JP6624998B2 - ボロンドープシリコンゲルマニウム膜の形成方法および形成装置 - Google Patents
ボロンドープシリコンゲルマニウム膜の形成方法および形成装置 Download PDFInfo
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- 229910000577 Silicon-germanium Inorganic materials 0.000 title claims description 40
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 title claims description 40
- 238000000034 method Methods 0.000 title claims description 33
- 239000007789 gas Substances 0.000 claims description 176
- 229910052796 boron Inorganic materials 0.000 claims description 28
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 229910052732 germanium Inorganic materials 0.000 claims description 11
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 238000005229 chemical vapour deposition Methods 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 238000003860 storage Methods 0.000 claims description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 7
- 229910000078 germane Inorganic materials 0.000 claims description 7
- 229910000077 silane Inorganic materials 0.000 claims description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
- 239000000460 chlorine Substances 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- -1 silane compound Chemical class 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- VXGHASBVNMHGDI-UHFFFAOYSA-N digermane Chemical compound [Ge][Ge] VXGHASBVNMHGDI-UHFFFAOYSA-N 0.000 claims description 3
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052986 germanium hydride Inorganic materials 0.000 claims description 3
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims description 3
- 230000000717 retained effect Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 44
- 239000011261 inert gas Substances 0.000 description 14
- 239000006185 dispersion Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 8
- 239000003990 capacitor Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000011534 incubation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 229910000085 borane Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
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Description
本発明に係るB−SiGe膜の形成方法は、下地上にシード層を介してB−SiGe膜を形成するものであるが、一実施形態として、半導体基板、典型的にはシリコン基板上に形成された下地膜上にB−SiGe膜を形成する場合について説明する。
まず、半導体基板200上に下地膜201が形成された被処理体を準備する(ステップ1、図2(a))。例えば、下地膜201としてはDRAMのキャパシタにおける上部電極が例示される。この場合は、半導体基板200上に、シリンダ状の下部電極と、その表面に形成された容量絶縁膜とを介して下地膜201となる上部電極が形成されるが、図2(a)では下地膜201の下の構造体は省略している。下地膜201としてDRAMのキャパシタの上部電極を用いる場合には、CVD法で形成されたTiN膜が例示される。下地膜201は、SiO2膜等の他の膜であってもよい。また、被処理体は半導体基板に限定されない。
あt
次に、本発明のB−SiGe膜の形成方法の実施に用いることができるB−SiGe膜の形成装置の一例について説明する。図3は、そのようなB−SiGe膜の形成装置の一例である成膜装置を示す縦断面図である。
