeled off, and "how much the cullet is peeled off from the end face of the glass plate 1 and adheres to the adhesive surface of the tape" is measured with a microscope. It is a test to do. In the microscopic measurement, the area occupied by the cullet present in the area of 125 μm × 125 μm randomly extracted from the adhesive surface of the tape was extracted by the binarization treatment, and the abundance rate in the area of 125 μm × 125 μm was shown. .. In this way, the cullet occupancy area per unit area was obtained, and the percentage notation was used as the cullet peeling rate (cullet occupancy rate).
The tape used in the tape test may have, for example, a tape having a 180 ° peeling adhesive strength of 10 N / 25 mm defined by JIS Z 0237: 2009, and the peeling method conforms to JIS Z 0237: 2009. Good.

Further, hereinafter, the cullet peeling rate of the first end face 30 is the first cullet peeling rate, the cullet peeling rate of the second end face 40 is the second cullet peeling rate, and the cullet peeling rate of the third end face 50 is the third cullet peeling rate. The cullet peeling rate of the four end faces 60 is referred to as the fourth cullet peeling rate.

From the tables of FIGS. 5A to 5B, the first cullet peeling rate of the first end face 30 is larger than the second cullet peeling rate of the second end face, and is larger than the third cullet peeling rate of the third end face 50. It can be said that it is preferable that the size is large and larger than the fourth cullet peeling rate of the fourth end surface 60. That is, it can be said that the first end face 30 preferably has the highest cullet peeling rate among all the end faces 40, 50, and 60. Therefore, the discriminability of the orientation (direction) of the glass plate 1 is further enhanced.

Further, from the tables of FIGS. 5A to 5B, the second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are the second cullet peeling rate and the third cullet peeling rate. It can be said that it is preferable that the average value with the fourth cullet peeling rate is 0.5 times or more and 1.5 times or less. From this, it can be understood that there is no clear tendency in the second end face 40, the third end face 50, and the fourth end face 60, and there is not much difference between them, and only the first end face 30 is large. Therefore, the discriminability of the orientation (direction) of the glass plate 1 is further enhanced.

Further, (Cullet peeling rate of the first end face 30) / (Cullet peeling rate of the second end face) ≈3.78 in FIG. 5 (a), (Cullet peeling rate of the first end face 30) in FIG. 5 (b) /. From (Cullet peeling rate of the second end face) ≈5.24, it can be said that the first cullet peeling rate is preferably 3 times or more of the second cullet peeling rate. That is, it can be understood that only the first end face 30 is by far larger than the other end faces 40, 50, 60. Therefore, the roughening of the first end surface 30 is conspicuous, and the discriminability of the orientation (direction) of the glass plate 1 is further enhanced. The upper limit is not particularly limited, but is, for example, 20 times or less.
Further, in the tape test, no cullet having a major axis of 6 μm or more was generated in the first sample. In the second sample, no cullet having a major axis of 9 μm or more was generated. Further, the second sample had sufficient strength as a glass substrate, and the first sample had higher strength than the second sample. From this, it can be said that the size of the cullet peeled from the first end surface 30 is preferably 10 μm or less in major axis, more preferably less than 9 μm in major axis, and further preferably less than 6 μm in major axis. That is, it can be understood that the cullet is easily peeled off from the first end surface 30, but the cullet that is too large is not peeled off. Within the above range, it is possible to roughen the first end face 30 and suppress a decrease in the end face strength of the first end face 30 by controlling the concentration of the retained gas G. The lower limit is not particularly limited, but is, for example, a major axis of 0.1 μm or more.

Further, since the second main surface side of the first end surface 30 is easily etched, it can be said that the first cullet peeling rate is larger in the second region 32 than in the first region 31. As described above, the boundary between the first region 31 and the second region 32 may have a corrugated shape because the glass plate may bend. Therefore, in the work of confirming the orientation of the glass plate 1, the orientation (direction) of the glass plate 1 can be easily determined.

It can be said that the third region 51 is larger than the fourth region 52 in the third cullet peeling rate of the third end surface 50. That is, among the side sides of the third end surface 50, the cullet peeling rate is higher in the upstream side in the transport direction where the stagnant gas G is easily touched, and the direction (direction) of the glass plate 1 is further improved.

