JP6790529B2 - 発光デバイス - Google Patents
発光デバイス Download PDFInfo
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- JP6790529B2 JP6790529B2 JP2016137341A JP2016137341A JP6790529B2 JP 6790529 B2 JP6790529 B2 JP 6790529B2 JP 2016137341 A JP2016137341 A JP 2016137341A JP 2016137341 A JP2016137341 A JP 2016137341A JP 6790529 B2 JP6790529 B2 JP 6790529B2
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- light emitting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2214—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0262—Photo-diodes, e.g. transceiver devices, bidirectional devices
- H01S5/0264—Photo-diodes, e.g. transceiver devices, bidirectional devices for monitoring the laser-output
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
- H01S5/18313—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation by oxidizing at least one of the DBR layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18322—Position of the structure
- H01S5/18327—Structure being part of a DBR
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/1835—Non-circular mesa
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0282—Passivation layers or treatments
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
- H01S5/04257—Electrodes, e.g. characterised by the structure characterised by the configuration having positive and negative electrodes on the same side of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
- H01S5/2063—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion obtained by particle bombardment
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
- Light Receiving Elements (AREA)
Description
また、第1のメサ構造体の面積と第2のメサ構造体の面積とが同じ場合と比較し、光量の検出精度が向上する、という効果を奏する。
図1を参照して、本実施の形態に係る発光デバイス10の構成の一例について説明する。本実施の形態では、本発明に係る発光デバイスを面発光型半導体レーザ(VCSEL:Vertical Cavity Surface Emitting Laser)に適用した形態を例示して説明する。図1(a)は本実施の形態に係る発光デバイス10の断面図であり、図1(b)は発光デバイス10の平面図である。図1(a)に示す断面図は、図1(b)に示す平面図においてA−A’で切断した断面図である。
以下では、メサM1とメサM2とから構成される全体の構造を「メサM」という。
p側電極配線36の他端側はメサMの側面から基板12の表面まで延伸され、p側電極パッド42−1を構成している。p側電極配線36は、例えば、Ti(チタン)/Au(金)の積層膜を着膜して形成される。なお、以下ではp側電極パッド42−1及びp側電極パッド42−2(図1(b)参照)を総称する場合は、「p側電極パッド42」という。
発光デバイス10ではp側電極がアノード電極を構成している。
図7を参照して、本実施の形態に係る発光デバイス10aについて説明する。発光デバイス10aは、電流阻止領域60を電流阻止領域60aに変更し、結合部40を結合部40aに変更し、半導体層のくびれをなくした形態である。従って、電流阻止領域、結合部以外の構成は上記実施の形態の発光デバイス10と同様なので、同様の構成には同じ符号を付し、詳細な説明を省略する。
図8及び図9を参照して、本実施の形態に係る発光デバイス10bないし発光デバイス10eについて説明する。本実施の形態は、上記各実施の形態において、メサMの形状、及び結合部の形状を変えた形態である。
なお、発光デバイス10b、10cでは各々くびれ部を有する結合部40b、40cを備えているので、各々電流阻止領域60b、60cのみを有する形態であってもよいし、むろん上記凹部を併用する形態であってもよい。
12 基板
14 コンタクト層
16 下部DBR
18 境界
24 活性領域
26 上部DBR
28 コンタクト層
30 n側電極配線
32 酸化狭窄層
32a 非酸化領域
32b 酸化領域
34 層間絶縁膜
36 p側電極配線
38 出射面保護層
40、40a〜40e 結合部
42、42−1、42−2 p側電極パッド
44、44−1、44−2 n側電極パッド
50 発光部
52 受光部
54 APC制御部
60、60a〜60e 電流阻止領域
62 凹部
CMp、CMn コンタクトメタル
Ith 閾値電流
Lo 出射光
Lv 発振光
Lm 伝播光
M、M1、M2 メサ
MS1、MS2、MS3 メサ
Im モニタ電流
Iv 駆動電流
Po 光出力
Claims (4)
- 発光部を有する第1のメサ構造体と、
前記第1のメサ構造体と共通の半導体層で接続され、前記発光部から当該半導体層を介して横方向に伝播する光を受光する受光部を有する第2のメサ構造体と、
前記受光部に接続されると共に前記受光部が受光した光の光量を検出する検出部と、
前記第1のメサ構造体及び前記第2のメサ構造体に跨って設けられた、酸化領域と非酸化領域とを含む酸化狭窄層と、を備え、
発光面側から見た場合に、前記第1のメサ構造体の面積よりも前記第2のメサ構造体の面積の方が大きい
発光デバイス。 - 前記非酸化領域は、発光面側から見た場合に、前記第1のメサ構造体と前記第2のメサ構造体との接続部でくびれた形状である
請求項1に記載の発光デバイス。 - 前記第1のメサ構造体と前記第2のメサ構造体との間には、前記発光部の上面から前記発光部の活性層には至らない深さまでの凹部が形成されている
請求項1又は請求項2に記載の発光デバイス。 - 前記第1のメサ構造体と前記第2のメサ構造体との間には、電流の流れを阻止する電流阻止領域が形成されている
請求項1ないし請求項3のいずれか1項に記載の発光デバイス。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016137341A JP6790529B2 (ja) | 2016-07-12 | 2016-07-12 | 発光デバイス |