次に実験例について説明する。
ここでは、BCl3ガスを用いてCVDによりB−Siシード層を形成した後、430℃でB−SiGe膜を形成する従来の条件(条件1)、および250℃でB2H6ガス(10%B2H6)を吸着させてB2H6シード層を形成した後、430℃、400℃、380℃の各温度で、B−SiGe膜を形成する本発明の条件(条件2、3、4)を用いて図3の装置により実験を行った。なお、ウエハボート内のウエハ枚数は125枚とし、B−SiGe膜の目標組成はGe:10at%、B:1at%、Si:89at%とした。
以上、本発明の実施形態について説明したが、この発明は、上記の実施形態に限定されることはなく、その趣旨を逸脱しない範囲で種々変形可能である。
2;加熱炉
4;ヒータ
10;処理容器
20;ウエハボート
21;Si原料ガス供給機構
22;Ge原料ガス供給機構
23;Bドープガス供給機構
24;Bシードガス供給機構
55;排気管
56;真空ポンプ
60;制御部
200;半導体基板
201;下地膜
202;シード層
203;B−SiGe膜
W;半導体ウエハ(被処理体)
Claims (14)
- 被処理体表面の下地の上にボロンドープシリコンゲルマニウム膜を形成するボロンドープシリコンゲルマニウム膜の形成方法であって、
前記下地表面に、300℃以下の温度で、ボロンと水素を含み塩素を含まないボロン含有ガスを吸着させてシード層を形成する工程と、
その後、前記シード層が吸着された前記下地表面に、シリコン原料ガス、ゲルマニウム原料ガス、およびボロンドープガスを用いてCVD法によりボロンドープシリコンゲルマニウム膜を成膜する工程と
を有することを特徴とするボロンドープシリコンゲルマニウム膜の形成方法。 - 前記被処理体は、その表面に前記下地を構成するTiN膜を有することを特徴とする請求項1に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記シード層を形成する際に、前記ボロン含有ガスとしてジボランガスを用いることを特徴とする請求項1または請求項2に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記シード層を形成する際の温度が250〜300℃であることを特徴とする請求項1から請求項3のいずれか1項に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記ボロンドープシリコンゲルマニウム膜を成膜する際に、前記シリコン原料ガスとしてシラン系化合物を用い、ゲルマニウム原料ガスとしてゲルマン系化合物を用いることを特徴とする請求項1から請求項4のいずれか1項に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記シラン系化合物は、モノシランまたはジシランであり、前記ゲルマン系化合物は、モノゲルマンまたはジゲルマンであることを特徴とする請求項5に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記ボロンドープガスは、三塩化ボロンガスまたはジボランガスであることを特徴とする請求項1から請求項6のいずれか1項に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記ボロンドープシリコンゲルマニウム膜を成膜する際の温度が、450℃以下であることを特徴とする請求項1から請求項7のいずれか1項に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記ボロンドープシリコンゲルマニウム膜を成膜する際の温度が、380〜430℃であることを特徴とする請求項8に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記ボロンドープシリコンゲルマニウム膜を成膜する際の温度が、380〜400℃であることを特徴とする請求項9に記載のボロンドープシリコンゲルマニウム膜の形成方法。
- 前記ボロンドープシリコンゲルマニウム膜は、ゲルマニウムの濃度が
20〜90at%の範囲であることを特徴とする請求項1から請求項10のいずれか1項に記載のボロンドープシリコンゲルマニウム膜の形成方法。 - 被処理体表面の下地の上にボロンドープシリコンゲルマニウム膜を形成するボロンドープシリコンゲルマニウム膜の形成装置であって、
前記被処理体を収容する処理容器と、
前記処理容器内に所定のガスを供給するガス供給部と、
前記処理容器内を加熱する加熱機構と、
前記処理容器内を排気して減圧状態とする排気機構と、
前記ガス供給部、前記加熱機構、および前記排気機構を制御する制御部と
を具備し、
前記制御部は、
前記加熱機構により、前記処理容器内を300℃以下の温度に制御し、前記ガス供給部に、ボロンと水素を含み塩素を含まないボロン含有ガスを前記処理容器内に供給させて、前記下地表面に、前記ボロン含有ガスを吸着させてシード層を形成させ、
前記加熱機構により、前記処理容器内を成膜温度に制御し、前記ガス供給部に、シリコン原料ガス、ゲルマニウム原料ガス、およびボロンドープガスを前記処理容器内に供給させて、前記シード層が吸着された前記下地表面に、CVD法によりボロンドープシリコンゲルマニウム膜を成膜させることを特徴とするボロンドープシリコンゲルマニウム膜の形成装置。 - 前記処理容器は、前記被処理体が複数保持された基板保持具が収容され、複数の基板に対して処理が行われることを特徴とする請求項12に記載のボロンドープシリコンゲルマニウム膜の形成装置。
- コンピュータ上で動作し、成膜装置を制御するためのプログラムが記憶された記憶媒体であって、前記プログラムは、実行時に、請求項1から請求項11のいずれかのボロンドープシリコンゲルマニウム膜の形成方法が行われるように、コンピュータに前記成膜装置を制御させることを特徴とする記憶媒体。
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