JP6664046B2 - プラズマ照射処理装置、その評価装置及び評価方法、その制御装置及び制御方法、並びに、膜の製造方法 - Google Patents

プラズマ照射処理装置、その評価装置及び評価方法、その制御装置及び制御方法、並びに、膜の製造方法 Download PDF

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JP6664046B2
JP6664046B2 JP2016043933A JP2016043933A JP6664046B2 JP 6664046 B2 JP6664046 B2 JP 6664046B2 JP 2016043933 A JP2016043933 A JP 2016043933A JP 2016043933 A JP2016043933 A JP 2016043933A JP 6664046 B2 JP6664046 B2 JP 6664046B2
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plasma
current value
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irradiation
unit
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JP2017158659A (ja
JP2017158659A5 (OSRAM
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譲 池原
譲 池原
早苗 池原
早苗 池原
宮本 健司
健司 宮本
光 武井
光 武井
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National Institute of Advanced Industrial Science and Technology AIST
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JP2016043933A 2016-03-07 2016-03-07 プラズマ照射処理装置、その評価装置及び評価方法、その制御装置及び制御方法、並びに、膜の製造方法 Active JP6664046B2 (ja)

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JP7325354B2 (ja) * 2020-02-12 2023-08-14 東京エレクトロン株式会社 測定システム及び測定方法
JP2024139855A (ja) * 2023-03-28 2024-10-10 日本特殊陶業株式会社 プラズマ照射装置
GB2639873A (en) * 2024-03-26 2025-10-08 Eaton Intelligent Power Ltd Method and system for Rogowski coil current measurements

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JP3380394B2 (ja) * 1996-05-10 2003-02-24 アシストジャパン株式会社 プラズマ外科処置用放電噴射ノズル
CN203001102U (zh) * 2009-11-09 2013-06-19 艾恩医疗有限公司 组织焊接的装置
EP2591742A4 (en) * 2010-07-07 2018-01-03 National Institute of Advanced Industrial Science And Technology Plasma irradiation treatment device
WO2013077126A1 (ja) * 2011-11-22 2013-05-30 独立行政法人産業技術総合研究所 プラズマ評価装置
JP6519039B2 (ja) * 2014-05-16 2019-05-29 国立大学法人名古屋大学 タンパク質膜の製造方法

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