JP6474861B2 - Polishing apparatus, polishing member processing or correction tool, polishing member processing or correction method, and polishing member manufacturing method - Google Patents

Polishing apparatus, polishing member processing or correction tool, polishing member processing or correction method, and polishing member manufacturing method Download PDF

Info

Publication number
JP6474861B2
JP6474861B2 JP2017130253A JP2017130253A JP6474861B2 JP 6474861 B2 JP6474861 B2 JP 6474861B2 JP 2017130253 A JP2017130253 A JP 2017130253A JP 2017130253 A JP2017130253 A JP 2017130253A JP 6474861 B2 JP6474861 B2 JP 6474861B2
Authority
JP
Japan
Prior art keywords
polishing
shape
polished
polishing member
tool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017130253A
Other languages
Japanese (ja)
Other versions
JP2017185623A (en
Inventor
均 森永
均 森永
宏 浅野
宏 浅野
伸悟 大月
伸悟 大月
玉井 一誠
一誠 玉井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujimi Inc
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of JP2017185623A publication Critical patent/JP2017185623A/en
Application granted granted Critical
Publication of JP6474861B2 publication Critical patent/JP6474861B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/06Devices or means for dressing or conditioning abrasive surfaces of profiled abrasive wheels
    • B24B53/07Devices or means for dressing or conditioning abrasive surfaces of profiled abrasive wheels by means of forming tools having a shape complementary to that to be produced, e.g. blocks, profile rolls
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B19/00Single-purpose machines or devices for particular grinding operations not covered by any other main group
    • B24B19/08Single-purpose machines or devices for particular grinding operations not covered by any other main group for grinding non-circular cross-sections, e.g. shafts of elliptical or polygonal cross-section
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/02Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12Dressing tools; Holders therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Description

本発明は、研磨部材を備える研磨装置とその周辺技術に関する。   The present invention relates to a polishing apparatus provided with a polishing member and its peripheral technology.

特許文献1に記載されているように、被研磨加工物(研磨加工される対象物)の被研磨部を研磨部材で磨くと、研磨部材の研磨面は徐々に形状が変化していく。そこで、一般的には、研磨面を修正して元の形状に戻す、いわゆるドレッシングが行われる。   As described in Patent Document 1, when a portion to be polished of an object to be polished (object to be polished) is polished with an abrasive member, the shape of the polished surface of the abrasive member gradually changes. Therefore, in general, so-called dressing is performed in which the polished surface is corrected and returned to the original shape.

特開平11−188590号公報JP 11-188590 A

ところで、従来のドレッシングは、平面状の研磨面を修正する目的で行われることが多く、被研磨加工物の被研磨部の形状に沿った様々な形状の研磨面をドレッシングすることについてはほとんど考慮されていない。   By the way, the conventional dressing is often performed for the purpose of correcting a flat polishing surface, and almost consideration is given to dressing various shapes of polishing surfaces along the shape of the portion to be polished of the workpiece. It has not been.

この発明は、こうした実情に鑑みてなされたものであり、その目的は、平面状とは異なる形状を有した研磨面の形状加工や形状修正を容易に行うことのできる研磨装置、その研磨装置が備える研磨部材の加工又は修正用の工具、研磨部材の加工又は修正方法、及び研磨部材の製造方法を提供することにある。   The present invention has been made in view of such circumstances, and an object of the present invention is to provide a polishing apparatus and a polishing apparatus that can easily perform shape processing and shape correction of a polishing surface having a shape different from a planar shape. An object of the present invention is to provide a polishing tool processing or correction tool, a polishing member processing or correction method, and a polishing member manufacturing method.

上記課題を解決する研磨装置は、被研磨加工物の被研磨部の形状に沿った形状の研磨面を有する樹脂、織物、不織布、不織布の樹脂加工品、合成皮革、又はこれらの複合品で形成された研磨部材と、前記被研磨部の形状と同一の形状を有しており、前記研磨面を前記被研磨部の形状に沿った形状に加工又は修正するための工具と、前記研磨面に対して前記工具を接触させる接触機構と、を備えるようにしている。   A polishing apparatus that solves the above problems is formed of a resin, a woven fabric, a nonwoven fabric, a resin processed product of a nonwoven fabric, a synthetic leather, or a composite product thereof having a polished surface that follows the shape of the part to be polished of the workpiece. A polishing member, a tool having the same shape as the shape of the portion to be polished, a tool for processing or correcting the polishing surface into a shape along the shape of the portion to be polished, and the polishing surface And a contact mechanism for bringing the tool into contact therewith.

同構成では、研磨部材が被研磨加工物の被研磨部の形状に沿った形状の研磨面を有している。従って、被研磨加工物の被研磨部が、例えば曲面や三角形状などのような平面状とは異なる形状であっても研磨することができる。   In this configuration, the polishing member has a polishing surface having a shape that follows the shape of the portion to be polished of the workpiece. Therefore, even if the part to be polished of the workpiece is different from a flat shape such as a curved surface or a triangular shape, it can be polished.

ここで、同構成では、被研磨部の形状と同一の形状を有しており研磨面を前記被研磨部の形状に沿った形状に加工又は修正するための工具が接触機構により研磨面に対して接触させられる。従って、前記工具が接触した研磨面は、被研磨加工物の被研磨部の形状と同一の形状を有した前記工具の形状が転写されることにより、被研磨加工物の被研磨部の形状に沿った形状に加工又は修正される。このように研磨部材の研磨面は被研磨加工物の被研磨部の形状に沿った形状になっているが、この研磨面の形状と前記工具の形状は一方が凹で他方が凸の関係になっているため、平面状とは異なる形状を有した研磨面の形状加工又は形状修正を容易に行うことができるようになる。   Here, in the same configuration, the tool has the same shape as the shape of the portion to be polished, and a tool for processing or correcting the polishing surface into a shape along the shape of the portion to be polished is applied to the polishing surface by the contact mechanism. Touch. Therefore, the polishing surface that is in contact with the tool is transferred to the shape of the portion to be polished of the workpiece by transferring the shape of the tool having the same shape as the shape of the portion to be polished of the workpiece to be polished. Processed or modified to the shape along. Thus, the polishing surface of the polishing member has a shape that conforms to the shape of the part to be polished of the workpiece, but the shape of the polishing surface and the shape of the tool are in such a relationship that one is concave and the other is convex. Therefore, shape processing or shape correction of the polished surface having a shape different from the planar shape can be easily performed.

なお、被研磨加工物の被研磨部の形状と前記工具の形状とが完全に同一である必要は無く、実用上問題が無い程度に互いの形状が若干異なっていてもよい。   Note that the shape of the part to be polished of the workpiece and the shape of the tool do not have to be completely the same, and the shapes may be slightly different from each other to the extent that there is no practical problem.

また、前記工具とは、研磨部材の研磨面を適切に加工することが出来るものであり、前記研磨部材の研磨面よりも硬度が高い加工部を有するものであれば特に制限は無く、具体例としては、ペレットや電着砥石などの固定砥粒付き加工工具、エンドミルやバイトなどの切削加工用工具を使用することが可能である。   Further, the tool is not particularly limited as long as it can process the polishing surface of the polishing member appropriately and has a processed part having a hardness higher than the polishing surface of the polishing member. As such, it is possible to use processing tools with fixed abrasives such as pellets and electrodeposition grindstones, and cutting tools such as end mills and tools.

あるいは、前記工具とは、研磨部材の表面を整えたり、研磨部材の表面に付着した汚れや固着物などを取り除いたりすることができるものであり、具体例としては、前記固定砥粒付き加工工具や、硬質のブラシなどを使用することが可能である。   Alternatively, the tool is a tool capable of adjusting the surface of the polishing member or removing dirt or fixed matter adhering to the surface of the polishing member. As a specific example, the tool with a fixed abrasive is used. Alternatively, a hard brush or the like can be used.

また、上記研磨装置は、接触機構による研磨面に対する工具の接触を所定周期毎に行うことが好ましい。同構成によれば、所定周期毎に研磨面が加工又は修正されるため、被研磨加工物を研磨するときの研磨精度を好適に維持することができる。   Moreover, it is preferable that the said grinding | polishing apparatus contacts the tool with respect to the grinding | polishing surface by a contact mechanism for every predetermined period. According to this configuration, since the polishing surface is processed or corrected every predetermined period, it is possible to favorably maintain the polishing accuracy when polishing the workpiece.

また、上記研磨装置において、研磨部材の研磨面は、前記被研磨部の形状とは異なる形状を有した研磨部材表面を前記工具に接触させることにより、前記被研磨部の形状に沿った形状に形成されていることが好ましい。   Further, in the above polishing apparatus, the polishing surface of the polishing member has a shape along the shape of the polished portion by bringing a surface of the polishing member having a shape different from the shape of the polished portion into contact with the tool. Preferably it is formed.

同構成によれば、被研磨加工物の被研磨部の形状に沿った形状の研磨面の形成が、当該研磨装置上で行われる。そのため、被研磨加工物の被研磨部の形状に沿った形状の研磨面が予め形成された研磨部材を研磨装置に取り付ける場合と比較して、そうした研磨面の形状を高精度に形成することができる。   According to this configuration, the formation of the polished surface along the shape of the portion to be polished of the workpiece is performed on the polishing apparatus. Therefore, it is possible to form the shape of such a polished surface with high accuracy as compared with a case where a polishing member having a polished surface formed in advance along the shape of the portion to be polished of the workpiece is attached to the polishing apparatus. it can.

また、上記研磨装置は、前記研磨部材を下方から回転させるモータを備えたり、研磨部材を上面に載置した状態で前記研磨部材と一体回転する定盤を備えたりすることが好ましい。これらの構成によれば、軸ぶれなどの少ない安定した研磨部材の回転が得られるようになるため、より高精度な加工を行うことができる。   The polishing apparatus preferably includes a motor that rotates the polishing member from below, or a surface plate that rotates integrally with the polishing member with the polishing member placed on the upper surface. According to these configurations, since stable rotation of the polishing member with less shaft runout or the like can be obtained, more accurate processing can be performed.

また、被研磨部の形状と同一の形状を有しており、研磨面を被研磨部の形状に沿った形状に加工又は修正するための工具を上記の研磨装置で用いることにより、平面状とは異なる形状を有した研磨面の形状加工又は修正を容易に行うことができる。   Moreover, it has the same shape as the shape of the part to be polished, and by using a tool for processing or correcting the polishing surface into a shape along the shape of the part to be polished in the above polishing apparatus, Can easily shape or modify a polished surface having a different shape.

また、上記課題を解決する研磨部材の加工又は修正方法では、被研磨加工物の被研磨部の形状に沿った形状の研磨面を有する樹脂、織物、不織布、不織布の樹脂加工品、合成皮革、又はこれらの複合品で形成された研磨部材の前記研磨面に対して、被研磨部の形状と同一の形状を有しており研磨面を被研磨部の形状に沿った形状に加工又は修正するための工具を接触させるようにしている。   Moreover, in the processing or correction method of the polishing member that solves the above problems, a resin having a polished surface that follows the shape of the part to be polished of the workpiece to be polished, a woven fabric, a nonwoven fabric, a resin processed product of a nonwoven fabric, a synthetic leather, Alternatively, the polishing surface of the polishing member formed of the composite product has the same shape as the shape of the portion to be polished, and the polishing surface is processed or corrected to a shape that matches the shape of the portion to be polished. Tool to make contact.

同方法では、被研磨加工物の被研磨部の形状に沿った形状の研磨面を有する研磨部材を用意している。従って、被研磨加工物の被研磨部が、例えば曲面や三角形状などのような平面状とは異なる形状であっても研磨することができる。   In this method, a polishing member having a polishing surface having a shape along the shape of a portion to be polished of a workpiece to be polished is prepared. Therefore, even if the part to be polished of the workpiece is different from a flat shape such as a curved surface or a triangular shape, it can be polished.