6 (a) to 6 (b) are photographs of Caret with an electron microscope, FIG. 6 (a) is a first end face 30, and FIG. 6 (b) is a second end face 40. The black part is the cullet and the other part is the tape. It can be understood that there are more cullets on the first end surface 30 than on the second end surface 40.

FIG. 7 is a table in which the roughness of the first end face 30, the second end face 40, the third end face 50, and the fourth end face 60 is measured. The indexes (Ra and Rδc) indicating each roughness in the table are defined as follows. These values are specified in JIS B 0601: 2013. These values are randomly measured at 5 points on each end face and averaged.
Ra: "Arithmetic mean roughness", which is a value representing the average of the absolute values of Z (x) (a collection of one curve) at a reference length.
Rδc: “Difference in cutting level of roughness curve”, which is a value representing the difference in cutting level c in the height direction corresponding to the two load length ratios.

From the table of FIG. 7, it can be understood that the values of Ra and Rδc of the first end face 30 are larger than the values of the other end faces 40, 50 and 60. That is, it can be said that the surface roughness of the first end surface 30 is preferably larger than the surface roughness of the second end surface 40.

Then, from the tables of FIGS. 5 (a) to 5 (b) and FIG. 7, the first surface roughness of the first main surface 10 is smaller than the second surface roughness of the second main surface 20, and the first end surface 30 It can be understood that the first cullet peeling rate is larger than the second cullet peeling rate of the second end face 40.

Therefore, peeling charging can be prevented by roughening the second main surface 20 on the side that is attracted to the stage and peeled off, the glass plate 1 can be easily removed from vacuum suction, and the glass plate 1 is roughened by roughening the first end surface 30. The direction of the above can be easily understood, and for example, it is possible to improve the efficiency of the determination work on the mounting side at the time of transportation at the delivery destination.

Further, the edge region 11 preferably has a region having a larger surface roughness than the central region 12. In FIGS. 4A to 4B, since the influence of the reaction gas can be confirmed on the downstream side of the edge region 11 of the first main surface in the transport direction, the edge region 11 of the first main surface is also referred to as the second main surface 20. It is considered that they have similar surface characteristics. If the edge region 11 is provided with a region having a surface roughness larger than that of the central region 12, air can easily enter from that region, so that the interleaving paper when laminating the glass plates 1 can be easily peeled off. That is, it can be said that it is easy to turn the interleaving paper because a part of the peripheral edge of the glass plate 1 is rough. If the edge region 11 is not suitable for forming the semiconductor element, it may be cut off in a later step, and only the central region 12 may be used for forming the semiconductor element.

The first end surface 30 that first rushes into the glass plate 1 conveyed in the transfer device 100 becomes coarser than the other end surfaces 40, 50, 60 due to the reaction gas, and the cullet peeling rate increases, so that the first end surface 30 Can be determined. As a result, the orientation (direction) of the glass plate 1 can be discriminated, and the orientation of the glass plate 1 can be easily discriminated.

FIG. 8 is a table showing values obtained by measuring the second main surface 20 with indexes showing various roughness, and the number of samples N is 5 (N = 5).

The indexes (Rku, Rsk, etc.) indicating each roughness in the table are defined as follows. These indicators are defined in JIS B 0601: 2013.

Rku: "Curtosis of roughness curve", which is a value representing the mean square of Z (x) at a reference length dimensionless by the square of the root mean square height Rq.

Rsk: "Skewness of roughness curve", which represents the cube root average of Z (x) at a reference length made non-dimensional by the cube root mean square root height Rq cubed. It means the degree of skewness, and is a value that represents the symmetry of the peaks and valleys around the average line. It is also a kind of parameter representing the uneven shape of the surface measured by an atomic force microscope.

Rsm: “Average length of roughness curve element”, which is a value representing the average of the length Xs of the contour curve element at the reference length.
Rv: “Maximum valley depth of roughness curve”, which is the maximum value of valley depth Zv of the contour curve at the reference length.
Rz: “Maximum height roughness”, which is a value representing the sum of the maximum value Rp of the peak height Zp of the contour curve and the maximum value Rv of the valley depth Zv at the reference length (Rz = Rp + Rv).

