JP2015536891A - 固有の形態を有する立方晶窒化ホウ素粒子 - Google Patents
固有の形態を有する立方晶窒化ホウ素粒子 Download PDFInfo
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- 239000002245 particle Substances 0.000 title claims abstract description 188
- 229910052582 BN Inorganic materials 0.000 title claims abstract description 29
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 39
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 239000008188 pellet Substances 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 18
- 230000003746 surface roughness Effects 0.000 claims abstract description 15
- 238000002156 mixing Methods 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 230000001788 irregular Effects 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims abstract description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 24
- 238000000576 coating method Methods 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 20
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- 239000013078 crystal Substances 0.000 claims description 7
- 230000004580 weight loss Effects 0.000 claims description 7
- 238000009826 distribution Methods 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 26
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 23
- 239000000463 material Substances 0.000 description 20
- 239000003082 abrasive agent Substances 0.000 description 13
- 229910052759 nickel Inorganic materials 0.000 description 11
- 239000011347 resin Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 238000000227 grinding Methods 0.000 description 9
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- 239000000126 substance Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 230000014759 maintenance of location Effects 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 241000282341 Mustela putorius furo Species 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
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- 239000007789 gas Substances 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- 239000004484 Briquette Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000029087 digestion Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
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- 238000009713 electroplating Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
- 238000010671 solid-state reaction Methods 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
- C01B21/0648—After-treatment, e.g. grinding, purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
- C01B21/0722—Preparation by direct nitridation of aluminium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
- C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Ceramic Products (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
本出願は、2012年10月3日に「固有の形態を有する立方晶窒化ホウ素粒子」という発明の名称で出願された仮出願第61/709,250号の優先権を主張する。
本発明の明細書と請求項では、次の用語を以下に示す定義に従って用いる。
表面粗さ=凸周囲長/周囲長
真球度=4πA/p2
本発明をいくつかの実施態様に関して説明してきたが、当業者には、開示した発明に関し、上に提示した詳細な説明と矛盾しない多くの代替例、改変、及びバリエーションが可能であることが明らかであろう。また、当業者には、開示したさまざまな実施態様のいくつかの特徴を、開示した他の任意の実施態様又はその代替例の特徴と組み合わせて利用して、この明細書には明示的に説明しなかったが、本発明が組み込まれ、かつ想定する用途又は性能条件にさらによく合致した追加の実施態様を生み出せることも明らかであろう。したがって本発明の精神に含まれるそのような代替例、改変、及びバリエーションはすべて、添付の請求項の範囲に包含されるものとする。
Claims (20)
- 不規則な表面を有する立方晶窒化ホウ素粒子であって、前記粒子の表面粗さが約0.95未満である粒子。
- 前記粒子の表面粗さが約0.50〜約0.80である、請求項1に記載の粒子。
- 前記粒子の真球度が約0.70未満である、請求項1又は2に記載の粒子。
- 前記粒子の表面積が、同じ粒径分布を有する従来の立方晶窒化ホウ素粒子よりも約20%大きい、請求項1〜3のいずれか1項に記載の粒子。
- 前記粒子のサイズが約0.1〜約500μmである、請求項1〜4のいずれか1項に記載の粒子。
- 前記粒子が1つ以上のスパイクを有する、請求項1〜5のいずれか1項に記載の粒子。
- 前記粒子が1つ以上のピットを備える、請求項1〜6のいずれか1項に記載の粒子。
- 前記ピットの深さが、前記粒子の最大長の約5%〜約70%の範囲である、請求項7に記載の粒子。
- 前記ピットの深さが、前記粒子の最大長の約40%〜約60%の範囲である、請求項8に記載の粒子。
