JP6705550B1 - 静電チャック - Google Patents
静電チャック Download PDFInfo
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- JP6705550B1 JP6705550B1 JP2019223574A JP2019223574A JP6705550B1 JP 6705550 B1 JP6705550 B1 JP 6705550B1 JP 2019223574 A JP2019223574 A JP 2019223574A JP 2019223574 A JP2019223574 A JP 2019223574A JP 6705550 B1 JP6705550 B1 JP 6705550B1
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- 239000000919 ceramic Substances 0.000 claims abstract description 214
- 229910052751 metal Inorganic materials 0.000 claims abstract description 162
- 239000002184 metal Substances 0.000 claims abstract description 162
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 238000001179 sorption measurement Methods 0.000 claims abstract description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 12
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 6
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 6
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 6
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 230000002708 enhancing effect Effects 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 17
- 230000001965 increasing effect Effects 0.000 description 11
- 230000002500 effect on skin Effects 0.000 description 10
- 238000004891 communication Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000000550 scanning electron microscopy energy dispersive X-ray spectroscopy Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
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- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
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Abstract
Description
図1に表したように、静電チャック100は、セラミック誘電体基板10と、第1電極層11と、第2電極層12と、ベースプレート50と、を備える。
図2は、図1に示す領域R1を拡大して示す。
図3(a)〜図3(d)に表したように、第1電極層11は、例えば、第1〜第5部分111〜115を有する。
これらの図は、静電チャック100において、セラミック誘電体基板10のうち第2電極層12(第3面12a)よりも第1主面10a側(上側)に位置する部分を省略した状態で、第3面12a側(上側)から第2電極層12を見た平面図である。
図5に表したように、ウェーハ処理装置500は、処理容器501と、高周波電源504と、吸着用電源505と、上部電極510と、静電チャック100と、を備えている。処理容器501の天井には、処理ガスを内部に導入するための処理ガス導入口502、及び、上部電極510が設けられている。処理容器501の底板には、内部を減圧排気するための排気口503が設けられている。静電チャック100は、処理容器501の内部において、上部電極510の下に配置されている。静電チャック100の第1電極層11及び上部電極510は、高周波電源504と接続されている。静電チャック100の第2電極層12は、吸着用電源505と接続されている。
Claims (13)
- 吸着の対象物が載置される第1主面と、前記第1主面とは反対側の第2主面と、を有するセラミック誘電体基板と、
前記セラミック誘電体基板を支持するベースプレートと、
前記セラミック誘電体基板の内部に設けられ、高周波電源と接続される少なくとも1つの第1電極層と、
前記セラミック誘電体基板の内部に設けられ、吸着用電源と接続される少なくとも1つの第2電極層と、
を備え、
前記第1電極層は、前記ベースプレートから前記セラミック誘電体基板に向かうZ軸方向において、前記第1主面と前記第2主面との間に設けられ、
前記第1電極層の前記Z軸方向における寸法は、前記第2電極層の前記Z軸方向における寸法よりも大きく、
前記第2電極層は、前記Z軸方向において、前記第1電極層と前記第1主面との間に設けられ、
前記第1電極層は、前記第1主面側の第1面と、前記第1面とは反対側の第2面と、を有し、前記第2面側から給電される静電チャックにおいて、
前記第1電極層は、前記第1面を含む第1部分を有し、セラミックス成分と金属成分とを含み、