ここで、同方法では、被研磨部の形状と同一の形状を有しており研磨面を前記被研磨部の形状に沿った形状に加工又は修正するための工具を研磨面に対して接触させるようにしている。従って、前記工具が接触した研磨面は、被研磨加工物の被研磨部の形状と同一の形状を有した前記工具の形状が転写されることにより、被研磨加工物の被研磨部の形状に沿った形状に修正される。このように研磨部材の研磨面は被研磨加工物の被研磨部の形状に沿った形状になっているが、この研磨面の形状と前記工具の形状は一方が凹で他方が凸の関係になっているため、平面状とは異なる形状を有した研磨面の形状修正を容易に行うことができるようになる。   Here, in this method, a tool that has the same shape as the shape of the portion to be polished and that processes or modifies the polishing surface into a shape that conforms to the shape of the portion to be polished is brought into contact with the polishing surface. I am doing so. Therefore, the polishing surface that is in contact with the tool is transferred to the shape of the portion to be polished of the workpiece by transferring the shape of the tool having the same shape as the shape of the portion to be polished of the workpiece to be polished. It is corrected to the shape along. Thus, the polishing surface of the polishing member has a shape that conforms to the shape of the part to be polished of the workpiece, but the shape of the polishing surface and the shape of the tool are in such a relationship that one is concave and the other is convex. Therefore, the shape of the polished surface having a shape different from the planar shape can be easily corrected.

本発明によれば、平面状とは異なる形状を有した研磨面の形状加工又は形状修正を容易に行うことができる。   According to the present invention, it is possible to easily perform shape processing or shape correction of a polished surface having a shape different from a planar shape.

一実施形態の研磨装置の概略構成を示す平面図。The top view which shows schematic structure of the grinding | polishing apparatus of one Embodiment. 同実施形態の研磨装置の概略構成を示す側面図。The side view which shows schematic structure of the grinding | polishing apparatus of the embodiment. 同実施形態において形状加工用切削工具又は表面修正用工具が研磨部材に接触しているときの状態を示す研磨装置の部分側面図。The partial side view of the grinding | polishing apparatus which shows a state when the cutting tool for shape processing or the tool for surface correction is contacting the grinding | polishing member in the embodiment. 同実施形態において形状加工用切削工具又は表面修正用工具が研磨部材から離れたときの状態を示す研磨装置の部分側面図。The partial side view of the grinding | polishing apparatus which shows a state when the cutting tool for shape processing or the tool for surface correction leaves | separated from the grinding | polishing member in the embodiment. 同実施形態の変形例における研磨装置の概略構成を示す平面図。The top view which shows schematic structure of the grinding | polishing apparatus in the modification of the embodiment. 同実施形態の別の変形例における形状加工用切削工具の構造を示す側面図。The side view which shows the structure of the cutting tool for shape processing in another modification of the embodiment. (A)は、同実施形態の別の変形例における形状加工用切削工具の構造を示す側面図。(B)は、C−C線に沿った断面図。(A) is a side view which shows the structure of the cutting tool for shape processing in another modification of the embodiment. (B) is sectional drawing along CC line. 同実施形態の別の変形例における表面修正用工具の構造を示す側面図。The side view which shows the structure of the tool for surface correction in another modification of the embodiment. 同実施形態の別の変形例における接触機構の動作態様を示す側面図。The side view which shows the operation | movement aspect of the contact mechanism in another modification of the embodiment. 図9と同じ変形例における接触機構の動作態様を示す側面図。The side view which shows the operation | movement aspect of the contact mechanism in the same modification as FIG. 図9と同じ変形例における接触機構の動作態様を示す側面図。The side view which shows the operation | movement aspect of the contact mechanism in the same modification as FIG. 同実施形態の別の変形例における棒材の斜視図。The perspective view of the bar in another modification of the embodiment. 図12と同じ変形例における研磨部材の平面図。The top view of the polishing member in the same modification as FIG. 同実施形態の別の変形例における研磨部材の側面図。The side view of the grinding | polishing member in another modification of the embodiment. 図14と同じ変形例における研磨部材の平面図。The top view of the polishing member in the same modification as FIG. 図14と同じ変形例における研磨部材の側面断面図。FIG. 15 is a side cross-sectional view of a polishing member in the same modification as FIG. 同実施形態の別の変形例における被研磨加工物及び研磨部材の部分側面図。The partial side view of the to-be-polished workpiece and polishing member in another modification of the embodiment. 同実施形態の別の変形例における被研磨加工物及び研磨部材の部分側面図。The partial side view of the to-be-polished workpiece and the polishing member in another modification of the embodiment. 同実施形態の別の変形例における被研磨加工物及び研磨部材の部分側面図。The partial side view of the to-be-polished workpiece and the polishing member in another modification of the embodiment. 同実施形態の別の変形例における被研磨加工物及び研磨部材の部分側面図。The partial side view of the to-be-polished workpiece and polishing member in another modification of the embodiment. 同実施形態の別の変形例における被研磨加工物及び研磨部材の部分側面図。The partial side view of the to-be-polished workpiece and the polishing member in another modification of the embodiment. 同実施形態の別の変形例における研磨部材の部分側面図。The partial side view of the polishing member in another modification of the embodiment. 図22と同じ変形例における研磨部材の部分側面図。The partial side view of the grinding | polishing member in the same modification as FIG.

以下、本発明の研磨装置、研磨部材の修正方法、形状加工用切削工具及び表面修正用工具を具体化した一実施形態について、図1〜図4を参照して説明する。
図1に示すように、この研磨装置は、円盤状の研磨部材10を備えている。この研磨部材10の径方向の外周面を使って、被研磨加工物Kの被研磨部である端部KEが研磨される。この端部KEは、予めの加工によって曲面形状にされている。被研磨加工物Kの形状は、その用途等に応じて任意の形状とすることができる。
Hereinafter, an embodiment in which a polishing apparatus, a polishing member correction method, a shape processing cutting tool, and a surface correction tool of the present invention are embodied will be described with reference to FIGS.
As shown in FIG. 1, the polishing apparatus includes a disk-shaped polishing member 10. Using the outer peripheral surface of the polishing member 10 in the radial direction, the end KE, which is the portion to be polished, of the workpiece K is polished. The end KE is curved by pre-processing. The shape of the workpiece K can be any shape depending on the application.

研磨部材10の材質は、端部KEを研磨する上で最適なものを任意に使用できる。例えば、研磨部材10の材質として樹脂を使用する場合には、任意の合成樹脂を使用することができる。その例としては、熱硬化性樹脂(フェノール樹脂、エポキシ樹脂、ウレタン樹脂、ポリイミドなど)や、熱可塑性樹脂(ポリエチレン、ポリプロピレン、アクリル樹脂、ポリアミド、ポリカーボネートなど)が挙げられる。また、織物、不織布、不織布の樹脂加工品、合成皮革、あるいはこれらの複合品であってもよく、研磨部材10の研磨面の硬度は、ショアA硬度で5以上であることが好ましい。ショアA硬度が5以上であるとは、硬度を測定される検体であって研磨面を有する研磨部材10を、湿度20〜60%の乾燥状態で室温に60分以上置いた後、JIS K6253に準拠したゴム硬度計(A型)にて測定される研磨面の硬度が5以上であることをいう。ショアA硬度が5以上であれば、被研磨加工物Kの表面を好適に加工することができ、また、研磨部材10の研磨面が短時間の研磨で変形することを抑えることが出来る。   As the material of the polishing member 10, an optimum material for polishing the end KE can be arbitrarily used. For example, when a resin is used as the material of the polishing member 10, any synthetic resin can be used. Examples thereof include a thermosetting resin (phenol resin, epoxy resin, urethane resin, polyimide, etc.) and a thermoplastic resin (polyethylene, polypropylene, acrylic resin, polyamide, polycarbonate, etc.). Further, it may be a woven fabric, a non-woven fabric, a non-woven fabric processed resin product, synthetic leather, or a composite product thereof. The hardness of the polishing surface of the polishing member 10 is preferably 5 or more in Shore A hardness. A Shore A hardness of 5 or more means that a polishing member 10 that is a specimen whose hardness is to be measured and has a polishing surface is placed in a dry state at a humidity of 20 to 60% at room temperature for 60 minutes or more, and is then placed in JIS K6253. It means that the hardness of the polished surface measured by a compliant rubber hardness meter (type A) is 5 or more. When the Shore A hardness is 5 or more, the surface of the workpiece K can be suitably processed, and the polishing surface of the polishing member 10 can be prevented from being deformed by short-time polishing.

なお、研磨部材10の研磨面のショアA硬度は、より好ましくは40以上であり、更に好ましくは70〜95、特に好ましくは70〜85である。
また、研磨部材10の材質として金属を使用する場合には、材質として、マグネシウム、アルミニウム、チタン、鉄、ニッケル、コバルト銅、亜鉛、マンガン或いはそれを主成分とする合金を使用することができる。
The Shore A hardness of the polishing surface of the polishing member 10 is more preferably 40 or more, still more preferably 70 to 95, and particularly preferably 70 to 85.
Further, when a metal is used as the material of the polishing member 10, magnesium, aluminum, titanium, iron, nickel, cobalt copper, zinc, manganese, or an alloy mainly composed thereof can be used as the material.

なお、研磨部材10の材質として、樹脂又は金属を使用する場合には、研磨部材10は砥粒を有していても良い。使用する砥粒の種類は特に限定されないが、酸化ケイ素、酸化アルミニウム、酸化ジルコニウム、酸化セリウム、酸化マグネシウム、酸化カルシウム、酸化チタニウム、酸化マンガン、酸化鉄、酸化クロムなどの金属酸化物粒子や、炭化ケイ素などの炭化物、その他窒化物、硼化物、ダイヤモンド等を使用することが出来る。   In addition, when using resin or a metal as a material of the grinding | polishing member 10, the grinding | polishing member 10 may have an abrasive grain. The type of abrasive grains used is not particularly limited, but metal oxide particles such as silicon oxide, aluminum oxide, zirconium oxide, cerium oxide, magnesium oxide, calcium oxide, titanium oxide, manganese oxide, iron oxide, and chromium oxide, and carbonized Carbides such as silicon, other nitrides, borides, diamonds and the like can be used.

また、研磨部材10の材質としてセラミックスを使用する場合には、材質として、陶磁器やガラスの他、ケイ素、アルミニウム、ジルコニウム、カルシウム、バリウムなどの酸化物、窒化物、ホウ化物、炭化物などや、酸化アルミニウム、酸化ジルコニウム、酸化ケイ素、炭化ケイ素、窒化ケイ素、窒化ホウ素などを使用することができる。   Further, when ceramics are used as the material of the polishing member 10, as materials, ceramics, glass, oxides such as silicon, aluminum, zirconium, calcium, barium, nitrides, borides, carbides, etc. Aluminum, zirconium oxide, silicon oxide, silicon carbide, silicon nitride, boron nitride and the like can be used.

被研磨加工物Kの材質も任意のものを使用することができる。例えば、被研磨加工物Kの材質として樹脂を使用する場合には、任意の合成樹脂を使用することができる。その例としては、熱硬化性樹脂(フェノール樹脂、エポキシ樹脂、ウレタン樹脂、ポリイミドなど)や、熱可塑性樹脂(ポリエチレン、ポリプロピレン、アクリル樹脂、ポリアミド、ポリカーボネートなど)が挙げられる。   Any material can be used for the workpiece K to be polished. For example, when a resin is used as the material of the workpiece K, any synthetic resin can be used. Examples thereof include a thermosetting resin (phenol resin, epoxy resin, urethane resin, polyimide, etc.) and a thermoplastic resin (polyethylene, polypropylene, acrylic resin, polyamide, polycarbonate, etc.).