- 前記粒子が金属被覆を有する、請求項1〜9のいずれか1項に記載の粒子。
- 真球度が約0.70未満である立方晶窒化ホウ素粒子。
- 前記粒子の真球度が約0.2〜約0.5である、請求項11に記載の粒子。
- 前記粒子の真球度が約0.25〜約0.4である、請求項11に記載の粒子。
- 下記のステップを含む、固有の表面形態を有する研磨粒子の製造方法:
複数の研磨粒子を提供するステップ;
反応性金属粉末を前記研磨粒子と混合するステップ;
混合した成分を圧縮してペレットにするステップ;
前記ペレットを加熱するステップ;及び
改質された研磨粒子を回収するステップ。 - 前記研磨粒子が立方晶窒化ホウ素粒子である、請求項14に記載の方法。
- 前記立方晶窒化ホウ素粒子が単結晶CBN粒子である、請求項15に記載の方法。
- 前記反応性金属粉末がアルミニウムである、請求項14〜16のいずれか1項に記載の方法。
- 前記加熱ステップが、金属で被覆された前記粒子を、少なくとも約1200℃に加熱することを含む、請求項14〜17のいずれか1項に記載の方法。
- 金属粉末と研磨粒子の比が1:10〜10:1である、請求項14〜18のいずれか1項に記載の方法。
- 前記改質された研磨粒子が、前記方法で処理されていない従来の研磨粒子と比べて、重量損失の約5%を超える平均重量損失を有する、請求項14〜19のいずれか1項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261709250P | 2012-10-03 | 2012-10-03 | |
US61/709,250 | 2012-10-03 | ||
PCT/US2013/060095 WO2014055230A1 (en) | 2012-10-03 | 2013-09-17 | Cubic boron nitride particles having a unique morphology |
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JP2020116404A Division JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
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JP2015536891A true JP2015536891A (ja) | 2015-12-24 |
JP6820657B2 JP6820657B2 (ja) | 2021-01-27 |
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JP2020116404A Pending JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
JP2022010010A Pending JP2022068167A (ja) | 2012-10-03 | 2022-01-26 | 固有の形態を有する立方晶窒化ホウ素粒子 |
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JP2022010010A Pending JP2022068167A (ja) | 2012-10-03 | 2022-01-26 | 固有の形態を有する立方晶窒化ホウ素粒子 |
Country Status (8)
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US (1) | US20140090309A1 (ja) |
EP (1) | EP2904063B1 (ja) |
JP (3) | JP6820657B2 (ja) |
KR (1) | KR101845141B1 (ja) |
CN (1) | CN104704080B (ja) |
ES (1) | ES2918458T3 (ja) |
WO (1) | WO2014055230A1 (ja) |
ZA (1) | ZA201501908B (ja) |
Cited By (1)
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JP2022502329A (ja) * | 2018-09-17 | 2022-01-11 | ダイヤモンド イノヴェーションズ インコーポレイテッド | 高度にエッチングされた粒子表面及び高い靭性指数を有する立方晶窒化ホウ素粒子集団 |
Families Citing this family (2)
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US11208324B2 (en) * | 2019-02-28 | 2021-12-28 | Sumitomo Electric Hardmetal Corp. | Polycrystalline cubic boron nitride and method for manufacturing the same |
CN110484206B (zh) * | 2019-08-23 | 2021-08-20 | 河南富莱格超硬材料有限公司 | 一种立方氮化硼磨料表面处理方法 |
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2013
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- 2013-09-17 KR KR1020157008580A patent/KR101845141B1/ko active IP Right Grant
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- 2013-09-17 US US14/028,965 patent/US20140090309A1/en not_active Abandoned
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Cited By (2)
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JP2022502329A (ja) * | 2018-09-17 | 2022-01-11 | ダイヤモンド イノヴェーションズ インコーポレイテッド | 高度にエッチングされた粒子表面及び高い靭性指数を有する立方晶窒化ホウ素粒子集団 |
JP7526722B2 (ja) | 2018-09-17 | 2024-08-01 | ダイヤモンド イノヴェーションズ インコーポレイテッド | 高度にエッチングされた粒子表面及び高い靭性指数を有する立方晶窒化ホウ素粒子集団 |
Also Published As
Publication number | Publication date |
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ZA201501908B (en) | 2020-02-26 |
EP2904063B1 (en) | 2022-06-01 |
WO2014055230A1 (en) | 2014-04-10 |
KR20150059755A (ko) | 2015-06-02 |
JP2020183342A (ja) | 2020-11-12 |
US20140090309A1 (en) | 2014-04-03 |
CN104704080A (zh) | 2015-06-10 |
JP2022068167A (ja) | 2022-05-09 |
JP6820657B2 (ja) | 2021-01-27 |
ES2918458T3 (es) | 2022-07-15 |
CN104704080B (zh) | 2017-04-26 |
EP2904063A1 (en) | 2015-08-12 |
KR101845141B1 (ko) | 2018-04-03 |
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