JP6652555B2 - レーザシステム、及び、レーザシステムの出力パワーを調整する方法 - Google Patents
レーザシステム、及び、レーザシステムの出力パワーを調整する方法 Download PDFInfo
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- JP6652555B2 JP6652555B2 JP2017513110A JP2017513110A JP6652555B2 JP 6652555 B2 JP6652555 B2 JP 6652555B2 JP 2017513110 A JP2017513110 A JP 2017513110A JP 2017513110 A JP2017513110 A JP 2017513110A JP 6652555 B2 JP6652555 B2 JP 6652555B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0427—Electrical excitation ; Circuits therefor for applying modulation to the laser
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0613—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
- B23K26/0876—Devices involving movement of the laser head in at least one axial direction in at least two axial directions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
- B23K26/703—Cooling arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
- H01S5/0071—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for beam steering, e.g. using a mirror outside the cavity to change the beam direction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4012—Beam combining, e.g. by the use of fibres, gratings, polarisers, prisms
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4018—Lasers electrically in series
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4062—Edge-emitting structures with an external cavity or using internal filters, e.g. Talbot filters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/023—Mount members, e.g. sub-mount members
- H01S5/02325—Mechanically integrated components on mount members or optical micro-benches
- H01S5/02326—Arrangements for relative positioning of laser diodes and optical components, e.g. grooves in the mount to fix optical fibres or lenses
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02423—Liquid cooling, e.g. a liquid cools a mount of the laser
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0617—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium using memorised or pre-programmed laser characteristics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4087—Array arrangements, e.g. constituted by discrete laser diodes or laser bar emitting more than one wavelength
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Semiconductor Lasers (AREA)
- Lasers (AREA)
- Laser Beam Processing (AREA)
- Optical Couplings Of Light Guides (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014210491 | 2014-10-15 | ||
| PCT/US2015/054713 WO2016060933A1 (en) | 2014-10-15 | 2015-10-08 | Laser system and method of tuning the output power of the laser system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018503966A JP2018503966A (ja) | 2018-02-08 |
| JP2018503966A5 JP2018503966A5 (enExample) | 2018-09-13 |
| JP6652555B2 true JP6652555B2 (ja) | 2020-02-26 |
Family
ID=55746649
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017513110A Active JP6652555B2 (ja) | 2014-10-15 | 2015-10-08 | レーザシステム、及び、レーザシステムの出力パワーを調整する方法 |
| JP2016554076A Active JP6374017B2 (ja) | 2014-10-15 | 2015-10-13 | 半導体レーザ発振器 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016554076A Active JP6374017B2 (ja) | 2014-10-15 | 2015-10-13 | 半導体レーザ発振器 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US10305252B2 (enExample) |
| EP (2) | EP3207602B1 (enExample) |
| JP (2) | JP6652555B2 (enExample) |
| CN (2) | CN107005020B (enExample) |
| WO (2) | WO2016060933A1 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6652555B2 (ja) | 2014-10-15 | 2020-02-26 | ルーメンタム オペレーションズ エルエルシーLumentum Operations LLC | レーザシステム、及び、レーザシステムの出力パワーを調整する方法 |
| KR20170104818A (ko) * | 2016-03-08 | 2017-09-18 | 주식회사 이오테크닉스 | 벨로우즈 용접이 가능한 레이저 용접 장치 |
| JP6625914B2 (ja) * | 2016-03-17 | 2019-12-25 | ファナック株式会社 | 機械学習装置、レーザ加工システムおよび機械学習方法 |
| CN109475976A (zh) * | 2016-07-14 | 2019-03-15 | 三菱电机株式会社 | 激光加工装置 |
| EP3504944B1 (en) * | 2016-08-26 | 2023-06-07 | NLIGHT, Inc. | Laser power distribution module |
| JP7089148B2 (ja) * | 2016-09-30 | 2022-06-22 | 日亜化学工業株式会社 | 光源装置 |
| GB2556197B (en) * | 2016-09-30 | 2021-11-24 | Nichia Corp | Light source device |
| JP6261810B1 (ja) * | 2016-10-25 | 2018-01-17 | 三菱電機株式会社 | レーザ加工機及びレーザ加工機の演算装置 |
| CN108075351A (zh) * | 2016-11-11 | 2018-05-25 | 大族激光科技产业集团股份有限公司 | 半导体激光器控制系统 |
| CN106532431A (zh) * | 2016-12-28 | 2017-03-22 | 尚华 | 一种应用于人体内的激光发生光导入装置 |
| JP6502993B2 (ja) * | 2017-04-06 | 2019-04-17 | ファナック株式会社 | 複数のレーザモジュールを備えたレーザ装置 |
| JP6568136B2 (ja) * | 2017-04-06 | 2019-08-28 | ファナック株式会社 | 複数のレーザモジュールを備えたレーザ装置 |
| JP6642546B2 (ja) * | 2017-09-21 | 2020-02-05 | 日亜化学工業株式会社 | 波長ビーム結合装置 |
| DE102017129790A1 (de) * | 2017-12-13 | 2019-06-13 | Osram Opto Semiconductors Gmbh | Verfahren zum Betreiben einer Laservorrichtung und Laservorrichtung |
| JP6970036B2 (ja) * | 2018-02-20 | 2021-11-24 | ファナック株式会社 | ファイバレーザ発振器用の電源回路 |
| US10425156B1 (en) | 2018-03-30 | 2019-09-24 | Facebook, Inc. | Dynamically determining optical transceiver expected life |
| US10461851B1 (en) * | 2018-03-30 | 2019-10-29 | Facebook, Inc. | Predicting optical transceiver failure |
| GB2573303A (en) * | 2018-05-01 | 2019-11-06 | Datalase Ltd | System and method for laser marking |
| WO2019215798A1 (ja) * | 2018-05-07 | 2019-11-14 | 三菱電機株式会社 | レーザ装置、レーザ加工機およびレーザ装置の出力制御方法 |
| JP7443248B2 (ja) * | 2018-05-11 | 2024-03-05 | エクセリタス テクノロジーズ コーポレイション | 幾何学的分離を採用する光ポンピングチューナブルvcsel |
| WO2019224601A2 (en) * | 2018-05-24 | 2019-11-28 | Panasonic intellectual property Management co., Ltd | Exchangeable laser resonator modules with angular adjustment |
| WO2020241592A1 (ja) | 2019-05-28 | 2020-12-03 | 三菱電機株式会社 | レーザ光発生装置およびそれを備えたレーザ加工装置 |
| CN110994352A (zh) * | 2019-11-11 | 2020-04-10 | 无锡锐科光纤激光技术有限责任公司 | 可拓展的分布式激光器 |
| CN110854654B (zh) * | 2019-11-18 | 2021-06-15 | 无锡锐科光纤激光技术有限责任公司 | 一种半闭环控制激光器 |
| CN111162454B (zh) * | 2020-01-02 | 2021-03-12 | 中国科学院半导体研究所 | 一种宽波段调谐系统及调谐方法 |
| JP2021118271A (ja) * | 2020-01-27 | 2021-08-10 | パナソニックIpマネジメント株式会社 | レーザ発振器及びレーザ加工方法 |
| US12134142B1 (en) * | 2020-02-07 | 2024-11-05 | Flexform, Incorporated | Systems and methods of permanently marking materials |
| US11769981B1 (en) * | 2020-03-27 | 2023-09-26 | Government Of The United States As Represented By The Secretary Of The Air Force | Circuit and method for regulating currents to multiple loads |
| CN111682399B (zh) * | 2020-06-20 | 2021-07-20 | 深圳市灵明光子科技有限公司 | 激光发射器驱动电路、系统及高速光通信装置 |
| US12030251B2 (en) | 2021-08-20 | 2024-07-09 | General Electric Company | Irradiation devices with optical modulators for additively manufacturing three-dimensional objects |
| US12280446B2 (en) | 2021-08-20 | 2025-04-22 | General Electric Company | Irradiation devices with optical modulators for additively manufacturing three-dimensional objects |
| CN118786591A (zh) * | 2022-03-31 | 2024-10-15 | 英特尔公司 | 激光发射机组件、光检测和测距系统以及计算机可读介质 |
| DE102023200658A1 (de) | 2023-01-27 | 2024-08-01 | Robert Bosch Gesellschaft mit beschränkter Haftung | Beleuchtungsvorrichtung und Verfahren zum Anschalten oder Ausschalten einer ersten und/oder einer zweiten Laserdiode einer Beleuchtungsvorrichtung |
Family Cites Families (61)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4439861A (en) | 1981-08-07 | 1984-03-27 | Mrj, Inc. | Solid state laser with controlled optical pumping |
| US5337325A (en) * | 1992-05-04 | 1994-08-09 | Photon Imaging Corp | Semiconductor, light-emitting devices |
| US5729568A (en) | 1993-01-22 | 1998-03-17 | Deutsche Forschungsanstalt Fuer Luft-Und Raumfahrt E.V. | Power-controlled, fractal laser system |
| DE4301689A1 (de) | 1993-01-22 | 1994-07-28 | Deutsche Forsch Luft Raumfahrt | Leistungsgesteuertes fraktales Lasersystem |
| DE19623883A1 (de) * | 1996-06-05 | 1997-12-11 | Siemens Ag | Optische Sendeeinrichtung |
| US5748654A (en) * | 1996-06-17 | 1998-05-05 | Trw Inc. | Diode array providing either a pulsed or a CW mode of operation of a diode pumped solid state laser |
| US5715270A (en) * | 1996-09-27 | 1998-02-03 | Mcdonnell Douglas Corporation | High efficiency, high power direct diode laser systems and methods therefor |
| US6094447A (en) * | 1998-06-12 | 2000-07-25 | Lockheed Martin Corporation | System and method for reducing wavefront distortion in high-gain diode-pumped laser media |
| SE518827C2 (sv) | 1999-02-17 | 2002-11-26 | Altitun Ab | Metod för karakterisering av en avstämbar laser |
| US6799242B1 (en) * | 1999-03-05 | 2004-09-28 | Sanyo Electric Co., Ltd. | Optical disc player with sleep mode |
| JP2001284732A (ja) | 2000-03-31 | 2001-10-12 | Matsushita Electric Ind Co Ltd | 多波長レーザ発光装置、当該装置に用いられる半導体レーザアレイ素子及び当該半導体レーザアレイ素子の製造方法 |
| US6826224B2 (en) | 2000-03-27 | 2004-11-30 | Matsushita Electric Industrial Co., Ltd. | High-power semiconductor laser array apparatus that outputs laser lights matched in wavelength and phase, manufacturing method therefor, and multi-wavelength laser emitting apparatus using such high-power semiconductor laser array apparatus |
| EP1143584A3 (en) | 2000-03-31 | 2003-04-23 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser array |
| EP1146617A3 (en) | 2000-03-31 | 2003-04-23 | Matsushita Electric Industrial Co., Ltd. | High-powered semiconductor laser array apparatus |
| US6518563B1 (en) | 2000-06-22 | 2003-02-11 | Agere Systems Inc. | Detecting aging of optical components |
| EP1346445B1 (en) * | 2000-08-09 | 2011-11-09 | Santur Corporation | Tunable distributed feedback laser |
| US6856634B2 (en) | 2001-02-19 | 2005-02-15 | Toyota Jidoshi Kabushiki Kaisha | Laser processing device and laser processing method |
| JP2002335042A (ja) | 2001-05-11 | 2002-11-22 | Mitsubishi Chemicals Corp | 外部共振器付きレーザダイオードモジュールの波長ロックの光出力範囲を広くする方法、および該方法を実施するためのレーザダイオードモジュール |
| CA2463502C (en) * | 2001-10-09 | 2011-09-20 | Infinera Corporation | Digital optical network architecture |
| DE10345220B4 (de) * | 2003-09-29 | 2012-02-16 | Infineon Technologies Ag | Verfahren zur Übertragung von Daten |
| US7369587B2 (en) | 2004-02-21 | 2008-05-06 | Finisar Corp | Temperature control for coarse wavelength division multiplexing systems |
| CN100541946C (zh) * | 2004-02-21 | 2009-09-16 | 菲尼萨公司 | 用于粗波分复用系统的温度控制 |
| US7508853B2 (en) | 2004-12-07 | 2009-03-24 | Imra, America, Inc. | Yb: and Nd: mode-locked oscillators and fiber systems incorporated in solid-state short pulse laser systems |
| US7233442B1 (en) * | 2005-01-26 | 2007-06-19 | Aculight Corporation | Method and apparatus for spectral-beam combining of high-power fiber lasers |
| US20070022939A1 (en) | 2005-07-27 | 2007-02-01 | Robert Stokes | Wet floor warning device |
| JP2007288139A (ja) * | 2006-03-24 | 2007-11-01 | Sumitomo Chemical Co Ltd | モノシリック発光デバイス及びその駆動方法 |
| US7515346B2 (en) | 2006-07-18 | 2009-04-07 | Coherent, Inc. | High power and high brightness diode-laser array for material processing applications |
| US20100103088A1 (en) | 2007-01-29 | 2010-04-29 | Toshifumi Yokoyama | Solid-state laser apparatus, display apparatus and wavelength converting element |
| CN101689748B (zh) | 2007-06-27 | 2012-06-20 | 皇家飞利浦电子股份有限公司 | 光学传感器模块及其制造 |
| GB0713265D0 (en) | 2007-07-09 | 2007-08-15 | Spi Lasers Uk Ltd | Apparatus and method for laser processing a material |
| CN201113219Y (zh) * | 2007-10-25 | 2008-09-10 | 常州凯森光电有限公司 | 激光模组结构 |
| CN102224606A (zh) * | 2009-01-09 | 2011-10-19 | 夏普株式会社 | 发光二极管驱动电路和具备该发光二极管驱动电路的面状照明装置 |
| JP5187441B2 (ja) * | 2009-04-24 | 2013-04-24 | 株式会社村田製作所 | Mems素子およびその製造方法 |
| JP5349129B2 (ja) | 2009-05-07 | 2013-11-20 | 住友重機械工業株式会社 | レーザ照射装置 |
| DE112011100812T5 (de) * | 2010-03-05 | 2013-03-07 | TeraDiode, Inc. | System und Verfahren zur Wellenlängenstrahlkombination |
| US8488245B1 (en) | 2011-03-07 | 2013-07-16 | TeraDiode, Inc. | Kilowatt-class diode laser system |
| US20110305250A1 (en) | 2010-03-05 | 2011-12-15 | TeraDiode, Inc. | Wavelength beam combining based pulsed lasers |
| US8437086B2 (en) | 2010-06-30 | 2013-05-07 | Jds Uniphase Corporation | Beam combining light source |
| US8427749B2 (en) | 2010-06-30 | 2013-04-23 | Jds Uniphase Corporation | Beam combining light source |
| US20120026320A1 (en) * | 2010-07-28 | 2012-02-02 | Bryceland Samuel S | Aircraft traffic logging and acquisition system |
| EP2440016B1 (en) * | 2010-10-08 | 2019-01-23 | Lantiq Beteiligungs-GmbH & Co.KG | Laser diode control device |
| US20120165800A1 (en) * | 2010-12-22 | 2012-06-28 | Scott Keeney | Single-emitter diode based light homogenizing apparatus and a hair removal device employing the same |
| JP5068863B2 (ja) | 2011-02-17 | 2012-11-07 | ファナック株式会社 | 精確にレーザ出力を補正できる高出力レーザ装置 |
| US9072533B2 (en) | 2011-03-30 | 2015-07-07 | Tria Beauty, Inc. | Dermatological treatment device with one or more multi-emitter laser diode |
| JP5729107B2 (ja) * | 2011-04-20 | 2015-06-03 | 村田機械株式会社 | レーザ発振器制御装置 |
| US9229156B2 (en) * | 2011-07-07 | 2016-01-05 | Reald Inc. | Laser systems and methods |
| JP2013197371A (ja) * | 2012-03-21 | 2013-09-30 | Fujikura Ltd | 駆動回路、光源装置、光増幅器、および、駆動方法 |
| JP2013222799A (ja) * | 2012-04-16 | 2013-10-28 | Sumitomo Electric Device Innovations Inc | 半導体レーザの制御方法及び光トランシーバの製造方法 |
| JP2013233556A (ja) | 2012-05-08 | 2013-11-21 | Product Support:Kk | レーザー加工装置 |
| US9679077B2 (en) * | 2012-06-29 | 2017-06-13 | Mmodal Ip Llc | Automated clinical evidence sheet workflow |
| US10405893B2 (en) | 2012-07-12 | 2019-09-10 | DePuy Synthes Products, Inc. | Device, kit and method for correction of spinal deformity |
| US8710470B2 (en) * | 2012-07-12 | 2014-04-29 | The United States Of America, As Represented By The Secretary Of The Navy | Wavelength and power scalable waveguiding-based infrared laser system |
| TWM443878U (en) * | 2012-07-23 | 2012-12-21 | Richtek Technology Corp | Multi-phase switching regulator and droop circuit therefor |
| JP5513571B2 (ja) * | 2012-09-06 | 2014-06-04 | ファナック株式会社 | 放電開始を判定する機能を有するガスレーザ発振器 |
| JP6211259B2 (ja) * | 2012-11-02 | 2017-10-11 | 株式会社アマダミヤチ | レーザ電源装置 |
| JP2014104479A (ja) | 2012-11-27 | 2014-06-09 | Amada Co Ltd | ファイバーレーザ加工機及び断線検出方法 |
| US9478931B2 (en) * | 2013-02-04 | 2016-10-25 | Nlight Photonics Corporation | Method for actively controlling the optical output of a seed laser |
| JP2014164577A (ja) * | 2013-02-26 | 2014-09-08 | Sumitomo Electric Ind Ltd | 駆動回路 |
| US9815140B2 (en) * | 2013-02-27 | 2017-11-14 | Komatsu Industries Corporation | Power control method for fiber laser processing machine, and fiber laser processing machine |
| US9550347B2 (en) * | 2013-07-31 | 2017-01-24 | Bell Helicopter Textron Inc. | Method of configuring composite core in a core stiffened structure and a structure incorporating the same |
| JP6652555B2 (ja) | 2014-10-15 | 2020-02-26 | ルーメンタム オペレーションズ エルエルシーLumentum Operations LLC | レーザシステム、及び、レーザシステムの出力パワーを調整する方法 |
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| JP2018503966A (ja) | 2018-02-08 |
| EP3208898A1 (en) | 2017-08-23 |
| US20170279245A1 (en) | 2017-09-28 |
| JPWO2016060103A1 (ja) | 2017-07-20 |
| CN107005020B (zh) | 2021-07-20 |
| EP3207602A4 (en) | 2018-06-20 |
| CN107005020A (zh) | 2017-08-01 |
| US20170279246A1 (en) | 2017-09-28 |
| CN107078461B (zh) | 2019-06-14 |
| EP3207602A1 (en) | 2017-08-23 |
| US9917416B2 (en) | 2018-03-13 |
| US10305252B2 (en) | 2019-05-28 |
| EP3207602B1 (en) | 2025-09-03 |
| WO2016060933A1 (en) | 2016-04-21 |
| WO2016060103A1 (ja) | 2016-04-21 |
| CN107078461A (zh) | 2017-08-18 |
| EP3208898A4 (en) | 2018-06-20 |
| JP6374017B2 (ja) | 2018-08-15 |
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