JP6796491B2 - Cvd又はpvdコーティング装置にプロセスガス混合物を供給するための装置及び方法 - Google Patents
Cvd又はpvdコーティング装置にプロセスガス混合物を供給するための装置及び方法 Download PDFInfo
- Publication number
- JP6796491B2 JP6796491B2 JP2016565413A JP2016565413A JP6796491B2 JP 6796491 B2 JP6796491 B2 JP 6796491B2 JP 2016565413 A JP2016565413 A JP 2016565413A JP 2016565413 A JP2016565413 A JP 2016565413A JP 6796491 B2 JP6796491 B2 JP 6796491B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- mixing chamber
- flow
- mixing
- cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 50
- 239000011248 coating agent Substances 0.000 title claims description 5
- 238000000576 coating method Methods 0.000 title claims description 5
- 239000000203 mixture Substances 0.000 title description 4
- 239000007789 gas Substances 0.000 claims description 368
- 238000002156 mixing Methods 0.000 claims description 180
- 230000004888 barrier function Effects 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 3
- 239000003085 diluting agent Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000010943 off-gassing Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000006200 vaporizer Substances 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000003034 coal gas Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000003260 vortexing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45512—Premixing before introduction in the reaction chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/421—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path
- B01F25/423—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path by means of elements placed in the receptacle for moving or guiding the components
- B01F25/4231—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path by means of elements placed in the receptacle for moving or guiding the components using baffles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
- B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
- B01F25/431—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor
- B01F25/4314—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor with helical baffles
- B01F25/43141—Straight mixing tubes with baffles or obstructions that do not cause substantial pressure drop; Baffles therefor with helical baffles composed of consecutive sections of helical formed elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/50—Mixing receptacles
- B01F35/52—Receptacles with two or more compartments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/712—Feed mechanisms for feeding fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/716—Feed mechanisms characterised by the relative arrangement of the containers for feeding or mixing the components
- B01F35/7163—Feed mechanisms characterised by the relative arrangement of the containers for feeding or mixing the components the containers being connected in a mouth-to-mouth, end-to-end disposition, i.e. the openings are juxtaposed before contacting the contents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014106523.9 | 2014-05-09 | ||
DE102014106523.9A DE102014106523A1 (de) | 2014-05-09 | 2014-05-09 | Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch |
PCT/EP2015/060017 WO2015169882A1 (de) | 2014-05-09 | 2015-05-07 | Vorrichtung und verfahren zum versorgen einer cvd- oder pvd-beschichtungseinrichtung mit einem prozessgasgemisch |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017522447A JP2017522447A (ja) | 2017-08-10 |
JP2017522447A5 JP2017522447A5 (de) | 2018-06-14 |
JP6796491B2 true JP6796491B2 (ja) | 2020-12-09 |
Family
ID=53199950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016565413A Active JP6796491B2 (ja) | 2014-05-09 | 2015-05-07 | Cvd又はpvdコーティング装置にプロセスガス混合物を供給するための装置及び方法 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6796491B2 (de) |
KR (1) | KR102413577B1 (de) |
CN (1) | CN106457168A (de) |
DE (1) | DE102014106523A1 (de) |
TW (1) | TWI694168B (de) |
WO (1) | WO2015169882A1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020020532A (ja) * | 2018-08-01 | 2020-02-06 | 三菱電機株式会社 | 温度均一化装置、構造物およびパラボラアンテナ装置 |
