JP6731279B2 - 有機半導体溶液塗布装置及び有機半導体溶液塗布方法 - Google Patents
有機半導体溶液塗布装置及び有機半導体溶液塗布方法 Download PDFInfo
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- JP6731279B2 JP6731279B2 JP2016090968A JP2016090968A JP6731279B2 JP 6731279 B2 JP6731279 B2 JP 6731279B2 JP 2016090968 A JP2016090968 A JP 2016090968A JP 2016090968 A JP2016090968 A JP 2016090968A JP 6731279 B2 JP6731279 B2 JP 6731279B2
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- 239000004065 semiconductor Substances 0.000 title claims description 167
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- -1 phenylene vinylene, carbazole Chemical class 0.000 description 3
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- DKLWRIQKXIBVIS-UHFFFAOYSA-N 1,1-diiodooctane Chemical compound CCCCCCCC(I)I DKLWRIQKXIBVIS-UHFFFAOYSA-N 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 2
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- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
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- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 1
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- 229930192474 thiophene Natural products 0.000 description 1
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Description
[実施例]
(実施例の有機半導体溶液塗布装置及び移動機構の準備)
(実施例の有機半導体溶液の準備)
(実施例による有機受光素子の作成)
(比較例による有機受光素子の作成)
(受光感度評価)
Claims (9)
- 下向きの開口を有し、有機半導体溶液を貯留する第1溶液貯留部と、
前記開口を塞ぐように前記第1溶液貯留部に取り付けられ、前記有機半導体溶液を透過させる多孔質材によって形成された溶液塗布部と、
水平方向に平行な軸線を中心線として、初期状態にある前記第1溶液貯留部を回転可能に保持する保持部と、を備え、
前記溶液塗布部は、前記第1溶液貯留部が前記初期状態にある場合に、前記軸線を含み且つ鉛直方向に平行な基準面に対して第1の側に所定角度で傾斜する下向きの第1傾斜面を有する、有機半導体溶液塗布装置。 - 前記多孔質材は、フッ素樹脂で構成されている、請求項1に記載の有機半導体溶液塗布装置。
- 前記軸線を中心線として前記第1溶液貯留部が前記初期状態から回転した際に、前記初期状態に戻るように前記第1溶液貯留部を付勢する付勢部を更に備える、請求項1又は2に記載の有機半導体溶液塗布装置。
- 前記付勢部は、弾性体によって形成されており、前記第1溶液貯留部と前記保持部との間に配置されている、請求項3に記載の有機半導体溶液塗布装置。
- 前記第1溶液貯留部に接続され、可撓性材によって形成された第2溶液貯留部を更に備える、請求項1〜4のいずれか一項に記載の有機半導体溶液塗布装置。
- 前記溶液塗布部は、前記第1溶液貯留部が前記初期状態にある場合に、前記基準面に対して前記第1の側とは反対側の第2の側に前記所定角度で傾斜する下向きの第2傾斜面を有する、請求項1〜5のいずれか一項に記載の有機半導体溶液塗布装置。
- 前記保持部を三次元的に移動させる移動機構を更に備える、請求項1〜6のいずれか一項に記載の有機半導体溶液塗布装置。
- 請求項1〜7のいずれか一項に記載の有機半導体溶液塗布装置を用いた有機半導体溶液塗布方法であって、
前記保持部が少なくとも下方に移動させられることで、前記軸線を中心線として前記第1溶液貯留部が前記初期状態から回転し、前記第1傾斜面が被塗布面に面接触する第1工程と、
前記第1工程の後に、前記第1傾斜面が前記被塗布面に面接触した状態で、前記保持部が前記被塗布面に沿って前記第1の側に移動させられることで、前記有機半導体溶液が前記被塗布面に塗布される第2工程と、
前記第2工程の後に、前記保持部が少なくとも上方に移動させられることで、前記第1溶液貯留部が前記初期状態に戻りつつ、前記第1傾斜面によって前記被塗布面上の余分な前記有機半導体溶液が拭き取られる第3工程と、を備える、有機半導体溶液塗布方法。 - 前記第3工程においては、前記保持部が上方と共に前記第1の側に移動させられる、請求項8に記載の有機半導体溶液塗布方法。
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JPH1085641A (ja) * | 1996-09-10 | 1998-04-07 | Toshiba Microelectron Corp | 液体塗布方法および液体塗布装置 |
JP5092269B2 (ja) * | 2006-04-26 | 2012-12-05 | コニカミノルタホールディングス株式会社 | 有機半導体薄膜および有機半導体デバイスの製造方法 |
JP2014057916A (ja) * | 2012-09-18 | 2014-04-03 | Kyocera Corp | 塗布装置 |
EP3439055A4 (en) * | 2016-03-30 | 2019-02-20 | FUJIFILM Corporation | FILM PRODUCTION PROCESS |
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