JP6626419B2 - 静電チャック、基板固定装置 - Google Patents
静電チャック、基板固定装置 Download PDFInfo
- Publication number
- JP6626419B2 JP6626419B2 JP2016195063A JP2016195063A JP6626419B2 JP 6626419 B2 JP6626419 B2 JP 6626419B2 JP 2016195063 A JP2016195063 A JP 2016195063A JP 2016195063 A JP2016195063 A JP 2016195063A JP 6626419 B2 JP6626419 B2 JP 6626419B2
- Authority
- JP
- Japan
- Prior art keywords
- groove
- electrostatic chuck
- heating element
- temperature sensor
- fixing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
図1は、本実施の形態に係る基板固定装置を簡略化して例示する図であり、図1(a)は断面図、図1(b)及び図1(c)は第1の溝及び第2の溝の部分拡大底面図である。但し、図1(b)は第2の溝に金属材が挿入されていない状態を、図1(c)は第2の溝に金属材が挿入されている状態を示している。
図2及び図3は、本実施の形態に係る基板固定装置の製造工程を例示する図である。図2及び図3を参照しながら、基板固定装置1の製造工程について説明する。なお、図2(a)〜図3(c)は、図1とは上下を反転した状態で描いている。
10 ベースプレート
15 水路
15a 冷却水導入部
15b 冷却水排出部
20 接着層
21 第1層
22 第2層
30 発熱部
31 絶縁層
32 発熱体
40 吸着保持部
41 基体
41x 第1の溝
41y 第2の溝
42 静電電極
50 温度センサ
60 金属材
70 静電チャック
311 絶縁樹脂フィルム
Claims (8)
- 一方の面に吸着対象物を吸着保持する吸着保持部と、前記吸着保持部の他方の面に設けられた発熱部と、を備えた静電チャックであって、
前記吸着保持部は、
一方の面が前記吸着対象物の載置面である基体と、
前記基体の厚さ方向の異なる位置に設けられ、前記発熱部側に開口する第1の溝及び第2の溝と、を有し、
前記第2の溝は、前記第1の溝よりも前記発熱部側に設けられて前記第1の溝と連通し、
平面視において、前記第2の溝の大きさは、前記第1の溝の大きさよりも大きく、
前記第1の溝の底面には温度センサが設けられ、
前記第2の溝には金属材が挿入され、
前記温度センサと前記金属材との間に空間が設けられていることを特徴とする静電チャック。 - 前記金属材は、前記基体を構成する材料よりも熱伝導率の高い材料により形成されていることを特徴とする請求項1に記載の静電チャック。
- 前記第1の溝は、前記第2の溝よりも深いことを特徴とする請求項1又は2に記載の静電チャック。
- 前記金属材の側面と前記第2の溝の内壁面との間に隙間が設けられていることを特徴とする請求項1乃至3の何れか一項に記載の静電チャック。
- 前記第1の溝及び前記第2の溝の平面形状は円形であり、前記第1の溝と前記第2の溝とは同心的に配置されていることを特徴とする請求項1乃至4の何れか一項に記載の静電チャック。
- 前記発熱部は、少なくとも一つの面が粗化された発熱体、及び前記発熱体を被覆する絶縁層を備え、
前記絶縁層と前記吸着保持部とが直接接合されていることを特徴とする請求項1乃至5の何れか一項に記載の静電チャック。 - 平面視において前記温度センサと重複する位置に前記発熱体が配置されていることを特徴とする請求項6に記載の静電チャック。
- 請求項1乃至7の何れか一項に記載の静電チャックがベースプレート上に搭載されたことを特徴とする基板固定装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016195063A JP6626419B2 (ja) | 2016-09-30 | 2016-09-30 | 静電チャック、基板固定装置 |
US15/702,274 US10593573B2 (en) | 2016-09-30 | 2017-09-12 | Electrostatic chuck and substrate fixing device |
TW106132085A TWI737814B (zh) | 2016-09-30 | 2017-09-19 | 靜電夾盤以及基板固定裝置 |
KR1020170123165A KR102345253B1 (ko) | 2016-09-30 | 2017-09-25 | 정전 척 및 기판 고정 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016195063A JP6626419B2 (ja) | 2016-09-30 | 2016-09-30 | 静電チャック、基板固定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018060833A JP2018060833A (ja) | 2018-04-12 |
JP6626419B2 true JP6626419B2 (ja) | 2019-12-25 |
Family
ID=61757179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016195063A Active JP6626419B2 (ja) | 2016-09-30 | 2016-09-30 | 静電チャック、基板固定装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10593573B2 (ja) |
JP (1) | JP6626419B2 (ja) |
KR (1) | KR102345253B1 (ja) |
TW (1) | TWI737814B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11289355B2 (en) | 2017-06-02 | 2022-03-29 | Lam Research Corporation | Electrostatic chuck for use in semiconductor processing |
CN111670491A (zh) | 2018-01-31 | 2020-09-15 | 朗姆研究公司 | 静电卡盘(esc)基座电压隔离 |
US11086233B2 (en) * | 2018-03-20 | 2021-08-10 | Lam Research Corporation | Protective coating for electrostatic chucks |
JP7278035B2 (ja) * | 2018-06-20 | 2023-05-19 | 新光電気工業株式会社 | 静電チャック、基板固定装置 |
KR102235765B1 (ko) * | 2018-08-24 | 2021-04-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 정전척 조립체 및 정전척 제조방법 |
KR102648439B1 (ko) * | 2021-11-25 | 2024-03-18 | 명지대학교 산학협력단 | 성능 평가 시스템 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4259123A (en) * | 1977-04-04 | 1981-03-31 | John Tymkewicz | Thermocouple probe-construction and mounting |
JPH06170670A (ja) * | 1992-12-08 | 1994-06-21 | Fuji Electric Co Ltd | 静電チャック装置およびその運転方法 |
JP4040814B2 (ja) * | 1998-11-30 | 2008-01-30 | 株式会社小松製作所 | 円盤状ヒータ及び温度制御装置 |
JP2001135714A (ja) * | 1999-08-09 | 2001-05-18 | Ibiden Co Ltd | 半導体製造・検査装置用セラミック基板 |
JP2004273460A (ja) | 1999-12-29 | 2004-09-30 | Ibiden Co Ltd | セラミックヒータ |
WO2001084888A1 (en) * | 2000-04-29 | 2001-11-08 | Ibiden Co., Ltd. | Ceramic heater and method of controlling temperature of the ceramic heater |
EP1345472A1 (en) * | 2000-11-24 | 2003-09-17 | Ibiden Co., Ltd. | Ceramic heater, and production method for ceramic heater |
JP5029257B2 (ja) * | 2007-01-17 | 2012-09-19 | 東京エレクトロン株式会社 | 載置台構造及び処理装置 |
US7651269B2 (en) * | 2007-07-19 | 2010-01-26 | Lam Research Corporation | Temperature probes having a thermally isolated tip |
JP4450106B1 (ja) * | 2008-03-11 | 2010-04-14 | 東京エレクトロン株式会社 | 載置台構造及び処理装置 |
JP5633766B2 (ja) * | 2013-03-29 | 2014-12-03 | Toto株式会社 | 静電チャック |
JP6215104B2 (ja) * | 2014-03-20 | 2017-10-18 | 新光電気工業株式会社 | 温度調整装置 |
JP6342769B2 (ja) | 2014-09-30 | 2018-06-13 | 日本特殊陶業株式会社 | 静電チャック |
JP6463938B2 (ja) * | 2014-10-08 | 2019-02-06 | 日本特殊陶業株式会社 | 静電チャック |
-
2016
- 2016-09-30 JP JP2016195063A patent/JP6626419B2/ja active Active
-
2017
- 2017-09-12 US US15/702,274 patent/US10593573B2/en active Active
- 2017-09-19 TW TW106132085A patent/TWI737814B/zh active
- 2017-09-25 KR KR1020170123165A patent/KR102345253B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US20180096869A1 (en) | 2018-04-05 |
TW201824446A (zh) | 2018-07-01 |
US10593573B2 (en) | 2020-03-17 |
JP2018060833A (ja) | 2018-04-12 |
TWI737814B (zh) | 2021-09-01 |
KR20180036554A (ko) | 2018-04-09 |
KR102345253B1 (ko) | 2021-12-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6626419B2 (ja) | 静電チャック、基板固定装置 | |
JP6708518B2 (ja) | 基板固定装置及びその製造方法 | |
TWI826597B (zh) | 基板固定裝置 | |
JP6697997B2 (ja) | 静電チャック、基板固定装置 | |
JP7328018B2 (ja) | 基板固定装置及びその製造方法 | |
TWI727080B (zh) | 基板固定裝置 | |
US20230420231A1 (en) | Substrate fixing device | |
US20220208593A1 (en) | Electrostatic chuck and substrate fixing device | |
US20240297026A1 (en) | Substrate fixing device | |
KR20240134762A (ko) | 기판 고정 장치 | |
KR20220133104A (ko) | 정전 척 및 기판 고정 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190305 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20191108 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20191119 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191129 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6626419 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |