JP6407146B2 - 時計構成要素の表面の処理方法およびその方法によって得られる時計構成要素 - Google Patents

時計構成要素の表面の処理方法およびその方法によって得られる時計構成要素 Download PDF

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Publication number
JP6407146B2
JP6407146B2 JP2015519249A JP2015519249A JP6407146B2 JP 6407146 B2 JP6407146 B2 JP 6407146B2 JP 2015519249 A JP2015519249 A JP 2015519249A JP 2015519249 A JP2015519249 A JP 2015519249A JP 6407146 B2 JP6407146 B2 JP 6407146B2
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Japan
Prior art keywords
layer
oxide
thickness
timepiece
component
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JP2015519249A
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Japanese (ja)
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JP2015522152A (ja
Inventor
ボロン， スザナ デル カルメン トベナス
ボロン， スザナ デル カルメン トベナス
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Rolex SA
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Rolex SA
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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Springs (AREA)
JP2015519249A 2012-07-06 2013-07-08 時計構成要素の表面の処理方法およびその方法によって得られる時計構成要素 Active JP6407146B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12175240 2012-07-06
EP12175240.6 2012-07-06
PCT/EP2013/064413 WO2014006229A1 (fr) 2012-07-06 2013-07-08 Procédé de traitement d'une surface d'un composant horloger et composant horloger obtenu par un tel procédé

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018131997A Division JP6550176B2 (ja) 2012-07-06 2018-07-12 時計構成要素の表面の処理方法およびその方法によって得られる時計構成要素

Publications (2)

Publication Number Publication Date
JP2015522152A JP2015522152A (ja) 2015-08-03
JP6407146B2 true JP6407146B2 (ja) 2018-10-17

Family

ID=48747586

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JP2015519249A Active JP6407146B2 (ja) 2012-07-06 2013-07-08 時計構成要素の表面の処理方法およびその方法によって得られる時計構成要素
JP2018131997A Active JP6550176B2 (ja) 2012-07-06 2018-07-12 時計構成要素の表面の処理方法およびその方法によって得られる時計構成要素

Family Applications After (1)

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JP2018131997A Active JP6550176B2 (ja) 2012-07-06 2018-07-12 時計構成要素の表面の処理方法およびその方法によって得られる時計構成要素

Country Status (5)

Country Link
US (2) US10372083B2 (enExample)
EP (2) EP4439193A3 (enExample)
JP (2) JP6407146B2 (enExample)
CN (1) CN104583880B (enExample)
WO (1) WO2014006229A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3002638B1 (fr) * 2014-09-08 2021-08-18 Richemont International S.A. Procédé de fabrication d'un ressort spiral thermocompensé
CH711218B1 (fr) 2015-06-16 2019-06-14 Nivarox Sa Procédé de fabrication d'un composant horloger.
EP3106928A1 (fr) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Procédé de fabrication comportant une étape de décolletage modifiée
US20170285573A1 (en) * 2016-11-30 2017-10-05 Firehouse Horology, Inc. Crystalline Compounds for Use in Mechanical Watches and Methods of Manufacture Thereof
EP3422116B1 (fr) * 2017-06-26 2020-11-04 Nivarox-FAR S.A. Ressort spiral d'horlogerie
EP3456859A1 (en) * 2017-09-13 2019-03-20 Rolex Sa Protective coating for a complex watch component
EP3608728B1 (fr) * 2018-08-08 2022-02-16 Nivarox-FAR S.A. Spiral thermocompensé coloré et son procédé de fabrication
JP6908064B2 (ja) * 2019-03-14 2021-07-21 セイコーエプソン株式会社 時計用部品、時計用ムーブメントおよび時計
EP3736638B1 (fr) * 2019-05-07 2021-12-01 Nivarox-FAR S.A. Procede de fabrication d'un ressort spiral pour mouvement d'horlogerie
EP3889691B1 (fr) * 2019-05-07 2024-02-21 Nivarox-FAR S.A. Spiral horloger en alliage nb-hf
EP4600758A3 (fr) * 2019-09-24 2025-09-24 Rolex Sa Composant horloger
EP3839644A1 (fr) * 2019-12-20 2021-06-23 Nivarox-FAR S.A. Composant horloger flexible, notamment pour mecanisme oscillateur, et mouvement d'horlogerie comportant un tel composant
EP3954802A1 (fr) * 2020-08-11 2022-02-16 Omega SA Composant noir decore de pierres et son procede de fabrication
EP3968097B1 (fr) * 2020-09-09 2025-03-26 Nivarox-FAR S.A. Ensemble horloger et son procédé de fabrication
EP4001458B1 (fr) * 2020-11-17 2024-10-16 The Swatch Group Research and Development Ltd Procede de depot d'un revetement sur un composant horloger et composant horloger revetu par un tel procede
US12493265B2 (en) * 2022-03-14 2025-12-09 Seiko Watch Kabushiki Kaisha (trading as Seiko Watch Corporation) Hairspring, timepiece movement, and timepiece
EP4520717A1 (fr) * 2023-09-05 2025-03-12 Patek Philippe SA Genève Procédé de fabrication d'un composant horloger en matériau sans déformation plastique, notamment en silicium