CN110237734A (zh) * | 2019-06-10 | 2019-09-17 | 中国石油大学(北京) | 气体混合器及废气处理装置 |
US11772058B2 (en) * | 2019-10-18 | 2023-10-03 | Taiwan Semiconductor Manufacturing Company Limited | Gas mixing system for semiconductor fabrication |
DE102019129176A1 (de) | 2019-10-29 | 2021-04-29 | Apeva Se | Verfahren und Vorrichtung zum Abscheiden organischer Schichten |
CN110773061B (zh) * | 2019-11-05 | 2021-09-21 | 浙江工业职业技术学院 | 一种搅拌装置 |
CN110917914B (zh) * | 2019-12-19 | 2022-09-16 | 北京北方华创微电子装备有限公司 | 气体混合装置及半导体加工设备 |
DE102020112568A1 (de) | 2020-02-14 | 2021-08-19 | AIXTRON Ltd. | Gaseinlassorgan für einen CVD-Reaktor |
CN111744340A (zh) * | 2020-07-02 | 2020-10-09 | 天津市英格环保科技有限公司 | 一种在低温环境下脱硫脱硝的方法 |
CN111804453B (zh) * | 2020-07-21 | 2021-10-12 | 宁波诺歌休闲用品有限公司 | 一种用于铝合金型材的表面喷涂机中的喷涂机构 |
CN112973483A (zh) * | 2021-03-29 | 2021-06-18 | 深圳市科曼医疗设备有限公司 | 一种气体混合装置 |
CN113430502B (zh) * | 2021-06-18 | 2022-07-22 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其混合进气装置 |
CN113813858B (zh) * | 2021-11-10 | 2023-01-31 | 西安国际医学中心有限公司 | 一种治疗癌症疼痛膏药制作的混料装置 |
CN114768578B (zh) * | 2022-05-20 | 2023-08-18 | 北京北方华创微电子装备有限公司 | 混气装置及半导体工艺设备 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4408893A (en) * | 1982-04-28 | 1983-10-11 | Luwa A.G. | Motionless mixing device |
JPS5949829A (ja) * | 1982-09-14 | 1984-03-22 | Matsushita Electric Ind Co Ltd | 流体混合器およびこれを用いた薄膜装置 |
US4850705A (en) * | 1987-11-18 | 1989-07-25 | Horner Terry A | Motionless mixers and baffles |
JP3609329B2 (ja) * | 1992-09-07 | 2005-01-12 | 三菱電機株式会社 | 窒化膜形成方法 |
CN1171485A (zh) | 1996-03-18 | 1998-01-28 | 郑宜智 | 内燃机用气流旋涡装置及其制造方法 |
JP3360539B2 (ja) * | 1996-07-12 | 2002-12-24 | 信越半導体株式会社 | ガス供給装置及び気相成長用設備 |
US6068703A (en) * | 1997-07-11 | 2000-05-30 | Applied Materials, Inc. | Gas mixing apparatus and method |
JPH11293465A (ja) * | 1998-04-15 | 1999-10-26 | Ebara Corp | Cvd装置 |
US6495233B1 (en) * | 1999-07-09 | 2002-12-17 | Applied Materials, Inc. | Apparatus for distributing gases in a chemical vapor deposition system |
JP4778655B2 (ja) | 2000-02-04 | 2011-09-21 | アイクストロン、アーゲー | 1つまたは多くの被膜を基板に沈積する方法および装置 |
US20030019428A1 (en) | 2001-04-28 | 2003-01-30 | Applied Materials, Inc. | Chemical vapor deposition chamber |
US6601986B2 (en) * | 2001-08-29 | 2003-08-05 | Taiwan Semiconductor Manufacturing Co., Ltd | Fluid mixing apparatus |
JP2003142473A (ja) * | 2001-10-31 | 2003-05-16 | Tokyo Electron Ltd | ガス供給装置及びガス供給方法、及び成膜装置及び成膜方法 |
TWI253479B (en) * | 2001-12-03 | 2006-04-21 | Ulvac Inc | Mixer, and device and method for manufacturing thin-film |
US6758591B1 (en) * | 2002-03-22 | 2004-07-06 | Novellus Systems, Inc. | Mixing of materials in an integrated circuit manufacturing equipment |
WO2004073850A1 (en) | 2003-02-14 | 2004-09-02 | Tokyo Electron Limited | Gas feeding apparatus |
CN102154628B (zh) * | 2004-08-02 | 2014-05-07 | 维高仪器股份有限公司 | 用于化学气相沉积反应器的多气体分配喷射器 |
DE102005003984A1 (de) * | 2005-01-28 | 2006-08-03 | Aixtron Ag | Gaseinlassorgan für einen CVD-Reaktor |
GB0603917D0 (en) * | 2006-02-28 | 2006-04-05 | Stein Peter | Gas retention vessel |
CN201086001Y (zh) * | 2007-08-22 | 2008-07-16 | 张国栋 | 静态混合器及其螺旋式混合元件 |
US8334015B2 (en) * | 2007-09-05 | 2012-12-18 | Intermolecular, Inc. | Vapor based combinatorial processing |
US20090120364A1 (en) | 2007-11-09 | 2009-05-14 | Applied Materials, Inc. | Gas mixing swirl insert assembly |
CN101371975B (zh) * | 2008-09-26 | 2010-06-09 | 沈阳化工学院 | 多流道螺旋静态混合器 |
SG183536A1 (en) | 2010-03-12 | 2012-09-27 | Applied Materials Inc | Atomic layer deposition chamber with multi inject |
CN202052481U (zh) * | 2010-04-30 | 2011-11-30 | 中国人民解放军总装备部后勤部防疫大队 | 肼类推进剂标准气体发生装置 |
JP2012030207A (ja) * | 2010-08-03 | 2012-02-16 | Soken Kogyo Kk | 流体混合器、流体混合輸送路および流体混合方法 |
KR101829669B1 (ko) * | 2011-01-04 | 2018-02-19 | 주식회사 원익아이피에스 | 박막 증착 방법 및 박막 증착 장치 |
US8485230B2 (en) * | 2011-09-08 | 2013-07-16 | Laor Consulting Llc | Gas delivery system |
US10232324B2 (en) * | 2012-07-12 | 2019-03-19 | Applied Materials, Inc. | Gas mixing apparatus |
CN102974257B (zh) * | 2012-12-03 | 2014-09-17 | 山西新华化工有限责任公司 | 动活性检测混合器 |
DE102013113817A1 (de) | 2012-12-14 | 2014-06-18 | Aixtron Se | Gasmischvorrichtung |
