CN104583880B - 处理钟表组件表面的方法和由这种方法得到的钟表组件 - Google Patents

处理钟表组件表面的方法和由这种方法得到的钟表组件 Download PDF

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Publication number
CN104583880B
CN104583880B CN201380036217.1A CN201380036217A CN104583880B CN 104583880 B CN104583880 B CN 104583880B CN 201380036217 A CN201380036217 A CN 201380036217A CN 104583880 B CN104583880 B CN 104583880B
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China
Prior art keywords
layer
clock
thickness
watch component
oxide
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CN201380036217.1A
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English (en)
Chinese (zh)
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CN104583880A (zh
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苏珊娜·德尔卡门·图贝纳斯·博洛恩
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Rolex SA
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Rolex SA
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Classifications

    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Springs (AREA)
CN201380036217.1A 2012-07-06 2013-07-08 处理钟表组件表面的方法和由这种方法得到的钟表组件 Active CN104583880B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12175240 2012-07-06
EP12175240.6 2012-07-06
PCT/EP2013/064413 WO2014006229A1 (fr) 2012-07-06 2013-07-08 Procédé de traitement d'une surface d'un composant horloger et composant horloger obtenu par un tel procédé

Publications (2)

Publication Number Publication Date
CN104583880A CN104583880A (zh) 2015-04-29
CN104583880B true CN104583880B (zh) 2018-07-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380036217.1A Active CN104583880B (zh) 2012-07-06 2013-07-08 处理钟表组件表面的方法和由这种方法得到的钟表组件

Country Status (5)

Country Link
US (2) US10372083B2 (enExample)
EP (2) EP4439193A3 (enExample)
JP (2) JP6407146B2 (enExample)
CN (1) CN104583880B (enExample)
WO (1) WO2014006229A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12493265B2 (en) * 2022-03-14 2025-12-09 Seiko Watch Kabushiki Kaisha (trading as Seiko Watch Corporation) Hairspring, timepiece movement, and timepiece

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3002638B1 (fr) * 2014-09-08 2021-08-18 Richemont International S.A. Procédé de fabrication d'un ressort spiral thermocompensé
CH711218B1 (fr) 2015-06-16 2019-06-14 Nivarox Sa Procédé de fabrication d'un composant horloger.
EP3106928A1 (fr) * 2015-06-16 2016-12-21 Nivarox-FAR S.A. Procédé de fabrication comportant une étape de décolletage modifiée
US20170285573A1 (en) * 2016-11-30 2017-10-05 Firehouse Horology, Inc. Crystalline Compounds for Use in Mechanical Watches and Methods of Manufacture Thereof
EP3422116B1 (fr) * 2017-06-26 2020-11-04 Nivarox-FAR S.A. Ressort spiral d'horlogerie
EP3456859A1 (en) * 2017-09-13 2019-03-20 Rolex Sa Protective coating for a complex watch component
EP3608728B1 (fr) * 2018-08-08 2022-02-16 Nivarox-FAR S.A. Spiral thermocompensé coloré et son procédé de fabrication
JP6908064B2 (ja) * 2019-03-14 2021-07-21 セイコーエプソン株式会社 時計用部品、時計用ムーブメントおよび時計
EP3736638B1 (fr) * 2019-05-07 2021-12-01 Nivarox-FAR S.A. Procede de fabrication d'un ressort spiral pour mouvement d'horlogerie
EP3889691B1 (fr) * 2019-05-07 2024-02-21 Nivarox-FAR S.A. Spiral horloger en alliage nb-hf
EP4600758A3 (fr) * 2019-09-24 2025-09-24 Rolex Sa Composant horloger
EP3839644A1 (fr) * 2019-12-20 2021-06-23 Nivarox-FAR S.A. Composant horloger flexible, notamment pour mecanisme oscillateur, et mouvement d'horlogerie comportant un tel composant
EP3954802A1 (fr) * 2020-08-11 2022-02-16 Omega SA Composant noir decore de pierres et son procede de fabrication
EP3968097B1 (fr) * 2020-09-09 2025-03-26 Nivarox-FAR S.A. Ensemble horloger et son procédé de fabrication
EP4001458B1 (fr) * 2020-11-17 2024-10-16 The Swatch Group Research and Development Ltd Procede de depot d'un revetement sur un composant horloger et composant horloger revetu par un tel procede
EP4520717A1 (fr) * 2023-09-05 2025-03-12 Patek Philippe SA Genève Procédé de fabrication d'un composant horloger en matériau sans déformation plastique, notamment en silicium

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1268682A (zh) * 1999-03-26 2000-10-04 劳力士表股份有限公司 手表机构中螺旋摆轮的自补偿游丝及处理该游丝的方法
CH702353A2 (fr) * 2009-12-15 2011-06-15 Swatch Group Res & Dev Ltd Résonateur thermocompensé au moins aux premier et second ordres.
WO2011103317A1 (en) * 2010-02-17 2011-08-25 Art Technology Limited Timepiece with twist restricted flexible display
EP2371993A1 (en) * 2010-03-26 2011-10-05 National Tsing Hua University Method of surface treatment and surface treated article provided by the same
CN102483607A (zh) * 2009-07-06 2012-05-30 Eta瑞士钟表制造股份有限公司 制造装饰有凸起的部件的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0886195B1 (fr) 1997-06-20 2002-02-13 Montres Rolex Sa Spiral autocompensateur pour oscillateur mécanique balancier-spiral de mouvement d'horlogerie et procédé de fabrication de ce spiral
EP1258786B1 (fr) 2001-05-18 2008-02-20 Rolex Sa Spiral auto-compensateur pour oscillateur mécanique balancier-spiral
CN100422386C (zh) * 2002-01-16 2008-10-01 精工爱普生株式会社 装饰品的表面处理方法、装饰品和钟表
JP3960227B2 (ja) * 2002-01-16 2007-08-15 セイコーエプソン株式会社 装飾品の表面処理方法、装飾品および時計
EP1422436B1 (fr) 2002-11-25 2005-10-26 CSEM Centre Suisse d'Electronique et de Microtechnique SA Ressort spiral de montre et son procédé de fabrication
JP4073848B2 (ja) * 2003-09-01 2008-04-09 シチズンホールディングス株式会社 装飾品およびその製造方法
JP5328577B2 (ja) * 2008-09-08 2013-10-30 シチズン時計株式会社 装飾品およびその製造方法
EP2394202B1 (de) * 2009-02-06 2016-09-07 DAMASKO GmbH Mechanisches schwingsystem für uhren sowie funktionselement für uhren
EP2337221A1 (fr) * 2009-12-15 2011-06-22 The Swatch Group Research and Development Ltd. Résonateur thermocompensé au moins aux premier et second ordres
JP5851989B2 (ja) * 2010-06-23 2016-02-03 シチズンホールディングス株式会社 時計用表示板
EP2597536A1 (fr) * 2011-11-25 2013-05-29 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Ressort spiral amélioré et procédé de fabrication dudit ressort spiral

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1268682A (zh) * 1999-03-26 2000-10-04 劳力士表股份有限公司 手表机构中螺旋摆轮的自补偿游丝及处理该游丝的方法
CN102483607A (zh) * 2009-07-06 2012-05-30 Eta瑞士钟表制造股份有限公司 制造装饰有凸起的部件的方法
CH702353A2 (fr) * 2009-12-15 2011-06-15 Swatch Group Res & Dev Ltd Résonateur thermocompensé au moins aux premier et second ordres.
WO2011103317A1 (en) * 2010-02-17 2011-08-25 Art Technology Limited Timepiece with twist restricted flexible display
EP2371993A1 (en) * 2010-03-26 2011-10-05 National Tsing Hua University Method of surface treatment and surface treated article provided by the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12493265B2 (en) * 2022-03-14 2025-12-09 Seiko Watch Kabushiki Kaisha (trading as Seiko Watch Corporation) Hairspring, timepiece movement, and timepiece

Also Published As

Publication number Publication date
JP6550176B2 (ja) 2019-07-24
US20190271947A1 (en) 2019-09-05
US10372083B2 (en) 2019-08-06
JP6407146B2 (ja) 2018-10-17
JP2018173425A (ja) 2018-11-08
EP2870512A1 (fr) 2015-05-13
EP4439193A2 (fr) 2024-10-02
EP2870512B1 (fr) 2024-09-11
CN104583880A (zh) 2015-04-29
JP2015522152A (ja) 2015-08-03
WO2014006229A1 (fr) 2014-01-09
EP4439193A3 (fr) 2024-12-18
US20150185701A1 (en) 2015-07-02
US11914328B2 (en) 2024-02-27

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