JP6612015B2 - 基板処理装置及び基板処理方法 - Google Patents

基板処理装置及び基板処理方法 Download PDF

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JP6612015B2
JP6612015B2 JP2014055836A JP2014055836A JP6612015B2 JP 6612015 B2 JP6612015 B2 JP 6612015B2 JP 2014055836 A JP2014055836 A JP 2014055836A JP 2014055836 A JP2014055836 A JP 2014055836A JP 6612015 B2 JP6612015 B2 JP 6612015B2
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liquid
substrate
processing
processing target
irradiation
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JP2014209595A (ja
JP2014209595A5 (enExample
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崇 大田垣
邦浩 宮崎
航之介 林
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Liquid Crystal (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
JP2014055836A 2013-03-28 2014-03-19 基板処理装置及び基板処理方法 Active JP6612015B2 (ja)

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JP2014055836A JP6612015B2 (ja) 2013-03-28 2014-03-19 基板処理装置及び基板処理方法

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JP2013069259 2013-03-28
JP2013069259 2013-03-28
JP2014055836A JP6612015B2 (ja) 2013-03-28 2014-03-19 基板処理装置及び基板処理方法

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JP2014209595A JP2014209595A (ja) 2014-11-06
JP2014209595A5 JP2014209595A5 (enExample) 2017-02-09
JP6612015B2 true JP6612015B2 (ja) 2019-11-27

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6934376B2 (ja) * 2017-09-20 2021-09-15 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
JP2025074800A (ja) * 2023-10-30 2025-05-14 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01286425A (ja) * 1988-05-13 1989-11-17 Hitachi Ltd 付着物除去方法とその装置
EP0428983A3 (en) * 1989-11-13 1991-12-11 Applied Materials, Inc. Particle removal from surfaces by pressure change
JPH047071A (ja) * 1990-04-24 1992-01-10 Ebara Res Co Ltd 洗浄方法
JPH0458527A (ja) * 1990-06-28 1992-02-25 Ebara Res Co Ltd 洗浄方法
JP2777498B2 (ja) * 1991-12-06 1998-07-16 三菱電機株式会社 基板の洗浄方法
JPH05259142A (ja) * 1992-03-12 1993-10-08 Hitachi Ltd 微細加工品の洗浄方法及び装置
JPH1064863A (ja) * 1996-08-21 1998-03-06 Nikon Corp 基板洗浄装置
JP2006093740A (ja) * 2002-07-16 2006-04-06 Chem Art Technol:Kk 基板処理方法及び基板処理装置

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