JP6820657B2 - 固有の形態を有する立方晶窒化ホウ素粒子 - Google Patents
固有の形態を有する立方晶窒化ホウ素粒子 Download PDFInfo
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- JP6820657B2 JP6820657B2 JP2015535671A JP2015535671A JP6820657B2 JP 6820657 B2 JP6820657 B2 JP 6820657B2 JP 2015535671 A JP2015535671 A JP 2015535671A JP 2015535671 A JP2015535671 A JP 2015535671A JP 6820657 B2 JP6820657 B2 JP 6820657B2
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- cbn
- abrasive
- boron nitride
- cubic boron
- Prior art date
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- 239000002245 particle Substances 0.000 title claims description 151
- 229910052582 BN Inorganic materials 0.000 title claims description 24
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims description 24
- 238000000034 method Methods 0.000 claims description 32
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 25
- 239000008188 pellet Substances 0.000 claims description 25
- 239000000843 powder Substances 0.000 claims description 20
- 229910052782 aluminium Inorganic materials 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 7
- 238000002156 mixing Methods 0.000 claims description 7
- 230000004580 weight loss Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000004615 ingredient Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 description 25
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 22
- 239000000463 material Substances 0.000 description 22
- 238000000576 coating method Methods 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 16
- 239000003082 abrasive agent Substances 0.000 description 14
- 238000005498 polishing Methods 0.000 description 13
- 230000003746 surface roughness Effects 0.000 description 12
- 229910052759 nickel Inorganic materials 0.000 description 11
- 239000002253 acid Substances 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 238000000227 grinding Methods 0.000 description 8
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 6
- 230000001788 irregular Effects 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 241000282341 Mustela putorius furo Species 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- 239000004484 Briquette Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
- C01B21/0648—After-treatment, e.g. grinding, purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
- C01B21/0722—Preparation by direct nitridation of aluminium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
- C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Ceramic Products (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
本出願は、2012年10月3日に「固有の形態を有する立方晶窒化ホウ素粒子」という発明の名称で出願された仮出願第61/709,250号の優先権を主張する。
本発明の明細書と請求項では、次の用語を以下に示す定義に従って用いる。
表面粗さ=凸周囲長/周囲長
真球度=4πA/p2
本発明をいくつかの実施態様に関して説明してきたが、当業者には、開示した発明に関し、上に提示した詳細な説明と矛盾しない多くの代替例、改変、及びバリエーションが可能であることが明らかであろう。また、当業者には、開示したさまざまな実施態様のいくつかの特徴を、開示した他の任意の実施態様又はその代替例の特徴と組み合わせて利用して、この明細書には明示的に説明しなかったが、本発明が組み込まれ、かつ想定する用途又は性能条件にさらによく合致した追加の実施態様を生み出せることも明らかであろう。したがって本発明の精神に含まれるそのような代替例、改変、及びバリエーションはすべて、添付の請求項の範囲に包含されるものとする。
Claims (6)
- 固有の表面形態を有する研磨粒子の製造方法であって、
複数の研磨粒子を提供するステップ;
反応性金属粉末を前記研磨粒子と混合するステップ;
混合した成分を圧縮してペレットにするステップ;
前記ペレットを加熱するステップ;及び
改質された研磨粒子を回収するステップ、
を含み、前記反応性金属粉末がアルミニウムを含み、かつ前記研磨粒子が立方晶窒化ホウ素粒子である、方法。 - 前記立方晶窒化ホウ素粒子が単結晶CBN粒子である、請求項1に記載の方法。
- 前記反応性金属粉末がアルミニウムである、請求項1又は2に記載の方法。
- 前記加熱ステップが、金属で被覆された前記粒子を、少なくとも約1200℃に加熱することを含む、請求項1〜3のいずれか1項に記載の方法。
- 金属粉末と研磨粒子の比が1:10〜10:1である、請求項1〜4のいずれか1項に記載の方法。
- 前記改質された研磨粒子が、前記方法で処理されていない従来の研磨粒子と比べて、重量損失の約5%を超える平均重量損失を有する、請求項1〜5のいずれか1項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261709250P | 2012-10-03 | 2012-10-03 | |
US61/709,250 | 2012-10-03 | ||
PCT/US2013/060095 WO2014055230A1 (en) | 2012-10-03 | 2013-09-17 | Cubic boron nitride particles having a unique morphology |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020116404A Division JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015536891A JP2015536891A (ja) | 2015-12-24 |
JP6820657B2 true JP6820657B2 (ja) | 2021-01-27 |
Family
ID=49237722
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015535671A Active JP6820657B2 (ja) | 2012-10-03 | 2013-09-17 | 固有の形態を有する立方晶窒化ホウ素粒子 |
JP2020116404A Pending JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
JP2022010010A Pending JP2022068167A (ja) | 2012-10-03 | 2022-01-26 | 固有の形態を有する立方晶窒化ホウ素粒子 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020116404A Pending JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
