KR20170004970A - 스틸과 초경합금 기판에서 세라믹 하드 물질층의 디코팅 방법 - Google Patents
스틸과 초경합금 기판에서 세라믹 하드 물질층의 디코팅 방법 Download PDFInfo
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- KR20170004970A KR20170004970A KR1020167028952A KR20167028952A KR20170004970A KR 20170004970 A KR20170004970 A KR 20170004970A KR 1020167028952 A KR1020167028952 A KR 1020167028952A KR 20167028952 A KR20167028952 A KR 20167028952A KR 20170004970 A KR20170004970 A KR 20170004970A
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- 239000000463 material Substances 0.000 title claims abstract description 59
- 238000000034 method Methods 0.000 title claims abstract description 57
- 239000000919 ceramic Substances 0.000 title claims abstract description 20
- 229910000831 Steel Inorganic materials 0.000 title abstract description 21
- 239000010959 steel Substances 0.000 title abstract description 21
- 239000000758 substrate Substances 0.000 title abstract description 10
- 230000032798 delamination Effects 0.000 title 1
- 239000003792 electrolyte Substances 0.000 claims abstract description 43
- 230000001681 protective effect Effects 0.000 claims abstract description 18
- 238000001514 detection method Methods 0.000 claims abstract description 9
- 239000000126 substance Substances 0.000 claims description 30
- 238000000576 coating method Methods 0.000 claims description 24
- 239000011248 coating agent Substances 0.000 claims description 22
- 230000003628 erosive effect Effects 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 13
- 239000000243 solution Substances 0.000 claims description 12
- 239000012286 potassium permanganate Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 7
- 229910017604 nitric acid Inorganic materials 0.000 claims description 7
- 239000012670 alkaline solution Substances 0.000 claims description 5
- -1 polyoxymethylene Polymers 0.000 claims description 5
- 230000005404 monopole Effects 0.000 claims description 4
- 239000011810 insulating material Substances 0.000 claims description 3
- 238000009413 insulation Methods 0.000 claims description 3
- 229930040373 Paraformaldehyde Natural products 0.000 claims description 2
- 150000007522 mineralic acids Chemical class 0.000 claims description 2
- 239000012811 non-conductive material Substances 0.000 claims description 2
- 229920006324 polyoxymethylene Polymers 0.000 claims description 2
- 230000035515 penetration Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 117
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 69
- 239000012790 adhesive layer Substances 0.000 description 31
- 238000005070 sampling Methods 0.000 description 20
- 229910000997 High-speed steel Inorganic materials 0.000 description 18
- 229910010037 TiAlN Inorganic materials 0.000 description 15
- 230000001737 promoting effect Effects 0.000 description 15
- 239000000203 mixture Substances 0.000 description 12
- 230000002378 acidificating effect Effects 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 150000002978 peroxides Chemical class 0.000 description 7
- 238000013459 approach Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000003637 basic solution Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910001930 tungsten oxide Inorganic materials 0.000 description 2
- 240000007049 Juglans regia Species 0.000 description 1
- 235000009496 Juglans regia Nutrition 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- DOKDOSPPUPOMEX-UHFFFAOYSA-N bis($l^{2}-stannanylidene)tin Chemical compound [Sn]=[Sn]=[Sn] DOKDOSPPUPOMEX-UHFFFAOYSA-N 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- UMUXBDSQTCDPJZ-UHFFFAOYSA-N chromium titanium Chemical compound [Ti].[Cr] UMUXBDSQTCDPJZ-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006114 decarboxylation reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 235000020234 walnut Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/06—Etching of iron or steel
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2014/055376 WO2015139731A1 (de) | 2014-03-18 | 2014-03-18 | Verfahren zum entschichten von keramischen hartstoffschichten von stahl- und hartmetall-substraten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20170004970A true KR20170004970A (ko) | 2017-01-11 |
Family
ID=50336315