The increase in the specific surface area ratio is the difference between the value and the surface area of the reference plane when the specific surface area of the first main surface 10 or the second main surface 20 is measured when the surface area of the reference plane is 1. That is, the value obtained by subtracting 1 from the value of the specific surface area of the first main surface 10 or the second main surface 20) is shown (unit is%).

In the table of FIG. 8, the fact that the edge region 11 of the second main surface 20 or the first main surface 10 has the desired roughening is that the Rsk value is positive and that the specific surface area ratio is It is important that the value of the increase is high.

From the table, it can be said that the edge region 11 of the second main surface 20 or the first main surface 10 includes a region where Rsk (skewness of the roughness curve) is positive. The maximum value of Rsk is preferably 0.2 or more, more preferably 0.4 or more, and further preferably 0.6 or more. The minimum value of Rsk is preferably 0.1 or less, and more preferably 0.05 or less. Further, the Rsk may be positive on the entire second main surface 20, in which case the overall second main surface 20 is preferably 0.005 or more, more preferably 0.008 or more, still more preferably 0.010. That is all.

By roughening the surface, peeling charge is suppressed, the glass plate 1 is easily adsorbed to the stage, the glass plate 1 is easily peeled from the stage, and the directionality of the glass plate 1 can be easily determined.

Further, from the table of FIG. 8, it can be said that the edge region 11 of the second main surface 20 or the first main surface 10 includes a region in which the increase in the specific surface area ratio is preferably 0.01% or more. The increase in the specific surface area ratio is more preferably 0.02% or more, still more preferably 0.03% or more. The maximum value of the increase in the specific surface area ratio is preferably 0.05% or more, more preferably 0.07% or more, and further preferably 0.10% or more.

By roughening the surface, peeling charge is suppressed, the glass plate 1 is easily adsorbed to the stage, the glass plate 1 is easily peeled from the stage, and the directionality of the glass plate 1 can be easily determined.

Although the first, second, etc. are used in the description of the present embodiment, they are not terms that particularly limit the position and directionality. Further, although the roughening of the first end surface 30 has been described, it may be advantageous to roughen the third end surface 50 and the fourth end surface 60 depending on the production line, and the directionality can be determined by roughening the one end surface. It may be a surface, and is not particularly limited.

The present invention is not limited to the above-described embodiment, and can be appropriately modified, improved, and the like. In addition, the material, shape, size, numerical value, form, number, arrangement location, etc. of each component in the above-described embodiment are arbitrary and are not limited as long as the present invention can be achieved.

In particular, although it is expressed as a substantially rectangular glass plate in the present embodiment, it may be a glass plate in which the corners of the rectangular glass plate are cut off, which is called a corner cut.

Based on the above matters, the present specification discloses the following contents.
[1]
It has a first main surface, a second main surface facing the first main surface, and an end surface connecting the first main surface and the second main surface, and the end surface includes a first end surface. The first surface roughness of the first main surface is smaller than the second surface roughness of the second main surface, and the first cullet peeling rate of the first end face is different from the cullet peeling rate of other end faces. A glass plate characterized by that.
[2]
The end face includes a second end face facing the first end face, and the first cullet peeling rate of the first end face is larger than the second cullet peeling rate of the second end face [1]. Glass plate.
[3]
The end face connects a third end face that connects one end of the first end face and one end of the second end face, the other end of the first end face, and the other end of the second end face, and faces the third end face. The first cullet peeling rate is larger than the third cullet peeling rate of the third end face, and the first cullet peeling rate is higher than the fourth cullet peeling rate of the fourth end face. The glass plate according to [1] or [2], which is also large.
[4]
The second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are the average of the second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate. The glass plate according to [3], which is 0.5 times or more and 1.5 times or less the value.
[5]
The glass plate according to any one of [2] to [4], wherein the first cullet peeling rate is three times or more the second cullet peeling rate.
[6]
The glass plate according to any one of [1] to [5], wherein the size of the cullet peeled from the first end surface is 10 μm or less in major axis.
[7]
The glass plate according to [2], wherein the surface roughness of the first end surface is larger than the surface roughness of the second end surface.
[8]
The first end surface includes a first region occupying the first main surface side and a second region occupying the second main surface side, and the first cullet peeling rate is higher than that of the first region. The glass plate according to any one of [1] to [7], wherein the two regions are larger.
[9]
The glass plate according to [8], wherein the boundary between the first region and the second region has a corrugated shape.
[10]
The third end face includes a third region on the first end face side and a fourth region on the second end face side, and the third cullet peeling rate is higher in the third region than in the fourth region. The large glass plate according to [3].
[11]
The first main surface includes an edge region that occupies a predetermined width from any of the first, second, third, and fourth end faces to the center side of the glass plate, and a central region that occupies the center side of the edge region. The glass plate according to [3], wherein the edge region has a region having a surface roughness larger than that of the central region.
[12]
The glass plate according to [11], wherein the second main surface or the edge region has a region in which the skewness (Rsk) of the roughness curve is positive.
[13]
The glass plate according to [11], wherein the second main surface or the edge region has a region in which the increase in specific surface area ratio is 0.01% or more.
[14]
The glass plate according to [11], wherein the second main surface or the edge region has a region having a fluorine content of 0.35 atm% or more.
[15]
The glass plate according to [11], wherein the second main surface or the edge region has a region in which Al / Si is 0.17 or less.
[16]
The glass plate according to [11], wherein the edge region occupies a predetermined width from the first end surface to the center side of the glass plate.

