IN2014DE02192A - - Google Patents
Info
- Publication number
- IN2014DE02192A IN2014DE02192A IN2192DE2014A IN2014DE02192A IN 2014DE02192 A IN2014DE02192 A IN 2014DE02192A IN 2192DE2014 A IN2192DE2014 A IN 2192DE2014A IN 2014DE02192 A IN2014DE02192 A IN 2014DE02192A
- Authority
- IN
- India
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02058—Passive reduction of errors by particular optical compensation or alignment elements, e.g. dispersion compensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/005—Testing of reflective surfaces, e.g. mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1301855A FR3009378B1 (en) | 2013-08-01 | 2013-08-01 | SYSTEM FOR CONTROLLING AN OPTICAL SURFACE TO BE MEASURED |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014DE02192A true IN2014DE02192A (en) | 2015-06-19 |
Family
ID=49667209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN2192DE2014 IN2014DE02192A (en) | 2013-08-01 | 2014-08-01 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20150036149A1 (en) |
EP (1) | EP2833094B1 (en) |
JP (1) | JP6550217B2 (en) |
FR (1) | FR3009378B1 (en) |
IN (1) | IN2014DE02192A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12053240B2 (en) | 2020-05-20 | 2024-08-06 | Arizona Optical Metrology Llc | Systems and methods for measurement of optical wavefronts |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4820049A (en) * | 1987-10-16 | 1989-04-11 | Zygo Corporation | Coating and method for testing plano and spherical wavefront producing optical surfaces and systems having a broad range of reflectivities |
DE19819762A1 (en) * | 1998-05-04 | 1999-11-25 | Bosch Gmbh Robert | Interferometric measuring device |
JP2003202204A (en) * | 2002-01-07 | 2003-07-18 | Nikon Corp | Interferometer, exposure device and exposure method |
US7317527B1 (en) * | 2004-11-29 | 2008-01-08 | Kla-Tencor Technologies Corporation | Spatial light modulator fourier transform |
JP4108085B2 (en) * | 2005-02-18 | 2008-06-25 | 富士通株式会社 | Optical distortion correction apparatus and optical distortion correction method |
US7599069B2 (en) * | 2005-05-06 | 2009-10-06 | The University Of Chicago | Vector beam generator using a passively phase stable optical interferometer |
US20060268282A1 (en) * | 2005-05-25 | 2006-11-30 | Evans Christopher J | Adaptive nulls for testing off-axis segments of aspherics |
US8049822B2 (en) * | 2006-02-27 | 2011-11-01 | Sanyo Electric Co., Ltd. | Projection type video display |
US20080297912A1 (en) * | 2007-06-01 | 2008-12-04 | Electro Scientific Industries, Inc., An Oregon Corporation | Vario-astigmatic beam expander |
US8243281B2 (en) * | 2007-09-25 | 2012-08-14 | Carl Zeiss Smt Gmbh | Method and system for measuring a surface of an object |
EP2286179B1 (en) * | 2008-04-08 | 2021-05-19 | QED Technologies International, Inc. | Stitching of near-nulled subaperture measurements |
KR101085061B1 (en) * | 2009-04-08 | 2011-11-18 | 한국과학기술원 | Viration-insensitive interferometer using high-speed camera and continuous phase-scanning method |
CN102661719B (en) * | 2012-04-16 | 2014-03-26 | 中国人民解放军国防科学技术大学 | Near-null compensator, surface shape measuring instrument and measuring method for matching measurement of sub-apertures of aspheric surfaces |
-
2013
- 2013-08-01 FR FR1301855A patent/FR3009378B1/en not_active Expired - Fee Related
-
2014
- 2014-07-31 EP EP14179391.9A patent/EP2833094B1/en active Active
- 2014-07-31 US US14/448,251 patent/US20150036149A1/en not_active Abandoned
- 2014-08-01 IN IN2192DE2014 patent/IN2014DE02192A/en unknown
- 2014-08-01 JP JP2014157446A patent/JP6550217B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
FR3009378A1 (en) | 2015-02-06 |
JP6550217B2 (en) | 2019-07-24 |
EP2833094A1 (en) | 2015-02-04 |
FR3009378B1 (en) | 2016-12-09 |
US20150036149A1 (en) | 2015-02-05 |
JP2015031695A (en) | 2015-02-16 |
EP2833094B1 (en) | 2019-05-22 |