JP6642927B2 - コーティングシステム及びそれによって製造された物品 - Google Patents
コーティングシステム及びそれによって製造された物品 Download PDFInfo
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- JP6642927B2 JP6642927B2 JP2018530108A JP2018530108A JP6642927B2 JP 6642927 B2 JP6642927 B2 JP 6642927B2 JP 2018530108 A JP2018530108 A JP 2018530108A JP 2018530108 A JP2018530108 A JP 2018530108A JP 6642927 B2 JP6642927 B2 JP 6642927B2
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- nanoparticle
- source
- nanoparticles
- float bath
- slot
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- 238000000576 coating method Methods 0.000 title claims description 241
- 239000011248 coating agent Substances 0.000 title claims description 235
- 239000002105 nanoparticle Substances 0.000 claims description 467
- 239000011521 glass Substances 0.000 claims description 127
- 238000002485 combustion reaction Methods 0.000 claims description 83
- 239000000446 fuel Substances 0.000 claims description 46
- 239000007800 oxidant agent Substances 0.000 claims description 42
- 230000001590 oxidative effect Effects 0.000 claims description 42
- 239000012530 fluid Substances 0.000 claims description 23
- 238000007740 vapor deposition Methods 0.000 claims description 20
- 229910044991 metal oxide Inorganic materials 0.000 claims description 12
- 150000004706 metal oxides Chemical class 0.000 claims description 12
- 238000011144 upstream manufacturing Methods 0.000 claims description 12
- 238000013016 damping Methods 0.000 claims description 11
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000003345 natural gas Substances 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 42
- 239000010410 layer Substances 0.000 description 33
- 239000000463 material Substances 0.000 description 30
- 239000000203 mixture Substances 0.000 description 14
- 239000002243 precursor Substances 0.000 description 14
- 239000011247 coating layer Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 239000000956 alloy Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000006060 molten glass Substances 0.000 description 8
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 8
- 230000005670 electromagnetic radiation Effects 0.000 description 7
- 239000005329 float glass Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical compound CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 5
- 239000011368 organic material Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000002082 metal nanoparticle Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- QVMHUALAQYRRBM-UHFFFAOYSA-N [P].[P] Chemical compound [P].[P] QVMHUALAQYRRBM-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 229910003668 SrAl Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002707 nanocrystalline material Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- -1 poly (p-phenylenevinylene) Polymers 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
- B05C19/04—Apparatus specially adapted for applying particulate materials to surfaces the particulate material being projected, poured or allowed to flow onto the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
- C03C14/004—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of particles or flakes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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Description
Claims (20)
- フロートバス中に配置された少なくとも1つのナノ粒子コーティング装置と、
前記少なくとも1つのナノ粒子コーティング装置の下流に配置された少なくとも1つの蒸着コーティング装置と