US15/496,641 US20180019574A1 (en) | 2016-07-12 | 2017-04-25 | Light emitting device |
CN201710433525.8A CN107611771A (zh) | 2016-07-12 | 2017-06-09 | 光发射器件 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016137341A JP6790529B2 (ja) | 2016-07-12 | 2016-07-12 | 発光デバイス |
Publications (2)
Publication Number | Publication Date |
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JP2018010913A JP2018010913A (ja) | 2018-01-18 |
JP6790529B2 true JP6790529B2 (ja) | 2020-11-25 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016137341A Active JP6790529B2 (ja) | 2016-07-12 | 2016-07-12 | 発光デバイス |
Country Status (3)
Country | Link |
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US (1) | US20180019574A1 (ja) |
JP (1) | JP6790529B2 (ja) |
CN (1) | CN107611771A (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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US9723762B1 (en) * | 2016-03-15 | 2017-08-01 | Amazon Technologies, Inc. | Free cooling in high humidity environments |
JP6926414B2 (ja) * | 2016-08-10 | 2021-08-25 | 富士フイルムビジネスイノベーション株式会社 | 発光素子アレイ、及び光伝送装置 |
JP7077500B2 (ja) * | 2017-01-12 | 2022-05-31 | ローム株式会社 | 面発光レーザ素子、光学装置 |
JP2019153706A (ja) * | 2018-03-05 | 2019-09-12 | 富士ゼロックス株式会社 | 面発光型半導体レーザ、および面発光型半導体レーザの製造方法 |
JP2020092256A (ja) * | 2018-11-27 | 2020-06-11 | 株式会社リコー | 光源、光源装置、光学装置、計測装置、ロボット、電子機器、移動体、および造形装置 |
JP7415329B2 (ja) * | 2019-04-18 | 2024-01-17 | 富士フイルムビジネスイノベーション株式会社 | 発光素子、および発光素子の製造方法 |
CN111244750B (zh) * | 2020-01-19 | 2021-12-21 | 全球能源互联网研究院有限公司 | 一种集成背光探测器的二极管及其制备方法 |
Family Cites Families (14)
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JPS6214465A (ja) * | 1985-07-12 | 1987-01-23 | Oki Electric Ind Co Ltd | モノリシツク光電子集積回路 |
JP3206080B2 (ja) * | 1992-03-05 | 2001-09-04 | セイコーエプソン株式会社 | 半導体レーザ |
JPH07123162B2 (ja) * | 1993-01-27 | 1995-12-25 | 日本電気株式会社 | プレーナ導波型光半導体素子およびその製造方法 |
US5345462A (en) * | 1993-03-29 | 1994-09-06 | At&T Bell Laboratories | Semiconductor surface emitting laser having enhanced polarization control and transverse mode selectivity |
US6001664A (en) * | 1996-02-01 | 1999-12-14 | Cielo Communications, Inc. | Method for making closely-spaced VCSEL and photodetector on a substrate |
US5757836A (en) * | 1996-07-01 | 1998-05-26 | Motorola, Inc. | Vertical cavity surface emitting laser with laterally integrated photodetector |
US5748661A (en) * | 1996-07-19 | 1998-05-05 | Motorola, Inc. | Integrated lateral detector and laser device and method of fabrication |
US6016326A (en) * | 1997-12-15 | 2000-01-18 | Motorola, Inc. | Method for biasing semiconductor lasers |
JP3652252B2 (ja) * | 2001-01-17 | 2005-05-25 | キヤノン株式会社 | 半導体光装置 |
JP2006165220A (ja) * | 2004-12-07 | 2006-06-22 | Seiko Epson Corp | 電気光学素子、電気光学素子の製造方法、光伝送モジュール |
JP5029079B2 (ja) * | 2007-03-15 | 2012-09-19 | 富士ゼロックス株式会社 | 半導体素子および光学装置 |
JP2008244101A (ja) * | 2007-03-27 | 2008-10-09 | Canon Inc | モニタリング方法およびモニタリング機能を有するvcselアレイ |
JP5645546B2 (ja) * | 2010-08-24 | 2014-12-24 | 国立大学法人東京工業大学 | 面発光型半導体レーザおよび光伝送装置 |
JP6240429B2 (ja) * | 2013-08-07 | 2017-11-29 | 国立大学法人東京工業大学 | 面発光型半導体レーザおよび光伝送装置 |
-
2016
- 2016-07-12 JP JP2016137341A patent/JP6790529B2/ja active Active
-
2017
- 2017-04-25 US US15/496,641 patent/US20180019574A1/en not_active Abandoned
- 2017-06-09 CN CN201710433525.8A patent/CN107611771A/zh active Pending
Also Published As
Publication number | Publication date |
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CN107611771A (zh) | 2018-01-19 |
US20180019574A1 (en) | 2018-01-18 |
JP2018010913A (ja) | 2018-01-18 |
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