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0886195B1 (fr) 1997-06-20 2002-02-13 Montres Rolex Sa Spiral autocompensateur pour oscillateur mécanique balancier-spiral de mouvement d'horlogerie et procédé de fabrication de ce spiral
EP1039352B1 (fr) 1999-03-26 2003-10-08 Rolex Sa Spiral autocompensateur pour balancier-spiral de mouvement d'horlogerie et procédé de traitement de ce spiral
EP1258786B1 (fr) 2001-05-18 2008-02-20 Rolex Sa Spiral auto-compensateur pour oscillateur mécanique balancier-spiral
CN100422386C (zh) * 2002-01-16 2008-10-01 精工爱普生株式会社 装饰品的表面处理方法、装饰品和钟表
JP3960227B2 (ja) * 2002-01-16 2007-08-15 セイコーエプソン株式会社 装飾品の表面処理方法、装飾品および時計
EP1422436B1 (fr) 2002-11-25 2005-10-26 CSEM Centre Suisse d'Electronique et de Microtechnique SA Ressort spiral de montre et son procédé de fabrication
JP4073848B2 (ja) * 2003-09-01 2008-04-09 シチズンホールディングス株式会社 装飾品およびその製造方法
JP5328577B2 (ja) * 2008-09-08 2013-10-30 シチズン時計株式会社 装飾品およびその製造方法
EP2394202B1 (de) * 2009-02-06 2016-09-07 DAMASKO GmbH Mechanisches schwingsystem für uhren sowie funktionselement für uhren
EP2273324A1 (fr) 2009-07-06 2011-01-12 ETA SA Manufacture Horlogère Suisse Procédé de fabrication d'une pièce en relief décorée
EP2337221A1 (fr) * 2009-12-15 2011-06-22 The Swatch Group Research and Development Ltd. Résonateur thermocompensé au moins aux premier et second ordres
CH702353A2 (fr) * 2009-12-15 2011-06-15 Swatch Group Res & Dev Ltd Résonateur thermocompensé au moins aux premier et second ordres.
WO2011103317A1 (en) 2010-02-17 2011-08-25 Art Technology Limited Timepiece with twist restricted flexible display
US20110236654A1 (en) * 2010-03-26 2011-09-29 Wen-Kuang Hsu Method of surface treatment and surface treated article provied by the same
JP5851989B2 (ja) * 2010-06-23 2016-02-03 シチズンホールディングス株式会社 時計用表示板
EP2597536A1 (fr) * 2011-11-25 2013-05-29 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Ressort spiral amélioré et procédé de fabrication dudit ressort spiral

Also Published As

Publication number Publication date
JP6550176B2 (ja) 2019-07-24
US20190271947A1 (en) 2019-09-05
US10372083B2 (en) 2019-08-06
JP2018173425A (ja) 2018-11-08
CN104583880B (zh) 2018-07-13
EP2870512A1 (fr) 2015-05-13
EP4439193A2 (fr) 2024-10-02
EP2870512B1 (fr) 2024-09-11
CN104583880A (zh) 2015-04-29
JP2015522152A (ja) 2015-08-03
WO2014006229A1 (fr) 2014-01-09
EP4439193A3 (fr) 2024-12-18
US20150185701A1 (en) 2015-07-02
US11914328B2 (en) 2024-02-27

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