前記第1部分における前記セラミックス成分の濃度は、前記第1電極層の前記セラミックス成分の平均濃度よりも高いことを特徴とする静電チャック。 - 前記第1部分における前記セラミックス成分の濃度は、前記第1電極層における前記第1部分以外の部分での前記セラミックス成分の濃度よりも高いことを特徴とする請求項1記載の静電チャック。
- 前記第1電極層は、前記Z軸方向において前記第1部分に隣接する第2部分をさらに有し、
前記第1部分における前記セラミックス成分の濃度は、前記第2部分における前記セラミックス成分の濃度よりも高いことを特徴とする請求項1または2に記載の静電チャック。 - 前記第1電極層は、前記第2面を含む第3部分をさらに有し、
前記第3部分における前記金属成分の濃度は、前記第1電極層の前記金属成分の平均濃度よりも高いことを特徴とする請求項1〜3のいずれか1つに記載の静電チャック。 - 前記金属成分の熱伝導率は、前記セラミックス成分の熱伝導率よりも大きいことを特徴とする請求項4記載の静電チャック。
- 前記第1電極層は、前記第2面を含む第3部分をさらに有し、
前記第3部分における前記金属成分の濃度は、前記第1電極層における前記第3部分以外の部分での前記金属成分の濃度よりも高いことを特徴とする請求項1〜5のいずれか1つに記載の静電チャック。 - 前記第1電極層は、前記第2面を含む第3部分と、前記Z軸方向において前記第3部分に隣接する第4部分と、をさらに有し、
前記第3部分における前記金属成分の濃度は、前記第4部分における前記金属成分の濃度よりも高いことを特徴とする請求項1〜6のいずれか1つに記載の静電チャック。 - 前記第1部分における前記金属成分の濃度は、30%以上であることを特徴とする請求項1〜7のいずれか1つに記載の静電チャック。
- 前記セラミックス成分は、前記セラミック誘電体基板の主成分と同じであることを特徴とする請求項1〜8のいずれか1つに記載の静電チャック。
- 前記セラミックス成分は、酸化アルミニウム、窒化アルミニウム、炭化ケイ素、窒化ケイ素、及び酸化イットリウムの少なくとも1つを含むことを特徴とする請求項1〜9のいずれか1つに記載の静電チャック。
- 前記金属成分は、パラジウム、銀、白金、モリブデン、及びタングステンの少なくとも1つを含むことを特徴とする請求項1〜10のいずれか1つに記載の静電チャック。
- 前記第1電極層の厚さは、1μm以上500μm以下であることを特徴とする請求項1〜11のいずれか1つに記載の静電チャック。
- 前記第1電極層は、前記第2面を含む第3部分をさらに有し、
前記第3部分における前記金属成分の濃度は、前記第2電極層の金属成分の平均濃度よりも高いことを特徴とする請求項1〜12のいずれか1つに記載の静電チャック。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109109039A TWI710055B (zh) | 2019-03-22 | 2020-03-18 | 靜電吸盤 |
KR1020200033623A KR102164083B1 (ko) | 2019-03-22 | 2020-03-19 | 정전 척 |
CN202010200600.8A CN111725121B (zh) | 2019-03-22 | 2020-03-20 | 静电吸盘 |
US16/825,256 US10840119B2 (en) | 2019-03-22 | 2020-03-20 | Electrostatic chuck |
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Application Number | Priority Date | Filing Date | Title |
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JP2019054723 | 2019-03-22 | ||
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JPH07153825A (ja) * | 1993-11-29 | 1995-06-16 | Toto Ltd | 静電チャック及びこの静電チャックを用いた被吸着体の処理方法 |
US6478924B1 (en) * | 2000-03-07 | 2002-11-12 | Applied Materials, Inc. | Plasma chamber support having dual electrodes |
US6483690B1 (en) * | 2001-06-28 | 2002-11-19 | Lam Research Corporation | Ceramic electrostatic chuck assembly and method of making |
JP4040284B2 (ja) | 2001-11-08 | 2008-01-30 | 住友大阪セメント株式会社 | プラズマ発生用電極内蔵型サセプタ及びその製造方法 |
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JP4855177B2 (ja) | 2006-08-10 | 2012-01-18 | 住友大阪セメント株式会社 | 静電チャック装置 |
JP4893526B2 (ja) * | 2007-08-10 | 2012-03-07 | ソニー株式会社 | 細胞の物性値測定方法及び物性測定装置 |
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JP2010278166A (ja) | 2009-05-27 | 2010-12-09 | Tokyo Electron Ltd | プラズマ処理用円環状部品、及びプラズマ処理装置 |
JP5960384B2 (ja) | 2009-10-26 | 2016-08-02 | 新光電気工業株式会社 | 静電チャック用基板及び静電チャック |
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