また、被研磨加工物Kの材質としてセラミックスを使用する場合には、陶磁器、ガラス、ファインセラミックスの他、ケイ素、アルミニウム、ジルコニウム、カルシウム、バリウムなどの酸化物、炭化物、窒化物、ホウ化物などを使用することができる。   When ceramics are used as the material of the workpiece K, ceramics, glass, fine ceramics, oxides such as silicon, aluminum, zirconium, calcium, barium, carbides, nitrides, borides, etc. Can be used.

また、被研磨加工物Kの材質として金属を使用する場合には、マグネシウム、アルミニウム、チタン、鉄、ニッケル、コバルト、銅、亜鉛、マンガン或いはそれを主成分とする合金等を使用することができる。   Further, when a metal is used as the material of the workpiece K, magnesium, aluminum, titanium, iron, nickel, cobalt, copper, zinc, manganese or an alloy containing the same as the main component can be used. .

また、被研磨加工物Kの具体的な用途についても任意である。例えばホイール、シャフト、容器、筐体(ケース、ハウジングなど)、枠(フレームなど)、ボール、ワイヤ、装飾品などをその用途とすることができる。   The specific use of the workpiece K is also arbitrary. For example, a wheel, a shaft, a container, a housing (a case, a housing, etc.), a frame (a frame, etc.), a ball, a wire, a decorative article, and the like can be used.

図2に示すように、研磨部材10は、円盤状の定盤20の上面に取り外し可能に固定されている。定盤20の中心部下面には、第1モータ21の回転軸が固定されている。第1モータ21が回転駆動されると、定盤20及び研磨部材10はともに回転する。研磨部材10及び定盤20の下に第1モータ21を設けており、定盤20の上面に配置された研磨部材10を同定盤20とともに下から回転させることにより、軸ぶれなどの少ない安定した研磨部材10の回転が得られるために、より高精度な加工を行うことができる。   As shown in FIG. 2, the polishing member 10 is detachably fixed to the upper surface of a disk-shaped surface plate 20. A rotation shaft of the first motor 21 is fixed to the lower surface of the center portion of the surface plate 20. When the first motor 21 is driven to rotate, both the surface plate 20 and the polishing member 10 rotate. The first motor 21 is provided under the polishing member 10 and the surface plate 20, and the polishing member 10 disposed on the upper surface of the surface plate 20 is rotated together with the identification plate 20 from the bottom, so that the shaft shake and the like are stable. Since the rotation of the polishing member 10 can be obtained, more accurate processing can be performed.

研磨部材10の径方向の外周面には、周方向に延びる溝状の曲面形状を有した研磨面11が設けられている。この研磨面11の曲面は、被研磨加工物Kの端部KEの形状(被研磨部の形状)に沿った形にされている。つまり研磨面11の曲率は、端部KEの曲率と同じにされている。   A polishing surface 11 having a groove-like curved surface extending in the circumferential direction is provided on the outer circumferential surface of the polishing member 10 in the radial direction. The curved surface of the polishing surface 11 is shaped along the shape of the end KE of the workpiece K (the shape of the portion to be polished). That is, the curvature of the polished surface 11 is the same as the curvature of the end KE.

被研磨加工物Kは、固定台32に取り外し可能に保持されている。固定台32は、第2モータ30の回転軸31に固定されている。第2モータ30は、当該第2モータ30を研磨部材10の回転軸と直交する方向(図1及び図2に示す矢印X方向)に往復移動させるモータ移動機構33に取り付けられている。このモータ移動機構33によって第2モータ30が移動されると、第2モータ30及び回転軸31及び固定台32及び被研磨加工物Kは、一体となって研磨部材10の回転軸と直交する方向に移動する。こうしたモータ移動機構33による第2モータ30の移動によって、被研磨加工物Kの端部KEは、研磨面11に押し付けられる。そして、端部KEと研磨面11との接触部に、適宜の態様で加工液等が供給されるとともに、第1モータ21及び第2モータ30が所定の回転速度で駆動されることにより、曲面形状を有した端部KEの研磨加工が行われる。なお、被研磨加工物Kの端部KEを研磨面11に押し付ける際には、予め定められた規定の圧力が付与されるように押し付け力は調整される。   The workpiece K is detachably held on the fixed base 32. The fixed base 32 is fixed to the rotating shaft 31 of the second motor 30. The second motor 30 is attached to a motor moving mechanism 33 that reciprocates the second motor 30 in a direction orthogonal to the rotation axis of the polishing member 10 (the direction of the arrow X shown in FIGS. 1 and 2). When the second motor 30 is moved by the motor moving mechanism 33, the second motor 30, the rotating shaft 31, the fixed base 32, and the workpiece K to be polished are integrated in a direction orthogonal to the rotating shaft of the polishing member 10. Move to. By such movement of the second motor 30 by the motor moving mechanism 33, the end KE of the workpiece K is pressed against the polishing surface 11. Then, the working fluid or the like is supplied to the contact portion between the end KE and the polishing surface 11 in an appropriate manner, and the first motor 21 and the second motor 30 are driven at a predetermined rotational speed, whereby a curved surface is obtained. The end KE having the shape is polished. Note that when the end KE of the workpiece K is pressed against the polishing surface 11, the pressing force is adjusted so that a predetermined pressure is applied.

加工液の供給は、端部KEと研磨面11との接触部に対して外部から直接供給することができる。または、研磨部材10と第1モータ21との接続部にロータリジョイントなどの加工液供給機構を介在させる。そしてこの加工液供給機構から研磨部材10の内部に加工液を供給し、研磨部材10の内部に供給された加工液を、研磨部材10の内部に形成された供給路を介して上記接触部に供給することもできる。このように研磨部材10の内部から接触部に向けて加工液を供給することで、加工液をより効率的に供給することができる。また、加工液を効率よく使用するために、研磨部材10の周囲にカバーを設けて加工液の回収効率を上げる回収装置を備えていると更によい。   The machining liquid can be directly supplied from the outside to the contact portion between the end KE and the polishing surface 11. Alternatively, a machining fluid supply mechanism such as a rotary joint is interposed at the connection portion between the polishing member 10 and the first motor 21. Then, the machining liquid is supplied from the machining liquid supply mechanism to the inside of the polishing member 10, and the machining liquid supplied to the inside of the polishing member 10 is supplied to the contact portion through a supply path formed inside the polishing member 10. It can also be supplied. Thus, by supplying the processing liquid from the inside of the polishing member 10 toward the contact portion, the processing liquid can be supplied more efficiently. Further, in order to use the machining fluid efficiently, it is further preferable to provide a recovery device that provides a cover around the polishing member 10 to increase the recovery efficiency of the machining fluid.

上述した加工液の種類は、被研磨加工物Kや研磨部材10の材質に応じて適切なものを使用出来る。具体的には切削用、研削用加工液やラッピング材、ポリシング剤、化学機械研磨用研磨液などを使用することが出来る。加工液は砥粒を含有していても良い。使用する砥粒の種類は特に限定されないが、酸化ケイ素、酸化アルミニウム、酸化ジルコニウム、酸化セリウム、酸化マグネシウム、酸化カルシウム、酸化チタニウム、酸化マンガン、酸化鉄、酸化クロムなどの金属酸化物粒子や、炭化ケイ素などの炭化物、窒化物、硼化物、ダイヤモンド等を使用することが出来る。   As the type of the above-described machining liquid, an appropriate one can be used according to the material to be polished K or the polishing member 10. Specifically, cutting and grinding working fluids, lapping materials, polishing agents, chemical mechanical polishing polishing fluids, and the like can be used. The processing liquid may contain abrasive grains. The type of abrasive grains used is not particularly limited, but metal oxide particles such as silicon oxide, aluminum oxide, zirconium oxide, cerium oxide, magnesium oxide, calcium oxide, titanium oxide, manganese oxide, iron oxide, and chromium oxide, and carbonized Carbides such as silicon, nitrides, borides, diamonds and the like can be used.

例えば、加工液中の砥粒の含有量は、1質量%以上であることが好ましく、より好ましくは2質量%以上である。また、加工液中の砥粒の含有量は、50質量%以下であることが好ましく、より好ましくは40質量%以下である。   For example, the content of abrasive grains in the working fluid is preferably 1% by mass or more, and more preferably 2% by mass or more. Moreover, it is preferable that content of the abrasive grain in a processing liquid is 50 mass% or less, More preferably, it is 40 mass% or less.

加工液中の砥粒の平均二次粒子径は0.1μm以上であることが好ましく、より好ましくは0.3μm以上である。砥粒の平均二次粒子径が大きくなるにつれて、加工液による加工速度が向上するようになる。   The average secondary particle diameter of the abrasive grains in the working fluid is preferably 0.1 μm or more, more preferably 0.3 μm or more. As the average secondary particle diameter of the abrasive grains increases, the processing speed by the processing liquid is improved.

一方、加工液中の砥粒の平均二次粒子径は、20μm以下であることが好ましく、より好ましくは5μm以下である。加工液中の砥粒の平均二次粒子径が小さくなるにつれて、被研磨加工物Kの表面をより均一に研磨することができるようになる。ちなみに、砥粒の平均二次粒子径とは、例えば、堀場製作所社製の“LA−950”などのレーザ回折/散乱式粒子径分布測定装置を用いて測定した体積平均粒子径などのことである。   On the other hand, the average secondary particle diameter of the abrasive grains in the working fluid is preferably 20 μm or less, more preferably 5 μm or less. As the average secondary particle diameter of the abrasive grains in the processing liquid decreases, the surface of the workpiece K can be more uniformly polished. Incidentally, the average secondary particle size of abrasive grains is, for example, the volume average particle size measured using a laser diffraction / scattering particle size distribution measuring device such as “LA-950” manufactured by Horiba Ltd. is there.

上記加工液には、必要に応じて、pH調整剤、エッチング剤、酸化剤、水溶性重合体、共重合体やその塩、誘導体、防食剤、キレート剤、分散助剤、防腐剤、防黴剤等の他の成分を更に含んでも良い。   In the above-mentioned processing liquid, a pH adjuster, an etching agent, an oxidizing agent, a water-soluble polymer, a copolymer and a salt thereof, a derivative, an anticorrosive agent, a chelating agent, a dispersion aid, an antiseptic agent, and an antifungal agent, as necessary It may further contain other components such as an agent.

上記pH調整剤の例としては、公知の酸、塩基、またはそれらの塩を使用することができる。pH調整剤として使用できる酸の例としては、例えば、塩酸、硫酸、硝酸、フッ酸、ホウ酸、炭酸、次亜リン酸、亜リン酸、およびリン酸等の無機酸や、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、2−メチル酪酸、n−ヘキサン酸、3,3−ジメチル酪酸、2−エチル酪酸、4−メチルペンタン酸、n−ヘプタン酸、2−メチルヘキサン酸、n−オクタン酸、2−エチルヘキサン酸、安息香酸、グリコール酸、サリチル酸、グリセリン酸、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、マレイン酸、フタル酸、リンゴ酸、酒石酸、クエン酸、乳酸、ジグリコール酸、2−フランカルボン酸、2,5−フランジカルボン酸、3−フランカルボン酸、2−テトラヒドロフランカルボン酸、メトキシ酢酸、メトキシフェニル酢酸、およびフェノキシ酢酸等の有機酸が挙げられる。   As examples of the pH adjusting agent, known acids, bases, or salts thereof can be used. Examples of acids that can be used as pH adjusters include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, boric acid, carbonic acid, hypophosphorous acid, phosphorous acid, and phosphoric acid, formic acid, acetic acid, Propionic acid, butyric acid, valeric acid, 2-methylbutyric acid, n-hexanoic acid, 3,3-dimethylbutyric acid, 2-ethylbutyric acid, 4-methylpentanoic acid, n-heptanoic acid, 2-methylhexanoic acid, n-octane Acid, 2-ethylhexanoic acid, benzoic acid, glycolic acid, salicylic acid, glyceric acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, maleic acid, phthalic acid, malic acid, tartaric acid, citric acid Lactic acid, diglycolic acid, 2-furancarboxylic acid, 2,5-furandicarboxylic acid, 3-furancarboxylic acid, 2-tetrahydrofurancarboxylic acid, methoxyacetic acid, methoxyphene Le acetate, and phenoxy organic acids such as acetic acid.

pH調整剤として使用できる塩基の例としては、脂肪族アミン、芳香族アミン等のアミン、水酸化第四アンモニウムなどの有機塩基、水酸化カリウム等のアルカリ金属の水酸化物、アルカリ土類金属の水酸化物、およびアンモニア等が挙げられる。   Examples of bases that can be used as pH adjusters include amines such as aliphatic amines and aromatic amines, organic bases such as quaternary ammonium hydroxide, alkali metal hydroxides such as potassium hydroxide, alkaline earth metal A hydroxide, ammonia, etc. are mentioned.

