JP6515811B2 - トリアジン系重合体含有組成物 - Google Patents

トリアジン系重合体含有組成物 Download PDF

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JP6515811B2
JP6515811B2 JP2015554853A JP2015554853A JP6515811B2 JP 6515811 B2 JP6515811 B2 JP 6515811B2 JP 2015554853 A JP2015554853 A JP 2015554853A JP 2015554853 A JP2015554853 A JP 2015554853A JP 6515811 B2 JP6515811 B2 JP 6515811B2
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group
polymer
triazine
compound
methyl
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Japanese (ja)
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JPWO2015098788A1 (ja
Inventor
直也 西村
直也 西村
小澤　雅昭
雅昭 小澤
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C08K5/103—Esters; Ether-esters of monocarboxylic acids with polyalcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C08G73/026—Wholly aromatic polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C08G73/0273—Polyamines containing heterocyclic moieties in the main chain
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/0622—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
    • C08G73/0638—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with at least three nitrogen atoms in the ring
    • C08G73/0644—Poly(1,3,5)triazines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2015554853A 2013-12-24 2014-12-22 トリアジン系重合体含有組成物 Active JP6515811B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013265359 2013-12-24
JP2013265359 2013-12-24
PCT/JP2014/083819 WO2015098788A1 (fr) 2013-12-24 2014-12-22 Composition contenant un polymère de triazine

Publications (2)

Publication Number Publication Date
JPWO2015098788A1 JPWO2015098788A1 (ja) 2017-03-23
JP6515811B2 true JP6515811B2 (ja) 2019-05-22

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JP2015554853A Active JP6515811B2 (ja) 2013-12-24 2014-12-22 トリアジン系重合体含有組成物

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JP (1) JP6515811B2 (fr)
WO (1) WO2015098788A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10928729B2 (en) 2016-02-09 2021-02-23 Nissan Chemical Corporation Triazine-ring-containing polymer and composition including same
SG10202006580TA (en) 2016-04-20 2020-08-28 Jsr Corp Polymer, composition, molded article, cured product, and laminate
CN111108816A (zh) 2017-09-15 2020-05-05 Jsr株式会社 电路基板
WO2019167681A1 (fr) * 2018-02-28 2019-09-06 富士フイルム株式会社 Composition, film de revêtement, film durci, lentille, dispositif d'imagerie à l'état solide, résine
JPWO2021079977A1 (fr) * 2019-10-25 2021-04-29
TWI838589B (zh) 2019-10-25 2024-04-11 日商日產化學股份有限公司 含有三嗪環之聚合物及含有其之膜形成用組成物
JPWO2022225001A1 (fr) * 2021-04-23 2022-10-27
CN117222691A (zh) * 2021-04-23 2023-12-12 日产化学株式会社 含三嗪环的聚合物以及含有该聚合物的膜形成用组合物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4297492A (en) * 1979-03-23 1981-10-27 Ciba-Geigy Corporation Phenolic-1,3,5-triazines
JP3817696B2 (ja) * 2002-11-07 2006-09-06 山栄化学株式会社 フェノール性水酸基を含有するトリアジンジハライド及び芳香族（ポリ）グアナミン、並びにその組成物
JP4257786B2 (ja) * 2003-11-27 2009-04-22 タムラ化研株式会社 活性エネルギー線硬化型アルカリ可溶性イミド樹脂、活性エネルギー線硬化型アルカリ可溶性イミド樹脂組成物、ソルダーレジスト用組成物、プリント配線板および感光性ドライフィルム
JP2007139878A (ja) * 2005-11-15 2007-06-07 Fujifilm Corp 感光性組成物及び感光性フィルム、並びに永久パターン形成方法及びパターン
JP2007283293A (ja) * 2006-03-24 2007-11-01 Fujifilm Corp 積層体の製造方法、積層体、偏光板、及び画像表示装置
JP2010006760A (ja) * 2008-06-27 2010-01-14 Fujifilm Corp 新規アセチレン化合物縮合物、重縮合物、それらを含む組成物、及びその硬化物
JP5509447B2 (ja) * 2009-08-07 2014-06-04 株式会社カネカ トリアジン環を含む高分子電解質
JP5598258B2 (ja) * 2010-10-28 2014-10-01 日産化学工業株式会社 トリアジン環含有重合体含有高屈折率膜を備える電子デバイス
WO2012111682A1 (fr) * 2011-02-15 2012-08-23 日産化学工業株式会社 Composition filmogène photodurcissable et procédé de fabrication de film durci
WO2013094663A1 (fr) * 2011-12-20 2013-06-27 日産化学工業株式会社 Polymère à teneur en cycle triazine et composition de formation de film le comprenant
JP6355890B2 (ja) * 2013-02-22 2018-07-11 出光興産株式会社 トリアジン環を含有する重合体

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JPWO2015098788A1 (ja) 2017-03-23
WO2015098788A1 (fr) 2015-07-02

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