JP6495816B2 - エラストマーキャップ層を有する印刷版原版、および原版からの印刷版の製造方法 - Google Patents

エラストマーキャップ層を有する印刷版原版、および原版からの印刷版の製造方法 Download PDF

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Publication number
JP6495816B2
JP6495816B2 JP2015503319A JP2015503319A JP6495816B2 JP 6495816 B2 JP6495816 B2 JP 6495816B2 JP 2015503319 A JP2015503319 A JP 2015503319A JP 2015503319 A JP2015503319 A JP 2015503319A JP 6495816 B2 JP6495816 B2 JP 6495816B2
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Japan
Prior art keywords
layer
composition
actinic radiation
elastomer
photopolymerizable
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Active
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JP2015503319A
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English (en)
Japanese (ja)
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JP2015514232A (ja
JP2015514232A5 (enExample
Inventor
エム．ブロムクイスト ロバート
エム．ブロムクイスト ロバート
スティーブン ロック ジョン
スティーブン ロック ジョン
ダブリュ．シュウ チー
ダブリュ．シュウ チー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
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Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2015514232A publication Critical patent/JP2015514232A/ja
Publication of JP2015514232A5 publication Critical patent/JP2015514232A5/ja
Application granted granted Critical
Publication of JP6495816B2 publication Critical patent/JP6495816B2/ja
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2015503319A 2012-03-27 2013-03-15 エラストマーキャップ層を有する印刷版原版、および原版からの印刷版の製造方法 Active JP6495816B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261616199P 2012-03-27 2012-03-27
US61/616,199 2012-03-27
PCT/US2013/031860 WO2013148299A2 (en) 2012-03-27 2013-03-15 Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor

Publications (3)

Publication Number Publication Date
JP2015514232A JP2015514232A (ja) 2015-05-18
JP2015514232A5 JP2015514232A5 (enExample) 2016-04-21
JP6495816B2 true JP6495816B2 (ja) 2019-04-03

Family

ID=48050280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015503319A Active JP6495816B2 (ja) 2012-03-27 2013-03-15 エラストマーキャップ層を有する印刷版原版、および原版からの印刷版の製造方法

Country Status (4)

Country Link
US (2) US9134612B2 (enExample)
EP (1) EP2831672B1 (enExample)
JP (1) JP6495816B2 (enExample)
WO (1) WO2013148299A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107850838A (zh) * 2015-06-17 2018-03-27 爱克发有限公司 柔性版印刷原版及其磁性显影
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
US11014395B2 (en) 2016-04-01 2021-05-25 Asahi Kasei Kabushiki Kaisha Photosensitive resin constituent for flexographic printing plate and flexographic printing plate

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Also Published As

Publication number Publication date
WO2013148299A2 (en) 2013-10-03
EP2831672A2 (en) 2015-02-04
WO2013148299A3 (en) 2013-12-27
EP2831672B1 (en) 2017-09-27
US9713919B2 (en) 2017-07-25
JP2015514232A (ja) 2015-05-18
US9134612B2 (en) 2015-09-15
US20150328878A1 (en) 2015-11-19
US20130255513A1 (en) 2013-10-03

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