JP6785888B2 - 微細噴霧用多孔性フィルタの製造方法およびこれを用いて製造された多孔性フィルタ - Google Patents
微細噴霧用多孔性フィルタの製造方法およびこれを用いて製造された多孔性フィルタ Download PDFInfo
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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- B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
- B05B17/0638—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced by discharging the liquid or other fluent material through a plate comprising a plurality of orifices
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Description
(a)パターンが形成された電気鋳造用陰極板を準備するステップ、
(b)前記ステップ(a)で準備された陰極板をニッケル20重量%〜80重量%およびパラジウム15重量%〜80重量%を含む多孔性フィルタメッキ液に浸漬させた後、電流を印加してメッキ膜を形成するステップ、および
(c)前記ステップ(b)で形成されたメッキ膜を前記陰極板から剥離するステップ。
また、本発明は、前記製造方法によって形成される多孔性フィルタを提供することを他の目的とする。
下記ステップを含む、多孔性フィルタの製造方法:
(a)パターンが形成された電気鋳造用陰極板を準備するステップ、
(b)前記ステップ(a)で準備された陰極板をニッケル20重量%〜80重量%およびパラジウム15重量%〜80重量%を含む多孔性フィルタメッキ液に浸漬させた後、電流を印加してメッキ膜を形成するステップ、および
(c)前記ステップ(b)で形成されたメッキ膜を前記陰極板から剥離するステップを提供する。
(a)パターンが形成された電気鋳造用陰極板を準備するステップ、
(b)前記ステップ(a)で準備された陰極板をニッケル20重量%〜80重量%およびパラジウム15重量%〜80重量%を含む多孔性フィルタメッキ液に浸漬させた後、電流を印加してメッキ膜を形成するステップ、および
(c)前記ステップ(b)で形成されたメッキ膜を前記陰極板から剥離するステップ。
〔実施例1.本発明に係る多孔性フィルタを製造するための最適条件の選定〕
本発明に係る最適の厚さおよび気孔大きさを有する多孔性フィルタを製造するための実験を下記のように行った。
そこで、前記方法に従ってメッキ液に含まれるパラジウムおよびニッケル重量比に応じた多孔性フィルタのビッカース硬度を確認する実験を行い、その結果を下記の表3に示す。
本発明に係る多孔性フィルタは、前述したように、金属成分の溶出を効果的に防ぐために、ニッケルおよびパラジウム合金をメッキに供したところ、これに対する金属成分の溶出防止効果を確認する生物学的安全性の評価実験を行い、前記生物学的安全性の評価実験は、国際標準であるISO 10993−5 Tests for in vitro cytotoxicityの実験方法のうちdirect diffusion法を適用して実施した。
Claims (15)
- 下記ステップを含む、多孔性フィルタの製造方法:
(a)パターンが形成された電気鋳造用陰極板を準備するステップ、
(b)前記ステップ(a)で準備された陰極板を、メッキ液に含まれるパラジウムおよびニッケルの比率がパラジウム59.6〜72.8重量%およびニッケル27.2〜40.4重量%である多孔性フィルタメッキ液に浸漬させた後、電流を印加してメッキ膜を形成するステップ、および
(c)前記ステップ(b)で形成されたメッキ膜を前記陰極板から剥離するステップ。 - 前記(b)ステップは、メッキ液温35℃〜65℃の条件で行われることを特徴とする、請求項1に記載の多孔性フィルタの製造方法。
- 前記(b)ステップは、メッキ時間0.5分〜65分の条件で行われることを特徴とする、請求項1に記載の多孔性フィルタの製造方法。
- 前記(b)ステップは、メッキ液温39℃〜48℃の条件で行われることを特徴とする、請求項2に記載の多孔性フィルタの製造方法。
- 前記(b)ステップは、メッキ時間40分〜65分の条件で行われることを特徴とする、請求項3に記載の多孔性フィルタの製造方法。
- 前記(b)ステップの多孔性フィルタメッキ液は、ジアミンパラジウムジクロリド(Pd(NH3)2Cl2)、およびスルファミン酸ニッケル4水和物(Ni(NH2SO3)24H2O)を含むことを特徴とする、請求項1に記載の多孔性フィルタの製造方法。
- 前記(b)ステップの多孔性フィルタメッキ液は、塩化ニッケル(NiCl2)をさらに含むことを特徴とする、請求項6に記載の多孔性フィルタの製造方法。
- 前記(b)ステップの多孔性フィルタメッキ液は、添加剤をさらに含むことができ、前記添加剤は、1次光沢剤1重量%〜20重量%を含むことを特徴とする、請求項1に記載の多孔性フィルタの製造方法。
- 前記(b)ステップの多孔性フィルタメッキ液は、添加剤をさらに含むことができ、前記添加剤は、2次光沢剤1重量%〜20重量%を含むことを特徴とする、請求項8に記載の多孔性フィルタの製造方法。
- 前記(b)ステップの多孔性フィルタメッキ液は、添加剤をさらに含むことができ、前記添加剤は、緩衝剤1重量%〜20重量%を含むことを特徴とする、請求項8に記載の多孔性フィルタの製造方法。
- 前記(b)ステップの多孔性フィルタメッキ液は、添加剤をさらに含むことができ、前記添加剤は、界面活性剤1重量%〜20重量%を含むことを特徴とする、請求項8に記載の多孔性フィルタの製造方法。
- 前記1次光沢剤はタンニン酸(C 76 H 52 O 46 )であることを特徴とする、請求項8に記載の多孔性フィルタの製造方法。
- 前記2次光沢剤は1,4−ブタンジオール(OH(CH2)4OH)であることを特徴とする、請求項9に記載の多孔性フィルタの製造方法。
- 前記緩衝剤はホウ酸(H3BO3)であることを特徴とする、請求項10に記載の多孔性フィルタの製造方法。
- 前記界面活性剤はラウリル硫酸ナトリウム(Sodium lauryl sulfate)であることを特徴とする、請求項11に記載の多孔性フィルタの製造方法。
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