JP6440814B2 - 鋼および超硬合金基板のセラミック硬質材料層の除膜方法 - Google Patents

鋼および超硬合金基板のセラミック硬質材料層の除膜方法 Download PDF

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JP6440814B2
JP6440814B2 JP2017500129A JP2017500129A JP6440814B2 JP 6440814 B2 JP6440814 B2 JP 6440814B2 JP 2017500129 A JP2017500129 A JP 2017500129A JP 2017500129 A JP2017500129 A JP 2017500129A JP 6440814 B2 JP6440814 B2 JP 6440814B2
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film removal
layer
workpiece
holder
hard material
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JP2017508893A (ja
JP2017508893A5 (enExample
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ヴィッテル,ビルギット
ラーツ,グンナル
ビューヒェル,クリスティアン
プロハスカ,ヤン
リュムケマン,アンドレアス
ヴェルクリ,ペーター
チェレ,ティボ
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プラティット・アクチエンゲゼルシャフト
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F5/00Electrolytic stripping of metallic layers or coatings
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/02Etching
    • C25F3/06Etching of iron or steel
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP2017500129A 2014-03-18 2014-03-18 鋼および超硬合金基板のセラミック硬質材料層の除膜方法 Active JP6440814B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/055376 WO2015139731A1 (de) 2014-03-18 2014-03-18 Verfahren zum entschichten von keramischen hartstoffschichten von stahl- und hartmetall-substraten

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JP2017508893A JP2017508893A (ja) 2017-03-30
JP2017508893A5 JP2017508893A5 (enExample) 2018-08-02
JP6440814B2 true JP6440814B2 (ja) 2018-12-19

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JP2017500129A Active JP6440814B2 (ja) 2014-03-18 2014-03-18 鋼および超硬合金基板のセラミック硬質材料層の除膜方法

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US (1) US9879356B2 (enExample)
EP (1) EP3119928B1 (enExample)
JP (1) JP6440814B2 (enExample)
KR (1) KR20170004970A (enExample)
WO (1) WO2015139731A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10501839B2 (en) 2018-04-11 2019-12-10 General Electric Company Methods of removing a ceramic coating from a substrate
WO2020039011A1 (en) * 2018-08-21 2020-02-27 Oerlikon Surface Solutions Ag, Pfäffikon Stripping of coatings al-containing coatings
DK3626864T3 (da) * 2018-09-18 2021-06-07 Rena Tech Austria Gmbh Fremgangsmåde til fjernelse af en hårdmaterialecoating
US11661646B2 (en) 2021-04-21 2023-05-30 General Electric Comapny Dual phase magnetic material component and method of its formation
US11926880B2 (en) 2021-04-21 2024-03-12 General Electric Company Fabrication method for a component having magnetic and non-magnetic dual phases

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0399049B1 (en) 1988-11-07 1995-02-01 Matsushita Electric Industrial Co., Ltd. Plating device for dielectric resonators
JP4326144B2 (ja) 1997-11-10 2009-09-02 エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ 物体より層を分離するための方法
TW591125B (en) * 1998-02-13 2004-06-11 Mitsubishi Heavy Ind Ltd Method and apparatus for removing Ti-derived film
EP1080254B1 (de) 1998-04-21 2003-07-02 Unaxis Balzers Aktiengesellschaft Verfahren zur entschichtung einer auf einem hartmetall-werkstück aufgebrachten hartstoffschicht
US6761807B2 (en) * 2002-03-09 2004-07-13 United Technologies Corporation Molded tooling for use in airfoil stripping processes
DE10259365A1 (de) 2002-04-08 2003-10-30 Siemens Ag Vorrichtung und Verfahren zur Entfernung von Oberflächenbereichen eines Bauteils
US7964085B1 (en) * 2002-11-25 2011-06-21 Applied Materials, Inc. Electrochemical removal of tantalum-containing materials
US7077918B2 (en) * 2004-01-29 2006-07-18 Unaxis Balzers Ltd. Stripping apparatus and method for removal of coatings on metal surfaces
DE102004009757B4 (de) 2004-02-28 2015-12-31 MTU Aero Engines AG Verfahren zum elektrochemischen Entschichten von Bauteilen, Verwendung des Verfahrens und Elektrode zum elektrochemischen Entschichten von Bauteilen
MX347701B (es) 2008-05-02 2017-05-09 Oerlikon Surface Solutions Ag Pfäffikon Procedimiento para decapar piezas de trabajo y solucion de decapado.
CN101845663B (zh) * 2009-03-27 2012-03-07 比亚迪股份有限公司 一种电解退镀液及退镀方法
DE102010010771A1 (de) 2010-03-09 2011-09-15 Lufthansa Technik Ag Verfahren zum elektrochemischen Entschichten von Gasturbinenbauteilen
TWI507573B (zh) 2010-04-15 2015-11-11 Corning Inc 剝除氮化物塗膜之方法
DE102010046372A1 (de) * 2010-09-24 2012-03-29 Oerlikon Trading Ag, Trübbach Verfahren zum Entschichten von Werkstücken
CN103572360A (zh) * 2012-08-02 2014-02-12 深圳富泰宏精密工业有限公司 电解退镀液及应用该电解退镀液进行退镀的方法

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Publication number Publication date
WO2015139731A1 (de) 2015-09-24
KR20170004970A (ko) 2017-01-11
EP3119928B1 (de) 2018-08-22
EP3119928A1 (de) 2017-01-25
US9879356B2 (en) 2018-01-30
JP2017508893A (ja) 2017-03-30
US20170204530A1 (en) 2017-07-20

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