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020167028952A Ceased KR20170004970A (ko) | 2014-03-18 | 2014-03-18 | 스틸과 초경합금 기판에서 세라믹 하드 물질층의 디코팅 방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9879356B2 (enExample) |
| EP (1) | EP3119928B1 (enExample) |
| JP (1) | JP6440814B2 (enExample) |
| KR (1) | KR20170004970A (enExample) |
| WO (1) | WO2015139731A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10501839B2 (en) | 2018-04-11 | 2019-12-10 | General Electric Company | Methods of removing a ceramic coating from a substrate |
| WO2020039011A1 (en) * | 2018-08-21 | 2020-02-27 | Oerlikon Surface Solutions Ag, Pfäffikon | Stripping of coatings al-containing coatings |
| DK3626864T3 (da) * | 2018-09-18 | 2021-06-07 | Rena Tech Austria Gmbh | Fremgangsmåde til fjernelse af en hårdmaterialecoating |
| US11661646B2 (en) | 2021-04-21 | 2023-05-30 | General Electric Comapny | Dual phase magnetic material component and method of its formation |
| US11926880B2 (en) | 2021-04-21 | 2024-03-12 | General Electric Company | Fabrication method for a component having magnetic and non-magnetic dual phases |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0399049B1 (en) | 1988-11-07 | 1995-02-01 | Matsushita Electric Industrial Co., Ltd. | Plating device for dielectric resonators |
| JP4326144B2 (ja) | 1997-11-10 | 2009-09-02 | エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ | 物体より層を分離するための方法 |
| TW591125B (en) * | 1998-02-13 | 2004-06-11 | Mitsubishi Heavy Ind Ltd | Method and apparatus for removing Ti-derived film |
| EP1080254B1 (de) | 1998-04-21 | 2003-07-02 | Unaxis Balzers Aktiengesellschaft | Verfahren zur entschichtung einer auf einem hartmetall-werkstück aufgebrachten hartstoffschicht |
| US6761807B2 (en) * | 2002-03-09 | 2004-07-13 | United Technologies Corporation | Molded tooling for use in airfoil stripping processes |
| DE10259365A1 (de) | 2002-04-08 | 2003-10-30 | Siemens Ag | Vorrichtung und Verfahren zur Entfernung von Oberflächenbereichen eines Bauteils |
| US7964085B1 (en) * | 2002-11-25 | 2011-06-21 | Applied Materials, Inc. | Electrochemical removal of tantalum-containing materials |
| US7077918B2 (en) * | 2004-01-29 | 2006-07-18 | Unaxis Balzers Ltd. | Stripping apparatus and method for removal of coatings on metal surfaces |
| DE102004009757B4 (de) | 2004-02-28 | 2015-12-31 | MTU Aero Engines AG | Verfahren zum elektrochemischen Entschichten von Bauteilen, Verwendung des Verfahrens und Elektrode zum elektrochemischen Entschichten von Bauteilen |
| MX347701B (es) | 2008-05-02 | 2017-05-09 | Oerlikon Surface Solutions Ag Pfäffikon | Procedimiento para decapar piezas de trabajo y solucion de decapado. |
| CN101845663B (zh) * | 2009-03-27 | 2012-03-07 | 比亚迪股份有限公司 | 一种电解退镀液及退镀方法 |
| DE102010010771A1 (de) | 2010-03-09 | 2011-09-15 | Lufthansa Technik Ag | Verfahren zum elektrochemischen Entschichten von Gasturbinenbauteilen |
| TWI507573B (zh) | 2010-04-15 | 2015-11-11 | Corning Inc | 剝除氮化物塗膜之方法 |
| DE102010046372A1 (de) * | 2010-09-24 | 2012-03-29 | Oerlikon Trading Ag, Trübbach | Verfahren zum Entschichten von Werkstücken |
| CN103572360A (zh) * | 2012-08-02 | 2014-02-12 | 深圳富泰宏精密工业有限公司 | 电解退镀液及应用该电解退镀液进行退镀的方法 |
-
2014
- 2014-03-18 WO PCT/EP2014/055376 patent/WO2015139731A1/de not_active Ceased
- 2014-03-18 EP EP14711234.6A patent/EP3119928B1/de active Active
- 2014-03-18 KR KR1020167028952A patent/KR20170004970A/ko not_active Ceased
- 2014-03-18 JP JP2017500129A patent/JP6440814B2/ja active Active
- 2014-03-18 US US15/126,664 patent/US9879356B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015139731A1 (de) | 2015-09-24 |
| JP6440814B2 (ja) | 2018-12-19 |
| EP3119928B1 (de) | 2018-08-22 |
| EP3119928A1 (de) | 2017-01-25 |
| US9879356B2 (en) | 2018-01-30 |
| JP2017508893A (ja) | 2017-03-30 |
| US20170204530A1 (en) | 2017-07-20 |
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Patent event date: 20161018 Patent event code: PA01051R01D Comment text: International Patent Application |
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| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20170117 Patent event code: PE09021S01D |
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Patent event date: 20170524 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20170117 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |