JP6473700B2 - 照射光を案内するための光導波路 - Google Patents

照射光を案内するための光導波路 Download PDF

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Publication number
JP6473700B2
JP6473700B2 JP2015562039A JP2015562039A JP6473700B2 JP 6473700 B2 JP6473700 B2 JP 6473700B2 JP 2015562039 A JP2015562039 A JP 2015562039A JP 2015562039 A JP2015562039 A JP 2015562039A JP 6473700 B2 JP6473700 B2 JP 6473700B2
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combined output
waveguide
partial beam
output
combined
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Japanese (ja)
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JP2016515222A5 (enExample
JP2016515222A (ja
Inventor
クリスティアン ヴァルト
クリスティアン ヴァルト
シュテファン シャフ
シュテファン シャフ
マルクス デギュンター
マルクス デギュンター
ダニエル ルンデ
ダニエル ルンデ
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033—Means for improving the coupling-out of light from the light guide
    • G02B6/005—Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
    • G02B6/0055—Reflecting element, sheet or layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0994—Fibers, light pipes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033—Means for improving the coupling-out of light from the light guide
    • G02B6/005—Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
    • G02B6/0053—Prismatic sheet or layer; Brightness enhancement element, sheet or layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0096—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the lights guides being of the hollow type
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/262—Optical details of coupling light into, or out of, or between fibre ends, e.g. special fibre end shapes or associated optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2015562039A 2013-03-14 2014-03-07 照射光を案内するための光導波路 Active JP6473700B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361781123P 2013-03-14 2013-03-14
US61/781123 2013-03-14
DE102013204442.9A DE102013204442A1 (de) 2013-03-14 2013-03-14 Optischer Wellenleiter zur Führung von Beleuchtungslicht
DE102013204442.9 2013-03-14
PCT/EP2014/054436 WO2014139881A1 (en) 2013-03-14 2014-03-07 Optical waveguide for guiding illumination light

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019012078A Division JP2019095799A (ja) 2013-03-14 2019-01-28 照射光を案内するための光導波路

Publications (3)

Publication Number Publication Date
JP2016515222A JP2016515222A (ja) 2016-05-26
JP2016515222A5 JP2016515222A5 (enExample) 2017-04-13
JP6473700B2 true JP6473700B2 (ja) 2019-02-20

Family

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Family Applications (2)

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JP2015562039A Active JP6473700B2 (ja) 2013-03-14 2014-03-07 照射光を案内するための光導波路
JP2019012078A Pending JP2019095799A (ja) 2013-03-14 2019-01-28 照射光を案内するための光導波路

Family Applications After (1)

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JP2019012078A Pending JP2019095799A (ja) 2013-03-14 2019-01-28 照射光を案内するための光導波路

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US (2) US9671548B2 (enExample)
JP (2) JP6473700B2 (enExample)
DE (1) DE102013204442A1 (enExample)
WO (1) WO2014139881A1 (enExample)

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DE102014219112A1 (de) * 2014-09-23 2016-03-24 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie sowie Hohlwellenleiter-Komponente hierfür
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Also Published As

Publication number Publication date
US10254466B2 (en) 2019-04-09
DE102013204442A1 (de) 2014-10-02
US20150362660A1 (en) 2015-12-17
US20170261680A1 (en) 2017-09-14
JP2019095799A (ja) 2019-06-20
WO2014139881A1 (en) 2014-09-18
US9671548B2 (en) 2017-06-06
JP2016515222A (ja) 2016-05-26

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