JP6550217B2 - 測定すべき光学面を制御するシステム - Google Patents

測定すべき光学面を制御するシステム Download PDF

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JP6550217B2
JP6550217B2 JP2014157446A JP2014157446A JP6550217B2 JP 6550217 B2 JP6550217 B2 JP 6550217B2 JP 2014157446 A JP2014157446 A JP 2014157446A JP 2014157446 A JP2014157446 A JP 2014157446A JP 6550217 B2 JP6550217 B2 JP 6550217B2
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optical
phase
optical element
control system
measured
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JP2014157446A
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Japanese (ja)
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JP2015031695A (ja
JP2015031695A5 (https=
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ジュリアン・フレ
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タレス
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02058—Passive reduction of errors by particular optical compensation or alignment elements, e.g. dispersion compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Dispersion Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2014157446A 2013-08-01 2014-08-01 測定すべき光学面を制御するシステム Active JP6550217B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1301855 2013-08-01
FR1301855A FR3009378B1 (fr) 2013-08-01 2013-08-01 Systeme de controle d'une surface optique a mesurer

Publications (3)

Publication Number Publication Date
JP2015031695A JP2015031695A (ja) 2015-02-16
JP2015031695A5 JP2015031695A5 (https=) 2019-01-24
JP6550217B2 true JP6550217B2 (ja) 2019-07-24

Family

ID=49667209

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014157446A Active JP6550217B2 (ja) 2013-08-01 2014-08-01 測定すべき光学面を制御するシステム

Country Status (5)

Country Link
US (1) US20150036149A1 (https=)
EP (1) EP2833094B1 (https=)
JP (1) JP6550217B2 (https=)
FR (1) FR3009378B1 (https=)
IN (1) IN2014DE02192A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12053240B2 (en) 2020-05-20 2024-08-06 Arizona Optical Metrology Llc Systems and methods for measurement of optical wavefronts

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4820049A (en) * 1987-10-16 1989-04-11 Zygo Corporation Coating and method for testing plano and spherical wavefront producing optical surfaces and systems having a broad range of reflectivities
DE19819762A1 (de) * 1998-05-04 1999-11-25 Bosch Gmbh Robert Interferometrische Meßeinrichtung
JP2003202204A (ja) * 2002-01-07 2003-07-18 Nikon Corp 干渉計、露光装置、および露光方法
US7317527B1 (en) * 2004-11-29 2008-01-08 Kla-Tencor Technologies Corporation Spatial light modulator fourier transform
JP4108085B2 (ja) * 2005-02-18 2008-06-25 富士通株式会社 光学歪補正装置および光学歪補正方法
US7599069B2 (en) * 2005-05-06 2009-10-06 The University Of Chicago Vector beam generator using a passively phase stable optical interferometer
US20060268282A1 (en) * 2005-05-25 2006-11-30 Evans Christopher J Adaptive nulls for testing off-axis segments of aspherics
US8049822B2 (en) * 2006-02-27 2011-11-01 Sanyo Electric Co., Ltd. Projection type video display
US20080297912A1 (en) * 2007-06-01 2008-12-04 Electro Scientific Industries, Inc., An Oregon Corporation Vario-astigmatic beam expander
US8243281B2 (en) * 2007-09-25 2012-08-14 Carl Zeiss Smt Gmbh Method and system for measuring a surface of an object
EP2286179B1 (en) * 2008-04-08 2021-05-19 QED Technologies International, Inc. Stitching of near-nulled subaperture measurements
KR101085061B1 (ko) * 2009-04-08 2011-11-18 한국과학기술원 고속카메라와 연속위상주사 방법을 이용한 진동둔감 간섭계
CN102661719B (zh) * 2012-04-16 2014-03-26 中国人民解放军国防科学技术大学 用于非球面子孔径拼接测量的近零位补偿器及面形测量仪和测量方法

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Publication number Publication date
JP2015031695A (ja) 2015-02-16
US20150036149A1 (en) 2015-02-05
FR3009378A1 (fr) 2015-02-06
EP2833094B1 (fr) 2019-05-22
EP2833094A1 (fr) 2015-02-04
FR3009378B1 (fr) 2016-12-09
IN2014DE02192A (https=) 2015-06-19

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