JP6795143B2 - 原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法 - Google Patents
原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法 Download PDFInfo
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- JP6795143B2 JP6795143B2 JP2018113882A JP2018113882A JP6795143B2 JP 6795143 B2 JP6795143 B2 JP 6795143B2 JP 2018113882 A JP2018113882 A JP 2018113882A JP 2018113882 A JP2018113882 A JP 2018113882A JP 6795143 B2 JP6795143 B2 JP 6795143B2
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- lorentz force
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- 239000002994 raw material Substances 0.000 title claims description 190
- 238000004519 manufacturing process Methods 0.000 title claims description 114
- 238000006243 chemical reaction Methods 0.000 claims description 194
- 239000007789 gas Substances 0.000 claims description 103
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 78
- 229910012375 magnesium hydride Inorganic materials 0.000 claims description 60
- 150000002500 ions Chemical class 0.000 claims description 45
- 229910052749 magnesium Inorganic materials 0.000 claims description 32
- 239000011777 magnesium Substances 0.000 claims description 32
- 150000001768 cations Chemical class 0.000 claims description 23
- -1 magnesium halide Chemical class 0.000 claims description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- 239000003989 dielectric material Substances 0.000 claims description 12
- 238000001556 precipitation Methods 0.000 claims description 11
- 239000000047 product Substances 0.000 description 149
- 210000002381 plasma Anatomy 0.000 description 128
- 229910052739 hydrogen Inorganic materials 0.000 description 103
- 239000001257 hydrogen Substances 0.000 description 102
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 89
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 41
- 238000003860 storage Methods 0.000 description 24
- 238000010438 heat treatment Methods 0.000 description 20
- 238000011084 recovery Methods 0.000 description 18
- 150000001450 anions Chemical class 0.000 description 16
- 238000006722 reduction reaction Methods 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 10
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 10
- 229910001425 magnesium ion Inorganic materials 0.000 description 10
- 125000004430 oxygen atom Chemical group O* 0.000 description 10
- 238000005192 partition Methods 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 238000001816 cooling Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 125000004429 atom Chemical group 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 230000009467 reduction Effects 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 230000020169 heat generation Effects 0.000 description 5
- 150000002680 magnesium Chemical class 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 230000006837 decompression Effects 0.000 description 4
- 101100023111 Schizosaccharomyces pombe (strain 972 / ATCC 24843) mfc1 gene Proteins 0.000 description 3
- 230000002238 attenuated effect Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000005187 foaming Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009529 body temperature measurement Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 210000003811 finger Anatomy 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 210000003813 thumb Anatomy 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/04—Hydrides of alkali metals, alkaline earth metals, beryllium or magnesium; Addition complexes thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018113882A JP6795143B2 (ja) | 2018-06-14 | 2018-06-14 | 原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法 |
| PCT/JP2019/019061 WO2019239765A1 (fr) | 2018-06-14 | 2019-05-14 | Dispositif et procédé de fabrication pour le traitement de matière première à l'aide d'un plasma à ondes de surface à micro-ondes et obtention d'un produit différent de la matière première |
| JP2020180785A JP6963848B2 (ja) | 2018-06-14 | 2020-10-28 | 原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018113882A JP6795143B2 (ja) | 2018-06-14 | 2018-06-14 | 原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020180785A Division JP6963848B2 (ja) | 2018-06-14 | 2020-10-28 | 原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019214033A JP2019214033A (ja) | 2019-12-19 |
| JP2019214033A5 JP2019214033A5 (fr) | 2020-09-10 |
| JP6795143B2 true JP6795143B2 (ja) | 2020-12-02 |
Family
ID=68842160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018113882A Active JP6795143B2 (ja) | 2018-06-14 | 2018-06-14 | 原料をマイクロ波表面波プラズマで処理して原料と異なる生成物を得る製造装置及び製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6795143B2 (fr) |
| WO (1) | WO2019239765A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11894724B2 (en) | 2020-10-29 | 2024-02-06 | Generac Power Systems, Inc. | Alternator with rotor lamination stack |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57133636A (en) * | 1981-02-13 | 1982-08-18 | Nippon Telegr & Teleph Corp <Ntt> | Film forming device utilizing plasma at low temperature |
| JPH0635323B2 (ja) * | 1982-06-25 | 1994-05-11 | 株式会社日立製作所 | 表面処理方法 |
| JPH0652716B2 (ja) * | 1984-08-24 | 1994-07-06 | 日本電信電話株式会社 | 半導体結晶性膜製造装置 |
| JPH01225041A (ja) * | 1988-03-03 | 1989-09-07 | Mitsubishi Electric Corp | イオン源装置 |
| US5133826A (en) * | 1989-03-09 | 1992-07-28 | Applied Microwave Plasma Concepts, Inc. | Electron cyclotron resonance plasma source |
| JPH02263799A (ja) * | 1989-04-03 | 1990-10-26 | Sumitomo Metal Ind Ltd | 基板加熱装置及びその操業方法 |
| JP2008071528A (ja) * | 2006-09-12 | 2008-03-27 | Seiko Epson Corp | プラズマ処理装置 |
-
2018
- 2018-06-14 JP JP2018113882A patent/JP6795143B2/ja active Active
-
2019
- 2019-05-14 WO PCT/JP2019/019061 patent/WO2019239765A1/fr active Application Filing
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11894724B2 (en) | 2020-10-29 | 2024-02-06 | Generac Power Systems, Inc. | Alternator with rotor lamination stack |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019239765A1 (fr) | 2019-12-19 |
| JP2019214033A (ja) | 2019-12-19 |
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