JP2022010010A Pending JP2022068167A (ja) | 2012-10-03 | 2022-01-26 | 固有の形態を有する立方晶窒化ホウ素粒子 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20140090309A1 (ja) |
EP (1) | EP2904063B1 (ja) |
JP (3) | JP6820657B2 (ja) |
KR (1) | KR101845141B1 (ja) |
CN (1) | CN104704080B (ja) |
ES (1) | ES2918458T3 (ja) |
WO (1) | WO2014055230A1 (ja) |
ZA (1) | ZA201501908B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW202016012A (zh) * | 2018-09-17 | 2020-05-01 | 美商戴蒙創新公司 | 具有高蝕刻粒子表面及高韌性指數的立方氮化硼粒子群 |
WO2020175642A1 (ja) * | 2019-02-28 | 2020-09-03 | 住友電工ハードメタル株式会社 | 立方晶窒化硼素多結晶体及びその製造方法 |
CN110484206B (zh) * | 2019-08-23 | 2021-08-20 | 河南富莱格超硬材料有限公司 | 一种立方氮化硼磨料表面处理方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1513990A (en) * | 1976-12-07 | 1978-06-14 | Inst Fiz Tverdogo Tela I Polup | Boron nitride-based superhard material and process for the production of the same |
ZA781390B (en) * | 1978-03-09 | 1979-04-25 | De Beers Ind Diamond | The metal coating of abrasive particles |
US4389223A (en) * | 1981-02-09 | 1983-06-21 | General Electric Company | Surface characteristics of boron rich cubic boron nitride |
US4647546A (en) * | 1984-10-30 | 1987-03-03 | Megadiamond Industries, Inc. | Polycrystalline cubic boron nitride compact |
DE3625743A1 (de) * | 1986-07-30 | 1988-02-11 | Winter & Sohn Ernst | Verfahren zum bearbeiten von diamantkoernern |
JP2739139B2 (ja) * | 1989-03-06 | 1998-04-08 | 昭和電工株式会社 | 六角板状立方晶窒化ほう素及びその合成方法 |
US4951427A (en) * | 1989-05-30 | 1990-08-28 | General Electric Company | Refractory metal oxide coated abrasives and grinding wheels made therefrom |
HUT62831A (en) * | 1991-09-12 | 1993-06-28 | Gen Electric | Method for producing covered cubed leather-nitride abrasive grain, abrasive grain and grinding tool by using the same |
AU1170501A (en) * | 1999-11-19 | 2001-05-30 | De Beers Industrial Diamond Division (Proprietary) Limited | Cubic boron nitride clusters |
US7261752B2 (en) * | 2002-09-24 | 2007-08-28 | Chien-Min Sung | Molten braze-coated superabrasive particles and associated methods |
ZA200506207B (en) * | 2003-02-03 | 2006-10-25 | Showa Denko Kk | Cubic boron nitride, catalyst for synthesizing cubic boron nitride, and process for producing cubic boron nitride |
JP2006088243A (ja) * | 2004-09-22 | 2006-04-06 | Toyoda Mach Works Ltd | 砥粒及び砥石 |
MXPA06012366A (es) * | 2004-09-23 | 2007-01-31 | Element Six Pty Ltd | Materiales abrasivos policristalinos y metodos de fabricacion. |
US7562858B2 (en) * | 2005-03-16 | 2009-07-21 | Diamond Innovations, Inc. | Wear and texture coatings for components used in manufacturing glass light bulbs |
WO2007049140A2 (en) * | 2005-10-28 | 2007-05-03 | Element Six (Production) (Pty) Ltd | Cubic boron nitride compact |
CN101578131A (zh) * | 2006-12-13 | 2009-11-11 | 戴蒙得创新股份有限公司 | 具有提高的机械加工性的研磨压实体 |
KR20110074532A (ko) * | 2008-09-16 | 2011-06-30 | 다이아몬드 이노베이션즈, 인크. | 독특한 특징부를 가지는 연마 입자 |
US8652226B2 (en) * | 2008-09-16 | 2014-02-18 | Diamond Innovations, Inc. | Abrasive particles having a unique morphology |
TWI587982B (zh) * | 2008-09-16 | 2017-06-21 | 戴蒙創新公司 | 具有獨特形態的硏磨劑粒子及其產生方法 |
-
2013
- 2013-09-17 JP JP2015535671A patent/JP6820657B2/ja active Active
- 2013-09-17 WO PCT/US2013/060095 patent/WO2014055230A1/en active Application Filing
- 2013-09-17 KR KR1020157008580A patent/KR101845141B1/ko active IP Right Grant
- 2013-09-17 CN CN201380052054.6A patent/CN104704080B/zh active Active
- 2013-09-17 ES ES13766871T patent/ES2918458T3/es active Active
- 2013-09-17 EP EP13766871.1A patent/EP2904063B1/en active Active
- 2013-09-17 US US14/028,965 patent/US20140090309A1/en not_active Abandoned
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2015
- 2015-03-19 ZA ZA2015/01908A patent/ZA201501908B/en unknown
-
2020
- 2020-07-06 JP JP2020116404A patent/JP2020183342A/ja active Pending
-
2022
- 2022-01-26 JP JP2022010010A patent/JP2022068167A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CN104704080A (zh) | 2015-06-10 |
EP2904063A1 (en) | 2015-08-12 |
US20140090309A1 (en) | 2014-04-03 |
ES2918458T3 (es) | 2022-07-15 |
ZA201501908B (en) | 2020-02-26 |
JP2020183342A (ja) | 2020-11-12 |
JP2022068167A (ja) | 2022-05-09 |
CN104704080B (zh) | 2017-04-26 |
KR20150059755A (ko) | 2015-06-02 |
KR101845141B1 (ko) | 2018-04-03 |
EP2904063B1 (en) | 2022-06-01 |
WO2014055230A1 (en) | 2014-04-10 |
JP2015536891A (ja) | 2015-12-24 |
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