また、上述した酸の代わりに、または上述した酸と組み合わせて、上記酸のアンモニウム塩やアルカリ金属塩等の塩をpH調整剤として用いてもよい。なお、こうしたpH調整剤は、加工液のpH値を、被研磨加工物Kの種類によって異なる最適値に調整するために用いられる。   Moreover, you may use salts, such as an ammonium salt of the said acid, an alkali metal salt, etc. as a pH adjuster instead of the acid mentioned above or combining with the acid mentioned above. Such a pH adjuster is used to adjust the pH value of the processing liquid to an optimum value that varies depending on the type of workpiece K to be polished.

上記エッチング剤の例としては、硝酸、硫酸、リン酸などの無機酸、酢酸、クエン酸、酒石酸やメタンスルホン酸などの有機酸、水酸化カリウム、水酸化ナトリウムなどの無機アルカリ、アンモニア、アミン、第四級アンモニウム水酸化物などの有機アルカリ等が挙げられる。   Examples of the etching agent include inorganic acids such as nitric acid, sulfuric acid and phosphoric acid, acetic acid, citric acid, organic acids such as tartaric acid and methanesulfonic acid, inorganic alkalis such as potassium hydroxide and sodium hydroxide, ammonia, amines, And organic alkalis such as quaternary ammonium hydroxides.

上記酸化剤の例としては、過酸化水素、過酢酸、過炭酸塩、過酸化尿素、過塩素酸塩、過硫酸塩等の他、硫酸、硝酸、リン酸及びその塩などのオキソ酸やその塩等が挙げられる。   Examples of the oxidizing agent include hydrogen peroxide, peracetic acid, percarbonate, urea peroxide, perchlorate, persulfate and the like, oxo acids such as sulfuric acid, nitric acid, phosphoric acid and salts thereof, and the like. Examples include salts.

上記水溶性重合体、共重合体やその塩、誘導体の例としては、ポリアクリル酸塩などのポリカルボン酸、ポリホスホン酸、ポリスチレンスルホン酸などのポリスルホン酸、キタンサンガム、アルギン酸ナトリウムなどの多糖類、ヒドロキシエチルセルロース、カルボキシメチルセルロースなどのセルロース誘導体、ポリエチレングリコール、ポリビニルアルコール、ポリビニルピロリドン、ソルビタンモノオレエート、単一種または複数種のオキシアルキレン単位を有するオキシアルキレン系重合体、ノニオン性界面活性剤、アニオン性界面活性剤等が挙げられる。ノニオン性界面活性剤の例としては、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルフェニルエーテル、ソルビタンモノオレエート、単一種又は複数種のオキシアルキレン単位を有するオキシアルキレン系重合体等が挙げられる。アニオン性界面活性剤の例としては、アルキルスルホン酸系化合物、アルキルベンゼンスルホン酸系化合物、アルキルナフタレンスルホン酸系化合物、メチルタウリン酸系化合物、アルキルジフェニルエーテルジスルホン酸系化合物、α−オレフィンスルホン酸系化合物、ナフタレンスルホン酸縮合物、スルホコハク酸ジエステル系化合物等が挙げられる。   Examples of the above water-soluble polymers, copolymers, salts and derivatives thereof include polycarboxylic acids such as polyacrylates, polysulfonic acids such as polyphosphonic acid and polystyrene sulfonic acid, polysaccharides such as chitansan gum and sodium alginate, hydroxy Cellulose derivatives such as ethyl cellulose and carboxymethyl cellulose, polyethylene glycol, polyvinyl alcohol, polyvinyl pyrrolidone, sorbitan monooleate, oxyalkylene polymers having one or more oxyalkylene units, nonionic surfactants, anionic surfactants Agents and the like. Examples of nonionic surfactants include polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, sorbitan monooleate, oxyalkylene polymers having a single kind or plural kinds of oxyalkylene units. Examples of anionic surfactants include alkyl sulfonic acid compounds, alkyl benzene sulfonic acid compounds, alkyl naphthalene sulfonic acid compounds, methyl tauric acid compounds, alkyl diphenyl ether disulfonic acid compounds, α-olefin sulfonic acid compounds, Naphthalenesulfonic acid condensate, sulfosuccinic acid diester compound and the like.

上記防食剤の例としては、アミン類、ピリジン類、テトラフェニルホスホニウム塩、ベンゾトリアゾール類、トリアゾール類、テトラゾール類、安息香酸等、単環化合物、縮合環を有する多環化合物、複素環式化合物等が挙げられる。   Examples of the anticorrosives include amines, pyridines, tetraphenylphosphonium salts, benzotriazoles, triazoles, tetrazoles, benzoic acid, monocyclic compounds, polycyclic compounds having a condensed ring, heterocyclic compounds, etc. Is mentioned.

上記キレート剤の例としては、グルコン酸等のカルボン酸系キレート剤、エチレンジアミン、ジエチレントリアミン、トリメチルテトラアミンなどのアミン系キレート剤、エチレンジアミン四酢酸、ニトリロ三酢酸、ヒドロキシエチルエチレンジアミン三酢酸、トリエチレンテトラミン六酢酸、ジエチレントリアミン五酢酸などのポリアミノポリカルボン系キレート剤、2−アミノエチルホスホン酸、1−ヒドロキシエチリデン−1,1−ジホスホン酸、アミノトリ(メチレンホスホン酸)、エチレンジアミンテトラキス(メチレンホスホン酸)、ジエチレントリアミンペンタ(メチレンホスホン酸)、エタン−1,1−ジホスホン酸、エタン−1,1,2−トリホスホン酸、メタンヒドロキシホスホン酸、1−ホスホノブタン−2,3,4−トリカルボン酸などの有機ホスホン酸系キレート剤、フェノール誘導体、1,3−ジケトン等が挙げられる。   Examples of the chelating agents include carboxylic acid chelating agents such as gluconic acid, amine chelating agents such as ethylenediamine, diethylenetriamine, and trimethyltetraamine, ethylenediaminetetraacetic acid, nitrilotriacetic acid, hydroxyethylethylenediaminetriacetic acid, triethylenetetramine hexa Polyaminopolycarboxylic chelating agents such as acetic acid and diethylenetriaminepentaacetic acid, 2-aminoethylphosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, aminotri (methylenephosphonic acid), ethylenediaminetetrakis (methylenephosphonic acid), diethylenetriaminepenta (Methylenephosphonic acid), ethane-1,1-diphosphonic acid, ethane-1,1,2-triphosphonic acid, methanehydroxyphosphonic acid, 1-phosphonobutane-2,3,4 Organic phosphonic acid chelating agent, such as a tricarboxylic acid, a phenol derivative, 1,3-diketones and the like.

上記分散助剤の例としては、ピロリン酸塩やヘキサメタリン酸塩などの縮合リン酸塩等が挙げられる。
上記防腐剤の例としては、次亜塩素酸ナトリウム等が挙げられる。
Examples of the dispersion aid include condensed phosphates such as pyrophosphate and hexametaphosphate.
Examples of the preservative include sodium hypochlorite and the like.

上記防黴剤の例としては、オキサゾリジン−2,5−ジオンなどのオキサゾリン等が挙げられる。
ちなみに、研磨精度を好適に維持できる範囲内で研磨部材10の直径をできる限り大きくすれば、研磨部材10の外周面において同時に複数の被研磨加工物Kの端部KEを研磨することができるため、生産性を向上させることができる。また、研磨部材10の直径をできる限り大きくすれば、研磨部材10の回転速度が同じであっても、外周では大きな線速度が得られるようになるため、研磨加工に際して研磨部材10の回転速度を比較的低くしても十分な線速度が得られるようになる。そのため、例えば加工液の飛散等を抑えることができる。
Examples of the antifungal agent include oxazolines such as oxazolidine-2,5-dione.
Incidentally, if the diameter of the polishing member 10 is made as large as possible within a range where the polishing accuracy can be suitably maintained, the end portions KE of the plurality of workpieces K can be simultaneously polished on the outer peripheral surface of the polishing member 10. , Productivity can be improved. Further, if the diameter of the polishing member 10 is made as large as possible, even if the rotation speed of the polishing member 10 is the same, a large linear velocity can be obtained on the outer periphery. Even if it is relatively low, a sufficient linear velocity can be obtained. Therefore, for example, scattering of the processing liquid can be suppressed.

先の図1に示すように、研磨部材10の径方向の外周面近傍であって研磨面11に対向する位置には、接触機構40が設けられている。
この接触機構40には、工具41が設けられている。この工具41は、棒状をなしておりその先端の加工部が端部KEの形状と同一の形状、より詳細には端部KEの曲率と同じ曲率を有している。そして工具41は、研磨面11を端部KEの形状に沿った形状に加工する形状加工用切削工具、又は研磨面11を端部KEの形状に沿った形状に修正する表面修正用工具として機能する。なお、工具41の材質は、研磨面11を加工又は修正する上で最適なものが選択されている。また、被研磨加工物Kの端部KEの形状と工具41の形状とは完全に同一である必要は無く、実用上問題が無い程度に互いの形状が若干異なっていてもよい。
As shown in FIG. 1, a contact mechanism 40 is provided at a position near the outer peripheral surface in the radial direction of the polishing member 10 and facing the polishing surface 11.
The contact mechanism 40 is provided with a tool 41. The tool 41 has a rod shape, and the processed portion at the tip thereof has the same shape as the shape of the end KE, more specifically, the same curvature as the curvature of the end KE. The tool 41 functions as a shape cutting tool for processing the polishing surface 11 into a shape along the shape of the end KE, or as a surface correction tool for correcting the polishing surface 11 into a shape along the shape of the end KE. To do. As the material of the tool 41, an optimum material for processing or correcting the polishing surface 11 is selected. Further, the shape of the end KE of the workpiece K and the shape of the tool 41 are not necessarily the same, and the shapes may be slightly different from each other to the extent that there is no practical problem.

上記接触機構40には、工具41が取り外し可能に固定される保持部42や、保持部42を研磨部材10の回転軸と直交する方向(図1に示す矢印M方向)に往復移動させる移動機構43も設けられている。なお、移動機構43の動力源としては、電力や油圧等を使用することができる。また、接触機構40の駆動は、CPU、RAM、及びROM等を備えた制御装置による自動駆動や、研磨装置を操作する操作者のスイッチ操作等によって行われる。   The contact mechanism 40 includes a holding portion 42 to which the tool 41 is detachably fixed, and a moving mechanism for reciprocating the holding portion 42 in a direction perpendicular to the rotation axis of the polishing member 10 (in the direction of arrow M shown in FIG. 1). 43 is also provided. In addition, as a power source of the moving mechanism 43, electric power, hydraulic pressure, or the like can be used. The contact mechanism 40 is driven by automatic driving by a control device including a CPU, RAM, ROM, or the like, or by a switch operation of an operator who operates the polishing apparatus.

