JP6650652B2 - 偏光板製造廃液の処理方法および処理装置 - Google Patents
偏光板製造廃液の処理方法および処理装置 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 71
- 238000000034 method Methods 0.000 title claims description 15
- 239000002351 wastewater Substances 0.000 title claims description 8
- 239000007788 liquid Substances 0.000 claims description 116
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 claims description 103
- 239000002699 waste material Substances 0.000 claims description 70
- 239000000706 filtrate Substances 0.000 claims description 47
- 239000002244 precipitate Substances 0.000 claims description 41
- 238000000926 separation method Methods 0.000 claims description 35
- 238000001704 evaporation Methods 0.000 claims description 30
- 239000013078 crystal Substances 0.000 claims description 24
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 23
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 23
- 238000001816 cooling Methods 0.000 claims description 14
- 239000000243 solution Substances 0.000 claims description 13
- 238000002425 crystallisation Methods 0.000 claims description 10
- 230000008025 crystallization Effects 0.000 claims description 10
- 238000005406 washing Methods 0.000 claims description 10
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 9
- 239000004327 boric acid Substances 0.000 claims description 8
- 239000012047 saturated solution Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 5
- 239000012141 concentrate Substances 0.000 claims description 4
- 238000011084 recovery Methods 0.000 claims description 4
- 238000004065 wastewater treatment Methods 0.000 claims description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000000909 electrodialysis Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- -1 and therefore Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D25/00—Filters formed by clamping together several filtering elements or parts of such elements
- B01D25/12—Filter presses, i.e. of the plate or plate and frame type
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
- C01D3/00—Halides of sodium, potassium or alkali metals in general
- C01D3/12—Iodides
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/02—Treatment of water, waste water, or sewage by heating
- C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
- C02F1/06—Flash evaporation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/22—Treatment of water, waste water, or sewage by freezing
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/38—Treatment of water, waste water, or sewage by centrifugal separation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/02—Treatment of water, waste water, or sewage by heating
- C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
- C02F2001/5218—Crystallization
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
Description
2 冷却晶析装置
3 第1の固液分離装置
4 第2の蒸発濃縮装置
5 第2の固液分離装置
6 貯留タンク
Claims (7)
- 偏光板製造廃液からヨウ化カリウム溶液を回収する偏光板製造廃液の処理方法であって、
偏光板製造廃液を蒸発濃縮し、ホウ酸およびポリビニルアルコールを含む第1の析出物を生成する第1の濃縮工程と、
前記偏光板製造廃液から前記第1の析出物を固液分離した第1の濾液を生成する第1の固液分離工程と、
前記第1の濾液を蒸発濃縮し、ヨウ化カリウムを含む第2の析出物を生成する第2の濃縮工程と、
前記第1の濾液から前記第2の析出物を固液分離した第2の濾液を生成する第2の固液分離工程と、
分離した前記第2の析出物からヨウ化カリウムを回収する回収工程とを備える偏光板製造廃液の処理方法。 - 前記回収工程は、ヨウ化カリウムの飽和溶液を用いて、前記第2の析出物に含まれるヨウ化カリウムの結晶を洗浄する工程を含む請求項1に記載の偏光板製造廃液の処理方法。
- 生成された前記第2の濾液の少なくとも一部を貯留タンクに貯留する貯留工程と、
貯留された前記第2の濾液を蒸発濃縮し、ヨウ化カリウムの粗結晶を生成する第3の濃縮工程と、
前記粗結晶を前記第2の濾液から固液分離する第3の固液分離工程とを更に備え、
前記第2の濃縮工程は、分離された前記粗結晶を含む前記第1の濾液を蒸発濃縮する請求項1または2に記載の偏光板製造廃液の処理方法。 - 前記第2の濃縮工程は、前記第2の濾液の一部を前記第1の濾液と共に蒸発濃縮する工程を含む請求項1から3のいずれかに記載の偏光板製造廃液の処理方法。
- 前記第2の濃縮工程は、前記第1の析出物を冷水で洗浄した際に生じる洗浄廃液を、前記第1の濾液と共に蒸発濃縮する工程を含む請求項1から4のいずれかに記載の偏光板製造廃液の処理方法。
- 前記第1の濃縮工程と前記第1の固液分離工程との間に、蒸発濃縮後の前記偏光板製造廃液を冷却晶析する冷却晶析工程を備える請求項1から5のいずれかに記載の偏光板製造廃液の処理方法。
- 偏光板製造廃液からヨウ化カリウム溶液を回収する偏光板製造廃液の処理装置であって、
偏光板製造廃液を蒸発濃縮し、ホウ酸およびポリビニルアルコールを含む第1の析出物を生成する第1の蒸発濃縮装置と、
前記偏光板製造廃液から前記第1の析出物を固液分離した第1の濾液を生成する第1の固液分離装置と、
前記第1の濾液を蒸発濃縮し、ヨウ化カリウムを含む第2の析出物を生成する第2の蒸発濃縮装置と、
前記第1の濾液から前記第2の析出物を固液分離した第2の濾液を生成する第2の固液分離装置とを備え、
分離した前記第2の析出物からヨウ化カリウムを回収可能な偏光板製造廃液の処理装置。
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JP2016237493A JP6650652B2 (ja) | 2016-12-07 | 2016-12-07 | 偏光板製造廃液の処理方法および処理装置 |
TW106135511A TWI794188B (zh) | 2016-12-07 | 2017-10-17 | 偏光板製造廢液之處理方法及處理裝置 |
KR1020170153550A KR102221509B1 (ko) | 2016-12-07 | 2017-11-17 | 편광판 제조폐액의 처리방법 및 처리장치 |
CN201711270907.XA CN108164067A (zh) | 2016-12-07 | 2017-12-05 | 偏光板制造废液的处理方法和处理装置 |
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JP4478996B2 (ja) | 2000-05-08 | 2010-06-09 | オルガノ株式会社 | 偏光板製造廃液の処理方法 |
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