を備えるフロートバスコーティングシステムであって、
前記少なくとも1つのナノ粒子コーティング装置は、
ハウジングと、
ナノ粒子源及びキャリア流体源に接続されて、前記ナノ粒子源からガラスリボン上に直接にナノ粒子を付加するようになっている、ナノ粒子放出スロットと、
前記ナノ粒子放出スロットの上流に位置する第1燃焼スロットであって、該第1燃焼スロットは、第1火炎を点火するように構成され、該第1火炎は前記ガラスリボンの表面を加熱するようになっている、前記第1燃焼スロットと、
第2火炎を点火するように構成された第2燃焼スロットであって、該第2火炎は前記ガラスリボンの表面を加熱して、前記ナノ粒子を付加した後の前記ガラスリボンの表面を平滑にするようになっている、前記第2燃焼スロットと
を備える、フロートバスコーティングシステム。 - 前記フロートバスは減衰領域を含み、前記少なくとも1つのナノ粒子コーティング装置は、前記減衰領域の上流に配置されている、請求項1に記載のフロートバスコーティングシステム。
- 前記フロートバスは減衰領域を含み、前記少なくとも1つのナノ粒子コーティング装置は、前記減衰領域の下流に配置されている、請求項1又は2に記載のフロートバスコーティングシステム。
- 前記ナノ粒子源は、蒸発器を備える、請求項1に記載のフロートバスコーティングシステム。
- 前記ナノ粒子源は、金属酸化物ナノ粒子を有する、請求項1に記載のフロートバスコーティングシステム。
- 前記ナノ粒子源は、発光性及び/又は燐光性ナノ粒子を有する、請求項1のフロートバスコーティングシステム。
- 前記ナノ粒子源は蛍光体を有する、請求項6に記載のフロートバスコーティングシステム。
- 前記ナノ粒子源は発光ナノ結晶性ナノ粒子を有する、請求項1のフロートバスコーティングシステム。
- 前記第1燃焼スロットは、燃料源及び酸化剤源に接続されている、請求項1に記載のフロートバスコーティングシステム。
- 前記燃料源は天然ガスを含む、請求項9に記載のフロートバスコーティングシステム。
- 前記酸化剤源は酸素を含む、請求項10に記載のフロートバスコーティングシステム。
- 前記ナノ粒子放出スロットは、前記第1燃焼スロットと前記第2燃焼スロットとの間に配置されている、請求項1に記載のフロートバスコーティングシステム。
- 第1ナノ粒子コーティング装置及び第2ナノ粒子コーティング装置を備える、請求項1に記載のフロートバスコーティングシステム。
- 前記第1ナノ粒子コーティング装置は第1ナノ粒子源に接続され、前記第2ナノ粒子コーティング装置は第2ナノ粒子源に接続されている、請求項13に記載のフロートバスコーティングシステム。
- 前記第1ナノ粒子源は、前記第2ナノ粒子源とは異なる、請求項14に記載のフロートバスコーティングシステム。
- 前記第1ナノ粒子コーティング装置は、第1燃料源及び第1酸化剤源に接続され、前記第2ナノ粒子コーティング装置は、第2燃料源及び第2酸化剤源に接続されている、請求項13に記載のフロートバスコーティングシステム。
- 前記第1燃料源は、前記第2燃料源とは異なる、請求項16に記載のフロートバスコーティングシステム。
- フロートバス中に配置された少なくとも1つのナノ粒子コーティング装置を備えるフロートバスコーティングシステムであって、
前記少なくとも1つのナノ粒子コーティング装置はハウジングを備え、該ハウジングは、その中に延在するナノ粒子放出スロット、第1燃焼スロットおよび第2燃焼スロットを備え、
前記ナノ粒子放出スロットは、ナノ粒子源及びキャリア流体源に接続されて、前記ナノ粒子源からガラスリボン上に直接にナノ粒子を付加するようになっており、
前記第1燃焼スロットは、第1燃料源及び第1酸化剤源に接続され、
前記第2燃焼スロットは、第2燃料源及び第2酸化剤源に接続され、
前記第1燃焼スロットは、前記ナノ粒子放出スロットの上流に位置し、前記第1燃焼スロットは、第1火炎を形成して前記ガラスリボンの表面を加熱するように構成されている、フロートバスコーティングシステム。 - 前記第2燃焼スロットは、第2火炎を形成するように構成され、該第2火炎は前記ガラスリボンの表面に向けられ、前記ナノ粒子を付加した後の前記ガラスリボンの表面を平滑にするようになっている、請求項18に記載のフロートバスコーティングシステム。
- 前記ナノ粒子放出スロットは、前記第1燃焼スロットと前記第2燃焼スロットとの間に位置し、前記第1燃焼スロットおよび前記第2燃焼スロットは、前記第1火炎および前記第2火炎を前記ガラスリボンの表面に向けるように構成されている、請求項19に記載のフロートバスコーティングシステム。
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JP2021070154A Pending JP2021120343A (ja) | 2015-12-11 | 2021-04-19 | コーティングシステム及びそれによって製造された物品 |
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EP (1) | EP3386645A1 (ja) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11014118B2 (en) * | 2015-12-11 | 2021-05-25 | Vitro Flat Glass Llc | Float bath coating system |
KR20180062249A (ko) * | 2016-11-30 | 2018-06-08 | 엘지디스플레이 주식회사 | 커버 윈도우 및 이를 포함하는 폴더블 표시장치 |
WO2020022920A1 (en) * | 2018-07-23 | 2020-01-30 | Corning Incorporated | Light extraction structure with high index nanoparticles for an organic light emitting diode |
CN111604233B (zh) * | 2020-06-10 | 2021-07-09 | 广东宸际内衣生物科技有限公司 | 一种彩色植绒布的植绒系统及其植绒方法 |
CN113277712A (zh) * | 2021-04-19 | 2021-08-20 | 信义节能玻璃(芜湖)有限公司 | 一种基于浮法联线系统 |
Family Cites Families (81)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2920001A (en) * | 1955-07-11 | 1960-01-05 | Union Carbide Corp | Jet flame spraying method and apparatus |
DE1184287B (de) * | 1957-04-18 | 1964-12-23 | Davy & United Eng Co Ltd | Duese zum Erzeugen eines flachen Schmieroelstrahls, insbesondere fuer die Bearbeitung von Blechbahnen |
GB1283432A (en) | 1970-03-24 | 1972-07-26 | Pilkington Brothers Ltd | Improvements in or relating to the coating of glass |
SE431196B (sv) * | 1980-12-12 | 1984-01-23 | Flemmert Goesta Lennart | Sett att genom hydrolys av kiseltetrafluorid i en laga framstella finfordelad kiseloxid |
JPS6022957A (ja) * | 1983-07-20 | 1985-02-05 | Japanese National Railways<Jnr> | 肉盛溶射装置 |
DE3403894C1 (de) * | 1984-02-04 | 1985-07-25 | Kulzer & Co GmbH, 6393 Wehrheim | Vorrichtung zum Beschichten eines metallischen Dentalprothesenteils und Verfahren zum Betrieb einer solchen Vorrichtung |
US4924936A (en) | 1987-08-05 | 1990-05-15 | M&T Chemicals Inc. | Multiple, parallel packed column vaporizer |
FR2675139B1 (fr) | 1991-04-09 | 1993-11-26 | Saint Gobain Vitrage Internal | Depot de couches pyrolysees a performances ameliorees et vitrage revetu d'une telle couche. |
FR2677639B1 (fr) | 1991-06-14 | 1994-02-25 | Saint Gobain Vitrage Internal | Technique de formation par pyrolyse en voie gazeuse d'un revetement essentiellement a base d'oxygene et de silicium. |
US5356451A (en) | 1993-12-20 | 1994-10-18 | Corning Incorporated | Method and apparatus for vaporization of liquid reactants |
TW359943B (en) | 1994-07-18 | 1999-06-01 | Silicon Valley Group Thermal | Single body injector and method for delivering gases to a surface |
US5858046A (en) * | 1995-05-30 | 1999-01-12 | Corning Incorporated | Method of making an internally channeled glass article |
FR2736632B1 (fr) | 1995-07-12 | 1997-10-24 | Saint Gobain Vitrage | Vitrage muni d'une couche conductrice et/ou bas-emissive |
US5762674A (en) * | 1995-09-27 | 1998-06-09 | Glasstech, Inc. | Apparatus for coating glass sheet ribbon |
US6507116B1 (en) * | 1997-04-24 | 2003-01-14 | International Business Machines Corporation | Electronic package and method of forming |
JP3501709B2 (ja) * | 1999-02-25 | 2004-03-02 | キヤノン株式会社 | 電子線装置用支持部材の製造方法および画像表示装置の製造方法 |
FI114548B (fi) | 1999-10-19 | 2004-11-15 | Liekki Oy | Menetelmä materiaalin värjäämiseksi |
US6526811B2 (en) | 2000-02-23 | 2003-03-04 | Jmic, Inc. | Analytical apparatus for measurement of low concentration constituent, method of measurement and calibration using the same |
US7078071B2 (en) * | 2000-10-05 | 2006-07-18 | Matsumoto Yushi-Seiyaku Co., Ltd. | Glass composite including dispersed rare earth iron garnet nanoparticles |
US6828043B2 (en) * | 2001-03-16 | 2004-12-07 | David K. Sturley | Luminous panel |
US20030037569A1 (en) | 2001-03-20 | 2003-02-27 | Mehran Arbab | Method and apparatus for forming patterned and/or textured glass and glass articles formed thereby |
US6680578B2 (en) * | 2001-09-19 | 2004-01-20 | Osram Opto Semiconductors, Gmbh | Organic light emitting diode light source |
GB0130057D0 (en) * | 2001-12-14 | 2002-02-06 | Dunne Stephen T | Liquid atomising system |
WO2003080530A1 (fr) | 2002-03-26 | 2003-10-02 | Nippon Sheet Glass Company, Limited | Substrat de verre et processus de production de ce substrat |
WO2004002909A1 (en) | 2002-06-28 | 2004-01-08 | Pirelli & C. S.P.A. | Method and device for vaporizing a liquid reactant in manufacturing a glass preform |
US9533913B2 (en) | 2002-07-19 | 2017-01-03 | Vitro, S.A.B. De C.V. | Methods of making colored glass by surface modification |
CN100335434C (zh) * | 2002-07-19 | 2007-09-05 | Ppg工业俄亥俄公司 | 具有纳米级结构的玻璃制品及其生产方法 |
US6776496B2 (en) * | 2002-08-19 | 2004-08-17 | Eastman Kodak Company | Area illumination lighting apparatus having OLED planar light source |
US7278353B2 (en) | 2003-05-27 | 2007-10-09 | Surface Treatment Technologies, Inc. | Reactive shaped charges and thermal spray methods of making same |
DE102004029911B4 (de) * | 2003-06-20 | 2006-11-23 | Innovent E.V. Technologieentwicklung | Verfahren und Anordnung zur Herstellung anorganischer Schichten |
FR2856512A1 (fr) * | 2003-06-23 | 2004-12-24 | Saint Gobain | Systeme eclairant a haute performance mecanique et optique |
EP1644660A2 (fr) | 2003-06-23 | 2006-04-12 | Saint-Gobain Glass France | Systeme eclairant a haute performance mecanique et optique |
US7482220B2 (en) | 2005-02-15 | 2009-01-27 | Semiconductor Components Industries, L.L.C. | Semiconductor device having deep trench charge compensation regions and method |
CN101258027A (zh) * | 2005-08-31 | 2008-09-03 | 纳幕尔杜邦公司 | 阳光控制层压体 |
CA2626603C (en) * | 2005-10-17 | 2014-07-15 | National Research Council Of Canada | Reactive spray formation of coatings and powders |
US20070141114A1 (en) * | 2005-12-15 | 2007-06-21 | Essilor International Compagnie Generale D'optique | Article coated with an ultra high hydrophobic film and process for obtaining same |
MY150737A (en) | 2006-02-23 | 2014-02-28 | Meadwestvaco Corp | Method for treating a substrate |
FI121336B (fi) * | 2006-03-27 | 2010-10-15 | Beneq Oy | Hydrofobinen lasipinta |
FI20060288A0 (fi) * | 2006-03-27 | 2006-03-27 | Abr Innova Oy | Pinnoitusmenetelmä |
FI20060924A0 (fi) * | 2006-10-20 | 2006-10-20 | Beneq Oy | Lasinvärjäämislaite ja menetelmä lasin värjäämiseksi |
EA015999B1 (ru) * | 2006-10-24 | 2012-01-30 | Бенек Ой | Устройство для получения наночастиц |
FI20061014A0 (fi) * | 2006-11-17 | 2006-11-17 | Beneq Oy | Diffuusiopinnoitusmenetelmä |
TWI327958B (en) * | 2007-05-28 | 2010-08-01 | Daxon Technology Inc | Antireflective film and method for making thereof |
FI122502B (fi) * | 2007-12-20 | 2012-02-29 | Beneq Oy | Menetelmä ja laite lasin pinnoittamiseksi |
FI122879B (fi) * | 2008-02-18 | 2012-08-15 | Beneq Oy | Menetelmä lasin pinnan muokkaamiseksi |
US20090233088A1 (en) | 2008-03-13 | 2009-09-17 | Lewis Mark A | In situ nano-particle matrix loading of metal oxide coatings via combustion deposition |
US8795773B2 (en) | 2008-03-13 | 2014-08-05 | Guardian Industries Corp. | Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition |
WO2009120330A2 (en) | 2008-03-25 | 2009-10-01 | Corning Incorporated | Substrates for photovoltaics |
US8231730B2 (en) * | 2008-06-09 | 2012-07-31 | Guardian Industries Corp. | Combustion deposition burner and/or related methods |
US20100009188A1 (en) * | 2008-07-11 | 2010-01-14 | John Haozhong Xin | Nano-structured surface and an in situ method for forming the same |
US20100126227A1 (en) * | 2008-11-24 | 2010-05-27 | Curtis Robert Fekety | Electrostatically depositing conductive films during glass draw |
FI20080675A0 (fi) | 2008-12-23 | 2008-12-23 | Beneq Oy | Lasinpinnoitusmenetelmä ja -laite |
US8553333B2 (en) * | 2009-01-23 | 2013-10-08 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Nanostructured anti-reflective coatings for substrates |
DE102009007908A1 (de) * | 2009-02-06 | 2010-08-12 | Zylum Beteiligungsgesellschaft Mbh & Co. Patente Ii Kg | Verfahren zur Herstellung eines Dünnschicht-Photovoltaik-Systems und Dünnschicht-Photovoltaik-System |
GB0904803D0 (en) * | 2009-03-20 | 2009-05-06 | Univ London | Coated substrate |
US8864897B2 (en) * | 2009-04-30 | 2014-10-21 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings with self-cleaning properties |
FI20090319A0 (fi) * | 2009-09-03 | 2009-09-03 | Beneq Oy | Prosessinsäätömenetelmä |
FI122881B (fi) | 2009-12-15 | 2012-08-15 | Beneq Oy | Menetelmä lasialustan valmistamiseksi |
US10581020B2 (en) | 2011-02-08 | 2020-03-03 | Vitro Flat Glass Llc | Light extracting substrate for organic light emitting diode |
RU2439199C2 (ru) | 2010-01-18 | 2012-01-10 | Государственное образовательное учреждение высшего профессионального образования Балтийский государственный технический университет "ВОЕНМЕХ" им. Д.Ф. Устинова (БГТУ "ВОЕНМЕХ") | Способ формирования многослойного покрытия, содержащего наночастицы |
RU2417902C1 (ru) | 2010-04-27 | 2011-05-10 | Елена Юрьевна Кутузова | Изделие с декоративным покрытием, содержащим люминофоры (варианты) |
US20110249450A1 (en) * | 2010-04-09 | 2011-10-13 | Ngai Peter Y Y | Oled luminaire having intensity shaping for oled light source |
FR2959244B1 (fr) * | 2010-04-23 | 2012-06-29 | Commissariat Energie Atomique | Procede de preparation d'un revetement multicouche sur une surface d'un substrat par projection thermique. |
US9272947B2 (en) * | 2011-05-02 | 2016-03-01 | Corning Incorporated | Glass article having antireflective layer and method of making |
RU2462536C1 (ru) | 2011-05-11 | 2012-09-27 | Государственный научный центр Российской Федерации - федеральное государственное унитарное предприятие "Исследовательский Центр имени М.В. Келдыша" | Способ нанесения покрытий |
WO2013078040A1 (en) * | 2011-11-23 | 2013-05-30 | Corning Incorporated | Vapor deposition systems and processes for the protection of glass sheets |
JP2013115213A (ja) | 2011-11-28 | 2013-06-10 | Panasonic Idemitsu Oled Lighting Co Ltd | 面状発光装置、照明装置、及び面状発光装置の製造方法 |
US8523418B2 (en) * | 2011-12-01 | 2013-09-03 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | LED light bar and backlight module of liquid crystal display device |
US10059622B2 (en) * | 2012-05-07 | 2018-08-28 | Guardian Glass, LLC | Anti-reflection glass with tin oxide nanoparticles |
TWI593644B (zh) * | 2012-05-09 | 2017-08-01 | 康寧公司 | 製造覆蓋玻璃的方法 |
CN102850894A (zh) * | 2012-07-03 | 2013-01-02 | 杭州和合玻璃工业有限公司 | 一种减反射镀膜用复合溶胶及减反射镀膜光伏玻璃 |
FR2993203B1 (fr) * | 2012-07-11 | 2014-07-18 | Saint Gobain | Vitrage lumineux |
EP2935474A1 (en) * | 2012-12-20 | 2015-10-28 | 3M Innovative Properties Company | Anti-soiling, abrasion resistant constructions and methods of making |
US9335027B2 (en) | 2013-01-02 | 2016-05-10 | Massachusetts Institute Of Technology | Methods and apparatus for transparent display using scattering nanoparticles |
US9366787B2 (en) * | 2013-03-12 | 2016-06-14 | Ppg Industries Ohio, Inc. | Organic light emitting diode with light extracting layer |
CN105392627B (zh) * | 2013-03-25 | 2019-01-15 | 康宁公司 | 使用低玻璃转换温度包覆层的纹理化玻璃分层 |
JP2014234487A (ja) | 2013-06-05 | 2014-12-15 | 日本電気硝子株式会社 | 波長変換部材及び発光デバイス |
DE102014102256A1 (de) | 2014-02-21 | 2015-08-27 | Osram Oled Gmbh | Glasware, Glasware mit Leuchtstoff-Partikeln, Vorrichtung zum Herstellen einer Glasware, Verfahren zum Herstellen einer Glasware und Verfahren zum Herstellen einer Glasware mit Leuchtstoff-Partikeln |
US10672921B2 (en) * | 2015-03-12 | 2020-06-02 | Vitro Flat Glass Llc | Article with transparent conductive layer and method of making the same |
US11014118B2 (en) * | 2015-12-11 | 2021-05-25 | Vitro Flat Glass Llc | Float bath coating system |
CN109461805B (zh) * | 2018-03-07 | 2021-08-10 | 普瑞光电股份有限公司 | 具有位于包含荧光体的玻璃转换板上的玻璃透镜的汽车led光源 |
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