JP6487125B1 - フレキシブルディスプレイおよびその製造方法、ならびにフレキシブルディスプレイ用支持基板 - Google Patents
フレキシブルディスプレイおよびその製造方法、ならびにフレキシブルディスプレイ用支持基板 Download PDFInfo
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- 238000005498 polishing Methods 0.000 claims description 25
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- 239000002184 metal Substances 0.000 claims description 15
- 150000004703 alkoxides Chemical class 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 12
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 10
- 235000010290 biphenyl Nutrition 0.000 claims description 5
- 239000004305 biphenyl Substances 0.000 claims description 5
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- 229910000679 solder Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 136
- 239000010410 layer Substances 0.000 description 71
- 239000007789 gas Substances 0.000 description 43
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- 238000000034 method Methods 0.000 description 27
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
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- 238000002834 transmittance Methods 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
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- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
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- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
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- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
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- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
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- 238000010304 firing Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
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- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
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- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
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- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000012970 tertiary amine catalyst Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
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- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
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- H—ELECTRICITY
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- H10K50/00—Organic light-emitting devices
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H10K59/12—Active-matrix OLED [AMOLED] displays
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Abstract
Description
本発明の実施形態を説明する前に、本発明者によって見出された知見を説明する。
以下、本開示の実施形態を説明する。本実施形態では、ゾルゲル法によって液体材料から焼結体の層が形成され、この焼結体層で樹脂膜の表面の全体が覆われる。なお、以下の説明において、必要以上に詳細な説明は省略する場合がある。例えば、既によく知られた事項の詳細説明や実質的に同一の構成に対する重複説明を省略する場合がある。これは、以下の説明が不必要に冗長になるのを避け、当業者の理解を容易にするためである。本発明者らは、当業者が本開示を十分に理解するために添付図面および以下の説明を提供する。これらによって特許請求の範囲に記載の主題を限定することを意図するものではない。
(R1)mM(OR2)X-m (1)
ここで、R1は、アルキル基、シクロアルキル基、アリール基またはアラルキル基であり、置換基を有していてもよい。R2は、低級アルキル基である。R1およびR2は、mによって異なっていてもよい。Mは、3価以上の金属元素である。Xは、金属Mの価数である。mは、0〜2の整数であり、X−m≧2の関係を満足する。
Claims (5)
- フレキシブル基板と、
前記フレキシブル基板に支持されたOLED素子と、
前記フレキシブル基板を覆う第1のガスバリア膜であって、前記OLED素子と前記フレキシブル基板との間に位置している第1のガスバリア膜と、
前記フレキシブル基板に支持され、前記OLED素子を覆う第2のガスバリア膜と、
を備え、
前記フレキシブル基板は、
表面、および前記表面よりも平坦な裏面を有する樹脂膜と、
前記樹脂膜の前記表面を覆っている焼結体層と、
を有しており、
前記樹脂膜の前記表面は、高さが50nm以上300nm以下の突起部、および/または深さが50nm以上300nm以下の凹部を含む研磨傷を有しており、
前記焼結体層は、Ti、Ta、およびAlからなる群から選択された1種以上の金属の酸化物から形成され、
前記焼結体層は、100nm以上500nm以下の厚さを有し、かつ、前記樹脂膜の前記表面における前記研磨傷を平坦化し、前記樹脂膜の前記表面よりも平坦な上面を有している、フレキシブルディスプレイ。 - 前記樹脂膜は、ビフェニル型ポリイミドから形成されている、請求項1に記載のフレキシブルディスプレイ。
- ガラスベースと、
表面を有する樹脂膜であって、前記ガラスベースによって支持された、樹脂膜と、
前記樹脂膜の前記表面を覆っている焼結体層と、
前記焼結体層を覆うガスバリア膜と、
を有しており、
前記樹脂膜の前記表面は、高さが50nm以上300nm以下の突起部、および/または深さが50nm以上300nm以下の凹部を含む研磨傷を有しており、
前記焼結体層は、Ti、Ta、およびAlからなる群から選択された1種以上の金属の酸化物から形成され、
前記焼結体層は、100nm以上500nm以下の厚さを有し、かつ、前記樹脂膜の前記表面における前記研磨傷を平坦化し、前記樹脂膜の前記表面よりも平坦な上面を有している、フレキシブルディスプレイ用支持基板。 - ガラスベースおよび前記ガラスベース上の樹脂膜を有するフレキシブルディスプレイ用支持基板を用意する工程と、
前記樹脂膜の表面の一部を研磨して、高さが50nm以上300nm以下の突起部、および/または深さが50nm以上300nm以下の凹部を含む研磨傷を前記表面の一部に形成する工程、
前記樹脂膜の表面を覆う焼結体層を形成する工程と、
前記焼結体層の表面を覆う第1のガスバリア膜を形成する工程と、
前記フレキシブル基板に支持されるOLED素子を形成する工程と、
前記フレキシブル基板に支持され、前記OLED素子を覆う第2のガスバリア膜を形成する工程と、
を含み、
前記焼結体層を形成する工程は、
前記樹脂膜の前記表面に液体材料を供給すること、および
前記液体材料を450℃以上に加熱することによって前記液体材料から前記焼結体層を形成すること、を含み、
前記液体材料は、Ti、Ta、およびAlからなる群から選択された1種以上の金属のアルコキシドを含むゾルであり、
前記焼結体層は、100nm以上500nm以下の厚さを有し、かつ、前記樹脂膜の前記表面における前記研磨傷を平坦化し、前記樹脂膜の前記表面よりも平坦な上面を有している、フレキシブルディスプレイの製造方法。 - 前記樹脂膜はポリイミドから形成されており、
前記液体材料のpHは10以下である、請求項4に記載の製造方法。
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Citations (5)
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JP2009152633A (ja) * | 2005-11-15 | 2009-07-09 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法及び液晶表示装置の作製方法 |
JP2013028688A (ja) * | 2011-07-27 | 2013-02-07 | Kaneka Corp | 製膜性が改善されたポリイミド樹脂及び光学フィルム |
JP2015062184A (ja) * | 2005-03-10 | 2015-04-02 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス用フィルム基板、および有機エレクトロルミネッセンスデバイス |
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JP2009152633A (ja) * | 2005-11-15 | 2009-07-09 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法及び液晶表示装置の作製方法 |
JP2013028688A (ja) * | 2011-07-27 | 2013-02-07 | Kaneka Corp | 製膜性が改善されたポリイミド樹脂及び光学フィルム |
WO2016009801A1 (ja) * | 2014-07-14 | 2016-01-21 | コニカミノルタ株式会社 | ガスバリア性フィルムおよび電子デバイス |
JP2017073345A (ja) * | 2015-10-09 | 2017-04-13 | 新日鉄住金マテリアルズ株式会社 | 有機el素子用積層体及びその製造方法 |
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