CN203484064U (zh) * | 2013-08-14 | 2014-03-19 | 新密港华燃气有限公司 | 四种气体均匀混合装置 |
-
2014
- 2014-05-09 DE DE102014106523.9A patent/DE102014106523A1/de active Pending
-
2015
- 2015-05-07 JP JP2016565413A patent/JP6796491B2/ja active Active
- 2015-05-07 CN CN201580027176.9A patent/CN106457168A/zh active Pending
- 2015-05-07 WO PCT/EP2015/060017 patent/WO2015169882A1/de active Application Filing
- 2015-05-07 KR KR1020167034147A patent/KR102413577B1/ko active IP Right Grant
- 2015-05-08 TW TW104114708A patent/TWI694168B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2017522447A (ja) | 2017-08-10 |
WO2015169882A1 (de) | 2015-11-12 |
CN106457168A (zh) | 2017-02-22 |
DE102014106523A1 (de) | 2015-11-12 |
TWI694168B (zh) | 2020-05-21 |
TW201602398A (zh) | 2016-01-16 |
KR20170003965A (ko) | 2017-01-10 |
KR102413577B1 (ko) | 2022-06-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6796491B2 (ja) | Cvd又はpvdコーティング装置にプロセスガス混合物を供給するための装置及び方法 | |
CN109594061B (zh) | 用于半导体处理的气体分配喷头 | |
JP6196215B2 (ja) | 気体と液体用分配トレイ、このトレイを装備した反応器、及びこのトレイの利用 | |
JP5932017B2 (ja) | 1つ又は複数の流体を接触させるためのプロセス及びそれに関連する反応器 | |
JP5595275B2 (ja) | 改良されたガスバーナ | |
JP3645581B2 (ja) | ガスの乱流混合装置およびガスの乱流混合方法 | |
JP2017522447A5 (de) | ||
US9123758B2 (en) | Gas injection apparatus and substrate process chamber incorporating same | |
US9861947B2 (en) | Reactor inlet vapor velocity equalizer and distributor | |
JP2013148345A (ja) | タービン・システムのマイクロミキサ | |
US1656907A (en) | Gas burner | |
TW201433355A (zh) | 氣體混合裝置 | |
WO2013146680A1 (ja) | 気化装置 | |
JP2008043946A (ja) | ガス供給装置用シャワーヘッド | |
US20190022609A1 (en) | Mixer structure, fluid passage device, and processing device | |
CN108699689B (zh) | 用于在涂层设备中制备过程气体的装置 | |
JP6039582B2 (ja) | バーナ、および該バーナを備える炉 | |
US20180154326A1 (en) | Equalizing vapor velocity for reactor inlet | |
CN112105759B (zh) | 用于cvd腔室的气体箱 | |
US20170157584A1 (en) | Inlet distributor for spherical reactor | |
US20160145099A1 (en) | Method and device for introducing reactive gasses into a reaction chamber | |
US20150284845A1 (en) | Film-forming apparatus | |
WO2018070463A1 (ja) | 流体分散装置及び熱処理装置 | |
WO2020027702A3 (en) | Apparatus and method for plasma-chemical hydrocracking, and plant with such apparatus | |
US917728A (en) | Gas-burner. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180427 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180427 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20190115 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190129 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190314 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20190702 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191009 |
|
C60 | Trial request (containing other claim documents, opposition documents) |
Free format text: JAPANESE INTERMEDIATE CODE: C60 Effective date: 20191009 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20191017 |
|
C21 | Notice of transfer of a case for reconsideration by examiners before appeal proceedings |
Free format text: JAPANESE INTERMEDIATE CODE: C21 Effective date: 20191018 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20191220 |
|
C211 | Notice of termination of reconsideration by examiners before appeal proceedings |
Free format text: JAPANESE INTERMEDIATE CODE: C211 Effective date: 20191224 |
|
C22 | Notice of designation (change) of administrative judge |
Free format text: JAPANESE INTERMEDIATE CODE: C22 Effective date: 20200624 |
|
C22 | Notice of designation (change) of administrative judge |
Free format text: JAPANESE INTERMEDIATE CODE: C22 Effective date: 20200722 |
|
C23 | Notice of termination of proceedings |
Free format text: JAPANESE INTERMEDIATE CODE: C23 Effective date: 20200930 |
|
C03 | Trial/appeal decision taken |
Free format text: JAPANESE INTERMEDIATE CODE: C03 Effective date: 20201028 |
|
C30A | Notification sent |
Free format text: JAPANESE INTERMEDIATE CODE: C3012 Effective date: 20201028 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20201116 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6796491 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |