JP6656192B2 - Polyamide imide solution, porous polyamide imide film, and method for producing the same - Google Patents
Polyamide imide solution, porous polyamide imide film, and method for producing the same Download PDFInfo
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- JP6656192B2 JP6656192B2 JP2017028928A JP2017028928A JP6656192B2 JP 6656192 B2 JP6656192 B2 JP 6656192B2 JP 2017028928 A JP2017028928 A JP 2017028928A JP 2017028928 A JP2017028928 A JP 2017028928A JP 6656192 B2 JP6656192 B2 JP 6656192B2
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- 229920002312 polyamide-imide Polymers 0.000 title claims description 173
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000004962 Polyamide-imide Substances 0.000 title claims description 20
- 239000002904 solvent Substances 0.000 claims description 43
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 26
- 239000007787 solid Substances 0.000 claims description 19
- 239000011148 porous material Substances 0.000 claims description 18
- 239000002798 polar solvent Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 16
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 15
- 150000004985 diamines Chemical class 0.000 claims description 9
- 239000004210 ether based solvent Substances 0.000 claims description 9
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 7
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 7
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052744 lithium Inorganic materials 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 claims description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- 239000004745 nonwoven fabric Substances 0.000 claims description 2
- 150000003949 imides Chemical class 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 13
- 229920001721 polyimide Polymers 0.000 description 13
- 239000004642 Polyimide Substances 0.000 description 12
- 238000009835 boiling Methods 0.000 description 12
- -1 wire coatings Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 9
- 230000009477 glass transition Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000012046 mixed solvent Substances 0.000 description 7
- 150000003628 tricarboxylic acids Chemical class 0.000 description 7
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000035699 permeability Effects 0.000 description 6
- 150000004984 aromatic diamines Chemical class 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 238000005191 phase separation Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 4
- NJMOHBDCGXJLNJ-UHFFFAOYSA-N trimellitic anhydride chloride Chemical compound ClC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 NJMOHBDCGXJLNJ-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004963 Torlon Substances 0.000 description 3
- 229920003997 Torlon® Polymers 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000005345 coagulation Methods 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 239000012770 industrial material Substances 0.000 description 3
- 239000012567 medical material Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- KVQQRFDIKYXJTJ-UHFFFAOYSA-N naphthalene-1,2,3-tricarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C(C(=O)O)=CC2=C1 KVQQRFDIKYXJTJ-UHFFFAOYSA-N 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 230000001112 coagulating effect Effects 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- MNUSMUGFHGAOIW-UHFFFAOYSA-N cyclohexane-1,1,2-tricarboxylic acid Chemical compound OC(=O)C1CCCCC1(C(O)=O)C(O)=O MNUSMUGFHGAOIW-UHFFFAOYSA-N 0.000 description 1
- JEBXNNPMFYXVHS-UHFFFAOYSA-N cyclohexane-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1CCCC(C(O)=O)C1C(O)=O JEBXNNPMFYXVHS-UHFFFAOYSA-N 0.000 description 1
- WTNDADANUZETTI-UHFFFAOYSA-N cyclohexane-1,2,4-tricarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)C(C(O)=O)C1 WTNDADANUZETTI-UHFFFAOYSA-N 0.000 description 1
- GEQHKFFSPGPGLN-UHFFFAOYSA-N cyclohexane-1,3-diamine Chemical compound NC1CCCC(N)C1 GEQHKFFSPGPGLN-UHFFFAOYSA-N 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- XIECTETUPIYSLZ-UHFFFAOYSA-N cyclopentane-1,2,4-tricarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1 XIECTETUPIYSLZ-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- DDHQTWZKAJOZQL-UHFFFAOYSA-N naphthalene-1,4,5-tricarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O DDHQTWZKAJOZQL-UHFFFAOYSA-N 0.000 description 1
- CYPRBDCCNAZGDN-UHFFFAOYSA-N naphthalene-1,6,7-tricarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 CYPRBDCCNAZGDN-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000379 polypropylene carbonate Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
- C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
- C08J3/095—Oxygen containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
- C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
- C08J3/096—Nitrogen containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/24—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by surface fusion and bonding of particles to form voids, e.g. sintering
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2479/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
- C08J2479/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2479/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Cell Separators (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
本発明は、ポリアミドイミド溶液およびその製造方法、ならびにこのポリアミドイミド溶液から得られる多孔質ポリアミドイミドフィルムおよびその製造方法に関するものである(以下、ポリアミドイミドを「PAI」と略記することがある)。 The present invention relates to a polyamideimide solution and a method for producing the same, and a porous polyamideimide film obtained from the polyamideimide solution and a method for producing the same (hereinafter, polyamideimide may be abbreviated as “PAI”).
ポリイミド系の多孔質フィルムは、その優れた耐熱性と高い気孔率を利用して、電子材料や光学材料、リチウム二次電池用セパレータ、フィルタ、分離膜、電線被覆等の産業用材料、医療材料の素材等の分野で利用されている。ポリイミド系の多孔質フィルムの中で、ポリイミド前駆体(ポリアミック酸)を利用する熱硬化型のポリイミド(PI)については、この多孔質フィルムを製造する方法として、アミド系溶媒とエーテル系溶媒とを溶媒として含有するPI前駆体溶液を、300℃以上の耐熱性を有する基材上に塗布後、乾燥することによって、相分離現象を誘起せしめた後、300℃程度の高温で熱硬化して多孔質PIフィルムを得る方法(以下、この方法を「乾式多孔化プロセス」と略記することがある)が提案されている(特許文献1)。この方法は、多孔質PIフィルムを製造する際に、基材上に形成された塗膜を、貧溶媒を含む凝固液に浸漬し、多孔質化を図る湿式多孔化プロセスとは異なり、多孔質化のための凝固浴を用いる必要がない。そのため、多孔質PIフィルム製造の際、凝固浴から廃液が発生しないので、乾式多孔化プロセスは環境適合性の良好な優れた方法である。ただ、熱硬化型の多孔質ポリイミドフィルムを製造するには、熱硬化の際、基材上に形成されたPI前駆体塗膜の収縮がおこり、そのため、場合によっては、その適用範囲が限定されることがあった。 Polyimide-based porous films utilize their excellent heat resistance and high porosity to produce electronic and optical materials, industrial materials such as lithium secondary battery separators, filters, separation membranes, wire coatings, and medical materials. It is used in fields such as materials. Among the polyimide-based porous films, for a thermosetting polyimide (PI) utilizing a polyimide precursor (polyamic acid), as a method for producing this porous film, an amide-based solvent and an ether-based solvent are used. A PI precursor solution containing as a solvent is applied on a substrate having heat resistance of 300 ° C. or higher, and then dried to induce a phase separation phenomenon. A method of obtaining a high quality PI film (hereinafter, this method may be abbreviated as “dry porous process”) has been proposed (Patent Document 1). This method is different from a wet-type porous process in which a coating film formed on a substrate is immersed in a coagulating liquid containing a poor solvent to produce a porous film when a porous PI film is manufactured. There is no need to use a coagulation bath for the formation. Therefore, during the production of the porous PI film, no waste liquid is generated from the coagulation bath, so that the dry porous process is an excellent method with good environmental compatibility. However, in order to produce a thermosetting porous polyimide film, the PI precursor coating film formed on the base material shrinks during thermosetting, and therefore, in some cases, its application range is limited. There was something.
そこで、前記したような塗膜製造の際に収縮が発生しないPAIを用いて多孔質フィルムや被膜を製造する方法が提案されている。例えば、特許文献2〜4には、アミド系溶媒とエーテル系溶媒とを溶媒として含有するPAI溶液を、銅線やアルミ条等の基材上に塗布後、500℃程度の高温で熱処理することによって、多孔質PAI被膜やフィルムを得る方法が提案されている。これらの方法は、高温での溶媒の分解と揮発に起因する発泡現象を利用して多孔質PAI被膜を得ようとするものであった。またPAI溶液はエーテル系溶媒の含有量が極めて少ないものであった。 Therefore, a method of manufacturing a porous film or coating using PAI that does not cause shrinkage during the manufacturing of a coating film as described above has been proposed. For example, Patent Documents 2 to 4 disclose that a PAI solution containing an amide-based solvent and an ether-based solvent as a solvent is applied on a base material such as a copper wire or an aluminum strip and then heat-treated at a high temperature of about 500 ° C. Thus, a method for obtaining a porous PAI coating or film has been proposed. These methods attempt to obtain a porous PAI coating by utilizing a foaming phenomenon caused by decomposition and volatilization of a solvent at a high temperature. The PAI solution had an extremely low content of the ether solvent.
しかしながら、公知のPAI溶液を、低温での多孔質化が容易な相分離現象を利用した乾式多孔化プロセスに適用した場合には、気孔率が低く、かつ独立気孔が多いため透過性の低いフィルムしか得られなかった。また、フィルム表面に気孔を形成させることは困難であった。従い、高い透過性が要求されるリチウム二次電池用セパレータやフィルタ等の用途に利用することは困難であった。さらに、発泡現象を利用して多孔質PAI被膜を基材から剥離して得られる多孔質PAIフィルムは、気孔の均一性に劣り、力学的強度が低いものであった。 However, when a known PAI solution is applied to a dry porosity process utilizing a phase separation phenomenon that can easily be made porous at a low temperature, a film having a low porosity and a large number of independent porosity has a low permeability. I could only get it. Further, it was difficult to form pores on the film surface. Therefore, it has been difficult to use the lithium secondary battery as a separator or a filter for a lithium secondary battery that requires high permeability. Furthermore, the porous PAI film obtained by peeling the porous PAI coating from the substrate by utilizing the foaming phenomenon was inferior in uniformity of pores and low in mechanical strength.
そこで本発明は、前記課題を解決するものであって、乾式多孔化プロセスへの適応が可能であり、耐熱性に優れ、かつ気孔率が高く、透過性に優れた多孔質PAIフィルムが得られるPAI溶液およびその製造方法、ならびにこの溶液から得られる多孔質PAIフィルム、およびその製造方法を提供することを目的とする。 Therefore, the present invention is to solve the above-mentioned problem, and it is possible to obtain a porous PAI film which is adaptable to a dry porosity process, has excellent heat resistance, has high porosity, and has excellent permeability. It is an object to provide a PAI solution and a method for producing the same, a porous PAI film obtained from the solution, and a method for producing the same.
本発明者らは、PAI溶液を特定の組成、特に特定の溶媒含有量、とすることにより前記課題が解決されることを見出し、本発明の完成に至った。 The present inventors have found that the aforementioned problems can be solved by using a PAI solution having a specific composition, particularly a specific solvent content, and have completed the present invention.
本発明は下記を趣旨とするものである。
<1> 含窒素極性溶媒およびエーテル系溶媒を含有するPAI溶液であって、
前記PAIの固形分濃度が、PAI溶液質量に対し25質量%以下であり、
前記含窒素極性溶媒の含有量が、PAI溶液質量に対し15質量%以上であり、
前記エーテル系溶媒の含有量が、PAI溶液質量に対し30質量%超であることを特徴とするPAI溶液。
<2> 固体状のPAIを、含窒素極性溶媒およびエーテル系溶媒を含む混合溶媒に溶解させることを特徴とする<1>に記載のPAI溶液の製造方法。
<3> <1>に記載のPAI溶液を基材上に塗布後、200℃以下の温度で乾燥することにより相分離現象を誘起せしめ多孔質化することを特徴とする多孔質PAIフィルムの製造方法。
<4> 基材がポリエステルフィルムであることを特徴とする<3>に記載の多孔質PAIフィルムの製造方法。
<5> <3>または<4>に記載の方法によって製造された多孔質PAIフィルム。
The present invention aims at the following.
<1> A PAI solution containing a nitrogen-containing polar solvent and an ether solvent,
The solid content concentration of the PAI is 25% by mass or less based on the mass of the PAI solution;
The content of the nitrogen-containing polar solvent is 15% by mass or more based on the mass of the PAI solution;
The PAI solution, wherein the content of the ether solvent is more than 30% by mass based on the mass of the PAI solution.
<2> The method for producing a PAI solution according to <1>, wherein the solid PAI is dissolved in a mixed solvent containing a nitrogen-containing polar solvent and an ether-based solvent.
<3> Production of a porous PAI film, characterized in that after applying the PAI solution described in <1> on a substrate, it is dried at a temperature of 200 ° C. or less to induce a phase separation phenomenon to make it porous. Method.
<4> The method for producing a porous PAI film according to <3>, wherein the substrate is a polyester film.
<5> A porous PAI film produced by the method according to <3> or <4>.
本発明のPAI溶液から、低温での簡単なプロセスで容易に多孔質PAIフィルムを得ることができる。得られた多孔質PAIフィルムは、耐熱性に優れ、気孔率が高く、透過性に優れ、かつ気孔の優れた均一性に基づく良好な力学的特性を有するので、電子材料や光学材料、リチウム二次電池用セパレータ、フィルタ、分離膜、電線被覆等の産業用材料、医療材料の素材等の分野で好適に使用することができる。 From the PAI solution of the present invention, a porous PAI film can be easily obtained by a simple process at a low temperature. The resulting porous PAI film is excellent in heat resistance, high in porosity, excellent in permeability, and has good mechanical properties based on excellent uniformity of pores. It can be suitably used in the fields of industrial materials such as separators for secondary batteries, filters, separation membranes, and electric wire coatings, and materials of medical materials.
以下、本発明について詳細に説明する。
本発明はPAI溶液およびその製造方法、このPAI溶液から得られる多孔質PAIフィルム、およびその製造方法に関するものである。
Hereinafter, the present invention will be described in detail.
The present invention relates to a PAI solution and a method for producing the same, a porous PAI film obtained from the PAI solution, and a method for producing the same.
[PAI溶液]
PAIは、主鎖にイミド結合とアミド結合の両方を有する耐熱性高分子であり、例えば、原料であるトリカルボン酸成分とジアミン成分との重縮合反応を行うことにより得ることができる。
[PAI solution]
PAI is a heat-resistant polymer having both an imide bond and an amide bond in the main chain, and can be obtained by, for example, performing a polycondensation reaction between a tricarboxylic acid component and a diamine component, which are raw materials.
PAIのトリカルボン酸成分は、1分子あたり3個のカルボキシル基(その誘導体を含む)および1個以上の芳香環または脂肪族環を有する有機化合物であって、当該3個のカルボキシル基のうち、少なくとも2個のカルボキシル基が共に酸無水物形態を形成し得る位置に配置されたものである。トリカルボン酸成分は芳香族トリカルボン酸成分および脂環族トリカルボン酸成分を包含する概念で用いるものとする。 The tricarboxylic acid component of the PAI is an organic compound having three carboxyl groups (including derivatives thereof) and one or more aromatic or aliphatic rings per molecule, and at least one of the three carboxyl groups. Two carboxyl groups are arranged at a position where both can form an acid anhydride form. The tricarboxylic acid component is used in a concept including an aromatic tricarboxylic acid component and an alicyclic tricarboxylic acid component.
芳香族トリカルボン酸成分として、例えば、ベンゼントリカルボン酸成分、ナフタレントリカルボン酸成分が挙げられる。 Examples of the aromatic tricarboxylic acid component include a benzene tricarboxylic acid component and a naphthalene tricarboxylic acid component.
ベンゼントリカルボン酸成分の具体例として、例えば、トリメリット酸、ヘミメリット酸、ならびにこれらの無水物およびそのモノクロライドが挙げられる。 Specific examples of the benzenetricarboxylic acid component include, for example, trimellitic acid, hemi-mellitic acid, their anhydrides and their monochlorides.
ナフタレントリカルボン酸成分の具体例として、例えば、1,2,3‐ナフタレントリカルボン酸、1,6,7−ナフタレントリカルボン酸、1,4,5−ナフタレントリカルボン酸、ならびにこれらの無水物およびそのモノクロライドが挙げられる。 Specific examples of the naphthalene tricarboxylic acid component include, for example, 1,2,3-naphthalene tricarboxylic acid, 1,6,7-naphthalene tricarboxylic acid, 1,4,5-naphthalene tricarboxylic acid, and anhydrides and monochlorides thereof. Is mentioned.
脂環族トリカルボン酸成分の具体例として、例えば、1,2,4−シクロペンタントリカルボン酸、1,2,3−シクロヘキサントリカルボン酸、1,2,4−シクロヘキサントリカルボン酸、1,3,5−シクロヘキサントリカルボン酸、1,2,4−デカヒドロナフタレントリカルボン酸、1,2,5−デカヒドロナフタレントリカルボン酸ならびにこれらの無水物およびそのモノクロライドが挙げられる。 Specific examples of the alicyclic tricarboxylic acid component include, for example, 1,2,4-cyclopentanetricarboxylic acid, 1,2,3-cyclohexanetricarboxylic acid, 1,2,4-cyclohexanetricarboxylic acid, 1,3,5- Examples thereof include cyclohexanetricarboxylic acid, 1,2,4-decahydronaphthalenetricarboxylic acid, 1,2,5-decahydronaphthalenetricarboxylic acid, anhydrides thereof and monochlorides thereof.
トリカルボン酸成分の中では、芳香族トリカルボン酸成分が好ましい。
芳香族トリカルボン酸成分の中では、トリメリット酸および無水トリメリット酸クロライド(TAC)が好ましい。
Among the tricarboxylic acid components, an aromatic tricarboxylic acid component is preferred.
Among the aromatic tricarboxylic acid components, trimellitic acid and trimellitic anhydride chloride (TAC) are preferred.
トリカルボン酸成分は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。トリカルボン酸成分は、その一部がピロメリット酸、ベンゾフェノンテトラカルボン酸、またはビフェニルテトラカルボン酸等の成分で置換されたものを用いてもよい。 The tricarboxylic acid component may be used alone or in combination of two or more. As the tricarboxylic acid component, a component partially substituted with a component such as pyromellitic acid, benzophenonetetracarboxylic acid, or biphenyltetracarboxylic acid may be used.
PAIのジアミン成分は、1分子あたり2個の1級アミノ基(その誘導体を含む)および1個以上の芳香環または脂肪族環を有する有機化合物である。ジアミン成分は芳香族ジアミン成分および脂環族ジアミン成分を包含する概念で用いるものとする。 The diamine component of PAI is an organic compound having two primary amino groups (including derivatives thereof) and one or more aromatic or aliphatic rings per molecule. The diamine component is used in a concept including an aromatic diamine component and an alicyclic diamine component.
芳香族ジアミン成分の具体例として、例えば、4,4′−ジアミノジフェニルエーテル(DADE)、m−フェニレンジアミン(MDA)、p−フェニレンジアミン、4,4′−ジフェニルメタンジアミン(DMA)、4,4′−ジフェニルエーテルジアミン、ジフェニルスルホン−4,4′−ジアミン、ジフェニルー4,4′−ジアミン、o−トリジン、2,4−トリレンジアミン、2,6−トリレンジアミン、キシリレンジアミン、ナフタレンジアミン、ならびにこれらのジイソシアネート誘導体が挙げられる。 Specific examples of the aromatic diamine component include, for example, 4,4'-diaminodiphenyl ether (DADE), m-phenylenediamine (MDA), p-phenylenediamine, 4,4'-diphenylmethanediamine (DMA), 4,4 ' Diphenyl ether diamine, diphenyl sulfone-4,4'-diamine, diphenyl-4,4'-diamine, o-tolidine, 2,4-tolylenediamine, 2,6-tolylenediamine, xylylenediamine, naphthalenediamine, and These diisocyanate derivatives are mentioned.
脂環族ジアミン成分の具体例として、例えば、1,3−ジアミノシクロヘキサン、1,4−ジアミノシクロヘキサン、ならびにこれらのジイソシアネート誘導体が挙げられる。 Specific examples of the alicyclic diamine component include, for example, 1,3-diaminocyclohexane, 1,4-diaminocyclohexane, and diisocyanate derivatives thereof.
ジアミン成分の中では、芳香族ジアミン成分が好ましい。
芳香族ジアミン成分の中では、DADE、MDAおよびDMAが好ましい。
Among the diamine components, an aromatic diamine component is preferred.
Among the aromatic diamine components, DADE, MDA and DMA are preferred.
ジアミン成分は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。 The diamine components may be used alone or in combination of two or more.
PAIは、通常、200℃以上のガラス転移温度を有する。ガラス転移温度は、DSC(示差熱分析)により測定された値を用いている。 PAI typically has a glass transition temperature of 200 ° C. or higher. As the glass transition temperature, a value measured by DSC (differential thermal analysis) is used.
PAIの中でも、力学的特性や耐熱性に優れた芳香族PAIが好ましい。芳香族PAIとは、前記した芳香族トリカルボン酸成分と芳香族ジアミン成分との重縮合反応を行うことにより得ることができるものである。芳香族PAIは、熱可塑性であっても非熱可塑性であってもよいが、前記したガラス転移温度を有する芳香族PAIを好ましく用いることができる。 Among PAIs, aromatic PAI having excellent mechanical properties and heat resistance is preferable. Aromatic PAI can be obtained by performing a polycondensation reaction between the aromatic tricarboxylic acid component and the aromatic diamine component. The aromatic PAI may be thermoplastic or non-thermoplastic, but aromatic PAI having the above-mentioned glass transition temperature can be preferably used.
本発明においては、PAIを溶媒に溶解したPAI溶液から、後で詳述するように、200℃以下の温度により、溶媒を除去することにより、力学的特性の優れた耐熱性フィルムを、容易に得ることができる。PAIは、この点において、成形の際、その前駆体であるポリアミック酸をイミド化するために300℃程度の高温を必要とする熱硬化型ポリイミドとは異なるものである。 In the present invention, by removing the solvent at a temperature of 200 ° C. or less from a PAI solution in which PAI is dissolved in a solvent, a heat-resistant film having excellent mechanical properties can be easily formed. Obtainable. In this respect, PAI is different from thermosetting polyimide which requires a high temperature of about 300 ° C. in order to imidize a polyamic acid as a precursor at the time of molding.
本発明のPAI溶液は、含窒素極性溶媒およびエーテル系溶媒を含む混合溶媒を含有する溶液であって、前記PAIの固形分濃度が、PAI溶液質量に対し25質量%以下であり、前記含窒素極性溶媒の含有量が、PAI溶液質量に対し15質量%以上であり、かつ、前記エーテル系溶媒の含有量が、PAI溶液質量に対し30質量%超である。 The PAI solution of the present invention is a solution containing a mixed solvent containing a nitrogen-containing polar solvent and an ether-based solvent, wherein the solid content of the PAI is 25% by mass or less based on the mass of the PAI solution, The content of the polar solvent is 15% by mass or more based on the mass of the PAI solution, and the content of the ether solvent is more than 30% by mass based on the mass of the PAI solution.
PAIの固形分濃度が高すぎると、均一な溶液を得ることができず、フィルム形成のための使用に耐えない。PAIの固形分濃度は、フィルムにおける気孔率のさらなる増大の観点から、PAI溶液質量に対し、20質量%以下とすることが好ましい。ただ、PAIの固形分濃度を必要以上に低下させると、生産性が低下するので、PAIの固形分濃度は、5質量%以上とすることが好ましい。 If the solid content of PAI is too high, a uniform solution cannot be obtained, and it cannot be used for film formation. From the viewpoint of further increasing the porosity of the film, the solid content concentration of PAI is preferably 20% by mass or less based on the mass of the PAI solution. However, if the solid content concentration of PAI is reduced more than necessary, productivity decreases. Therefore, the solid content concentration of PAI is preferably 5% by mass or more.
含窒素極性溶媒の含有量が少なすぎると、均一なPAI溶液を得ることができない。均一なPAI溶液を得るためには、含窒素極性溶媒の含有量は、PAI溶液質量に対し17質量%以上であることが好ましい。本発明において、含窒素極性溶媒の含有量における上限値は特に限定されるものではないが、フィルムにおける気孔率のさらなる増大の観点から、PAI溶液質量に対し50質量%以下、特に30質量%以下であることが好ましい。 If the content of the nitrogen-containing polar solvent is too small, a uniform PAI solution cannot be obtained. In order to obtain a uniform PAI solution, the content of the nitrogen-containing polar solvent is preferably 17% by mass or more based on the mass of the PAI solution. In the present invention, the upper limit value of the content of the nitrogen-containing polar solvent is not particularly limited, but from the viewpoint of further increasing the porosity in the film, 50% by mass or less, particularly 30% by mass or less based on the PAI solution mass. It is preferred that
エーテル系溶媒の含有量が少なすぎると、十分な気孔率を有するフィルムを得ることができない。エーテル系溶媒の含有量は、フィルムにおける気孔率のさらなる増大の観点から、PAI溶液質量に対し40質量%超であることが好ましく、50質量%超、特に60質量%以上とすることがより好ましい。本発明において、エーテル系溶媒の含有量における上限値は特に限定されるものではないが、フィルムにおける気孔率のさらなる増大の観点から、PAI溶液質量に対し80質量%以下、特に75質量%以下であることが好ましい。 If the content of the ether solvent is too small, a film having a sufficient porosity cannot be obtained. From the viewpoint of further increasing the porosity of the film, the content of the ether solvent is preferably more than 40% by mass, more preferably more than 50% by mass, especially more than 60% by mass based on the mass of the PAI solution. . In the present invention, the upper limit of the content of the ether solvent is not particularly limited, but from the viewpoint of further increasing the porosity in the film, the upper limit is 80% by mass or less, particularly 75% by mass or less based on the mass of the PAI solution. Preferably, there is.
溶媒組成を前記のようにすることにより、PAI溶液から得られる塗膜を乾燥して固化させる際に、塗膜中に残存するエーテル系溶媒(貧溶媒)の作用により、200℃以下の温度で効率よく相分離が起こる。従い、高い気孔率を有するPAIフィルムを得ることができる。 When the coating composition obtained from the PAI solution is dried and solidified by setting the solvent composition as described above, the ether-based solvent (poor solvent) remaining in the coating film acts at a temperature of 200 ° C. or less. Phase separation occurs efficiently. Accordingly, a PAI film having a high porosity can be obtained.
本発明で用いられる含窒素極性溶媒としては、アミド系溶媒や尿素系溶媒を用いることができる。アミド系溶媒としては、例えば、N−メチル−2−ピロリドン(NMP 沸点:202℃)、N,N−ジメチルホルムアミド(沸点:153℃)、N,N−ジメチルアセトアミド(DMAc 沸点:166℃)が挙げられる。尿素系溶媒としては、例えば、テトラメチル尿素(TMU 沸点:177℃)、ジメチルエチレン尿素(沸点:220℃)が挙げられる。含窒素極性溶媒は、これらを単独で用いてもよく、2種以上を組み合わせて用いてもよい。これらの中でも、NMPおよびDMAcが好ましく用いられ、NMPが特に好ましい。 Amide solvents and urea solvents can be used as the nitrogen-containing polar solvent used in the present invention. Examples of the amide solvent include N-methyl-2-pyrrolidone (NMP boiling point: 202 ° C.), N, N-dimethylformamide (boiling point: 153 ° C.), and N, N-dimethylacetamide (DMAc boiling point: 166 ° C.). No. Examples of the urea-based solvent include tetramethyl urea (TMU boiling point: 177 ° C.) and dimethyl ethylene urea (boiling point: 220 ° C.). These nitrogen-containing polar solvents may be used alone or in combination of two or more. Among these, NMP and DMAc are preferably used, and NMP is particularly preferred.
本発明で用いられるエーテル系溶媒としては、前記含窒素極性溶媒よりも沸点が高いものを用いることが好ましく、その沸点差は、5℃以上が好ましく、20℃以上がより好ましく、50℃以上が更に好ましい。これらのエーテル系溶媒は単独では、PAIを溶解できない貧溶媒である。エーテル系溶媒としては、例えば、ジエチレングリコールジメチルエーテル(DEGM 沸点:162℃)、トリエチレングリコールジメチルエーテル(TRGM 沸点:216℃)、テトラエチレングリコールジメチルエーテル(TEGM 沸点:275℃)、ジエチレングリコール(DEG 沸点:244℃)、トリエチレングリコール(TEG 沸点:287℃)等の溶媒が挙げられる。これらを単独で用いてもよく、2種以上を組み合わせて用いてもよい。これらの中でも、TRGMおよびTEGMが好ましく用いられ、TEGMが特に好ましい。 As the ether solvent used in the present invention, it is preferable to use a solvent having a boiling point higher than that of the nitrogen-containing polar solvent, and the boiling point difference is preferably 5 ° C or higher, more preferably 20 ° C or higher, and 50 ° C or higher. More preferred. These ether solvents alone are poor solvents that cannot dissolve PAI. Examples of ether solvents include diethylene glycol dimethyl ether (DEGM boiling point: 162 ° C), triethylene glycol dimethyl ether (TRGM boiling point: 216 ° C), tetraethylene glycol dimethyl ether (TEGM boiling point: 275 ° C), diethylene glycol (DEG boiling point: 244 ° C). And a solvent such as triethylene glycol (TEG boiling point: 287 ° C.). These may be used alone or in combination of two or more. Among these, TRGM and TEGM are preferably used, and TEGM is particularly preferred.
混合溶媒は、必要に応じて、他の溶媒を、本発明の効果を損なわない範囲で含んでもよい。 The mixed solvent may contain another solvent as needed, as long as the effects of the present invention are not impaired.
本発明のPAI溶液は、例えば、以下のような製造方法で製造することが好ましい。すなわち、固体状のPAIを前記混合溶媒に溶解せしめてPAI溶液とする。固体状のPAIとしては、例えば、市販のPAI粉体(例えば、ソルベイアドバンストポリマーズ株式会社製トーロン4000Tシリーズ、トーロン4000TF、トーロンAI−10シリーズ等)を利用することができる。固体状のPAIを用いることにより、本発明の組成としたPAI溶液を容易に得ることができる。 The PAI solution of the present invention is preferably produced, for example, by the following production method. That is, the solid PAI is dissolved in the mixed solvent to obtain a PAI solution. As the solid PAI, for example, commercially available PAI powder (for example, Torlon 4000T series, Torlon 4000TF, Torlon AI-10 series, etc., manufactured by Solvay Advanced Polymers Co., Ltd.) can be used. By using solid PAI, a PAI solution having the composition of the present invention can be easily obtained.
本発明のPAI溶液を得るには、前記したような固体状のPAIを用いて製造する方法が好ましいが、原料である前記トリカルボン酸成分および前記ジアミン成分を略等モルで配合し、それを前記混合溶媒中で重合反応させて得られる溶液も用いることができる。また、含窒素極性溶媒中のみで重合反応して溶液を得た後、これにエーテル系溶媒を加える方法や、エーテル系溶媒中のみで重合反応して懸濁液を得た後、これに含窒素極性溶媒を加える方法で、PAI溶液を得ることもできるが、前記したような固体状のPAIを用いて製造する方法が好ましい。 In order to obtain the PAI solution of the present invention, the method of producing using the solid PAI as described above is preferable, but the tricarboxylic acid component and the diamine component, which are the raw materials, are mixed in approximately equimolar amounts, and A solution obtained by performing a polymerization reaction in a mixed solvent can also be used. Also, a method in which a polymerization reaction is carried out only in a nitrogen-containing polar solvent to obtain a solution, and then an ether solvent is added thereto, or a polymerization reaction is carried out only in an ether solvent to obtain a suspension, which is then contained therein Although a PAI solution can be obtained by a method of adding a nitrogen polar solvent, a method of producing using a solid PAI as described above is preferable.
本発明のPAI溶液には、必要に応じて、各種界面活性剤や有機シランカップリング剤のような公知の添加物を、本発明の効果を損なわない範囲で添加してもよい。また、必要に応じて、PAI溶液に、PAI以外の他のポリマーを、本発明の効果を損なわない範囲で添加してもよい。 If necessary, known additives such as various surfactants and organic silane coupling agents may be added to the PAI solution of the present invention as long as the effects of the present invention are not impaired. If necessary, a polymer other than PAI may be added to the PAI solution as long as the effects of the present invention are not impaired.
[多孔質PAIフィルム]
本発明の多孔質PAIフィルムは、前記PAI溶液を用いて低温乾式多孔化プロセスにより製造することができる。すなわち、本発明の前記PAI溶液を、基材の表面に塗布し、80〜200℃、好ましくは100〜160℃で、10〜60分乾燥することにより、気孔率が40〜90体積%の多孔質PAIフィルムを形成することができる。その後、これらの基材から多孔質PAIフィルムを剥離して多孔質PAIフィルム単体とすることができる。また、基材上に形成された多孔質PAIフィルムは、基材から剥離することなく、基材と積層一体化して使用することもできる。なお、多孔質PAIフィルムは、耐熱性に優れるので、前記乾燥後、200℃以上の温度、例えば300℃程度で熱処理を行っても良い。
[Porous PAI film]
The porous PAI film of the present invention can be manufactured by a low-temperature dry-type porous process using the PAI solution. That is, the PAI solution of the present invention is applied to the surface of a substrate and dried at 80 to 200 ° C., preferably 100 to 160 ° C. for 10 to 60 minutes to obtain a porosity of 40 to 90% by volume. A high quality PAI film can be formed. Thereafter, the porous PAI film can be peeled off from these substrates to form a single porous PAI film. Further, the porous PAI film formed on the substrate can be used by being laminated and integrated with the substrate without peeling off from the substrate. Since the porous PAI film has excellent heat resistance, a heat treatment may be performed at a temperature of 200 ° C. or more, for example, about 300 ° C. after the drying.
前記基材としては、例えば、金属箔、金属線、ガラス板、熱可塑性樹脂フィルム(ポリエステル、ポリプロピレン、ポリカーボネート等融点または軟化点が300℃以下の熱可塑性樹脂フィルム)、ポリイミド等の熱硬化性樹脂フィルム、各種織物、各種不織布等が挙げられる。前記金属としては、金、銀、銅、白金、アルミニウム等を用いることができる。基材は、多孔質であっても非多孔質であってもよい。これらの中で、ポリエステルフィルムが好ましく、ポリエチレンテレフタレート(PET 融点:260℃)フィルムが特に好ましい。PETフィルムはコロナ放電処理等の表面処理が行われていても良い。これら基材への塗液の塗布方法としては、ディップコータ、バーコータ、スピンコータ、ダイコータ、スプレーコータ等を用い、連続式またはバッチ式で塗布することができる。 Examples of the substrate include a metal foil, a metal wire, a glass plate, a thermoplastic resin film (a thermoplastic resin film having a melting point or softening point of 300 ° C. or less such as polyester, polypropylene, and polycarbonate), and a thermosetting resin such as polyimide. Examples include films, various woven fabrics, and various nonwoven fabrics. As the metal, gold, silver, copper, platinum, aluminum and the like can be used. The substrate may be porous or non-porous. Among these, a polyester film is preferable, and a polyethylene terephthalate (PET melting point: 260 ° C.) film is particularly preferable. The PET film may have been subjected to a surface treatment such as a corona discharge treatment. As a method of applying the coating liquid to these substrates, a dip coater, a bar coater, a spin coater, a die coater, a spray coater or the like can be used to apply the coating liquid in a continuous or batch manner.
前記製造方法により得られた多孔質PAIフィルムの気孔率は、40〜90体積%であることが好ましく、45〜85体積%であることがより好ましく、60〜85体積%であることがさらに好ましい。気孔率がこのように設定された多孔質PAIフィルムは、良好な力学的特性と透過性とが同時に確保されるので、リチウム二次電池用セパレータ、フィルタ等に利用することができる。多孔質PAIフィルムの気孔率は、多孔質PAIフィルムの見掛け密度と、多孔質PAIフィルムを構成するPAIの真密度(比重)とから算出される値である。詳細には、気孔率(体積%)は、多孔質PAIフィルムの見掛け密度がA(g/cm3)、PAIの真密度がB(g/cm3)の場合、次式により算出される。 The porosity of the porous PAI film obtained by the production method is preferably from 40 to 90% by volume, more preferably from 45 to 85% by volume, and still more preferably from 60 to 85% by volume. . The porous PAI film having the porosity set as described above can ensure good mechanical properties and permeability at the same time, and thus can be used for a separator, a filter, and the like for a lithium secondary battery. The porosity of the porous PAI film is a value calculated from the apparent density of the porous PAI film and the true density (specific gravity) of PAI constituting the porous PAI film. Specifically, the porosity (volume%) is calculated by the following equation when the apparent density of the porous PAI film is A (g / cm 3 ) and the true density of PAI is B (g / cm 3 ).
多孔質PAIフィルムの気孔の平均孔径は、0.1〜10μmが好ましく、0.5〜5μmがより好ましい。 The average pore diameter of the pores of the porous PAI film is preferably from 0.1 to 10 μm, more preferably from 0.5 to 5 μm.
また、形成される気孔は、連続気孔であっても、独立気孔であってもよいが、連続気孔であることが好ましい。また、フィルム表面には気孔が形成されていることが好ましい。 The pores formed may be continuous pores or independent pores, but are preferably continuous pores. Further, it is preferable that pores are formed on the film surface.
多孔質PAIフィルムの厚みは1〜300μmが好ましく、10〜100μmがより好ましい。 The thickness of the porous PAI film is preferably from 1 to 300 μm, more preferably from 10 to 100 μm.
前記プロセスにおいて、PAI溶液中の混合溶媒(含窒素極性溶媒とエーテル系溶媒)の種類や配合量を選ぶことにより、気孔率や気孔径を調整することができる。 In the above process, the porosity and the pore diameter can be adjusted by selecting the type and the amount of the mixed solvent (the nitrogen-containing polar solvent and the ether-based solvent) in the PAI solution.
以上述べた如く、本発明のPAI溶液から容易に多孔質PAIフィルムが得られる。この多孔質PAIフィルム製造方法は、乾式多孔化プロセスに基づくので、気孔形成の際、貧溶媒を含む凝固浴からの廃液が発生しない。従い、環境適合性が良好であり、しかも、プロセスが極めて簡単である。得られた多孔質PAIフィルムは、高い気孔率と良好な力学的特性を有する。 As described above, a porous PAI film can be easily obtained from the PAI solution of the present invention. Since this method for producing a porous PAI film is based on a dry porous process, no waste liquid is generated from a coagulation bath containing a poor solvent during pore formation. Therefore, the environmental compatibility is good and the process is extremely simple. The resulting porous PAI film has high porosity and good mechanical properties.
以下に、実施例を挙げて、本発明をさらに詳細に説明する。なお本発明は実施例により限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples. The present invention is not limited by the embodiments.
<実施例1>
TACと、DADEおよびMDAとを共重合(共重合モル比:DADE/MDA=7/3)して得られるPAI粉体(ソルベイアドバンストポリマーズ株式会社製トーロン4000T−HV、ガラス転移温度280℃)15gを、NMP25gとTEGM60gとからなる混合溶媒に、30℃で溶解して、PAIの固形分濃度が対PAI溶液比で15質量%であり、エーテル系溶媒の含有比率が対PAI溶液比で60質量%の均一なPAI溶液(A−1)を得た。
<Example 1>
15 g of PAI powder (Toron 4000T-HV manufactured by Solvay Advanced Polymers Co., Ltd., glass transition temperature: 280 ° C.) obtained by copolymerizing TAC, DADE and MDA (copolymerization molar ratio: DADE / MDA = 7/3) Was dissolved in a mixed solvent consisting of 25 g of NMP and 60 g of TEGM at 30 ° C., the solid content concentration of PAI was 15% by mass relative to the PAI solution ratio, and the content ratio of the ether solvent was 60% by mass relative to the PAI solution ratio. % PAI solution (A-1) was obtained.
この溶液を、表面がコロナ放電処理されたPETフィルム(ユニチカ社製:厚み100μm)上に塗布し、130℃で30分乾燥後、PETフィルムから塗膜を剥離することにより、厚みが50μmの多孔質PAIフィルムを得た。この多孔質PAIフィルムの気孔率の測定結果を表1に示す。また、この多孔質PAIフィルム断面および表面(PETフィルム接触面)のSEM像を図1〜図3に示す。断面全般にわたって、孔径2〜3μm程度の均一な連続気孔が形成され、表面にも気孔が形成されていることが判る。JIS−C−2151の規定に基づき、この多孔質PAIフィルムの力学的特性を評価した所、引張強度は14.1MPa、伸度は38.8%と良好な力学的特性を有していることが確認された。さらに、JIS−P8117の規定に基づき、この多孔質PAIフィルムのガーレ値を測定した所、1580秒であり、連続気孔に基づく良好な透過性を示すことが確認された。 This solution was applied on a PET film (100 μm thick, manufactured by Unitika) whose surface was subjected to corona discharge treatment, dried at 130 ° C. for 30 minutes, and then peeled off from the PET film to form a 50 μm thick porous film. A quality PAI film was obtained. Table 1 shows the measurement results of the porosity of this porous PAI film. 1 to 3 show SEM images of the cross section and the surface (the PET film contact surface) of the porous PAI film. It can be seen that uniform continuous pores having a pore diameter of about 2 to 3 μm are formed over the entire cross section, and pores are also formed on the surface. When the mechanical properties of the porous PAI film were evaluated based on the provisions of JIS-C-2151, the porous PAI film had good mechanical properties of 14.1 MPa and an elongation of 38.8%. Was confirmed. Furthermore, when the Gurley value of this porous PAI film was measured based on the provisions of JIS-P8117, it was 1580 seconds, and it was confirmed that the porous PAI film exhibited good permeability based on continuous pores.
<実施例2〜8>
実施例1と同様にして、表1に示す組成で、PAI溶液(A−2〜A−8)を作成した。これらの溶液から、実施例1と同様の条件で多孔質PAIフィルムを得た。これらの多孔質PAIフィルムの気孔率測定結果を表1に示す。
<Examples 2 to 8>
In the same manner as in Example 1, PAI solutions (A-2 to A-8) were prepared with the compositions shown in Table 1. From these solutions, a porous PAI film was obtained under the same conditions as in Example 1. Table 1 shows the porosity measurement results of these porous PAI films.
<実施例9>
PAI粉体として、TACと、DMAとを重合して得られるPAI粉体(ソルベイアドバンストポリマーズ株式会社製トーロンAI−10、ガラス転移温度272℃)を用いたこと以外は、実施例1と同様にして、PAI溶液(A−9)を作成した。この溶液から、実施例1と同様の条件で多孔質PAIフィルムを得た。この多孔質PAIフィルムの気孔率測定結果を表1に示す。
<Example 9>
The same procedure as in Example 1 was carried out except that PAI powder (Toron AI-10, manufactured by Solvay Advanced Polymers Co., Ltd., glass transition temperature: 272 ° C.) obtained by polymerizing TAC and DMA was used as the PAI powder. Thus, a PAI solution (A-9) was prepared. From this solution, a porous PAI film was obtained under the same conditions as in Example 1. Table 1 shows the results of measuring the porosity of this porous PAI film.
<比較例1〜6>
実施例1と同様にして、表1に示す組成で、PAI溶液(B−1〜B−6)を作成した。これらの溶液から、実施例1と同様の条件で多孔質PAIフィルムを得た。これらの多孔質PAIフィルムの気孔率測定結果を表1に示す。
<Comparative Examples 1 to 6>
In the same manner as in Example 1, PAI solutions (B-1 to B-6) having the compositions shown in Table 1 were prepared. From these solutions, a porous PAI film was obtained under the same conditions as in Example 1. Table 1 shows the porosity measurement results of these porous PAI films.
<比較例7〜9>
表1に示した組成で、実施例1と同様にしてPAI溶液(B−7〜B−9)を作成しようとしたが、均一な溶液を得ることができなかった。
<Comparative Examples 7 to 9>
An attempt was made to prepare PAI solutions (B-7 to B-9) in the same manner as in Example 1 with the compositions shown in Table 1, but no uniform solution could be obtained.
<比較例10>
特開2013−187029(特許文献2)実施例1の記載に従って、PAI溶液(B−10)を作成した。すなわち、市販のPAI溶液(日立化成工業株式会社製:HI−406、PAI固形分:32質量%、溶媒:NMP、PAIのガラス転移温度:288℃)200gにTRGM51.2gを加えることにより、PAIの固形分濃度が対PAI溶液比で約25質量%であり、エーテル系溶媒の含有比率が対PAI溶液比で約21質量%の均一なPAI溶液(B−10)を得た。この溶液から、実施例1と同様の条件で多孔質PAIフィルムを得た。このPAIフィルムの気孔率測定結果を表1に示す。
<Comparative Example 10>
JP-A-2013-187029 (Patent Document 2) A PAI solution (B-10) was prepared as described in Example 1. That is, by adding 51.2 g of TRGM to 200 g of a commercially available PAI solution (manufactured by Hitachi Chemical Co., Ltd .: HI-406, PAI solid content: 32% by mass, solvent: NMP, glass transition temperature of PAI: 288 ° C.), A homogeneous PAI solution (B-10) having a solid content concentration of about 25% by mass relative to the PAI solution and an ether solvent content of about 21% by mass relative to the PAI solution ratio was obtained. From this solution, a porous PAI film was obtained under the same conditions as in Example 1. Table 1 shows the porosity measurement results of the PAI film.
<比較例11>
特開2013−210493(特許文献3)実施例2の記載に従って、PAI溶液(B−10)を作成した。すなわち、市販のPAI溶液(日立化成工業株式会社製:HI−406、PAI固形分:32質量%、溶媒:NMP、PAIのガラス転移温度:288℃)200gに、NMP15g,TRGM10g、TEGM30gを加えることにより、PAIの固形分濃度が対PAI溶液比で約25質量%であり、エーテル系溶媒の含有比率が対PAI溶液比で約16質量%の均一なPAI溶液(B−11)を得た。この溶液から、実施例1と同様の条件で多孔質PAIフィルムを得た。このPAIフィルムの気孔率測定結果を表1に示す。
<Comparative Example 11>
JP-A-2013-210493 (Patent Document 3) A PAI solution (B-10) was prepared as described in Example 2. That is, 15 g of NMP, 10 g of TRGM, and 30 g of TEGM are added to 200 g of a commercially available PAI solution (manufactured by Hitachi Chemical Co., Ltd .: HI-406, solid content of PAI: 32% by mass, solvent: NMP, glass transition temperature of PAI: 288 ° C.). As a result, a uniform PAI solution (B-11) having a PAI solid content concentration of about 25% by mass relative to the PAI solution and an ether solvent content of approximately 16% by mass relative to the PAI solution ratio was obtained. From this solution, a porous PAI film was obtained under the same conditions as in Example 1. Table 1 shows the porosity measurement results of the PAI film.
実施例で示した様に、本発明のPAI溶液から得られた多孔質PAIフィルムの気孔率(40体積%以上)は高いものであり、二次電池セパレータやフィルタ等に好適に使用できるものであることが判る。これに対し、比較例で示したPAI溶液から得られた多孔質PAIフィルムの気孔率(40体積%未満)は低いものであり、二次電池セパレータやフィルタ等への適用は難しいことが判る。 As shown in the examples, the porosity (40% by volume or more) of the porous PAI film obtained from the PAI solution of the present invention is high and can be suitably used for a secondary battery separator, a filter, and the like. It turns out there is. On the other hand, the porosity (less than 40% by volume) of the porous PAI film obtained from the PAI solution shown in the comparative example is low, which indicates that application to a secondary battery separator, a filter, or the like is difficult.
本発明のPAI溶液を用いて得られた多孔質PAIフィルムは、電子材料や光学材料、リチウム二次電池用セパレータ、フィルタ、分離膜、電線被覆等の産業用材料、医療材料の素材等の分野で有用である。 The porous PAI film obtained by using the PAI solution of the present invention is used in the fields of electronic materials, optical materials, industrial materials such as lithium secondary battery separators, filters, separation membranes, electric wire coatings, and medical material materials. Useful in
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