図3及び図4に、接触機構40の動作態様を示す。
図3に示すように、接触機構40によって、保持部42が研磨部材10の回転中心に向かって(矢印M1の向きに)移動すると、工具41が研磨面11に接触する。より詳細には、工具41が研磨面11に対して押圧される。
3 and 4 show an operation mode of the contact mechanism 40.
As shown in FIG. 3, when the holding unit 42 is moved toward the rotation center of the polishing member 10 (in the direction of the arrow M <b> 1) by the contact mechanism 40, the tool 41 contacts the polishing surface 11. More specifically, the tool 41 is pressed against the polishing surface 11.

工具41を研磨面11に押圧するに際しては、定圧加工を行うことも可能ではあるが、定寸加工(定寸切り込み加工)にて行う方がより好ましい。定圧加工とは、主に表面粗さを向上させるために用いられる加工方法であり、研磨面11に対して工具41を一定の押圧力で押し付けて研磨する加工方法である。一方、定寸加工とは、主に形状を仕上げるために用いられる加工方法であり、研磨面11に対して工具41を一定の寸法だけ切り込んで研削する加工方法である。このように定寸加工は、形状を仕上げる加工に適しているため、工具41を使って研磨面11の形状を修正又は加工する際の加工方法に適しており、定圧加工を行う場合と比較してより精度良く形状の修正や加工を行うことができる。   When the tool 41 is pressed against the polishing surface 11, constant pressure processing can be performed, but it is more preferable to perform constant size processing (fixed cut processing). The constant pressure processing is a processing method mainly used for improving the surface roughness, and is a processing method in which the tool 41 is pressed against the polishing surface 11 with a constant pressing force for polishing. On the other hand, the sizing processing is a processing method mainly used for finishing the shape, and is a processing method in which the tool 41 is cut into the polishing surface 11 by a certain dimension and ground. Since the sizing process is suitable for finishing the shape, it is suitable for a processing method when the shape of the polishing surface 11 is corrected or processed using the tool 41, and compared with a case where constant pressure processing is performed. The shape can be corrected and processed with higher accuracy.

なお、工具41を使って研磨面11の形状を修正又は加工する際の加工方法として、上述した定圧加工を行うことも可能であり、この場合には例えば被研磨加工物Kの表面粗さの精度向上を目的とした加工を行うことができ、主に工具41が表面修正用工具であって研磨面11を修正する際に好適な加工を行うことができる。   In addition, as the processing method when the shape of the polishing surface 11 is corrected or processed using the tool 41, the above-described constant pressure processing can be performed. In this case, for example, the surface roughness of the workpiece K to be polished is determined. It is possible to perform processing for the purpose of improving accuracy, and it is possible to perform suitable processing mainly when the tool 41 is a surface correction tool and the polishing surface 11 is corrected.

図4に示すように、接触機構40によって、保持部42が研磨部材10の回転中心から離れる方向(矢印M2の向きに)移動すると、工具41が研磨面11から離れる。
基本的に、工具41は研磨面11から離れた図4の位置に配置されている。そして、所定周期毎、例えば研磨時間の累積値が予め定められた値を超えた場合や、操作者がスイッチ操作を行った場合に、研磨部材10が回転駆動されている状態で、工具41は研磨面11に接触した図3の位置に移動される。
As shown in FIG. 4, when the holding unit 42 is moved by the contact mechanism 40 in a direction away from the rotation center of the polishing member 10 (in the direction of the arrow M <b> 2), the tool 41 is separated from the polishing surface 11.
Basically, the tool 41 is arranged at a position in FIG. 4 away from the polishing surface 11. In addition, when the accumulated value of the polishing time exceeds a predetermined value, for example, when the operator performs a switch operation, the tool 41 is rotated in a state where the polishing member 10 is driven to rotate. 3 is brought into contact with the polishing surface 11.

なお、工具41が研磨面11に接触した状態にあるとき、工具41と研磨面11との接触部に対して水や加工液の供給を行うとよい。この場合には、工具41による研磨面11の加工又は修正を補助したり、接触部を冷却したりすることができる。   When the tool 41 is in contact with the polishing surface 11, it is preferable to supply water or a working fluid to the contact portion between the tool 41 and the polishing surface 11. In this case, the processing or correction of the polishing surface 11 by the tool 41 can be assisted, or the contact portion can be cooled.

使用する加工液の種類は、形状加工用切削工具又は表面修正用工具の種類に応じて、または、研磨部材の材質に応じて、任意に適切なものを選択することができる。例えば切削加工用工具を使用する場合は、切削加工用の加工液を用いることが出来る。固定砥粒付き加工工具を使用する場合は、研削加工用加工液を用いることが出来る。硬質のブラシを使用する場合は、洗浄液などを使用することが出来る。   The kind of working fluid to be used can be arbitrarily selected according to the kind of the cutting tool for shape processing or the tool for surface correction, or according to the material of the polishing member. For example, when a cutting tool is used, a cutting fluid can be used. When using a processing tool with fixed abrasive, a working fluid for grinding can be used. When a hard brush is used, a cleaning solution or the like can be used.

以上説明した本実施形態によれば、以下の作用効果を得ることができる。
(1)研磨装置は、被研磨加工物Kの端部KEの形状に沿った形状の研磨面11を有する研磨部材10を備えている。従って、被研磨加工物Kの端部KEが平面状とは異なる形状、つまり曲面形状であっても、その端部KEを研磨することができる。
According to this embodiment described above, the following effects can be obtained.
(1) The polishing apparatus includes a polishing member 10 having a polishing surface 11 having a shape along the shape of the end KE of the workpiece K to be polished. Therefore, even if the end KE of the workpiece K is different from a flat shape, that is, a curved shape, the end KE can be polished.

(2)研磨装置は、端部KEの形状と同一の形状を有しており研磨面11を端部KEの形状に沿った形状に修正または加工する工具41と、研磨面11に対して工具41を接触させる接触機構40とを備えている。従って、先の図3に示したように、工具41が接触した研磨面11は、被研磨加工物Kの端部KEの形状と同一の曲率を有した工具41の形状が転写されることにより、被研磨加工物Kの端部KEの形状に沿った形状に修正又は加工される。   (2) The polishing apparatus has the same shape as the shape of the end portion KE, a tool 41 for correcting or processing the polishing surface 11 into a shape along the shape of the end portion KE, and a tool for the polishing surface 11 And a contact mechanism 40 for bringing 41 into contact therewith. Therefore, as shown in FIG. 3, the shape of the tool 41 having the same curvature as the shape of the end KE of the workpiece K is transferred to the polishing surface 11 with which the tool 41 is in contact. Then, it is corrected or processed into a shape along the shape of the end KE of the workpiece K to be polished.

このように研磨部材10の研磨面11は被研磨加工物Kの端部KEの形状に沿った形状になっているが、この研磨面11の形状と工具41の形状は一方が凹で他方が凸の関係になっている。そのため、平面状とは異なる形状、つまり曲面形状の研磨面11の形状加工又は形状修正を容易に行うことができるようになる。   As described above, the polishing surface 11 of the polishing member 10 has a shape along the shape of the end KE of the workpiece K to be polished. The shape of the polishing surface 11 and the shape of the tool 41 are concave on one side and the other is on the other side. Convex relationship. Therefore, the shape processing or shape correction of the polished surface 11 having a shape different from the planar shape, that is, the curved shape can be easily performed.

(3)接触機構40による研磨面11に対する工具41の接触は、所定周期毎に行われる。従って、所定周期毎に研磨面11が修正されるようになるため、被研磨加工物Kの端部KEを研磨するときの研磨精度を長期にわたって維持することができるようになる。   (3) The contact of the tool 41 with the polishing surface 11 by the contact mechanism 40 is performed at predetermined intervals. Therefore, since the polishing surface 11 is corrected every predetermined period, it is possible to maintain the polishing accuracy when polishing the end KE of the workpiece K to be polished over a long period of time.

なお、上記実施形態は以下のように変更して実施することもできる。
・上記工具41による研磨面11の修正を、被研磨加工物Kを研磨する合間に行ったり、被研磨加工物Kの研磨中の一部の時間又は全部の時間を用いて研磨と同時に行ったりしてもよい。
In addition, the said embodiment can also be changed and implemented as follows.
The correction of the polishing surface 11 by the tool 41 is performed during polishing of the workpiece K to be polished, or is performed at the same time as polishing using a part or all of the time during polishing of the workpiece K to be polished. May be.

・上述した形状加工用切削工具とは、研磨部材の研磨面を適切に加工することが出来るものであり、前記研磨部材の研磨面よりも硬度が高い加工部を有するものであれば特に制限は無く、具体例としては、ペレットや電着砥石などの固定砥粒付き加工工具、エンドミルやバイトなどの切削加工用工具を使用することが可能である。   The cutting tool for shape processing described above is capable of appropriately processing the polishing surface of the polishing member, and is not particularly limited as long as it has a processed portion having a hardness higher than the polishing surface of the polishing member. As a specific example, it is possible to use a processing tool with fixed abrasives such as pellets or an electrodeposition grindstone, or a cutting tool such as an end mill or a bite.

なお、上述した電着砥石を用いる場合には、研磨部材10の研磨面11を切削する際に砥粒が脱落し、被研磨加工物Kの表面に傷が付く場合がある。こうした傷は、研磨部材10による被研磨加工物Kの研磨中において、電着砥石による研磨面11の研削を併せて行う場合には特に注意が必要である。そこで、電着砥石の表面を硬質層でコーティングする処理、例えばDLC(ダイヤモンドライクカーボン)によるコーティングなどを行うことにより、上述した砥粒の脱落が抑えられるようになり、これにより上述したような傷の発生を抑えることができる。   When the above-described electrodeposition grindstone is used, the abrasive grains may drop off when the polishing surface 11 of the polishing member 10 is cut, and the surface of the workpiece K may be damaged. Such scratches require special attention when grinding the polished surface 11 with an electrodeposition grindstone during polishing of the workpiece K to be polished by the polishing member 10. Therefore, by performing a treatment for coating the surface of the electrodeposited grindstone with a hard layer, for example, coating with DLC (diamond-like carbon), it is possible to prevent the above-mentioned abrasive grains from falling off. Can be suppressed.

・上述した表面修正用工具とは、研磨部材の表面を整えたり、表面に付着した汚れや固着物などを取り除いたりすることができるものであり、具体例としては、前記固定砥粒付き加工工具や、硬質のブラシなどを使用することが可能である。   The above-mentioned surface correction tool is a tool capable of adjusting the surface of the polishing member or removing dirt or fixed matter adhering to the surface, and as a specific example, the processing tool with fixed abrasive Alternatively, a hard brush or the like can be used.

・図5に示すように、形状加工用切削工具又は表面修正用工具として機能する工具41として、被研磨加工物Kの端部KEの形状と同一の形状を有しており、研磨面11を端部KEの形状に沿った形状に修正する刃を外周に備える回転式のカッタを使用するようにしてもよい。   As shown in FIG. 5, the tool 41 functioning as a shape processing cutting tool or surface correction tool has the same shape as the end KE of the workpiece K, and the polishing surface 11 You may make it use the rotary cutter which equips the outer periphery with the blade corrected to the shape along the shape of the edge part KE.

図5にこの変形例における研磨装置の概略構成を示す。この図5に示すように、研磨部材10の径方向における外周面近傍であって研磨面11に対向する位置に接触機構60を設ける。この接触機構60には、上述したようなカッタ50と、カッタ50の回転軸を研磨部材10の回転軸と直交する方向(図5に示す矢印M方向)に往復移動させる移動機構とを設ける。そして接触機構60によって、カッタ50が研磨部材10の回転中心に向かって(矢印M1の向きに)移動されると、図5中に二点鎖線で示すようにカッタ50の刃が研磨面11に接触する。一方、接触機構60によって、カッタ50が研磨部材10の回転中心から離れる方向(矢印M2の向きに)移動されると、カッタ50の刃が研磨面11から離れる。こうした変形例でも、研磨面11の形状とカッタ50の刃の形状は一方が凹で他方が凸の関係になっているため、平面状とは異なる形状、つまり曲面形状となっている研磨面11の形状修正を容易に行うことができる。   FIG. 5 shows a schematic configuration of a polishing apparatus according to this modification. As shown in FIG. 5, a contact mechanism 60 is provided near the outer peripheral surface in the radial direction of the polishing member 10 and at a position facing the polishing surface 11. The contact mechanism 60 is provided with the cutter 50 as described above and a moving mechanism that reciprocates the rotation axis of the cutter 50 in a direction orthogonal to the rotation axis of the polishing member 10 (the direction of arrow M shown in FIG. 5). When the cutter 50 is moved toward the rotation center of the polishing member 10 (in the direction of the arrow M1) by the contact mechanism 60, the blade of the cutter 50 is brought into contact with the polishing surface 11 as shown by a two-dot chain line in FIG. Contact. On the other hand, when the cutter 50 is moved by the contact mechanism 60 in a direction away from the rotation center of the polishing member 10 (in the direction of the arrow M <b> 2), the blade of the cutter 50 is separated from the polishing surface 11. Even in such a modified example, the shape of the polishing surface 11 and the shape of the blade of the cutter 50 are in a relationship in which one is concave and the other is convex, so that the polishing surface 11 has a shape different from a flat shape, that is, a curved shape. The shape can be easily corrected.

・形状加工用切削工具又は表面修正用工具として機能する工具として、上述した工具41とは異なる工具を使ってもよい。そうした変形例のいくつかを以下に説明する。
図6に示す円筒状の形状加工用切削工具200は、その軸方向に延びる切れ刃210が周方向に間隔をおいて複数設けられている。形状加工用切削工具200の先端部210aにおける切れ刃210の外形形状は、端部KEの曲率と同じ曲率を有している。こうした形状加工用切削工具200を工具41の代わりに用いた場合には、形状加工用切削工具200を回転させながら先端部210aを研磨面11に接触させることにより、研磨部材10の研磨面11を端部KEの形状に沿った形状に加工することができる。
A tool different from the tool 41 described above may be used as a tool that functions as a cutting tool for shape processing or a tool for surface correction. Some of these variations are described below.
6 has a plurality of cutting blades 210 extending in the axial direction at intervals in the circumferential direction. The outer shape of the cutting edge 210 at the tip end portion 210a of the cutting tool 200 for shape processing has the same curvature as the curvature of the end portion KE. When such a cutting tool for shape machining 200 is used instead of the tool 41, the polishing surface 11 of the polishing member 10 is made to contact the tip surface 210a with the polishing surface 11 while rotating the cutting tool for shape machining 200. It can be processed into a shape along the shape of the end KE.

図7(A)及び図7(B)に示す別の形状加工用切削工具300は平板状をなしており、その先端部310は、端部KEの曲率と同じ曲率を有する円形状の切れ刃になっている。また、図7(B)に示すように、形状加工用切削工具300の厚みは、先端部310に向かって薄くなっている。こうした形状加工用切削工具300を工具41の代わりに用いた場合にも、形状加工用切削工具300を回転させながら先端部310を研磨面11に接触させることにより、研磨部材10の研磨面11を端部KEの形状に沿った形状に加工することができる。なお、こうした平板状の形状加工用切削工具300を複数組み合わせて用いてもよく、例えば複数の形状加工用切削工具300が60°や90°といった一定の角度で互いに交差するように組み合わせるようにしてもよい。   Another shape cutting tool 300 shown in FIGS. 7 (A) and 7 (B) has a flat plate shape, and a tip 310 thereof has a circular cutting edge having the same curvature as that of the end KE. It has become. Further, as shown in FIG. 7B, the thickness of the cutting tool 300 for shape processing becomes thinner toward the tip portion 310. Even when such a shape machining cutting tool 300 is used instead of the tool 41, the polishing surface 11 of the polishing member 10 is made to contact the tip surface 310 with the polishing surface 11 while rotating the shape machining cutting tool 300. It can be processed into a shape along the shape of the end KE. A plurality of such flat shape cutting tools 300 may be used in combination. For example, a plurality of shape cutting tools 300 may be combined so that they intersect each other at a fixed angle such as 60 ° or 90 °. Also good.

図8に示す別の円筒状の表面修正用工具400は、その先端部に硬質のブラシ410を備えている。このブラシ410の先端形状は全体として半球形状をなしており、その半球形状の曲率は端部KEの曲率とほぼ同じ曲率を有している。こうした表面修正用工具400を工具41の代わりに用いた場合には、表面修正用工具400を回転させながらブラシ410を研磨面11に接触させることにより、研磨部材10の研磨面11を端部KEの形状に沿った形状に修正することができる。   Another cylindrical surface correcting tool 400 shown in FIG. 8 includes a hard brush 410 at the tip. The tip of the brush 410 has a hemispherical shape as a whole, and the curvature of the hemispherical shape has substantially the same curvature as that of the end KE. When such a surface correction tool 400 is used instead of the tool 41, the polishing surface 11 of the polishing member 10 is brought into contact with the end KE by bringing the brush 410 into contact with the polishing surface 11 while rotating the surface correction tool 400. It can be corrected to a shape along the shape.

・上記実施形態では、曲面状の研磨面11が予め設けられた研磨部材10を定盤20に固定するようにした。しかしながら、研磨面11の形状形成は、形状加工用切削工具を使用して行うことができるため、例えば被研磨部の形状に沿った形状の面を有していない研磨部材を準備し、形状加工用切削工具を用いて被研磨加工物の被研磨部の形状に沿った形状の研磨面を形成してもよい。この一例として、図9〜図11に示すように、被研磨加工物Kの端部KEの形状とは異なる形状を有した研磨部材10Aの外周面を工具41と接触させることにより、端部KEの形状に沿った形状の研磨面11を形成するようにしてもよい。   In the above embodiment, the polishing member 10 provided with the curved polishing surface 11 in advance is fixed to the surface plate 20. However, since the shape of the polishing surface 11 can be formed using a cutting tool for shape processing, for example, a polishing member that does not have a surface having a shape along the shape of the portion to be polished is prepared, and shape processing is performed. You may form the grinding | polishing surface of the shape along the shape of the to-be-polished part of a to-be-polished workpiece using the cutting tool for an object. As an example of this, as shown in FIGS. 9 to 11, by bringing the outer peripheral surface of the polishing member 10 </ b> A having a shape different from the shape of the end KE of the workpiece K into contact with the tool 41, the end KE is obtained. You may make it form the grinding | polishing surface 11 of the shape along this shape.

より詳細には、図9に示すように、径方向の外周面が平面状になっている研磨部材10Aを定盤20に固定する。そして、図10に示すように、接触機構40によって、保持部42を、研磨部材10Aの回転中心に向かって(矢印M1の向きに)移動させることにより、工具41を、研磨部材10Aの径方向における外周面に接触させる。より詳細には、研磨部材10Aの径方向における外周面に対して工具41を押圧する。この工具41の押圧により、平面状であった研磨部材10Aの外周面には、上記研磨面11が形成される。なお、こうした研磨面11の形成に際しても、上述した加工液を供給することが望ましい。そして、研磨面11が形成された後、図11に示すように、接触機構40によって、保持部42を、研磨部材10Aの回転中心から離れる方向(矢印M2の向きに)移動させることにより、工具41を研磨面11から離間させる。   More specifically, as shown in FIG. 9, the polishing member 10 </ b> A whose outer peripheral surface in the radial direction is planar is fixed to the surface plate 20. Then, as shown in FIG. 10, the tool 41 is moved in the radial direction of the polishing member 10A by moving the holding portion 42 toward the rotation center of the polishing member 10A (in the direction of the arrow M1) by the contact mechanism 40. In contact with the outer peripheral surface. More specifically, the tool 41 is pressed against the outer peripheral surface in the radial direction of the polishing member 10A. By the pressing of the tool 41, the polishing surface 11 is formed on the outer peripheral surface of the polishing member 10A which is flat. Note that it is desirable to supply the above-described processing liquid also when forming the polished surface 11. After the polishing surface 11 is formed, the tool 42 is moved by the contact mechanism 40 in a direction away from the center of rotation of the polishing member 10A (in the direction of the arrow M2), as shown in FIG. 41 is separated from the polishing surface 11.

この変形例によれば、被研磨加工物Kの端部KEの形状に沿った形状の研磨面11の形成が、研磨装置上で行われる。そのため、被研磨加工物Kの端部KEの形状に沿った形状の研磨面11が予め形成された研磨部材10を研磨装置に取り付ける場合と比較して、研磨面11の形状を高精度に形成することができるようになる。また、事前に研磨面11が形成された研磨部材10を準備する手間を省くことができる。   According to this modification, formation of the polishing surface 11 having a shape along the shape of the end KE of the workpiece K is performed on the polishing apparatus. Therefore, the shape of the polishing surface 11 is formed with higher accuracy than when the polishing member 10 in which the polishing surface 11 having a shape corresponding to the shape of the end KE of the workpiece K is previously formed is attached to the polishing apparatus. Will be able to. Moreover, the trouble of preparing the polishing member 10 on which the polishing surface 11 is formed in advance can be saved.

・図12に示すように、直線状の棒材70の長手方向の一側面に上記研磨面11と同様な形状を有した研磨面71を設ける。なお、棒材70の材質としては、任意の材質を選択することができる。例えば曲げ加工が容易な材質、例えば合成樹脂や黄銅などを使用することが好ましい。   As shown in FIG. 12, a polishing surface 71 having the same shape as the polishing surface 11 is provided on one side surface in the longitudinal direction of the linear bar 70. An arbitrary material can be selected as the material of the bar 70. For example, it is preferable to use a material that can be easily bent, such as synthetic resin or brass.

そして、図13に示すように、円盤80の周囲に、研磨面71が外側を向くように棒材70を巻き付け、巻き付けた棒材70を適宜の方法で円盤80に固定することにより、棒材70及び円盤80で構成された研磨部材を作る。こうした態様でも、上記研磨部材10と同様な研磨部材を形成することができる。なお、円盤80の材質も任意に選択できる。例えば、金属やセラミックなどを使用することができるが、できる限り軽量な材質が好ましい。   Then, as shown in FIG. 13, a rod 70 is wound around the disk 80 so that the polishing surface 71 faces outward, and the wound rod 70 is fixed to the disk 80 by an appropriate method. An abrasive member composed of 70 and a disk 80 is made. Even in such an embodiment, a polishing member similar to the polishing member 10 can be formed. In addition, the material of the disk 80 can also be selected arbitrarily. For example, metal or ceramic can be used, but a material that is as light as possible is preferable.

ちなみに、先の図12及び図13に示した変形例では、棒材70に研磨面71を設けた後、同棒材70を円盤80に巻き付けるようにしたが、代わりに、例えば直線状の棒材70を円盤80に巻き付けた後、同棒材70に研磨面71を設けるようにしてもよい。   Incidentally, in the modification shown in FIGS. 12 and 13, the polishing surface 71 is provided on the rod 70 and then the rod 70 is wound around the disk 80. Instead, for example, a linear rod is used. After the material 70 is wound around the disk 80, a polishing surface 71 may be provided on the rod 70.

こうした変形例によれば、例えば研磨面71が摩耗した場合等に、同研磨面71が設けられた棒材70のみを交換することが可能になるため、上述したような研磨部材10と比べて交換コスト等を抑えることができる。また、被研磨部の形状が種々異なる被研磨加工物Kを研磨する場合には、棒材70を交換することにより、そうした被研磨部の形状の違いに対して容易に対応することができるようになる。   According to such a modified example, for example, when the polishing surface 71 is worn out, it is possible to replace only the bar 70 provided with the polishing surface 71. Therefore, compared to the polishing member 10 as described above. Exchange costs can be reduced. Further, when polishing the workpiece K having different shapes of the parts to be polished, it is possible to easily cope with the difference in the shape of the parts to be polished by exchanging the rod 70. become.

・図14に示すように、円盤状の研磨部材90の径方向の外周面に、周方向に延びる上記研磨面11と同様な曲面91を設け、その曲面91上に別部材を貼り付けたりコーティングを形成したりして研磨面を設けてもよい。例えば図15及び図16に示すように、研磨部材90の径方向の外周面に形成された曲面91に、研磨面となるテープ状の不織布100を貼り付けるようにしてもよい。この場合には、不織布100を交換することで、研磨面を新品の状態に戻すことができる。そのため、例えば研磨部材90の材質には、比較的耐久性の高い材質、例えばステンレス鋼などの金属を採用することが好ましい。ただし、研磨部材90の材質は任意に選択することができる。例えば、研磨部材90を金属で作り、曲面91には、研磨面となる樹脂コーティングを施してもよい。また、研磨部材90をセラミックで作り、曲面91には、研磨面となる樹脂コーティングを施してもよい。   As shown in FIG. 14, a curved surface 91 similar to the polishing surface 11 extending in the circumferential direction is provided on the radially outer peripheral surface of the disc-shaped polishing member 90, and another member is pasted or coated on the curved surface 91. Or a polishing surface may be provided. For example, as shown in FIGS. 15 and 16, a tape-like nonwoven fabric 100 serving as a polishing surface may be attached to a curved surface 91 formed on the outer circumferential surface of the polishing member 90 in the radial direction. In this case, the polishing surface can be returned to a new state by replacing the nonwoven fabric 100. Therefore, for example, a material having a relatively high durability, such as a metal such as stainless steel, is preferably used as the material of the polishing member 90. However, the material of the polishing member 90 can be arbitrarily selected. For example, the polishing member 90 may be made of metal, and the curved surface 91 may be provided with a resin coating serving as a polishing surface. Further, the polishing member 90 may be made of ceramic, and the curved surface 91 may be provided with a resin coating serving as a polishing surface.

・定盤20の上面に研磨部材10を設けるようにしたが、定盤20を省略して、研磨部材10の中心に第1モータ21の回転軸を直接固定してもよい。
・モータ移動機構33を駆動させることにより端部KEを研磨面11に押し付けるようにしたが、端部KEを研磨面11に押し付ける機構を別途設けてもよい。
Although the polishing member 10 is provided on the upper surface of the surface plate 20, the surface plate 20 may be omitted and the rotation shaft of the first motor 21 may be directly fixed to the center of the polishing member 10.
Although the end KE is pressed against the polishing surface 11 by driving the motor moving mechanism 33, a mechanism for pressing the end KE against the polishing surface 11 may be provided separately.

・研磨部材10を回転させるようにしたが、直線状に往復移動させるようにしてもよい。
・被研磨加工物Kの端部KEを研磨するようにしたが、被研磨部はそうした端部に限定されるものではなく、他の部位でもよい。
Although the polishing member 10 is rotated, it may be reciprocated linearly.
-Although the edge part KE of the workpiece K was grind | polished, a to-be-polished part is not limited to such an edge part, Other parts may be sufficient.

・被研磨加工物Kの端部KEの形状は、曲面以外の非平面状であってもよく、例えば図17に示す三角形状や、図18に示すように略三角形状であって頂部が丸みを帯びた形状でもよい。また、被研磨加工物Kの端部KEの形状は、図19に示す階段形状や、図20に示すように略階段形状であって角部が丸みを帯びた形状であってもよい。また、図21に示すように、端部KEが、被研磨加工物Kの内側に向けて窪んだ曲面形状であってもよい。また、複数の曲率で構成される曲面や、一部に直線部を備える曲面でもよい。これらの変形例においても、研磨部材10の研磨面11を、被研磨加工物Kの端部KEの形状(被研磨部の形状)に沿った形にすることで、端部KEを研磨することができる。   The shape of the end KE of the workpiece K may be a non-planar shape other than a curved surface, for example, a triangular shape as shown in FIG. 17 or a substantially triangular shape as shown in FIG. The shape may have a tinge. Further, the shape of the end KE of the workpiece K may be a staircase shape shown in FIG. 19 or a substantially staircase shape as shown in FIG. 20 with rounded corners. Further, as shown in FIG. 21, the end KE may have a curved shape that is recessed toward the inside of the workpiece K to be polished. Further, it may be a curved surface composed of a plurality of curvatures or a curved surface partially including a straight line portion. Also in these modifications, the end KE is polished by making the polishing surface 11 of the polishing member 10 along the shape of the end KE of the workpiece K (the shape of the part to be polished). Can do.

・先の図2等に示したように、上述した実施形態では、研磨面11に対して被研磨加工物Kを、研磨部材10の回転軸と直交する方向(図2等に示す矢印X方向)に押し付けることにより、被研磨加工物Kの端部KEを研磨するようにした。この場合、そうして押し付けられた端部KEについては研磨することができるものの、被研磨加工物Kの上面及び下面、つまり研磨部材10の回転軸が直交する平面に対して平行になる被研磨加工物Kの両面については、研磨に際して圧力が余りかからないため、十分に研磨加工することができないおそれがある。   As shown in FIG. 2 and the like, in the above-described embodiment, the workpiece K to be polished with respect to the polishing surface 11 is perpendicular to the rotation axis of the polishing member 10 (the direction of the arrow X shown in FIG. 2 and the like). ), The end portion KE of the workpiece K to be polished was polished. In this case, the end KE thus pressed can be polished, but the upper and lower surfaces of the workpiece K, that is, the object to be polished which is parallel to the plane in which the rotation axis of the polishing member 10 is orthogonal. Since both sides of the workpiece K do not require excessive pressure during polishing, there is a possibility that sufficient polishing cannot be performed.

そこで、まず、樹脂等のようにある程度の弾性を有しており弾性変形する材質にて研磨部材10を形成する。そして、図22に示すように、研磨部材10の回転軸に平行な方向(図22に示す矢印Y方向)における研磨面11の幅H1は、加工前の被研磨加工物Kの厚さT1(つまり被研磨加工物Kの上面KU及び下面KD間の長さ)よりも所定量αだけ小さくする。このように、研磨部材10を弾性体で形成して、研磨面11の形状を被研磨加工物Kの形状よりも小さくした変形例では、次の効果が得られる。   Therefore, first, the polishing member 10 is formed of a material that has a certain degree of elasticity, such as resin, and that is elastically deformed. As shown in FIG. 22, the width H1 of the polishing surface 11 in the direction parallel to the rotation axis of the polishing member 10 (the direction of the arrow Y shown in FIG. 22) is the thickness T1 of the workpiece K to be polished before processing. That is, it is made smaller by a predetermined amount α than the length between the upper surface KU and the lower surface KD of the workpiece K. As described above, in the modification in which the polishing member 10 is formed of an elastic body and the shape of the polishing surface 11 is smaller than the shape of the workpiece K, the following effects are obtained.

図23に示すように、この変形例によれば、研磨部材10に被研磨加工物Kを押し付けて研磨する際、被研磨加工物Kの上面KU及び下面KDには、上記所定量αの分だけ弾性変形した研磨部材10からの押し付け力Fが付与される。従って、被研磨加工物Kの研磨時には、端部KEだけではなく、上面KU及び下面KDも同時に研磨することができるという効果が得られる。なお、上記所定量αを大きくするほど、被研磨加工物Kを研磨する際の研磨部材10の弾性変形量は大きくなるため、同所定量αを最適化することにより、被研磨加工物Kの上面KU及び下面KDに付与される押し付け力Fを最適化することができる。   As shown in FIG. 23, according to this modification, when the workpiece K is pressed against the polishing member 10 for polishing, the upper surface KU and the lower surface KD of the workpiece K are divided by the predetermined amount α. A pressing force F is applied from the polishing member 10 which is elastically deformed only. Therefore, when the workpiece K is polished, not only the end KE but also the upper surface KU and the lower surface KD can be simultaneously polished. As the predetermined amount α is increased, the amount of elastic deformation of the polishing member 10 when polishing the workpiece K is increased. Therefore, by optimizing the predetermined amount α, the workpiece K can be polished. The pressing force F applied to the upper surface KU and the lower surface KD can be optimized.

また、被研磨加工物Kの端部KEを研磨面11に押し付ける力と、被研磨加工物Kの上面KU及び下面KDに付与される押し付け力Fとを、必要に応じて調整することにより、被研磨加工物Kを適切に加工することができる。   Further, by adjusting the force for pressing the end KE of the workpiece K to the polishing surface 11 and the pressing force F applied to the upper surface KU and the lower surface KD of the workpiece K as necessary, The workpiece K can be appropriately processed.

10、10A、90…研磨部材、11…研磨面、20…定盤、21…第1モータ、30…第2モータ、31…回転軸、32…固定台、33…モータ移動機構、40…接触機構、41…工具、42…保持部、43…移動機構、50…カッタ、60…接触機構、70…棒材、71…研磨面、80…円盤、91…曲面、100…不織布、200…形状加工用切削工具、210…切れ刃、210a…先端部、300…形状加工用切削工具、310…先端部、400…表面修正用工具、410…ブラシ、K…被研磨加工物、KE…(被研磨加工物の)端部、KU…(被研磨加工物の)上面、KD…(被研磨加工物の)下面。
DESCRIPTION OF SYMBOLS 10, 10A, 90 ... Polishing member, 11 ... Polishing surface, 20 ... Surface plate, 21 ... 1st motor, 30 ... 2nd motor, 31 ... Rotating shaft, 32 ... Fixed stand, 33 ... Motor moving mechanism, 40 ... Contact Mechanism: 41 ... Tool, 42 ... Holding part, 43 ... Moving mechanism, 50 ... Cutter, 60 ... Contact mechanism, 70 ... Bar material, 71 ... Polished surface, 80 ... Disc, 91 ... Curved surface, 100 ... Nonwoven fabric, 200 ... Shape Cutting tool for processing, 210: Cutting edge, 210a: Tip portion, 300: Cutting tool for shape processing, 310: Tip portion, 400 ... Tool for surface correction, 410 ... Brush, K ... Workpiece to be polished, KE ... End of polishing workpiece, KU ... upper surface of workpiece to be polished, KD ... lower surface of workpiece to be polished.

Claims (9)

被研磨加工物の被研磨部の形状に沿った形状の研磨面を有する樹脂、織物、不織布、不織布の樹脂加工品、合成皮革、又はこれらの複合品で形成された研磨部材と、
前記被研磨部の形状と同一の形状を有しており、前記研磨面を前記被研磨部の形状に沿った形状に加工又は修正するための工具と、
前記研磨面に対して前記工具を接触させる接触機構と
を備える研磨装置であって、交換可能な棒材を円盤に巻き付けることにより前記研磨部材が構成されていることを特徴とする研磨装置。
A polishing member formed of a resin having a polishing surface along the shape of the part to be polished of the workpiece, a woven fabric, a non-woven fabric, a non-woven resin processed product, synthetic leather, or a composite product thereof,
A tool for processing or correcting the polished surface into a shape along the shape of the portion to be polished, having the same shape as the shape of the portion to be polished;
A polishing apparatus comprising a contact mechanism for contacting the tool with the polishing surface, wherein the polishing member is configured by winding a replaceable bar around a disk .
前記接触機構による前記研磨面に対する前記工具の接触を所定周期毎に行う
請求項1に記載の研磨装置。
The polishing apparatus according to claim 1, wherein the contact of the tool with the polishing surface by the contact mechanism is performed at predetermined intervals.
前記研磨部材を下方から回転させるモータを備える
請求項1又は2に記載の研磨装置。
The polishing apparatus according to claim 1, further comprising a motor that rotates the polishing member from below.
前記研磨部材を上面に載置した状態で前記研磨部材と一体回転する定盤を備える
請求項1〜3のいずれか1項に記載の研磨装置。
The polishing apparatus according to claim 1, further comprising a surface plate that rotates integrally with the polishing member in a state where the polishing member is placed on an upper surface.
前記研磨部材の研磨面が曲面である、請求項1〜4のいずれか1項に記載の研磨装置。The polishing apparatus according to claim 1, wherein a polishing surface of the polishing member is a curved surface. 前記曲面は、複数の曲率で構成されているか、あるいは一部に直線部を備える、請求項5に記載の研磨装置。  The polishing apparatus according to claim 5, wherein the curved surface is configured with a plurality of curvatures, or includes a straight portion in part. 請求項1〜のいずれか1項に記載の研磨装置で用いられる部材であって前記被研磨部の形状と同一の形状を有しており、交換可能な棒材を円盤に巻き付けることにより構成された前記研磨部材の研磨面を前記被研磨部の形状に沿った形状に加工又は修正するための工具。 It is a member used with the grinding | polishing apparatus of any one of Claims 1-6 , Comprising: It has the same shape as the shape of the said to-be-polished part, and is comprised by winding an exchangeable bar around a disk. A tool for processing or correcting the polished surface of the polished polishing member into a shape along the shape of the portion to be polished. 請求項1〜のいずれか1項に記載の研磨装置において行われる樹脂、織物、不織布、不織布の樹脂加工品、合成皮革、又はこれらの複合品で形成された研磨部材の加工又は修正方法であって、交換可能な棒材を円盤に巻き付けることにより構成された前記研磨部材の研磨面に対して前記工具を接触させることを含む、研磨部材の加工又は修正方法。 Resin performed in the polishing apparatus according to any one of claims 1 to 6 woven, nonwoven, nonwoven resin processed article, synthetic leather, or processing or correction method of the polishing member which is formed of these composite articles A method for processing or correcting a polishing member, comprising bringing the tool into contact with a polishing surface of the polishing member formed by winding a replaceable bar around a disk . 請求項1〜のいずれか1項に記載の研磨装置において行われる樹脂、織物、不織布、不織布の樹脂加工品、合成皮革、又はこれらの複合品で形成された研磨部材の製造方法であって、
交換可能な棒材を円盤に巻き付けることにより構成されかつ前記被研磨部の形状とは異なる形状を有した研磨部材表面を前記工具に接触させることにより、前記研磨部材の研磨面を前記被研磨部の形状に沿った形状に形成することを含む、研磨部材の製造方法。
A method for producing an abrasive member formed of a resin, a woven fabric, a non-woven fabric, a non-woven fabric resin processed product, a synthetic leather, or a composite product thereof, which is performed in the polishing apparatus according to any one of claims 1 to 6. ,
By contacting the configured and surface of a polishing member having a shape different from the shape of the polished section by winding a replaceable bar in a disk to the tool, the polished section of the polishing surface of the polishing member The manufacturing method of the polishing member including forming in the shape along the shape of this.
JP2017130253A 2013-10-04 2017-07-03 Polishing apparatus, polishing member processing or correction tool, polishing member processing or correction method, and polishing member manufacturing method Active JP6474861B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013209601 2013-10-04
JP2013209601 2013-10-04

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2015540533A Division JPWO2015050185A1 (en) 2013-10-04 2014-10-02 Polishing apparatus, polishing member processing method, polishing member correction method, shape processing cutting tool, and surface correction tool

Publications (2)

Publication Number Publication Date
JP2017185623A JP2017185623A (en) 2017-10-12
JP6474861B2 true JP6474861B2 (en) 2019-02-27

Family

ID=52778772

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2015540533A Pending JPWO2015050185A1 (en) 2013-10-04 2014-10-02 Polishing apparatus, polishing member processing method, polishing member correction method, shape processing cutting tool, and surface correction tool
JP2017130253A Active JP6474861B2 (en) 2013-10-04 2017-07-03 Polishing apparatus, polishing member processing or correction tool, polishing member processing or correction method, and polishing member manufacturing method

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2015540533A Pending JPWO2015050185A1 (en) 2013-10-04 2014-10-02 Polishing apparatus, polishing member processing method, polishing member correction method, shape processing cutting tool, and surface correction tool

Country Status (7)

Country Link
US (1) US20160236322A1 (en)
EP (1) EP3053704A4 (en)
JP (2) JPWO2015050185A1 (en)
KR (1) KR20160067107A (en)
CN (1) CN105636743B (en)
TW (1) TWI689378B (en)
WO (1) WO2015050185A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6884015B2 (en) * 2017-03-22 2021-06-09 株式会社荏原製作所 Substrate polishing equipment and polishing method
US11685013B2 (en) 2018-01-24 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Polishing pad for chemical mechanical planarization

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS47636Y1 (en) * 1966-07-12 1972-01-11
GB1082418A (en) * 1966-07-22 1967-09-06 Toolmasters Ltd Improvements relating to grinding wheels
US3526058A (en) * 1967-06-28 1970-09-01 Litton Industries Inc Diamond roller dresser
US4010583A (en) * 1974-05-28 1977-03-08 Engelhard Minerals & Chemicals Corporation Fixed-super-abrasive tool and method of manufacture thereof
JPS5250088A (en) * 1975-10-15 1977-04-21 Monsanto Co Crush forming roll
US4182082A (en) * 1978-01-19 1980-01-08 Ernst Winter & Sohn (Gmbh & Co.) Method for the profiling of grinding wheels and apparatus therefor
US4555873A (en) * 1981-03-30 1985-12-03 Energy-Adaptive Grinding, Inc. Method and apparatus for wheel conditioning in a grinding machine
JPS6090674A (en) * 1983-10-22 1985-05-21 Yasumasa Nakamura Abrasive sponge wheel
JPS60143646U (en) * 1984-03-02 1985-09-24 豊田工機株式会社 grinding equipment
JPH01289671A (en) * 1988-05-11 1989-11-21 Boarheath Theodore Sanding wheel
JP2559650B2 (en) * 1991-11-27 1996-12-04 信越半導体株式会社 Wafer chamfer polishing device
JP2921250B2 (en) * 1992-02-28 1999-07-19 信越半導体株式会社 Mirror polishing method and apparatus for wafer chamfer
JPH06170720A (en) * 1992-12-02 1994-06-21 Speedfam Co Ltd Surface plate dressing device
US5624306A (en) * 1993-11-23 1997-04-29 Visser Irrevocable Trust 1992-1 Stacked sanding wheel for radical profiles
JPH08206953A (en) * 1994-11-28 1996-08-13 Canon Inc Grinding-polishing method and grinding-polishing tool and its manufacture
US5938507A (en) * 1995-10-27 1999-08-17 Applied Materials, Inc. Linear conditioner apparatus for a chemical mechanical polishing system
KR19990071956A (en) * 1995-12-06 1999-09-27 이데미쓰 유지 Planarization of the surface of the sheet-like material and a method for producing the sheet-like material based thereon
JP3676030B2 (en) * 1997-04-10 2005-07-27 株式会社東芝 Polishing pad dressing method and semiconductor device manufacturing method
JP3187353B2 (en) 1997-10-01 2001-07-11 株式会社エスプリジャパン Cleaning method and cleaning device for air conditioner of vehicles such as automobiles
JPH11188590A (en) 1997-12-22 1999-07-13 Speedfam Co Ltd Edge polishing device
CN1138612C (en) * 1998-06-25 2004-02-18 尤诺瓦英国有限公司 Waffer edge polishing method and apparatus
US6783428B1 (en) * 1999-01-18 2004-08-31 Nsk Ltd. Method for forming grooves on workpiece and for dressing a grindstone used in the groove formation
JP2001121391A (en) * 1999-10-28 2001-05-08 Canon Inc Polishing plate combining method
US6630059B1 (en) * 2000-01-14 2003-10-07 Nutool, Inc. Workpeice proximity plating apparatus
JP2003048164A (en) * 2001-08-07 2003-02-18 Disco Abrasive Syst Ltd Polishing wheel
JP3534115B1 (en) * 2003-04-02 2004-06-07 住友電気工業株式会社 Edge-polished nitride semiconductor substrate, edge-polished GaN free-standing substrate, and edge processing method for nitride semiconductor substrate
JP2005340732A (en) * 2004-05-31 2005-12-08 Disco Abrasive Syst Ltd Wafer cleaning apparatus
JP2007088143A (en) * 2005-09-21 2007-04-05 Elpida Memory Inc Edge grinding device
JP4742845B2 (en) * 2005-12-15 2011-08-10 信越半導体株式会社 Method for processing chamfered portion of semiconductor wafer and method for correcting groove shape of grindstone
JP2010173016A (en) * 2009-01-29 2010-08-12 Mitsubishi Materials Corp Conditioner for semiconductor polishing cloth, method for manufacturing the conditioner for semiconductor polishing cloth, and semiconductor polishing apparatus
JP2010182813A (en) * 2009-02-04 2010-08-19 Noritake Super Abrasive Co Ltd Cmp pad conditioner
CN201380419Y (en) * 2009-03-02 2010-01-13 湖北新火炬科技股份有限公司 Diamond roller grinding wheel for grinding inner roller way of hub assembly
JP5405887B2 (en) * 2009-04-27 2014-02-05 ルネサスエレクトロニクス株式会社 Polishing apparatus and polishing method
CN201728564U (en) * 2010-07-28 2011-02-02 许昌义 Angle grinder adhesive wheel and adhesive sticker sand paper

Also Published As

Publication number Publication date
CN105636743A (en) 2016-06-01
CN105636743B (en) 2021-01-08
TW201536479A (en) 2015-10-01
JP2017185623A (en) 2017-10-12
EP3053704A4 (en) 2017-07-19
TWI689378B (en) 2020-04-01
KR20160067107A (en) 2016-06-13
WO2015050185A1 (en) 2015-04-09
US20160236322A1 (en) 2016-08-18
EP3053704A1 (en) 2016-08-10
JPWO2015050185A1 (en) 2017-03-09

Similar Documents

Publication Publication Date Title
JP4730844B2 (en) Method for simultaneously polishing both surfaces of a plurality of semiconductor wafers and semiconductor wafer
JP2018001406A (en) Polishing device and polishing method
JP5538253B2 (en) Manufacturing method of semiconductor wafer
JP3770752B2 (en) Semiconductor device manufacturing method and processing apparatus
US7452814B2 (en) Method of polishing GaN substrate
KR102252945B1 (en) Surface grinding method for workpiece
JP6474861B2 (en) Polishing apparatus, polishing member processing or correction tool, polishing member processing or correction method, and polishing member manufacturing method
WO2015020082A1 (en) Polishing tool and processing method for member
JP2015196224A (en) Polishing method and retainer
WO2014054611A1 (en) Polishing method and method for producing alloy material
JP2006210488A (en) Method and device for mechanochemical polishing
JP5024305B2 (en) Polishing method of GaN substrate
JP6976713B2 (en) Chamfer grinding method and chamfer grinding equipment
JP2004342985A (en) Polishing device and method for dressing polishing pad
JP2020531298A (en) Surface protrusion polishing pad
TW202245944A (en) Method for producing wafers from a cylindrical ingot of semiconductor material
JP5195966B2 (en) Polishing method of GaN substrate
JP5545536B2 (en) Wafer polishing method, polishing pad, polishing apparatus
JP2007307627A (en) Method for machining surface coating formation face

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180612

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20180810

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181010

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20190108

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20190130

R150 Certificate of patent or registration of utility model

Ref document number: 6474861

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250