The glass plate of the present invention is suitably used for a glass plate that prevents peeling and charging of the surface in contact with the stage and requires direction determination on the end surface side.

Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention.

1 Glass plate (glass substrate)
10 1st main surface 11 Edge area 12 Central area 20 2nd main surface 30 1st end surface 31 1st area 32 2nd area 40 2nd end surface 50 3rd end surface 51 3rd area 52 4th area 60 4th end surface 100 Transport Equipment 101 Rotating roller 102 Nozzle G Retained gas

Claims (13)

The first main surface and
The second main surface facing the first main surface and
It has an end surface that connects the first main surface and the second main surface.
The end face includes a first end face, a second end face facing the first end face, a third end face connecting one end of the first end face and one end of the second end face, and the other end of the first end face. wherein connecting the other end of the second end surface, and a fourth end face opposing the third end face, a glass plate Ru provided with,
The first surface roughness of the first main surface is smaller than the second surface roughness of the second main surface.
The first cullet peeling rate of the first end face is different from the cullet peeling rate of other end faces.
The first main surface includes an edge region occupying a predetermined width from any of the first, second, third, and fourth end faces to the center side of the glass plate, and a center occupying the center side of the edge region. With area,
The edge region is a glass plate having a region having a surface roughness larger than that of the central region. The glass plate according to claim 1, wherein the first cullet peeling rate of the first end face is larger than the second cullet peeling rate of the second end face. The first cullet peeling rate is larger than the third cullet peeling rate of the third end face.
The glass plate according to claim 1 or 2, wherein the first cullet peeling rate is larger than the fourth cullet peeling rate of the fourth end face. The second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are
The glass plate according to claim 3, wherein the second cullet peeling rate, the third cullet peeling rate, and the fourth cullet peeling rate are 0.5 times or more and 1.5 times or less the average value. The glass plate according to any one of claims 2 to 4, wherein the first cullet peeling rate is three times or more the second cullet peeling rate. The glass plate according to any one of claims 1 to 5, wherein the size of the cullet peeled from the first end surface is 10 μm or less in major axis. The glass plate according to any one of claims 1 to 6, wherein the surface roughness of the first end surface is larger than the surface roughness of the second end surface. The first end face is
A first region occupying the first main surface side and a second region occupying the second main surface side are provided.
The glass plate according to any one of claims 1 to 7, wherein the first cullet peeling rate is larger in the second region than in the first region. The glass plate according to claim 8, wherein the boundary between the first region and the second region has a corrugated shape. The third end face is
A third region on the first end face side and a fourth region on the second end face side are provided.
The glass plate according to any one of claims 1 to 9, wherein the third cullet peeling rate of the third end surface is larger in the third region than in the fourth region. The glass plate according to any one of claims 1 to 10, wherein the second main surface or the edge region has a region in which the skewness (Rsk) of the roughness curve is positive. The glass plate according to any one of claims 1 to 10, wherein the second main surface or the edge region has a region having a fluorine content of 0.35 atm% or more. The glass plate according to any one of claims 1 to 10 , wherein the edge region occupies a predetermined width from the first end surface to the center side of the glass plate.